JP5875297B2 - 放射線発生管及びそれを用いた放射線発生装置、放射線撮影システム - Google Patents

放射線発生管及びそれを用いた放射線発生装置、放射線撮影システム Download PDF

Info

Publication number
JP5875297B2
JP5875297B2 JP2011189108A JP2011189108A JP5875297B2 JP 5875297 B2 JP5875297 B2 JP 5875297B2 JP 2011189108 A JP2011189108 A JP 2011189108A JP 2011189108 A JP2011189108 A JP 2011189108A JP 5875297 B2 JP5875297 B2 JP 5875297B2
Authority
JP
Japan
Prior art keywords
radiation
target
electron
tube according
brazing material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011189108A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013051153A (ja
JP2013051153A5 (https=
Inventor
孝夫 小倉
孝夫 小倉
上田 和幸
和幸 上田
佐藤 安栄
安栄 佐藤
野村 一郎
一郎 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011189108A priority Critical patent/JP5875297B2/ja
Priority to US14/127,647 priority patent/US9251995B2/en
Priority to PCT/JP2012/068543 priority patent/WO2013031423A1/en
Publication of JP2013051153A publication Critical patent/JP2013051153A/ja
Publication of JP2013051153A5 publication Critical patent/JP2013051153A5/ja
Application granted granted Critical
Publication of JP5875297B2 publication Critical patent/JP5875297B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/16Vessels; Containers; Shields associated therewith
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/16Vessels; Containers; Shields associated therewith
    • H01J35/165Vessels; Containers; Shields associated therewith joining connectors to the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/16Vessels; Containers; Shields associated therewith
    • H01J35/18Windows
    • H01J35/186Windows used as targets or X-ray converters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00X-ray tubes
    • H01J2235/16Vessels
    • H01J2235/165Shielding arrangements
    • H01J2235/166Shielding arrangements against electromagnetic radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes
    • H01J35/112Non-rotating anodes
    • H01J35/116Transmissive anodes

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • X-Ray Techniques (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
JP2011189108A 2011-08-31 2011-08-31 放射線発生管及びそれを用いた放射線発生装置、放射線撮影システム Expired - Fee Related JP5875297B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011189108A JP5875297B2 (ja) 2011-08-31 2011-08-31 放射線発生管及びそれを用いた放射線発生装置、放射線撮影システム
US14/127,647 US9251995B2 (en) 2011-08-31 2012-07-17 Radiation generating tube and radiation imaging apparatus using the same
PCT/JP2012/068543 WO2013031423A1 (en) 2011-08-31 2012-07-17 Radiation generating tube and radiation imaging apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011189108A JP5875297B2 (ja) 2011-08-31 2011-08-31 放射線発生管及びそれを用いた放射線発生装置、放射線撮影システム

Publications (3)

Publication Number Publication Date
JP2013051153A JP2013051153A (ja) 2013-03-14
JP2013051153A5 JP2013051153A5 (https=) 2014-10-09
JP5875297B2 true JP5875297B2 (ja) 2016-03-02

Family

ID=46598909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011189108A Expired - Fee Related JP5875297B2 (ja) 2011-08-31 2011-08-31 放射線発生管及びそれを用いた放射線発生装置、放射線撮影システム

Country Status (3)

Country Link
US (1) US9251995B2 (https=)
JP (1) JP5875297B2 (https=)
WO (1) WO2013031423A1 (https=)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6039282B2 (ja) 2011-08-05 2016-12-07 キヤノン株式会社 放射線発生装置及び放射線撮影装置
CN103733734B (zh) 2011-08-05 2016-04-27 佳能株式会社 放射线发生装置和放射线成像装置
JP5896649B2 (ja) 2011-08-31 2016-03-30 キヤノン株式会社 ターゲット構造体及びx線発生装置
US20150117599A1 (en) * 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
JP2013109902A (ja) * 2011-11-18 2013-06-06 Canon Inc 透過型放射線発生装置及びそれを用いた放射線撮影装置
JP5984367B2 (ja) 2011-12-02 2016-09-06 キヤノン株式会社 放射線発生装置及びそれを用いた放射線撮影システム
JP5936895B2 (ja) 2012-03-27 2016-06-22 株式会社リガク X線発生装置のターゲット及びその製造方法並びにx線発生装置
JP6140983B2 (ja) * 2012-11-15 2017-06-07 キヤノン株式会社 透過型ターゲット、x線発生ターゲット、x線発生管、x線x線発生装置、並びに、x線x線撮影装置
JP6316019B2 (ja) 2013-03-06 2018-04-25 キヤノン株式会社 X線発生管、該x線発生管を備えたx線発生装置及びx線撮影システム
JP6230389B2 (ja) 2013-06-05 2017-11-15 キヤノン株式会社 X線発生管及びそれを用いたx線発生装置とx線撮影システム
JP6327802B2 (ja) 2013-06-12 2018-05-23 キヤノン株式会社 放射線発生管及びそれを用いた放射線発生装置と放射線撮影システム
JP6207246B2 (ja) * 2013-06-14 2017-10-04 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備える放射線発生管、放射線発生装置、及び、放射線撮影装置
JP2015028879A (ja) * 2013-07-30 2015-02-12 東京エレクトロン株式会社 X線発生用ターゲット及びx線発生装置
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6272043B2 (ja) * 2014-01-16 2018-01-31 キヤノン株式会社 X線発生管及びこれを用いたx線発生装置、x線撮影システム
JP6264145B2 (ja) * 2014-03-28 2018-01-24 株式会社島津製作所 X線発生装置
JP6552289B2 (ja) * 2014-07-18 2019-07-31 キヤノン株式会社 X線発生管、x線発生装置、x線撮影システム
JP6598538B2 (ja) * 2014-07-18 2019-10-30 キヤノン株式会社 陽極及びこれを用いたx線発生管、x線発生装置、x線撮影システム
JP6473316B2 (ja) * 2014-10-23 2019-02-20 浜松ホトニクス株式会社 X線像撮像用ユニット及びx線顕微鏡
JP6456172B2 (ja) * 2015-02-04 2019-01-23 キヤノン株式会社 陽極及びこれを用いたx線発生管、x線発生装置、x線撮影システム
JP6573380B2 (ja) * 2015-07-27 2019-09-11 キヤノン株式会社 X線発生装置及びx線撮影システム
CN105263251B (zh) * 2015-10-13 2018-02-27 上海联影医疗科技有限公司 靶组件以及包括该靶组件的直线加速器
US10453643B2 (en) 2016-03-30 2019-10-22 Moxtek, Inc. Shielded, transmission-target, x-ray tube
KR102385456B1 (ko) * 2017-11-30 2022-04-12 한국전기연구원 빔 전류 측정이 가능한 선형가속기용 엑스선 타켓
US10727023B2 (en) 2018-05-07 2020-07-28 Moxtek, Inc. X-ray tube single anode bore
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
GB2591630B (en) 2018-07-26 2023-05-24 Sigray Inc High brightness x-ray reflection source
WO2020051061A1 (en) 2018-09-04 2020-03-12 Sigray, Inc. System and method for x-ray fluorescence with filtering
WO2020051221A2 (en) 2018-09-07 2020-03-12 Sigray, Inc. System and method for depth-selectable x-ray analysis
WO2021011209A1 (en) 2019-07-15 2021-01-21 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
JP7414640B2 (ja) * 2020-05-27 2024-01-16 キヤノン電子管デバイス株式会社 固定陽極x線管
US11728122B2 (en) 2020-10-23 2023-08-15 Moxtek, Inc. X-ray tube backscatter suppression
US12094680B2 (en) 2021-06-17 2024-09-17 Moxtek, Inc. X-ray tube anode with integrated collimator
DE112023000574B4 (de) 2022-01-13 2026-02-26 Sigray, Inc. Mikrofokus-röntgenquelle zur erzeugung von röntgenstrahlen mit hohem fluss und niedriger energie
WO2023168204A1 (en) 2022-03-02 2023-09-07 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3594716B2 (ja) * 1995-12-25 2004-12-02 浜松ホトニクス株式会社 透過型x線管
JP2002025446A (ja) * 1997-12-04 2002-01-25 Hamamatsu Photonics Kk X線管の製造方法
JP2000306533A (ja) 1999-02-19 2000-11-02 Toshiba Corp 透過放射型x線管およびその製造方法
DE19934987B4 (de) 1999-07-26 2004-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Röntgenanode und ihre Verwendung
JP4306110B2 (ja) * 2000-10-04 2009-07-29 株式会社島津製作所 開放型x線管
US20020085674A1 (en) 2000-12-29 2002-07-04 Price John Scott Radiography device with flat panel X-ray source
JP2002298772A (ja) 2001-03-30 2002-10-11 Toshiba Corp 透過放射型x線管およびその製造方法
EP1488441A2 (en) 2002-01-31 2004-12-22 The Johns Hopkins University X-ray source and method for more efficiently producing selectable x-ray frequencies
US7526069B2 (en) * 2003-09-16 2009-04-28 Hamamatsu Photonics K.K. X-ray tube
EP1683175B1 (en) * 2003-10-07 2009-06-03 Koninklijke Philips Electronics N.V. Method of manufacturing a window transparent for electrons of an electron beam, in particular of an x-ray source
JP4878311B2 (ja) 2006-03-03 2012-02-15 キヤノン株式会社 マルチx線発生装置
EP2006880A1 (en) * 2007-06-19 2008-12-24 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Miniature X-ray source with guiding means for electrons and / or ions
JP2009021032A (ja) * 2007-07-10 2009-01-29 Takasago Thermal Eng Co Ltd X線発生管
JP4391561B2 (ja) * 2007-12-26 2009-12-24 浜松ホトニクス株式会社 X線発生装置
JP5294653B2 (ja) 2008-02-28 2013-09-18 キヤノン株式会社 マルチx線発生装置及びx線撮影装置
JP5570060B2 (ja) 2010-02-22 2014-08-13 株式会社小泉製作所 仏具
JP5416006B2 (ja) 2010-03-23 2014-02-12 キヤノン株式会社 X線発生装置及びその制御方法
JP5455880B2 (ja) 2010-12-10 2014-03-26 キヤノン株式会社 放射線発生管、放射線発生装置ならびに放射線撮影装置
EP2649634B1 (en) 2010-12-10 2018-07-04 Canon Kabushiki Kaisha Radiation generating apparatus and radiation imaging apparatus
JP5800578B2 (ja) 2011-05-31 2015-10-28 キヤノン株式会社 X線管
JP5804777B2 (ja) 2011-06-01 2015-11-04 キヤノン株式会社 X線発生管及び、x線発生装置
JP5825892B2 (ja) 2011-07-11 2015-12-02 キヤノン株式会社 放射線発生装置及びそれを用いた放射線撮影装置
JP5791401B2 (ja) 2011-07-11 2015-10-07 キヤノン株式会社 放射線発生装置及びそれを用いた放射線撮影装置
JP2013020792A (ja) 2011-07-11 2013-01-31 Canon Inc 放射線発生装置及びそれを用いた放射線撮影装置
CN103733734B (zh) 2011-08-05 2016-04-27 佳能株式会社 放射线发生装置和放射线成像装置
JP6039282B2 (ja) 2011-08-05 2016-12-07 キヤノン株式会社 放射線発生装置及び放射線撮影装置
JP5896649B2 (ja) 2011-08-31 2016-03-30 キヤノン株式会社 ターゲット構造体及びx線発生装置

Also Published As

Publication number Publication date
US9251995B2 (en) 2016-02-02
JP2013051153A (ja) 2013-03-14
WO2013031423A1 (en) 2013-03-07
US20140140480A1 (en) 2014-05-22

Similar Documents

Publication Publication Date Title
JP5875297B2 (ja) 放射線発生管及びそれを用いた放射線発生装置、放射線撮影システム
JP2013051153A5 (https=)
JP6061692B2 (ja) 放射線発生管及び放射線発生装置及びそれらを用いた放射線撮影装置
CN103765547B (zh) X射线发生器和x射线成像装置
US9281158B2 (en) X-ray emitting target and X-ray emitting device
JP5896649B2 (ja) ターゲット構造体及びx線発生装置
JP6207246B2 (ja) 透過型ターゲットおよび該透過型ターゲットを備える放射線発生管、放射線発生装置、及び、放射線撮影装置
JP5911323B2 (ja) ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム
JP2013239317A (ja) 放射線発生ターゲット、放射線発生装置および放射線撮影システム
JP6456172B2 (ja) 陽極及びこれを用いたx線発生管、x線発生装置、x線撮影システム
US10032597B2 (en) X-ray generating tube, X-ray generating apparatus, X-ray imaging system, and anode used therefor
JP2016103451A (ja) X線発生管、x線発生装置およびx線撮影システム
WO2012169143A1 (en) X-ray emitting target and x-ray emitting device
US10242837B2 (en) Anode and X-ray generating tube, X-ray generating apparatus, and radiography system that use the anode
CN102468103A (zh) 具有接合靶和轴承套筒的x射线管
KR20060009146A (ko) 열 흡수 및 열 방출을 위한 무산소 동 외관벌브를 구비한연 엑스선 발생관
JP6659167B2 (ja) 電子銃を備えたx線発生管及びx線撮影装置
JP6153314B2 (ja) X線透過型ターゲット及びその製造方法
JP2015060731A (ja) 放射線発生管及びこれを用いた放射線発生装置、放射線撮影システム
JP2014220096A (ja) 放射線発生装置及びそれを用いた放射線撮影システム
JP6381756B2 (ja) 透過型ターゲットおよび該透過型ターゲットを備える放射線発生管、放射線発生装置、及び、放射線撮影装置
TW201137918A (en) X-ray tube and X-ray target

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140822

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140822

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20150514

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150519

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150717

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20151222

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160119

R151 Written notification of patent or utility model registration

Ref document number: 5875297

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

LAPS Cancellation because of no payment of annual fees