JP5852986B2 - 感放射線性組成物、カラーフィルタ、カラーフィルタの製造方法 - Google Patents

感放射線性組成物、カラーフィルタ、カラーフィルタの製造方法 Download PDF

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Publication number
JP5852986B2
JP5852986B2 JP2013099491A JP2013099491A JP5852986B2 JP 5852986 B2 JP5852986 B2 JP 5852986B2 JP 2013099491 A JP2013099491 A JP 2013099491A JP 2013099491 A JP2013099491 A JP 2013099491A JP 5852986 B2 JP5852986 B2 JP 5852986B2
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group
radiation
sensitive composition
acid
general formula
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JP2013099491A
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Japanese (ja)
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JP2013257543A (ja
Inventor
和也 尾田
和也 尾田
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2013099491A priority Critical patent/JP5852986B2/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
JP2013099491A 2012-05-16 2013-05-09 感放射線性組成物、カラーフィルタ、カラーフィルタの製造方法 Expired - Fee Related JP5852986B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013099491A JP5852986B2 (ja) 2012-05-16 2013-05-09 感放射線性組成物、カラーフィルタ、カラーフィルタの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012112277 2012-05-16
JP2012112277 2012-05-16
JP2013099491A JP5852986B2 (ja) 2012-05-16 2013-05-09 感放射線性組成物、カラーフィルタ、カラーフィルタの製造方法

Publications (2)

Publication Number Publication Date
JP2013257543A JP2013257543A (ja) 2013-12-26
JP5852986B2 true JP5852986B2 (ja) 2016-02-09

Family

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JP2013099491A Expired - Fee Related JP5852986B2 (ja) 2012-05-16 2013-05-09 感放射線性組成物、カラーフィルタ、カラーフィルタの製造方法

Country Status (3)

Country Link
JP (1) JP5852986B2 (zh)
TW (1) TWI547761B (zh)
WO (1) WO2013172469A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9864121B2 (en) 2011-11-22 2018-01-09 Samsung Electronics Co., Ltd. Stress-resistant component for use with quantum dots
JP6388776B2 (ja) * 2014-03-12 2018-09-12 新日鉄住金化学株式会社 白色感光性樹脂組成物、それを用いた硬化物、及びその硬化物を構成成分として含むタッチパネル
KR20170008581A (ko) * 2015-07-14 2017-01-24 삼성에스디아이 주식회사 감광성 수지 조성물 및 이를 이용한 컬러필터
JP2017116787A (ja) * 2015-12-25 2017-06-29 三洋化成工業株式会社 感光性樹脂組成物
KR101895310B1 (ko) * 2016-01-25 2018-09-05 삼성에스디아이 주식회사 감광성 수지 조성물, 감광성 수지막 및 이를 이용한 컬러필터
TWI765170B (zh) * 2018-08-21 2022-05-21 神盾股份有限公司 光學感測器、光學感測系統及其製造方法
WO2022045113A1 (ja) 2020-08-28 2022-03-03 富士フイルム株式会社 下層膜形成用組成物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3104127B2 (ja) * 1997-05-23 2000-10-30 第一工業製薬株式会社 固体電解質
JP4726076B2 (ja) * 2006-09-28 2011-07-20 日本化薬株式会社 ネガ型着色感光性組成物
JP5189392B2 (ja) * 2008-03-28 2013-04-24 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP5224936B2 (ja) * 2008-06-26 2013-07-03 富士フイルム株式会社 分散液、黒色硬化性組成物、製造方法、固体撮像素子用の遮光膜または反射防止膜の製造方法、および固体撮像素子
JP5701576B2 (ja) * 2009-11-20 2015-04-15 富士フイルム株式会社 分散組成物及び感光性樹脂組成物、並びに固体撮像素子
JP5849011B2 (ja) * 2012-04-24 2016-01-27 富士フイルム株式会社 ソルダーレジスト組成物、硬化膜、および硬化膜の製造方法
JP5833969B2 (ja) * 2012-04-27 2015-12-16 富士フイルム株式会社 感放射線性組成物、遮光膜および固体撮像素子

Also Published As

Publication number Publication date
JP2013257543A (ja) 2013-12-26
WO2013172469A1 (en) 2013-11-21
TWI547761B (zh) 2016-09-01
TW201348874A (zh) 2013-12-01

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