JP5931741B2 - シリコン含有膜の平滑SiConiエッチング - Google Patents
シリコン含有膜の平滑SiConiエッチング Download PDFInfo
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- 238000005530 etching Methods 0.000 title claims description 56
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title description 18
- 229910052710 silicon Inorganic materials 0.000 title description 18
- 239000010703 silicon Substances 0.000 title description 18
- 239000000758 substrate Substances 0.000 claims description 120
- 238000000034 method Methods 0.000 claims description 106
- 238000012545 processing Methods 0.000 claims description 91
- 239000007787 solid Substances 0.000 claims description 53
- 229910052731 fluorine Inorganic materials 0.000 claims description 45
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 42
- 239000001257 hydrogen Substances 0.000 claims description 42
- 229910052739 hydrogen Inorganic materials 0.000 claims description 42
- 239000006227 byproduct Substances 0.000 claims description 40
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 36
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 35
- 239000011737 fluorine Substances 0.000 claims description 35
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 26
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 26
- 229910021529 ammonia Inorganic materials 0.000 claims description 18
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 16
- 238000000859 sublimation Methods 0.000 claims description 13
- 230000008022 sublimation Effects 0.000 claims description 13
- 125000001153 fluoro group Chemical group F* 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 3
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 230000008569 process Effects 0.000 description 64
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- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
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- 238000005240 physical vapour deposition Methods 0.000 description 3
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- 238000010926 purge Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910017855 NH 4 F Inorganic materials 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
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- 239000003989 dielectric material Substances 0.000 description 2
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- 238000009825 accumulation Methods 0.000 description 1
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- 230000003213 activating effect Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- WYEMLYFITZORAB-UHFFFAOYSA-N boscalid Chemical compound C1=CC(Cl)=CC=C1C1=CC=CC=C1NC(=O)C1=CC=CN=C1Cl WYEMLYFITZORAB-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
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- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
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- 230000032798 delamination Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 210000003811 finger Anatomy 0.000 description 1
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- 239000012212 insulator Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000012552 review Methods 0.000 description 1
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- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 210000003813 thumb Anatomy 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
- H01J2237/3341—Reactive etching
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Description
例示的処理システム
Claims (17)
- 基板処理チャンバの基板処理領域内で基板の表面の酸化シリコン層をエッチングする方法であって、相対的に平滑なエッチング後表面が残され、
前記基板処理領域に流体結合された第1の遠隔プラズマ領域の中に水素源のアンモニア(NH 3 )およびフッ素源の三フッ化窒素(NF 3 )を、プラズマ放出物を生成するために前記第1の遠隔プラズマ領域内でプラズマを形成しながら流すステップであって、前記水素源のアンモニア(NH 3 )の流量および前記フッ素源の三フッ化窒素(NF 3 )の流量により、水素対フッ素原子流れ比率が1:2未満になるステップと、
前記基板の前記表面に固体副生成物を形成しながら前記プラズマ放出物を前記基板処理領域内に流し込むことによって前記酸化シリコン層をエッチングするステップと、
前記固体副生成物を、前記固体副生成物の昇華温度を超えて前記基板の温度を上げることによって昇華させて、前記相対的に平滑なエッチング後表面を残すステップとを含む、方法。 - 前記酸化シリコン層が、エッチング操作中に約50℃以上に維持される、請求項1に記載の方法。
- 前記酸化シリコン層をエッチングする操作および前記固体副生成物を昇華させる操作が1つのステップから成り立ち、整数個のステップが使用されて各サイクル中に除去される材料の量が低減する、請求項1に記載の方法。
- 前記酸化シリコン層の全厚が3つのステップで除去され、各ステップで全厚の20%から40%を除去する、請求項3に記載の方法。
- 各ステップで前記酸化シリコン層から約150Å以下を除去する、請求項3に記載の方法。
- 基板処理チャンバの基板処理領域内で基板の表面の酸化シリコン層をエッチングする方法であって、前記方法は、高密度にパターニングされた区域と低密度にパターニングされた区域との間のエッチング速度の差を低減し、
前記基板処理領域に流体結合された第1の遠隔プラズマ領域の中に水素源のアンモニア(NH 3 )およびフッ素源の三フッ化窒素(NF 3 )を、プラズマ放出物を生成するために前記第1の遠隔プラズマ領域内でプラズマを形成しながら流すステップであって、前記水素源のアンモニア(NH 3 )の流量および前記フッ素源の三フッ化窒素(NF 3 )の流量により、水素対フッ素原子流れ比率が1:2未満になるステップと、
前記基板の前記表面に固体副生成物を形成しながら前記プラズマ放出物を前記基板処理領域内に流し込むことによって前記高密度にパターニングされた区域と前記低密度にパターニングされた区域で前記酸化シリコン層をエッチングするステップと、
前記固体副生成物を、前記固体副生成物の昇華温度を超えて前記基板の温度を上げることによって昇華させるステップとを含む、方法。 - 前記酸化シリコン層をエッチングする操作および前記固体副生成物を昇華させる操作が1つのステップから成り立ち、整数個のステップが使用されて各サイクル中に除去される材料の量が低減する、請求項6に記載の方法。
- 前記酸化シリコン層の全厚が3つのステップで除去され、各ステップで全厚の20%から40%を除去する、請求項7に記載の方法。
- 各ステップで前記酸化シリコン層から約100Å以下を除去する、請求項7に記載の方法。
- 前記水素源のアンモニア(NH 3 )の前記流量および前記フッ素源の三フッ化窒素(NF 3 )の前記流量により、水素対フッ素原子流れ比率が1:4未満になる、請求項6に記載の方法。
- 基板処理チャンバの基板処理領域内で基板の表面の酸化シリコン層をエッチングする方法であって、
前記基板処理領域に流体結合された第1の遠隔プラズマ領域の中に水素源のアンモニア(NH 3 )およびフッ素源の三フッ化窒素(NF 3 )を、プラズマ放出物を生成するために前記第1の遠隔プラズマ領域内で一連の複数のプラズマパルスを形成しながら流すステップであって、前記水素源のアンモニア(NH 3 )の流量および前記フッ素源の三フッ化窒素(NF 3 )の流量により、水素対フッ素原子流れ比率が1:2未満になるステップと、
前記基板の前記表面に固体副生成物を形成しながら前記プラズマ放出物を前記基板処理領域内に流し込むことによって前記酸化シリコン層をエッチングするステップと、
前記固体副生成物を、前記固体副生成物の昇華温度を超えて前記基板の温度を上げることによって昇華させるステップとを含む、方法。 - 前記一連のプラズマパルスが、前記第1の遠隔プラズマ領域に加えられるプラズマ出力をパルス化することによって作り出される、請求項11に記載の方法。
- 前記フッ素源の三フッ化窒素(NF 3 )流および前記水素源のアンモニア(NH 3 )流の両方が前記エッチング操作中に一定である、請求項12に記載の方法。
- 前記一連のプラズマパルスが、前記水素源のアンモニア(NH 3 )流および前記フッ素源の三フッ化窒素(NF 3 )流の少なくとも一方の流れをパルス化することによって作り出される、請求項11に記載の方法。
- 前記固体副生成物を昇華させる操作が、前記一連の複数のプラズマパルスの各プラズマパルスに続いて起こる複数の基板アニールを含む、請求項11に記載の方法。
- 前記一連のプラズマパルスの繰返し周波数が約0.1Hzから約1.0Hzの間である、請求項11に記載の方法。
- 前記酸化シリコン層をエッチングする操作の間、前記基板が相対的に高い温度に維持され、それにより、前記固体副生成物を昇華させる操作において前記固体副生成物を昇華させるための温度上昇が小さいことを特徴とする、請求項1ないし請求項16のいずれか一項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US12/646,030 US8501629B2 (en) | 2009-12-23 | 2009-12-23 | Smooth SiConi etch for silicon-containing films |
US12/646,030 | 2009-12-23 | ||
PCT/US2010/057676 WO2011087580A1 (en) | 2009-12-23 | 2010-11-22 | Smooth siconi etch for silicon-containing films |
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JP2014216327A Division JP6009520B2 (ja) | 2009-12-23 | 2014-10-23 | シリコン含有膜の平滑SiConiエッチング |
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JP2013516069A JP2013516069A (ja) | 2013-05-09 |
JP2013516069A5 JP2013516069A5 (ja) | 2014-01-16 |
JP5931741B2 true JP5931741B2 (ja) | 2016-06-08 |
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JP2014216327A Active JP6009520B2 (ja) | 2009-12-23 | 2014-10-23 | シリコン含有膜の平滑SiConiエッチング |
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Country Status (7)
Country | Link |
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US (1) | US8501629B2 (ja) |
JP (2) | JP5931741B2 (ja) |
KR (1) | KR101425629B1 (ja) |
CN (1) | CN102687249B (ja) |
SG (1) | SG181669A1 (ja) |
TW (1) | TWI445081B (ja) |
WO (1) | WO2011087580A1 (ja) |
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KR101297926B1 (ko) * | 2009-03-26 | 2013-08-19 | 가부시키가이샤 알박 | 진공 처리 방법 및 진공 처리 장치 |
US8501629B2 (en) | 2009-12-23 | 2013-08-06 | Applied Materials, Inc. | Smooth SiConi etch for silicon-containing films |
US8637411B2 (en) | 2010-04-15 | 2014-01-28 | Novellus Systems, Inc. | Plasma activated conformal dielectric film deposition |
US9390909B2 (en) | 2013-11-07 | 2016-07-12 | Novellus Systems, Inc. | Soft landing nanolaminates for advanced patterning |
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