JP5857573B2 - 化合物半導体装置の製造方法 - Google Patents
化合物半導体装置の製造方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims description 57
- 150000001875 compounds Chemical class 0.000 title claims description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 238000000034 method Methods 0.000 title claims description 20
- 239000000758 substrate Substances 0.000 claims description 38
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 139
- 230000015572 biosynthetic process Effects 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000007789 gas Substances 0.000 description 10
- 229910002704 AlGaN Inorganic materials 0.000 description 9
- 229910052733 gallium Inorganic materials 0.000 description 9
- 230000006911 nucleation Effects 0.000 description 9
- 238000010899 nucleation Methods 0.000 description 9
- 239000003990 capacitor Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 4
- 238000002955 isolation Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 3
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- -1 nitride compound Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 230000005533 two-dimensional electron gas Effects 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/76—Unipolar devices, e.g. field effect transistors
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- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
- H01L29/7787—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
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- H01L29/66409—Unipolar field-effect transistors
- H01L29/66446—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET]
- H01L29/66462—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET] with a heterojunction interface channel or gate, e.g. HFET, HIGFET, SISFET, HJFET, HEMT
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L29/2003—Nitride compounds
Description
先ず、第1の実施形態について説明する。図1は、第1の実施形態に係るGaN系HEMT(化合物半導体装置)の構造を示す断面図である。
次に、第2の実施形態について説明する。図4は、第2の実施形態に係るGaN系HEMT(化合物半導体装置)の構造を示す断面図である。
次に、第3の実施形態について説明する。図5は、第3の実施形態に係るGaN系HEMT(化合物半導体装置)の構造を示す断面図である。
第4の実施形態は、GaN系HEMTのディスクリートパッケージに関する。図6は、第4の実施形態に係るディスクリートパッケージを示す図である。
次に、第5の実施形態について説明する。第5の実施形態は、GaN系HEMTを備えたPFC(Power Factor Correction)回路に関する。図7は、第5の実施形態に係るPFC回路を示す結線図である。
次に、第6の実施形態について説明する。第6の実施形態は、GaN系HEMTを備えた電源装置に関する。図8は、第6の実施形態に係る電源装置を示す結線図である。
次に、第7の実施形態について説明する。第7の実施形態は、GaN系HEMTを備えた高周波増幅器に関する。図9は、第7の実施形態に係る高周波増幅器を示す結線図である。
Si基板と、
前記Si基板の表面に形成されたSi酸化層と、
前記Si酸化層上に形成され、前記Si酸化層の一部を露出する核形成層と、
前記Si酸化層及び前記核形成層上に形成された化合物半導体積層構造と、
を有することを特徴とする化合物半導体装置。
前記核形成層がAlN層であることを特徴とする付記1に記載の化合物半導体装置。
前記化合物半導体積層構造は、
電子走行層と、
前記電子走行層の上方に形成された電子供給層と、
を有することを特徴とする付記1又は2に記載の化合物半導体装置。
前記電子供給層の上方に形成されたゲート電極、ソース電極及びドレイン電極を有することを特徴とする付記3に記載の化合物半導体装置。
前記Si酸化層の最も薄い部分の厚さが10nm以上であることを特徴とする付記1乃至4のいずれか1項に記載の化合物半導体装置。
前記核形成層は、平面視で前記Si酸化層上の複数個所において線状に延びていることを特徴とする付記1乃至5のいずれか1項に記載の化合物半導体装置。
付記1乃至6のいずれか1項に記載の化合物半導体装置を有することを特徴とする電源装置。
付記1乃至6のいずれか1項に記載の化合物半導体装置を有することを特徴とする高出力増幅器。
Si基板上に核形成層を形成する工程と、
前記核形成層に前記Si基板の一部を露出する開口部を形成する工程と、
前記開口部を通じて前記Si基板の表面を酸化してSi酸化層を形成する工程と、
前記Si酸化層及び前記核形成層上に化合物半導体積層構造を形成する工程と、
を有することを特徴とする化合物半導体装置の製造方法。
前記Si基板の酸化を熱酸化法により行うことを特徴とする付記9に記載の化合物半導体装置の製造方法。
前記核形成層としてAlN層を形成することを特徴とする付記9又は10に記載の化合物半導体装置の製造方法。
前記化合物半導体積層構造を形成する工程は、
電子走行層を形成する工程と、
前記電子走行層の上方に電子供給層を形成する工程と、
を有することを特徴とする付記9乃至11のいずれか1項に記載の化合物半導体装置の製造方法。
前記電子供給層の上方にゲート電極、ソース電極及びドレイン電極を形成する工程を有することを特徴とする付記12に記載の化合物半導体装置の製造方法。
前記Si酸化層の最も薄い部分の厚さを10nm以上とすることを特徴とする付記9乃至13のいずれか1項に記載の化合物半導体装置の製造方法。
前記開口部を、平面視で前記Si基板上の複数個所において線状に延びるように形成することを特徴とする付記9乃至14のいずれか1項に記載の化合物半導体装置。
2:AlN層
2a:開口部
3:Si酸化層
4:バッファ層
5:電子走行層
6:スペーサ層
7:電子供給層
8:キャップ層
9:化合物半導体積層構造
11g:ゲート電極
11s:ソース電極
11d:ドレイン電極
Claims (3)
- Si基板上にAlN層を形成する工程と、
前記AlN層に前記Si基板の一部を露出する開口部を形成する工程と、
前記開口部を通じて前記Si基板の表面を酸化してSi酸化層を形成する工程と、
前記Si酸化層及び前記AlN層上に化合物半導体積層構造を形成する工程と、
を有することを特徴とする化合物半導体装置の製造方法。 - 前記Si基板の酸化を熱酸化法により行うことを特徴とする請求項1に記載の化合物半導体装置の製造方法。
- 前記化合物半導体積層構造を形成する工程は、
電子走行層を形成する工程と、
前記電子走行層の上方に電子供給層を形成する工程と、
を有することを特徴とする請求項1又は2に記載の化合物半導体装置の製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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JP2011203582A JP5857573B2 (ja) | 2011-09-16 | 2011-09-16 | 化合物半導体装置の製造方法 |
US13/549,660 US8933485B2 (en) | 2011-09-16 | 2012-07-16 | Compound semiconductor device and method of manufacturing the same |
TW101125614A TWI488301B (zh) | 2011-09-16 | 2012-07-17 | 化合物半導體裝置及其製造方法(一) |
CN201210262740.3A CN103000683B (zh) | 2011-09-16 | 2012-07-26 | 化合物半导体器件及其制造方法 |
KR1020120082228A KR101272399B1 (ko) | 2011-09-16 | 2012-07-27 | 화합물 반도체 장치 및 그 제조 방법 |
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JP5857573B2 true JP5857573B2 (ja) | 2016-02-10 |
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JP (1) | JP5857573B2 (ja) |
KR (1) | KR101272399B1 (ja) |
CN (1) | CN103000683B (ja) |
TW (1) | TWI488301B (ja) |
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US9642289B2 (en) | 2013-09-19 | 2017-05-02 | Infineon Technologies Austria Ag | Power supply and method |
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JPH01149488A (ja) * | 1987-12-06 | 1989-06-12 | Canon Inc | フォトセンサ及びその製造方法 |
JPH03132017A (ja) * | 1989-10-18 | 1991-06-05 | Canon Inc | 結晶の形成方法 |
JPH0513447A (ja) * | 1991-07-03 | 1993-01-22 | Canon Inc | 電界効果トランジスター及びその製造方法 |
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JPH07183493A (ja) | 1993-12-24 | 1995-07-21 | Mitsubishi Electric Corp | 半導体装置 |
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