TWI525041B - Synthetic amorphous silica powder and method for producing the same - Google Patents
Synthetic amorphous silica powder and method for producing the same Download PDFInfo
- Publication number
- TWI525041B TWI525041B TW101109323A TW101109323A TWI525041B TW I525041 B TWI525041 B TW I525041B TW 101109323 A TW101109323 A TW 101109323A TW 101109323 A TW101109323 A TW 101109323A TW I525041 B TWI525041 B TW I525041B
- Authority
- TW
- Taiwan
- Prior art keywords
- powder
- vermiculite
- vermiculite powder
- gel
- synthetic amorphous
- Prior art date
Links
- 239000000843 powder Substances 0.000 title claims description 773
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 43
- 238000004519 manufacturing process Methods 0.000 title claims description 31
- 229910002029 synthetic silica gel Inorganic materials 0.000 title 1
- 239000010455 vermiculite Substances 0.000 claims description 621
- 229910052902 vermiculite Inorganic materials 0.000 claims description 621
- 235000019354 vermiculite Nutrition 0.000 claims description 621
- 239000002245 particle Substances 0.000 claims description 241
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 118
- 238000001035 drying Methods 0.000 claims description 107
- 229910052786 argon Inorganic materials 0.000 claims description 59
- 238000001354 calcination Methods 0.000 claims description 52
- 238000005406 washing Methods 0.000 claims description 46
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 36
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 35
- 229910052799 carbon Inorganic materials 0.000 claims description 35
- 239000000460 chlorine Substances 0.000 claims description 35
- 229910052801 chlorine Inorganic materials 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 32
- 238000005469 granulation Methods 0.000 claims description 22
- 230000003179 granulation Effects 0.000 claims description 22
- 239000000454 talc Substances 0.000 claims description 16
- 229910052623 talc Inorganic materials 0.000 claims description 16
- IREVRWRNACELSM-UHFFFAOYSA-J ruthenium(4+);tetrachloride Chemical compound Cl[Ru](Cl)(Cl)Cl IREVRWRNACELSM-UHFFFAOYSA-J 0.000 claims description 15
- 238000010298 pulverizing process Methods 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 10
- 230000003301 hydrolyzing effect Effects 0.000 claims description 10
- 229910052712 strontium Inorganic materials 0.000 claims description 8
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 8
- 238000009835 boiling Methods 0.000 claims description 6
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 6
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 6
- -1 hydrazine compound Chemical class 0.000 claims description 5
- 150000001785 cerium compounds Chemical class 0.000 claims description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 4
- 229910021485 fumed silica Inorganic materials 0.000 claims description 2
- 238000003756 stirring Methods 0.000 description 105
- 229910021642 ultra pure water Inorganic materials 0.000 description 105
- 239000012498 ultrapure water Substances 0.000 description 105
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 104
- 239000007789 gas Substances 0.000 description 78
- 239000002994 raw material Substances 0.000 description 55
- 238000004506 ultrasonic cleaning Methods 0.000 description 55
- 229910052757 nitrogen Inorganic materials 0.000 description 52
- 230000000052 comparative effect Effects 0.000 description 45
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 41
- 239000011521 glass Substances 0.000 description 36
- 239000010453 quartz Substances 0.000 description 36
- 238000000197 pyrolysis Methods 0.000 description 35
- 239000000203 mixture Substances 0.000 description 34
- 239000012299 nitrogen atmosphere Substances 0.000 description 27
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 24
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 23
- 239000001301 oxygen Substances 0.000 description 23
- 229910052760 oxygen Inorganic materials 0.000 description 23
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 23
- 239000012298 atmosphere Substances 0.000 description 22
- 238000011084 recovery Methods 0.000 description 20
- 239000000155 melt Substances 0.000 description 19
- 230000007062 hydrolysis Effects 0.000 description 18
- 238000006460 hydrolysis reaction Methods 0.000 description 18
- HBBBDGWCSBWWKP-UHFFFAOYSA-J tetrachloroantimony Chemical compound Cl[Sb](Cl)(Cl)Cl HBBBDGWCSBWWKP-UHFFFAOYSA-J 0.000 description 15
- 230000000694 effects Effects 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- 239000012535 impurity Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 8
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 150000003304 ruthenium compounds Chemical class 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000012300 argon atmosphere Substances 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000004575 stone Substances 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000004576 sand Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 210000004027 cell Anatomy 0.000 description 3
- BBLKWSIOIYLDHV-UHFFFAOYSA-J cerium(4+);tetrachloride Chemical compound Cl[Ce](Cl)(Cl)Cl BBLKWSIOIYLDHV-UHFFFAOYSA-J 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000006837 decompression Effects 0.000 description 3
- 238000001739 density measurement Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- YOBAEOGBNPPUQV-UHFFFAOYSA-N iron;trihydrate Chemical compound O.O.O.[Fe].[Fe] YOBAEOGBNPPUQV-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 101000662791 Homo sapiens Trafficking protein particle complex subunit 3 Proteins 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 102100037494 Trafficking protein particle complex subunit 3 Human genes 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000001698 pyrogenic effect Effects 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 1
- NBIFQXWCYNMOMH-UHFFFAOYSA-N C1=CC2=CC=CC(C3=C4C5=CC=CC4=CC=C3)=C2C5=C1.Cl.Cl.Cl.Cl Chemical compound C1=CC2=CC=CC(C3=C4C5=CC=CC4=CC=C3)=C2C5=C1.Cl.Cl.Cl.Cl NBIFQXWCYNMOMH-UHFFFAOYSA-N 0.000 description 1
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000001463 antimony compounds Chemical class 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 239000010436 fluorite Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 210000003093 intracellular space Anatomy 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/102—Forming solid beads by blowing a gas onto a stream of molten glass or onto particulate materials, e.g. pulverising
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Silicon Compounds (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011064456 | 2011-03-23 | ||
| JP2011064451 | 2011-03-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201242897A TW201242897A (en) | 2012-11-01 |
| TWI525041B true TWI525041B (zh) | 2016-03-11 |
Family
ID=46879163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101109323A TWI525041B (zh) | 2011-03-23 | 2012-03-19 | Synthetic amorphous silica powder and method for producing the same |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9446959B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2690066A4 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5825145B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20140002673A (cg-RX-API-DMAC7.html) |
| CN (1) | CN103249674B (cg-RX-API-DMAC7.html) |
| TW (1) | TWI525041B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2012128005A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6466635B2 (ja) * | 2013-06-14 | 2019-02-06 | 信越化学工業株式会社 | 非水電解質二次電池用負極の製造方法及び非水電解質二次電池の製造方法 |
| US9637405B2 (en) | 2013-06-30 | 2017-05-02 | Sumco Corporation | Evaluation method of suitable silica powder in manufacturing vitreous silica crucible for pulling of silicon single crystal |
| JPWO2015114956A1 (ja) * | 2014-01-29 | 2017-03-23 | 三菱マテリアル株式会社 | 合成非晶質シリカ粉末及びその製造方法 |
| CN104227006A (zh) * | 2014-08-26 | 2014-12-24 | 苏州智研新材料科技有限公司 | 一种微细球形不锈钢粉体的制备方法 |
| EP3390293B1 (de) | 2015-12-18 | 2023-04-19 | Heraeus Quarzglas GmbH & Co. KG | Erhöhen des siliziumgehalts bei der herstellung von quarzglas |
| TW201731782A (zh) | 2015-12-18 | 2017-09-16 | 何瑞斯廓格拉斯公司 | 在多腔式爐中製備石英玻璃體 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| WO2017103121A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines opaken quarzglaskörpers |
| WO2017103120A1 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung einer synthetischen quarzglaskörnung |
| CN108698888A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备 |
| CN108698892A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 从二氧化硅颗粒制备石英玻璃体 |
| WO2017103123A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| TWI808933B (zh) | 2015-12-18 | 2023-07-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法 |
| JPWO2018092804A1 (ja) * | 2016-11-16 | 2019-10-17 | 三菱ケミカル株式会社 | 定量供給用シリカ粉体、並びにこれを用いた生体物質の精製キット及びその製造方法 |
| CN107052225A (zh) * | 2016-12-30 | 2017-08-18 | 天津泽希矿产加工有限公司 | 特种砂‑球形熔融硅砂及其制备方法和应用 |
| JP2019182691A (ja) * | 2018-04-04 | 2019-10-24 | 東ソ−・エスジ−エム株式会社 | 石英ガラスインゴット及び石英ガラス製品の製造方法 |
| DE112018008204T5 (de) * | 2018-12-14 | 2021-09-09 | Tosoh Quartz Corporation | Verfahren zum Herstellen eines opaken Quarzglases |
| CN111943214B (zh) * | 2020-08-18 | 2022-08-30 | 苏州英纳特纳米科技有限公司 | 非晶态纳米球形二氧化硅的制备方法 |
| JP2024043650A (ja) * | 2022-09-20 | 2024-04-02 | 株式会社Sumco | 石英ガラスルツボ及びその製造方法及び石英ガラスルツボ用石英粉 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3525495C1 (de) | 1985-07-17 | 1987-01-02 | Heraeus Schott Quarzschmelze | Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid |
| JPS62176928A (ja) | 1986-01-29 | 1987-08-03 | Mitsubishi Metal Corp | 石英ガラス粉末の製造方法 |
| JPS62176929A (ja) | 1986-01-30 | 1987-08-03 | Olympus Optical Co Ltd | 成形型の離型リング |
| JPH03275527A (ja) | 1990-03-24 | 1991-12-06 | Mitsubishi Kasei Corp | 多孔質シリカガラス粉末 |
| JPH0475848A (ja) | 1990-07-17 | 1992-03-10 | Toyoda Mach Works Ltd | 適応制御装置 |
| FR2693451B1 (fr) * | 1992-07-07 | 1994-08-19 | Alcatel Nv | Procédé de fabrication d'une poudre de silice et application d'une telle poudre à la réalisation d'une préforme pour fibre optique. |
| JP3350139B2 (ja) | 1993-03-31 | 2002-11-25 | 三菱レイヨン株式会社 | 球状シリカ粒子の製造方法 |
| JPH09100105A (ja) * | 1995-10-02 | 1997-04-15 | Mitsubishi Chem Corp | 超微粒金属酸化物粉の製造方法 |
| JP4154563B2 (ja) * | 2001-07-23 | 2008-09-24 | 信越化学工業株式会社 | シリカ含有複合酸化物球状微粒子及びその製造方法 |
| DE10211958A1 (de) | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung |
| JP3639279B2 (ja) * | 2003-01-24 | 2005-04-20 | 高周波熱錬株式会社 | 熱プラズマによる粉末の合成／精製または球状化方法とその装置 |
| JP2005162593A (ja) * | 2003-12-04 | 2005-06-23 | Kiyoaki Shiraishi | 加熱処理する事によって「角（かど）」無くしたシリカ |
| JP5013573B2 (ja) * | 2005-09-30 | 2012-08-29 | 信越石英株式会社 | 高耐熱性石英ガラス粉の製造方法、高耐熱性石英ガラス粉及びガラス体 |
| EP2014622B1 (de) | 2007-07-06 | 2017-01-18 | Evonik Degussa GmbH | Verfahren zur Herstellung eines Kieselglasgranulats |
| JP2011157261A (ja) * | 2010-01-07 | 2011-08-18 | Mitsubishi Materials Corp | 合成非晶質シリカ粉末及びその製造方法 |
| CN102666384B (zh) * | 2010-01-07 | 2015-12-09 | 三菱综合材料株式会社 | 合成非晶态二氧化硅粉末 |
| JP2011157260A (ja) * | 2010-01-07 | 2011-08-18 | Mitsubishi Materials Corp | 合成非晶質シリカ粉末及びその製造方法 |
-
2012
- 2012-02-29 JP JP2012043206A patent/JP5825145B2/ja not_active Expired - Fee Related
- 2012-02-29 CN CN201280004018.8A patent/CN103249674B/zh not_active Expired - Fee Related
- 2012-02-29 WO PCT/JP2012/055059 patent/WO2012128005A1/ja not_active Ceased
- 2012-02-29 KR KR1020137015585A patent/KR20140002673A/ko not_active Withdrawn
- 2012-02-29 EP EP12761100.2A patent/EP2690066A4/en not_active Withdrawn
- 2012-02-29 US US14/004,551 patent/US9446959B2/en active Active
- 2012-03-19 TW TW101109323A patent/TWI525041B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140002673A (ko) | 2014-01-08 |
| CN103249674B (zh) | 2015-03-11 |
| JP5825145B2 (ja) | 2015-12-02 |
| US20140065423A1 (en) | 2014-03-06 |
| EP2690066A1 (en) | 2014-01-29 |
| EP2690066A4 (en) | 2014-08-20 |
| US9446959B2 (en) | 2016-09-20 |
| WO2012128005A1 (ja) | 2012-09-27 |
| TW201242897A (en) | 2012-11-01 |
| JP2012211070A (ja) | 2012-11-01 |
| CN103249674A (zh) | 2013-08-14 |
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