JP5916680B2 - 表示装置製造用フォトマスク、及びパターン転写方法 - Google Patents

表示装置製造用フォトマスク、及びパターン転写方法 Download PDF

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Publication number
JP5916680B2
JP5916680B2 JP2013210145A JP2013210145A JP5916680B2 JP 5916680 B2 JP5916680 B2 JP 5916680B2 JP 2013210145 A JP2013210145 A JP 2013210145A JP 2013210145 A JP2013210145 A JP 2013210145A JP 5916680 B2 JP5916680 B2 JP 5916680B2
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JP
Japan
Prior art keywords
pattern
light
photomask
exposure
display device
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JP2013210145A
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English (en)
Japanese (ja)
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JP2014102496A5 (enExample
JP2014102496A (ja
Inventor
修久 今敷
修久 今敷
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Hoya Corp
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Hoya Corp
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Priority to JP2013210145A priority Critical patent/JP5916680B2/ja
Publication of JP2014102496A publication Critical patent/JP2014102496A/ja
Publication of JP2014102496A5 publication Critical patent/JP2014102496A5/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
    • H10P76/00—
    • H10P76/2041—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
JP2013210145A 2012-10-25 2013-10-07 表示装置製造用フォトマスク、及びパターン転写方法 Active JP5916680B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013210145A JP5916680B2 (ja) 2012-10-25 2013-10-07 表示装置製造用フォトマスク、及びパターン転写方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012235424 2012-10-25
JP2012235424 2012-10-25
JP2013210145A JP5916680B2 (ja) 2012-10-25 2013-10-07 表示装置製造用フォトマスク、及びパターン転写方法

Publications (3)

Publication Number Publication Date
JP2014102496A JP2014102496A (ja) 2014-06-05
JP2014102496A5 JP2014102496A5 (enExample) 2015-12-17
JP5916680B2 true JP5916680B2 (ja) 2016-05-11

Family

ID=50569873

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JP2013210145A Active JP5916680B2 (ja) 2012-10-25 2013-10-07 表示装置製造用フォトマスク、及びパターン転写方法

Country Status (4)

Country Link
JP (1) JP5916680B2 (enExample)
KR (2) KR101544274B1 (enExample)
CN (1) CN103777462B (enExample)
TW (1) TWI541588B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10942575B2 (en) 2017-06-07 2021-03-09 Cisco Technology, Inc. 2D pointing indicator analysis

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6581759B2 (ja) * 2014-07-17 2019-09-25 Hoya株式会社 フォトマスク、フォトマスクの製造方法、フォトマスクブランク及び表示装置の製造方法
JP6335735B2 (ja) * 2014-09-29 2018-05-30 Hoya株式会社 フォトマスク及び表示装置の製造方法
JP2016224289A (ja) * 2015-06-01 2016-12-28 Hoya株式会社 フォトマスクの製造方法、フォトマスク及び表示装置の製造方法
JP6726553B2 (ja) * 2015-09-26 2020-07-22 Hoya株式会社 フォトマスクの製造方法、及び表示装置の製造方法
WO2017086590A1 (en) * 2015-11-19 2017-05-26 Rohm And Haas Electronic Materials Korea Ltd. Method for preparing column spacer
KR101755318B1 (ko) 2015-11-19 2017-07-10 롬엔드하스전자재료코리아유한회사 컬럼 스페이서의 제조방법
CN106773524A (zh) * 2017-02-20 2017-05-31 京东方科技集团股份有限公司 掩膜板
JP6808665B2 (ja) * 2017-03-10 2021-01-06 Hoya株式会社 表示装置製造用フォトマスク、及び表示装置の製造方法
WO2018212943A1 (en) * 2017-05-16 2018-11-22 Applied Materials, Inc. Wire grid polarizer manufacturing methods using frequency doubling interference lithography
TWI710850B (zh) * 2018-03-23 2020-11-21 日商Ｈｏｙａ股份有限公司 光罩、光罩基底、光罩之製造方法、及電子元件之製造方法
JP6731441B2 (ja) * 2018-05-01 2020-07-29 Hoya株式会社 フォトマスク及び表示装置の製造方法
JP2019012280A (ja) * 2018-09-19 2019-01-24 Hoya株式会社 フォトマスク、フォトマスクの製造方法、フォトマスクブランク及び表示装置の製造方法
JP6872061B2 (ja) * 2020-05-11 2021-05-19 Hoya株式会社 フォトマスク及び表示装置の製造方法
KR102886549B1 (ko) * 2021-01-21 2025-11-14 삼성디스플레이 주식회사 표시 장치 및 포토 마스크
CN113608406A (zh) * 2021-05-27 2021-11-05 联芯集成电路制造(厦门)有限公司 光掩模结构
WO2024065153A1 (zh) * 2022-09-27 2024-04-04 京东方科技集团股份有限公司 阵列基板及其制作方法、掩膜版、显示装置

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JP2881892B2 (ja) * 1990-01-16 1999-04-12 富士通株式会社 投影露光用マスク
JPH05165194A (ja) * 1991-12-16 1993-06-29 Nec Corp フォトマスク
JP2882233B2 (ja) * 1993-03-29 1999-04-12 凸版印刷株式会社 補助パターン付き位相シフトマスクの製造方法
JP3283624B2 (ja) * 1993-04-12 2002-05-20 株式会社日立製作所 ホトマスク
JP3577363B2 (ja) * 1994-06-29 2004-10-13 株式会社ルネサステクノロジ 半導体装置の製造方法
JPH1092706A (ja) * 1996-09-10 1998-04-10 Sony Corp 露光方法、及び該露光方法を用いた半導体装置の製造方法
JP2002323746A (ja) * 2001-04-24 2002-11-08 Matsushita Electric Ind Co Ltd 位相シフトマスク及び、それを用いたホールパターン形成方法
JP2002351046A (ja) * 2001-05-24 2002-12-04 Nec Corp 位相シフトマスクおよびその設計方法
JP4314285B2 (ja) * 2003-02-17 2009-08-12 パナソニック株式会社 フォトマスク
JP2008116862A (ja) 2006-11-08 2008-05-22 Elpida Memory Inc フォトマスク
JP5524447B2 (ja) * 2007-09-25 2014-06-18 ピーエスフォー ルクスコ エスエイアールエル 露光用マスク、パターン形成方法及び露光用マスクの製造方法
JP2009169255A (ja) * 2008-01-18 2009-07-30 Nsk Ltd 露光装置及び基板の製造方法ならびにマスク
JP5106220B2 (ja) * 2008-04-10 2012-12-26 キヤノン株式会社 原版データ生成プログラム、原版データ生成方法、照明条件決定プログラム、照明条件決定方法およびデバイス製造方法
JP2012073326A (ja) * 2010-09-28 2012-04-12 Toppan Printing Co Ltd フォトマスク、フォトマスクブランク及びフォトマスクの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10942575B2 (en) 2017-06-07 2021-03-09 Cisco Technology, Inc. 2D pointing indicator analysis

Also Published As

Publication number Publication date
KR101544274B1 (ko) 2015-08-12
KR20140052890A (ko) 2014-05-07
TW201421148A (zh) 2014-06-01
KR20140130387A (ko) 2014-11-10
CN103777462B (zh) 2017-03-01
KR101544324B1 (ko) 2015-08-12
JP2014102496A (ja) 2014-06-05
CN103777462A (zh) 2014-05-07
TWI541588B (zh) 2016-07-11

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