JP4636875B2 - 工作物のプラズマ処理方法および装置 - Google Patents
工作物のプラズマ処理方法および装置 Download PDFInfo
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- JP4636875B2 JP4636875B2 JP2004507556A JP2004507556A JP4636875B2 JP 4636875 B2 JP4636875 B2 JP 4636875B2 JP 2004507556 A JP2004507556 A JP 2004507556A JP 2004507556 A JP2004507556 A JP 2004507556A JP 4636875 B2 JP4636875 B2 JP 4636875B2
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- 238000003672 processing method Methods 0.000 title 1
- 238000000034 method Methods 0.000 claims description 57
- 238000012545 processing Methods 0.000 claims description 27
- 238000000576 coating method Methods 0.000 claims description 22
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- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 15
- 238000009832 plasma treatment Methods 0.000 claims description 7
- 238000003780 insertion Methods 0.000 claims description 6
- 230000037431 insertion Effects 0.000 claims description 6
- 230000004888 barrier function Effects 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
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- 230000001954 sterilising effect Effects 0.000 claims description 3
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- 239000011368 organic material Substances 0.000 claims description 2
- 238000006116 polymerization reaction Methods 0.000 claims description 2
- 239000004416 thermosoftening plastic Substances 0.000 claims description 2
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- 239000011247 coating layer Substances 0.000 description 1
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
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Description
さらに本発明は、工作物を受容するための少なくとも1つの排気可能なプラズマチャンバーを有し、プラズマチャンバーが処理ステーションの領域に配置され、該プラズマチャンバーがチャンバー底部とチャンバーカバーと側部のチャンバー壁とによって画成され、且つ工作物を位置決めするための少なくとも1つの保持要素を有している、工作物をプラズマ処理するための装置にも関わる。
図1はプラズマモジュール(1)を示している。プラズマモジュール(1)は回転するプラズマホイール(2)を備えている。プラズマホイール(2)の周囲に沿って多数のプラズマステーション(3)が配置されている。プラズマステーション(3)は処理対象である工作物(5)を受容するためのキャビティまたはプラズマチャンバー(17)を備えている。
Claims (58)
- 工作物を処理ステーションの少なくとも部分的に排気可能なチャンバーのなかへ挿入し、工作物を処理ステーションの内部で保持要素により位置決めするようにした工作物をプラズマ処理するための方法において、
‐工作物(5)がキャビティ長手軸線(53)の方向に位置変化可能に案内され且つ処理位置決めにおいて開口領域によってパッキン(73)に対し押圧されるように工作物(5)に対し保持要素(46)を作用させること、
‐工作物(5)が保持要素(46)の互いに相対的に位置決め可能な少なくとも2つの締付け要素の間にある締付け空間(54)により受容されるように、工作物(5)に対し前記締付け要素を作用させること、
‐締付け要素の位置決めを水平方向において行うこと、及び
‐工作物(5)をやっとこ状の保持アーム(47,48)により位置決めすること
を特徴とする方法。 - プラズマステーション(3)のキャビティ(4)の排気をチャンバー底部(29)を通じて行うことを特徴とする、請求項1に記載の方法。
- チャンバー底部(29)を通じてプロセスガスを供給することを特徴とする、請求項1または2に記載の方法。
- プロセスガスを長棒(36)を通じて工作物(5)の内部空間内へ供給することを特徴とする、請求項1から3までのいずれか一つに記載の方法。
- 工作物(5)を回動可能に支持される保持アーム(47,48)により位置決めすることを特徴とする、請求項1から4までのいずれか一つに記載の方法。
- 保持アーム(48,49)をばねによりロック位置へ押圧することを特徴とする、請求項5に記載の方法。
- 工作物(5)を締付け空間(54)内へ挿入するときに保持アーム(47,48)を互いに押し広げることを特徴とする、請求項1から6までのいずれか一つに記載の方法。
- 工作物(5)を締付け空間(54)から取り出すときに保持アーム(47,48)を互いに押し広げることを特徴とする、請求項1から7までのいずれか一つに記載の方法。
- 保持アーム(47,48)を固定するためのロック要素(59,60)をチャンバー壁(18)とともに位置決めすることを特徴とする、請求項1から8までのいずれか一つに記載の方法。
- 保持アーム(47,48)と同じ高さレベルで、工作物(5)を固定するためのストッパー要素(61)を配置することを特徴とする、請求項1から9までのいずれか一つに記載の方法。
- チャンバーカバー(31)の領域でマイクロ波発生器(19)により発生させたマイクロ波をキャビティ(4)内へ誘導することを特徴とする、請求項1から10までのいずれか一つに記載の方法。
- 熱可塑性プラスチックから成る工作物(5)を処理することを特徴とする、請求項1から11までのいずれか一つに記載の方法。
- 中空体状の工作物(5)の内部空間を処理することを特徴とする、請求項1から12までのいずれか一つに記載の方法。
- 工作物(5)として容器を処理することを特徴とする、請求項1から13までのいずれか一つに記載の方法。
- 工作物(5)として飲料物のボトルを処理することを特徴とする、請求項1から14までのいずれか一つに記載の方法。
- 少なくとも1つのプラズマステーション(3)を回転するプラズマホイール(2)により装入位置から排出位置へ移送することを特徴とする、請求項1から15までのいずれか一つに記載の方法。
- 1つのプラズマステーション(3)により複数個のキャビティ(4)を提供することを特徴とする、請求項1から16までのいずれか一つに記載の方法。
- 工作物(5)を開口領域において保持アーム(47,48)により固定することを特徴とする、請求項1から17までのいずれか一つに記載の方法。
- プラズマ処理としてプラズマコーティングを行なうことを特徴とする、請求項1から18までのいずれか一つに記載の方法。
- プラズマ重合処理を実施することを特徴とする、請求項1から19までのいずれか一つに記載の方法。
- プラズマにより少なくとも部分的に有機物質を析出させることを特徴とする、請求項1から20までのいずれか一つに記載の方法。
- プラズマにより少なくとも部分的に非有機物質を析出させることを特徴とする、請求項1から21までのいずれか一つに記載の方法。
- プラズマにより工作物(5)のバリヤー特性を改善させる物質を析出させることを特徴とする、請求項1から22までのいずれか一つに記載の方法。
- 工作物(5)の表面上での物質の付着力を改善させる結合剤を付加的に析出させることを特徴とする、請求項23に記載の方法。
- 1つの共通のキャビティ(4)で少なくとも2つの工作物(5)を同時に処理することを特徴とする、請求項1から24までのいずれか一つに記載の方法。
- プラズマ処理としてプラズマ殺菌を実施することを特徴とする、請求項1から18までのいずれか一つに記載の方法。
- プラズマ処理として工作物(5)の表面活性処理を実施することを特徴とする、請求項1から18までのいずれか一つに記載の方法。
- プラズマステーション(3)の1つのチャンバー壁(18)を変位させることにより保持要素(46)を位置決めすることを特徴とする、請求項1から27までのいずれか一つに記載の方法。
- 保持要素(46)を少なくとも1つのばね(74,75)により基本位置へ保持することを特徴とする、請求項1から28までのいずれか一つに記載の方法。
- 工作物を受容するための少なくとも1つの排気可能なプラズマチャンバーを有し、プラズマチャンバーが処理ステーションの領域に配置され、該プラズマチャンバーがチャンバー底部とチャンバーカバーと側部のチャンバー壁とによって画成され、且つ工作物を位置決めするための少なくとも1つの保持要素を有している、工作物をプラズマ処理するための装置において、
‐保持要素(46)が少なくともキャビティ長手軸線(53)の方向において位置変化可能であるように配置されていること、
‐保持要素(46)の一部として形成された台座要素(71)が工作物(5)の開口領域に作用するパッキン(73)を有していること、
‐保持要素(46)が互いに相対的に位置決め可能な少なくとも2つの締付け要素を有し、締付け要素が工作物(5)を受容するための締付け空間(54)を提供するように互いに間隔をもって配置されていること、
‐締付け要素が水平方向に位置決め可能であること、及び
‐締付け要素がやっとこ状に配置される保持アーム(47,48)により提供されていること
を特徴とする装置。 - プラズマステーション(3)のキャビティ(4)を排気するためにチャンバー底部(29)に少なくとも1つの真空管路が配置されていることを特徴とする、請求項30に記載の装置。
- チャンバー底部(29)に、プロセスガスを供給するための少なくとも1つの管路が配置されていることを特徴とする、請求項30または31に記載の装置。
- 工作物(5)の内部空間にプロセスガスを供給するため、チャンバー底部(29)に対し相対的に位置決め可能に長棒(36)が配置されていることを特徴とする、請求項30から32までのいずれか一つに記載の装置。
- 保持アーム(48,49)が回転軸線(49,50)に対し相対的に回動可能に配置されていることを特徴とする、請求項30から33までのいずれか一つに記載の装置。
- 保持アーム(47,48)がロック位置の方向へ弾性的に緊張固定させる弾性緊張固定部を備えていることを特徴とする、請求項30から34までのいずれか一つに記載の装置。
- 弾性緊張固定部が脚ばね(51,52)により形成されていることを特徴とする、請求項35に記載の装置。
- 保持アーム(47,48)がそれぞれ挿入傾斜部(67)を備えた複数個の固定突起(55,56)を有していることを特徴とする、請求項30から36までのいずれか一つに記載の装置。
- 保持アーム(47,48)がそれぞれ排出傾斜部(68)を備えた複数個の固定突起(55,56)を有していることを特徴とする、請求項30から37までのいずれか一つに記載の装置。
- 保持アーム(47,48)がその固定突起(55,56)とは逆の側の膨張部の領域にロック細条部(57,58)を備えていることを特徴とする、請求項30から38までのいずれか一つに記載の装置。
- チャンバーカバー(31)の領域にマイクロ波発生器(19)が配置されていることを特徴とする、請求項30から39までのいずれか一つに記載の装置。
- プラズマステーション(3)が熱可塑性プラスチックから成る工作物(5)をコーティングするために構成されていることを特徴とする、請求項30から40までのいずれか一つに記載の装置。
- プラズマステーション(3)が容器状の工作物(5)をコーティングするために構成されていることを特徴とする、請求項30から41までのいずれか一つに記載の装置。
- プラズマステーション(3)が中空体状の工作物(5)の内部空間をコーティングするために構成されていることを特徴とする、請求項30から42までのいずれか一つに記載の装置。
- プラズマステーション(3)が飲料物のボトルの形態の工作物(5)をコーティングするために構成されていることを特徴とする、請求項30から43までのいずれか一つに記載の装置。
- 少なくとも1つのプラズマステーション(3)が回転するプラズマホイール(2)によって担持されていることを特徴とする、請求項30から44までのいずれか一つに記載の装置。
- プラズマステーション(3)の領域に複数個のキャビティ(4)が配置されていることを特徴とする、請求項30から45までのいずれか一つに記載の装置。
- 少なくとも2つのキャビティ(4)を提供するために設けられるチャンバー壁(18)が位置決め可能に配置されていることを特徴とする、請求項30から46までのいずれか一つに記載の装置。
- ロック細条部(57,58)がロック要素(59,60)により固定可能であることを特徴とする、請求項30から47までのいずれか一つに記載の装置。
- ロック要素(59,60)が硬化材料から形成されていることを特徴とする、請求項48に記載の装置。
- ロック要素(59,60)がチャンバー壁(18)により位置決め可能であることを特徴とする、請求項48または49に記載の装置。
- 保持要素(46)が工作物(5)のためのストッパー要素(61)を備えていることを特徴とする、請求項30から50までのいずれか一つに記載の装置。
- 固定突起(55,56)とストッパー要素(61)とが同じ高さレベルに配置されていることを特徴とする、請求項30から51までのいずれか一つに記載の装置。
- 固定突起(55,56)とストッパー要素(61)とがボトル状の工作物(5)の開口領域に作用するための高さレベルに配置されていることを特徴とする、請求項30から52までのいずれか一つに記載の装置。
- 固定突起(55,56)とストッパー要素(61)とがボトル状の工作物(5)の開口領域に作用するための高さレベルで工作物(5)の支持リング(69)と工作物(5)の肩領域(70)との間に配置されていることを特徴とする、請求項30から53までのいずれか一つに記載の装置。
- 保持要素(46)がプラズマステーション(3)のチャンバー壁(18)によって位置決め可能であることを特徴とする、請求項30から54までのいずれか一つに記載の装置。
- 保持要素(46)が出発位置へ位置決めするための少なくとも1つのばね(74,75)を有していることを特徴とする、請求項30から55までのいずれか一つに記載の装置。
- パッキン(73)がパッキンリングとして構成されていることを特徴とする、請求項30から56までのいずれか一つに記載の装置。
- 台座要素(71)が工作物(5)のためのサイドガイド(77)を備えていることを特徴とする、請求項30から57までのいずれか一つに記載の装置。
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