JP5878965B2 - 工程廃ガス処理用スクラバ - Google Patents
工程廃ガス処理用スクラバ Download PDFInfo
- Publication number
- JP5878965B2 JP5878965B2 JP2014192927A JP2014192927A JP5878965B2 JP 5878965 B2 JP5878965 B2 JP 5878965B2 JP 2014192927 A JP2014192927 A JP 2014192927A JP 2014192927 A JP2014192927 A JP 2014192927A JP 5878965 B2 JP5878965 B2 JP 5878965B2
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- Prior art keywords
- waste gas
- process waste
- reaction
- cooling
- trap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002912 waste gas Substances 0.000 title claims description 207
- 238000000034 method Methods 0.000 title claims description 195
- 230000008569 process Effects 0.000 title claims description 195
- 238000001816 cooling Methods 0.000 claims description 132
- 238000006243 chemical reaction Methods 0.000 claims description 117
- 239000007789 gas Substances 0.000 claims description 51
- 239000006227 byproduct Substances 0.000 claims description 37
- 150000001412 amines Chemical class 0.000 claims description 35
- 238000002347 injection Methods 0.000 claims description 34
- 239000007924 injection Substances 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 31
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 22
- 239000003054 catalyst Substances 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 15
- 229910000039 hydrogen halide Inorganic materials 0.000 claims description 15
- 239000012433 hydrogen halide Substances 0.000 claims description 15
- 239000004202 carbamide Substances 0.000 claims description 11
- 235000013877 carbamide Nutrition 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 8
- 238000010669 acid-base reaction Methods 0.000 claims description 7
- 230000000149 penetrating effect Effects 0.000 claims description 7
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 230000009257 reactivity Effects 0.000 claims description 4
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 claims description 3
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 claims description 3
- 235000015278 beef Nutrition 0.000 claims description 3
- 235000013922 glutamic acid Nutrition 0.000 claims description 3
- 239000004220 glutamic acid Substances 0.000 claims description 3
- XJINZNWPEQMMBV-UHFFFAOYSA-N n-methylhexan-1-amine Chemical compound CCCCCCNC XJINZNWPEQMMBV-UHFFFAOYSA-N 0.000 claims description 3
- 239000003760 tallow Substances 0.000 claims description 3
- UENRXLSRMCSUSN-UHFFFAOYSA-N 3,5-diaminobenzoic acid Chemical compound NC1=CC(N)=CC(C(O)=O)=C1 UENRXLSRMCSUSN-UHFFFAOYSA-N 0.000 claims description 2
- AJHPGXZOIAYYDW-UHFFFAOYSA-N 3-(2-cyanophenyl)-2-[(2-methylpropan-2-yl)oxycarbonylamino]propanoic acid Chemical compound CC(C)(C)OC(=O)NC(C(O)=O)CC1=CC=CC=C1C#N AJHPGXZOIAYYDW-UHFFFAOYSA-N 0.000 claims description 2
- ALYNCZNDIQEVRV-UHFFFAOYSA-M 4-aminobenzoate Chemical compound NC1=CC=C(C([O-])=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-M 0.000 claims description 2
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 claims description 2
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 claims 2
- 235000001014 amino acid Nutrition 0.000 claims 1
- 150000001413 amino acids Chemical class 0.000 claims 1
- 238000005192 partition Methods 0.000 description 45
- 239000000498 cooling water Substances 0.000 description 20
- 239000000843 powder Substances 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000002093 peripheral effect Effects 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- 230000004913 activation Effects 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 4
- 239000002351 wastewater Substances 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000007086 side reaction Methods 0.000 description 3
- SNICXCGAKADSCV-JTQLQIEISA-N (-)-Nicotine Chemical compound CN1CCC[C@H]1C1=CC=CN=C1 SNICXCGAKADSCV-JTQLQIEISA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000005700 Putrescine Substances 0.000 description 2
- 229940124277 aminobutyric acid Drugs 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- LMXOWXVJZDTLAD-UHFFFAOYSA-N dodecan-1-amine Chemical compound CCCCCCCCCCCCN.CCCCCCCCCCCCN LMXOWXVJZDTLAD-UHFFFAOYSA-N 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229960002715 nicotine Drugs 0.000 description 2
- SNICXCGAKADSCV-UHFFFAOYSA-N nicotine Natural products CN1CCCC1C1=CC=CN=C1 SNICXCGAKADSCV-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 208000018459 dissociative disease Diseases 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- XYGMTBGUABLGQJ-UHFFFAOYSA-N octadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCN.CCCCCCCCCCCCCCCCCCN XYGMTBGUABLGQJ-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Environmental & Geological Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Organic Chemistry (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Catalysts (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2013-0112805 | 2013-09-23 | ||
KR20130112805 | 2013-09-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015061725A JP2015061725A (ja) | 2015-04-02 |
JP5878965B2 true JP5878965B2 (ja) | 2016-03-08 |
Family
ID=52821286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014192927A Active JP5878965B2 (ja) | 2013-09-23 | 2014-09-22 | 工程廃ガス処理用スクラバ |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5878965B2 (zh) |
KR (1) | KR101635388B1 (zh) |
CN (1) | CN104437029B (zh) |
TW (1) | TWI568489B (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101926055B1 (ko) * | 2017-01-10 | 2018-12-06 | 한국기계연구원 | 플라즈마를 이용한 고속 열제어 반응기 |
CN107243245B (zh) * | 2017-07-31 | 2023-07-04 | 赣州市恒源科技股份有限公司 | 一种钕铁硼废料回收尾气处理装置及其控制方法 |
KR101855511B1 (ko) * | 2017-09-04 | 2018-06-11 | (주)쏠츠 | 반도체공정의 배기가스 정제장치 |
CN108176671A (zh) * | 2017-12-28 | 2018-06-19 | 徐工集团工程机械有限公司 | 盐浴清洗设备 |
KR102189446B1 (ko) * | 2018-03-16 | 2020-12-11 | (주)인트로스 | 복수의 스크러버 챔버 및 가열 챔버를 갖는 하이브리드 스크러버 및 상기 하이브리드 스크러버의 운용 방법 |
KR101959165B1 (ko) * | 2018-04-27 | 2019-03-15 | (주)엔노피아 | 플라즈마 폐가스 처리 장치 및 그를 포함하는 폐가스 처리 시스템 |
KR102188604B1 (ko) * | 2019-04-02 | 2020-12-09 | 주식회사 미래보 | 반도체 공정의 반응부산물 포집장치 |
KR102127952B1 (ko) * | 2019-12-06 | 2020-06-29 | (주)제이솔루션 | 냉각수 순환시스템 일체형 부산물 포집장치 |
CN111359401A (zh) * | 2020-03-18 | 2020-07-03 | 江西汇和化工有限公司 | 一种利用咪鲜胺酰化酸性尾气联产胺盐的方法 |
CN112604383B (zh) * | 2020-11-13 | 2022-06-17 | 北京北方华创微电子装备有限公司 | 半导体工艺设备的副产物处理装置及半导体工艺设备 |
KR102258142B1 (ko) | 2021-01-21 | 2021-05-31 | 주식회사 에이치티아이티 | 유해가스 처리장치 |
KR102330326B1 (ko) * | 2021-05-25 | 2021-11-24 | 주식회사 원익홀딩스 | 습식 타워용 냉각 어셈블리 |
CN113993264B (zh) * | 2021-11-05 | 2023-11-14 | 北京环境特性研究所 | 一种等离子体炬及其冷却方法 |
CN114200080A (zh) * | 2021-11-30 | 2022-03-18 | 刘杰 | 锅炉废气检测装置 |
KR102523983B1 (ko) * | 2022-12-28 | 2023-04-21 | 영진아이엔디(주) | 축열체를 구비한 촉매방식의 플라즈마 스크러버 및 이를 이용한 폐가스 처리 방법 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5351671U (zh) * | 1976-10-05 | 1978-05-02 | ||
JPH0625364B2 (ja) * | 1986-04-30 | 1994-04-06 | 株式会社日立製作所 | 超微粒子の作製装置 |
JPH037662U (zh) * | 1989-06-07 | 1991-01-24 | ||
JP3007662B2 (ja) * | 1990-08-23 | 2000-02-07 | 株式会社神戸製鋼所 | 耐縦割れ性の優れた熱延軟鋼板の製造方法 |
JP3007662U (ja) * | 1994-08-10 | 1995-02-21 | 株式会社赤松電機製作所 | 除塵装置のルーバー |
JP3546108B2 (ja) * | 1996-03-13 | 2004-07-21 | 株式会社タクマ | 灰溶融炉における排ガス処理方法及びその装置 |
JP3073196B1 (ja) * | 1999-03-26 | 2000-08-07 | 株式会社ヒロベ | 熱伝導性活性炭物質およびガス処理装置 |
JP3737082B2 (ja) * | 2001-12-04 | 2006-01-18 | 株式会社荏原製作所 | 排ガスの処理方法および装置 |
JP2003265916A (ja) * | 2002-03-15 | 2003-09-24 | Ichiro Yanaka | 集塵ベッセル |
JP4285108B2 (ja) * | 2003-06-25 | 2009-06-24 | 東京エレクトロン株式会社 | トラップ装置、処理システム及び不純物除去方法 |
JP4304020B2 (ja) * | 2003-07-25 | 2009-07-29 | 関東電化工業株式会社 | 酸性ガス及び/又は炭化水素を含む排ガスの処理剤並びに処理方法 |
JP2005205330A (ja) * | 2004-01-23 | 2005-08-04 | Kanken Techno Co Ltd | パーフルオロコンパウンド排ガスのプラズマ分解処理方法および該方法を利用したプラズマ分解処理装置並びにこのプラズマ分解処理装置を搭載した排ガス処理システム |
US7846407B2 (en) * | 2006-04-07 | 2010-12-07 | Liang Hu | Self-concentrating absorbent for acid gas separation |
JP4223534B2 (ja) * | 2007-02-28 | 2009-02-12 | 安積濾紙株式会社 | 脱臭シート及びハニカム形フィルタ |
CN101279187A (zh) * | 2007-04-06 | 2008-10-08 | 严桓燮 | 氟化气体消除装置及消除方法 |
JP2009082893A (ja) * | 2007-10-03 | 2009-04-23 | Kanken Techno Co Ltd | 排ガス処理装置 |
WO2009125457A1 (ja) * | 2008-04-11 | 2009-10-15 | カンケンテクノ株式会社 | シラン系ガス及びフッ素系ガス含有排ガスの処理方法及び該方法を用いた排ガス処理装置 |
JP2010179249A (ja) * | 2009-02-06 | 2010-08-19 | Hitachi Ltd | パーフルオロコンパウンドの分解処理装置及び分解処理方法 |
WO2010092671A1 (ja) * | 2009-02-10 | 2010-08-19 | ズードケミー触媒株式会社 | 金属水素化物含有排ガスの除害剤及び除害方法 |
JP2010240595A (ja) * | 2009-04-07 | 2010-10-28 | Kanken Techno Co Ltd | 排ガス除害装置 |
JP2012121018A (ja) * | 2010-11-16 | 2012-06-28 | National Institute Of Advanced Industrial Science & Technology | ガス状ハロゲン化物の除去・回収方法及びガス状ハロゲン化物の除去・回収剤 |
CN202751933U (zh) * | 2012-08-27 | 2013-02-27 | 浙江大学 | 四段式污泥干化尾气处理系统 |
CN202823131U (zh) * | 2012-10-25 | 2013-03-27 | 无锡宇吉科技有限公司 | 废气净化回收装置 |
-
2014
- 2014-09-02 KR KR1020140116406A patent/KR101635388B1/ko active IP Right Grant
- 2014-09-17 CN CN201410475214.4A patent/CN104437029B/zh active Active
- 2014-09-22 JP JP2014192927A patent/JP5878965B2/ja active Active
- 2014-09-23 TW TW103132828A patent/TWI568489B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP2015061725A (ja) | 2015-04-02 |
KR20150033535A (ko) | 2015-04-01 |
TW201511820A (zh) | 2015-04-01 |
CN104437029A (zh) | 2015-03-25 |
KR101635388B1 (ko) | 2016-07-08 |
CN104437029B (zh) | 2016-11-30 |
TWI568489B (zh) | 2017-02-01 |
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