JP5825145B2 - 合成非晶質シリカ粉末及びその製造方法 - Google Patents

合成非晶質シリカ粉末及びその製造方法 Download PDF

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Publication number
JP5825145B2
JP5825145B2 JP2012043206A JP2012043206A JP5825145B2 JP 5825145 B2 JP5825145 B2 JP 5825145B2 JP 2012043206 A JP2012043206 A JP 2012043206A JP 2012043206 A JP2012043206 A JP 2012043206A JP 5825145 B2 JP5825145 B2 JP 5825145B2
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JP
Japan
Prior art keywords
powder
silica powder
synthetic amorphous
siliceous gel
average particle
Prior art date
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Expired - Fee Related
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JP2012043206A
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English (en)
Japanese (ja)
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JP2012211070A5 (cg-RX-API-DMAC7.html
JP2012211070A (ja
Inventor
植田　稔晃
稔晃 植田
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Mitsubishi Materials Corp
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Mitsubishi Materials Corp
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Publication date
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Priority to JP2012043206A priority Critical patent/JP5825145B2/ja
Publication of JP2012211070A publication Critical patent/JP2012211070A/ja
Publication of JP2012211070A5 publication Critical patent/JP2012211070A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/102—Forming solid beads by blowing a gas onto a stream of molten glass or onto particulate materials, e.g. pulverising
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Glass Compositions (AREA)
JP2012043206A 2011-03-23 2012-02-29 合成非晶質シリカ粉末及びその製造方法 Expired - Fee Related JP5825145B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012043206A JP5825145B2 (ja) 2011-03-23 2012-02-29 合成非晶質シリカ粉末及びその製造方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2011064456 2011-03-23
JP2011064451 2011-03-23
JP2011064451 2011-03-23
JP2011064456 2011-03-23
JP2012043206A JP5825145B2 (ja) 2011-03-23 2012-02-29 合成非晶質シリカ粉末及びその製造方法

Publications (3)

Publication Number Publication Date
JP2012211070A JP2012211070A (ja) 2012-11-01
JP2012211070A5 JP2012211070A5 (cg-RX-API-DMAC7.html) 2014-10-30
JP5825145B2 true JP5825145B2 (ja) 2015-12-02

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JP2012043206A Expired - Fee Related JP5825145B2 (ja) 2011-03-23 2012-02-29 合成非晶質シリカ粉末及びその製造方法

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Country Link
US (1) US9446959B2 (cg-RX-API-DMAC7.html)
EP (1) EP2690066A4 (cg-RX-API-DMAC7.html)
JP (1) JP5825145B2 (cg-RX-API-DMAC7.html)
KR (1) KR20140002673A (cg-RX-API-DMAC7.html)
CN (1) CN103249674B (cg-RX-API-DMAC7.html)
TW (1) TWI525041B (cg-RX-API-DMAC7.html)
WO (1) WO2012128005A1 (cg-RX-API-DMAC7.html)

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JP6466635B2 (ja) * 2013-06-14 2019-02-06 信越化学工業株式会社 非水電解質二次電池用負極の製造方法及び非水電解質二次電池の製造方法
US9637405B2 (en) 2013-06-30 2017-05-02 Sumco Corporation Evaluation method of suitable silica powder in manufacturing vitreous silica crucible for pulling of silicon single crystal
JPWO2015114956A1 (ja) * 2014-01-29 2017-03-23 三菱マテリアル株式会社 合成非晶質シリカ粉末及びその製造方法
CN104227006A (zh) * 2014-08-26 2014-12-24 苏州智研新材料科技有限公司 一种微细球形不锈钢粉体的制备方法
EP3390293B1 (de) 2015-12-18 2023-04-19 Heraeus Quarzglas GmbH & Co. KG Erhöhen des siliziumgehalts bei der herstellung von quarzglas
TW201731782A (zh) 2015-12-18 2017-09-16 何瑞斯廓格拉斯公司 在多腔式爐中製備石英玻璃體
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
WO2017103121A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines opaken quarzglaskörpers
WO2017103120A1 (de) * 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung einer synthetischen quarzglaskörnung
CN108698888A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
CN108698892A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 从二氧化硅颗粒制备石英玻璃体
WO2017103123A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
JPWO2018092804A1 (ja) * 2016-11-16 2019-10-17 三菱ケミカル株式会社 定量供給用シリカ粉体、並びにこれを用いた生体物質の精製キット及びその製造方法
CN107052225A (zh) * 2016-12-30 2017-08-18 天津泽希矿产加工有限公司 特种砂‑球形熔融硅砂及其制备方法和应用
JP2019182691A (ja) * 2018-04-04 2019-10-24 東ソ−・エスジ−エム株式会社 石英ガラスインゴット及び石英ガラス製品の製造方法
DE112018008204T5 (de) * 2018-12-14 2021-09-09 Tosoh Quartz Corporation Verfahren zum Herstellen eines opaken Quarzglases
CN111943214B (zh) * 2020-08-18 2022-08-30 苏州英纳特纳米科技有限公司 非晶态纳米球形二氧化硅的制备方法
JP2024043650A (ja) * 2022-09-20 2024-04-02 株式会社Sumco 石英ガラスルツボ及びその製造方法及び石英ガラスルツボ用石英粉

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DE3525495C1 (de) 1985-07-17 1987-01-02 Heraeus Schott Quarzschmelze Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid
JPS62176928A (ja) 1986-01-29 1987-08-03 Mitsubishi Metal Corp 石英ガラス粉末の製造方法
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JPH09100105A (ja) * 1995-10-02 1997-04-15 Mitsubishi Chem Corp 超微粒金属酸化物粉の製造方法
JP4154563B2 (ja) * 2001-07-23 2008-09-24 信越化学工業株式会社 シリカ含有複合酸化物球状微粒子及びその製造方法
DE10211958A1 (de) 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
JP3639279B2 (ja) * 2003-01-24 2005-04-20 高周波熱錬株式会社 熱プラズマによる粉末の合成／精製または球状化方法とその装置
JP2005162593A (ja) * 2003-12-04 2005-06-23 Kiyoaki Shiraishi 加熱処理する事によって「角（かど）」無くしたシリカ
JP5013573B2 (ja) * 2005-09-30 2012-08-29 信越石英株式会社 高耐熱性石英ガラス粉の製造方法、高耐熱性石英ガラス粉及びガラス体
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Also Published As

Publication number Publication date
KR20140002673A (ko) 2014-01-08
CN103249674B (zh) 2015-03-11
TWI525041B (zh) 2016-03-11
US20140065423A1 (en) 2014-03-06
EP2690066A1 (en) 2014-01-29
EP2690066A4 (en) 2014-08-20
US9446959B2 (en) 2016-09-20
WO2012128005A1 (ja) 2012-09-27
TW201242897A (en) 2012-11-01
JP2012211070A (ja) 2012-11-01
CN103249674A (zh) 2013-08-14

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