JP2013545897A - 工作物のプラズマ処理方法およびガスバリヤー層を備えた工作物 - Google Patents
工作物のプラズマ処理方法およびガスバリヤー層を備えた工作物 Download PDFInfo
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- JP2013545897A JP2013545897A JP2013543528A JP2013543528A JP2013545897A JP 2013545897 A JP2013545897 A JP 2013545897A JP 2013543528 A JP2013543528 A JP 2013543528A JP 2013543528 A JP2013543528 A JP 2013543528A JP 2013545897 A JP2013545897 A JP 2013545897A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
本発明は、さらに、少なくとも1つの表面の領域に、プラズマから析出される、SiOxを含むガスバリヤー層を備え、該ガスバリヤー層の上に、炭素を含んでいる保護層が配置されている、熱可塑性材料から成る工作物にも関する。
Claims (15)
- 工作物をプラズマチャンバーに挿入し、次に負圧を作用させてプラズマの着火後に前記工作物上に被膜を析出させ、プラズマの着火をマイクロ波エネルギーによって行い、前記被膜が、少なくとも、ガスバリヤー層と保護層とから成り、前記ガスバリヤー層がSiOxを含み、前記保護層が炭素を含んでいるプラズマ処理方法において、
前記保護層(42)を、少なくとも1つの珪素化合物とアルゴンとを含んでいるガスから生成させることを特徴とする方法。 - プロセスガスとしてHMDSOを使用することを特徴とする、請求項1に記載の方法。
- プロセスガスとしてHMDSNを使用することを特徴とする、請求項1に記載の方法。
- プラズマの着火のために、パルス化したマイクロ波を使用することを特徴とする、請求項1から3までのいずれか一つに記載の方法。
- 前記保護層(42)の生成中に、前記プロセスガスを時間的にほぼ一定の体積流で供給することを特徴とする、請求項1から4までのいずれか一つに記載の方法。
- 前記保護層(42)内に、ほぼ30ないし60元素パーセンテージの成分で炭素を析出させることを特徴とする、請求項1から5までのいずれか一つに記載の方法。
- 前記工作物(5)と前記バリヤー層(40)との間に接着層(41)を生成させることを特徴とする、請求項1から6までのいずれか一つに記載の方法。
- アルゴンに加えて少なくとも1つの他の希ガスを使用することを特徴とする、請求項1から7までのいずれか一つに記載の方法。
- 前記保護層(42)の生成中に、酸素をプロセスガスとして供給しないことを特徴とする、請求項1から8までのいずれか一つに記載の方法。
- 前記接着層(41)の生成中に、酸素をプロセスガスとして供給しないことを特徴とする、請求項1から8までのいずれか一つに記載の方法。
- 前記バリヤー層(40)の生成中に、アルゴンをプロセスガスとして供給しないことを特徴とする、請求項1から10までのいずれか一つに記載の方法。
- 少なくとも1つの表面の領域に、プラズマから析出される、SiOxを含むガスバリヤー層を備え、該ガスバリヤー層の上に、炭素成分を含む保護層が配置されている、熱可塑性材料から成る工作物において、
前記保護層(42)がアルゴンを含んでいることを特徴とする工作物。 - 前記工作物と前記バリヤー層(40)との間に接着層(41)が配置されていることを特徴とする、請求項12に記載の工作物。
- 前記工作物が、ボトルとして形成され、且つ内面の領域に前記ガスバリヤー層(40)を備えていることを特徴とする、請求項12または13に記載の工作物。
- 前記接着層(41)がアルゴンを含んでいることを特徴とする、請求項12から14までのいずれか一つに記載の工作物。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010055155.4 | 2010-12-15 | ||
DE102010055155A DE102010055155A1 (de) | 2010-12-15 | 2010-12-15 | Verfahren zur Plasmabehandlung von Werkstücken sowie Werkstück mit Gasbarriereschicht |
PCT/DE2011/002159 WO2012089196A1 (de) | 2010-12-15 | 2011-12-15 | Verfahren zur plasmabehandlung von werkstücken sowie werkstück mit gasbarriereschicht |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2013545897A true JP2013545897A (ja) | 2013-12-26 |
Family
ID=45936583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013543528A Pending JP2013545897A (ja) | 2010-12-15 | 2011-12-15 | 工作物のプラズマ処理方法およびガスバリヤー層を備えた工作物 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20130264303A1 (ja) |
EP (1) | EP2652169A1 (ja) |
JP (1) | JP2013545897A (ja) |
DE (1) | DE102010055155A1 (ja) |
WO (1) | WO2012089196A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019510881A (ja) * | 2016-03-24 | 2019-04-18 | カーハーエス コーポプラスト ゲーエムベーハー | 容器をプラズマ処理するための方法および装置 |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PL2251454T3 (pl) | 2009-05-13 | 2014-12-31 | Sio2 Medical Products Inc | Powlekanie i kontrola pojemnika |
US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
DE102011104730A1 (de) | 2011-06-16 | 2012-12-20 | Khs Corpoplast Gmbh | Verfahren zur Plasmabehandlung von Werkstücken sowie Werkstück mit Gasbarriereschicht |
US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
EP2776603B1 (en) | 2011-11-11 | 2019-03-06 | SiO2 Medical Products, Inc. | PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS |
US9903782B2 (en) | 2012-11-16 | 2018-02-27 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
EP2925903B1 (en) | 2012-11-30 | 2022-04-13 | Si02 Medical Products, Inc. | Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like |
US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
KR102336796B1 (ko) | 2013-03-11 | 2021-12-10 | 에스아이오2 메디컬 프로덕츠, 인크. | 코팅된 패키징 |
WO2014144926A1 (en) | 2013-03-15 | 2014-09-18 | Sio2 Medical Products, Inc. | Coating method |
EP3122917B1 (en) | 2014-03-28 | 2020-05-06 | SiO2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
JP2018523538A (ja) | 2015-08-18 | 2018-08-23 | エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド | 低酸素透過速度を有する薬剤包装及び他の包装 |
USD977142S1 (en) | 2016-08-18 | 2023-01-31 | Sio2 Medical Products, Inc. | Vial |
USD948743S1 (en) | 2019-11-06 | 2022-04-12 | Sio2 Medical Products, Inc. | Collection tube assembly |
USD962466S1 (en) | 2019-11-06 | 2022-08-30 | Sio2 Medical Products, Inc. | Collection tube assembly |
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2010
- 2010-12-15 DE DE102010055155A patent/DE102010055155A1/de not_active Withdrawn
-
2011
- 2011-12-15 JP JP2013543528A patent/JP2013545897A/ja active Pending
- 2011-12-15 EP EP11831820.3A patent/EP2652169A1/de not_active Withdrawn
- 2011-12-15 WO PCT/DE2011/002159 patent/WO2012089196A1/de active Application Filing
- 2011-12-15 US US13/993,778 patent/US20130264303A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
---|---|
WO2012089196A1 (de) | 2012-07-05 |
DE102010055155A1 (de) | 2012-06-21 |
WO2012089196A9 (de) | 2012-09-07 |
EP2652169A1 (de) | 2013-10-23 |
US20130264303A1 (en) | 2013-10-10 |
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