JP5945508B2 - 工作物をプラズマ処理する方法および装置 - Google Patents
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0218—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using optical fibers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/443—Emission spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/32779—Continuous moving of batches of workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
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- Chemical & Material Sciences (AREA)
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- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
Description
さらに本発明は、工作物を受容するための少なくとも1つの真空化可能なプラズマチャンバーを有し、該プラズマチャンバーが処理ステーションの領域に配置され、前記プラズマチャンバーがチャンバー底部とチャンバーカバーと側部のチャンバー壁とによって画成され、前記プラズマチャンバーが方法工程を光学的に監視するための光学的監視装置と連結されている、工作物をプラズマ処理する装置に関するものである。
Claims (12)
- 工作物をプラズマチャンバー内へ挿入し、プラズマを点火した後に負圧を作用させた状態で工作物上に層を析出させ、方法ステップを少なくとも一時的に光学的に監視するようにした、工作物をプラズマ処理する方法において、
光学的に監視する際、500ナノメートル以上のプラズマ光線の波長を評価し、検出したプラズマ放出光線の少なくとも一部を少なくとも1つの光導波路(44)によって伝送し、光学的監視の際に検出した信号推移の少なくとも一部を、予め設定可能な少なくとも1つの時間にわたって、予め設定可能なスペクトル範囲に対してすべての強度に関し積分することを特徴とする方法。 - 600ナノメートル以上のスペクトル線を評価することを特徴とする、請求項1に記載の方法。
- 700ナノメートル以上のスペクトル線を評価することを特徴とする、請求項1に記載の方法。
- 少なくとも2つの異なるスペクトル線を評価することを特徴とする、請求項1から3までのいずれか一つに記載の方法。
- 前記予め設定可能なスペクトル範囲が700ナノメートルないし1000ナノメートルであることを特徴とする、請求項1に記載の方法。
- 前記光導波路(44)が少なくとも1つのフォト要素(45)と連結され、該フォト要素の信号を前記フォト要素(45)に近い位置で増幅させることを特徴とする、請求項1から5までのいずれか一つに記載の方法。
- プラズマの点火をマイクロ波発生器を用いて行い、マイクロ波発生器から出力され、マグネトロン内へのエネルギーチャージに対応する変調電流・電圧信号推移を、予め設定可能な少なくとも1つの時間にわたって積分することを特徴とする、請求項1から6までのいずれか一つに記載の方法。
- 積分値を、光学的監視の積分値との相関関係で参照値として使用することを特徴とする、請求項7に記載の方法。
- 工作物を受容するための少なくとも1つの真空化可能なプラズマチャンバーを有し、該プラズマチャンバーが処理ステーションの領域に配置され、前記プラズマチャンバーがチャンバー底部とチャンバーカバーと側部のチャンバー壁とによって画成され、前記プラズマチャンバーが方法工程を光学的に監視するための光学的監視装置と連結されている、工作物をプラズマ処理する装置において、
前記光学的監視装置(40)が、信号伝送用の少なくとも1つの光導波路(44)を有し、且つプラズマから放出された500ナノメートル以上のスペクトル線を評価するように構成され、且つ光学的監視の際に検出した信号推移の少なくとも一部を、予め設定可能な少なくとも1つの時間にわたって、予め設定可能なスペクトル範囲に対してすべての強度に関し積分するように構成されていることを特徴とする装置。 - 前記光導波路(44)が少なくとも1つのフォト要素(45)と連結され、該フォト要素の付近に、検出した信号用の増幅器が配置されていることを特徴とする、請求項9に記載の装置。
- 前記増幅器が少なくとも2つの切換え可能な増幅ファクタを有していることを特徴とする、請求項10に記載の装置。
- 前記光学的監視装置(40)が、信号推移用の積分器を備えた評価装置(47)を有していることを特徴とする、請求項9から11までのいずれか一つに記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010012501.6 | 2010-03-12 | ||
DE102010012501A DE102010012501A1 (de) | 2010-03-12 | 2010-03-12 | Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken |
PCT/DE2011/000234 WO2011110162A1 (de) | 2010-03-12 | 2011-03-03 | Verfahren und vorrichtung zur plasmabehandlung von werkstücken |
Publications (2)
Publication Number | Publication Date |
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JP2013522464A JP2013522464A (ja) | 2013-06-13 |
JP5945508B2 true JP5945508B2 (ja) | 2016-07-05 |
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Application Number | Title | Priority Date | Filing Date |
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JP2012557405A Active JP5945508B2 (ja) | 2010-03-12 | 2011-03-03 | 工作物をプラズマ処理する方法および装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9371585B2 (ja) |
EP (1) | EP2545196B1 (ja) |
JP (1) | JP5945508B2 (ja) |
DE (1) | DE102010012501A1 (ja) |
WO (1) | WO2011110162A1 (ja) |
Families Citing this family (3)
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DE102012200976A1 (de) | 2012-01-24 | 2013-07-25 | Krones Ag | Qualitätskontrolle von Behälterbeschichtungen |
DE102017120017A1 (de) * | 2017-08-31 | 2019-02-28 | Plasmatreat Gmbh | Düsenanordnung für eine Vorrichtung zur Erzeugung eines atmosphärischen Plasmastrahls, System und Verfahren zur Überwachung und/oder Steuerung des Systems |
DE102018132609A1 (de) * | 2018-12-18 | 2020-06-18 | Krones Ag | Vorrichtung und Verfahren zum Beschichten von Behältnissen |
Family Cites Families (19)
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JPH0765993A (ja) * | 1993-08-20 | 1995-03-10 | Anelva Corp | 有磁場マイクロ波放電反応装置 |
ES2131810T5 (es) | 1994-02-16 | 2004-02-16 | The Coca-Cola Company | Recipientes huecos con superficies interiores inertes o impermeables producidas por reaccion superficial asistida por plasma o polimerizacion sobre la superficie. |
DE19629877C1 (de) | 1996-07-24 | 1997-03-27 | Schott Glaswerke | CVD-Verfahren und Vorrichtung zur Innenbeschichtung von Hohlkörpern |
AU744162B2 (en) | 1997-02-19 | 2002-02-14 | Kirin Beer Kabushiki Kaisha | Method and apparatus for producing plastic container having carbon film coating |
RU2199792C2 (ru) | 1997-09-30 | 2003-02-27 | Тетра Лаваль Холдинг Энд Финанс С.А. | Способ и устройство для плазменной обработки внутренней поверхности пластиковых бутылок |
FR2791598B1 (fr) | 1999-03-30 | 2001-06-22 | Sidel Sa | Machine a carrousel pour le traitement de corps creux comportant un circuit de distribution de pression perfectionne et distributeur pour une telle machine |
FR2799994B1 (fr) | 1999-10-25 | 2002-06-07 | Sidel Sa | Dispositif pour le traitement d'un recipient a l'aide d'un plasma a basse pression comportant un circuit de vide perfectionne |
JP2001284322A (ja) * | 2000-03-30 | 2001-10-12 | Sharp Corp | プラズマプロセス装置、プラズマプロセス装置の制御方法および不良品判定方法 |
KR20050007341A (ko) | 2002-04-26 | 2005-01-17 | 호카이세이칸가부시끼가이샤 | 내면 피복 플라스틱 용기 및 그 제조 방법 |
JP4340764B2 (ja) * | 2002-04-26 | 2009-10-07 | 北海製罐株式会社 | 内面被覆プラスチック容器の製造方法 |
JP4411896B2 (ja) * | 2003-07-30 | 2010-02-10 | 凸版印刷株式会社 | 薄膜成膜プロセスの監視方法および薄膜成膜装置 |
US8062716B2 (en) * | 2002-09-30 | 2011-11-22 | Toppan Printing Co., Ltd. | Method for forming thin film, apparatus for forming thin film, and method for monitoring thin film forming process |
JP2005002469A (ja) * | 2003-05-16 | 2005-01-06 | Mitsubishi Heavy Ind Ltd | 樹脂容器の成膜監視装置及び成膜監視方法並びに樹脂容器の製造システム |
JP4379057B2 (ja) * | 2003-09-05 | 2009-12-09 | 東洋製罐株式会社 | 蒸着膜検査方法及び蒸着膜検査システム |
DE102004020185B4 (de) | 2004-04-22 | 2013-01-17 | Schott Ag | Verfahren und Vorrichtung für die Innenbeschichtung von Hohlkörpern sowie Verwendung der Vorrichtung |
DE102004042431B4 (de) * | 2004-08-31 | 2008-07-03 | Schott Ag | Verfahren und Vorrichtung zur Plasmabeschichtung von Werkstücken mit spektraler Auswertung der Prozessparameter und Verwendung der Vorrichtung |
FR2892854A1 (fr) * | 2005-10-27 | 2007-05-04 | Sidel Sas | Methode de surveillance d'un plasma, dispositif pour la mise en oeuvre de cette methode, application de cette methode au depot d'un film sur corps creux en pet |
DE102006053366A1 (de) * | 2006-11-10 | 2008-05-15 | Schott Ag | Verfahren und Vorrichtung zur plasmaunterstützten chemischen Dampfphasenabscheidung |
DE102008016923A1 (de) * | 2008-03-31 | 2009-10-01 | Khs Corpoplast Gmbh & Co. Kg | Vorrichtung zur Plasmabehandlung von Werkstücken |
-
2010
- 2010-03-12 DE DE102010012501A patent/DE102010012501A1/de not_active Withdrawn
-
2011
- 2011-03-03 US US13/634,138 patent/US9371585B2/en active Active
- 2011-03-03 JP JP2012557405A patent/JP5945508B2/ja active Active
- 2011-03-03 WO PCT/DE2011/000234 patent/WO2011110162A1/de active Application Filing
- 2011-03-03 EP EP11723860.0A patent/EP2545196B1/de active Active
Also Published As
Publication number | Publication date |
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JP2013522464A (ja) | 2013-06-13 |
DE102010012501A1 (de) | 2011-09-15 |
US9371585B2 (en) | 2016-06-21 |
EP2545196A1 (de) | 2013-01-16 |
WO2011110162A8 (de) | 2013-08-29 |
EP2545196B1 (de) | 2019-06-26 |
US20130004682A1 (en) | 2013-01-03 |
WO2011110162A1 (de) | 2011-09-15 |
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