JP5812700B2 - Ｘ線放出ターゲット、ｘ線発生管およびｘ線発生装置 - Google Patents

Ｘ線放出ターゲット、ｘ線発生管およびｘ線発生装置 Download PDF

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Publication number
JP5812700B2
JP5812700B2 JP2011127513A JP2011127513A JP5812700B2 JP 5812700 B2 JP5812700 B2 JP 5812700B2 JP 2011127513 A JP2011127513 A JP 2011127513A JP 2011127513 A JP2011127513 A JP 2011127513A JP 5812700 B2 JP5812700 B2 JP 5812700B2
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Japan
Prior art keywords
target
layer
ray
metal
carbide
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JP2011127513A
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English (en)
Japanese (ja)
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JP2012256444A (ja
JP2012256444A5 (enExample
Inventor
孝夫 小倉
孝夫 小倉
佐藤　安栄
安栄 佐藤
靖浩 伊藤
靖浩 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011127513A priority Critical patent/JP5812700B2/ja
Priority to PCT/JP2012/003474 priority patent/WO2012169141A1/en
Priority to US14/124,216 priority patent/US9281158B2/en
Publication of JP2012256444A publication Critical patent/JP2012256444A/ja
Publication of JP2012256444A5 publication Critical patent/JP2012256444A5/ja
Application granted granted Critical
Publication of JP5812700B2 publication Critical patent/JP5812700B2/ja
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/12—Cooling non-rotary anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/083—Bonding or fixing with the support or substrate
    • H01J2235/084—Target-substrate interlayers or structures, e.g. to control or prevent diffusion or improve adhesion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/12—Cooling
    • H01J2235/1225—Cooling characterised by method
    • H01J2235/1291—Thermal conductivity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H01J35/116—Transmissive anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/16—Vessels; Containers; Shields associated therewith
    • H01J35/18—Windows
    • H01J35/186—Windows used as targets or X-ray converters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/02—Constructional details
    • H05G1/04—Mounting the X-ray tube within a closed housing
    • H05G1/06—X-ray tube and at least part of the power supply apparatus being mounted within the same housing

Landscapes

  • X-Ray Techniques (AREA)
JP2011127513A 2011-06-07 2011-06-07 Ｘ線放出ターゲット、ｘ線発生管およびｘ線発生装置 Active JP5812700B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011127513A JP5812700B2 (ja) 2011-06-07 2011-06-07 Ｘ線放出ターゲット、ｘ線発生管およびｘ線発生装置
PCT/JP2012/003474 WO2012169141A1 (en) 2011-06-07 2012-05-28 X-ray emitting target and x-ray emitting device
US14/124,216 US9281158B2 (en) 2011-06-07 2012-05-28 X-ray emitting target and X-ray emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011127513A JP5812700B2 (ja) 2011-06-07 2011-06-07 Ｘ線放出ターゲット、ｘ線発生管およびｘ線発生装置

Publications (3)

Publication Number Publication Date
JP2012256444A JP2012256444A (ja) 2012-12-27
JP2012256444A5 JP2012256444A5 (enExample) 2014-07-10
JP5812700B2 true JP5812700B2 (ja) 2015-11-17

Family

ID=46489444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011127513A Active JP5812700B2 (ja) 2011-06-07 2011-06-07 Ｘ線放出ターゲット、ｘ線発生管およびｘ線発生装置

Country Status (3)

Country Link
US (1) US9281158B2 (enExample)
JP (1) JP5812700B2 (enExample)
WO (1) WO2012169141A1 (enExample)

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JP5850059B2 (ja) * 2011-10-04 2016-02-03 株式会社ニコン Ｘ線を用いた形状測定装置、形状計測方法、及び構造物の製造方法
US20150117599A1 (en) * 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
JP6140983B2 (ja) * 2012-11-15 2017-06-07 キヤノン株式会社 透過型ターゲット、ｘ線発生ターゲット、ｘ線発生管、ｘ線ｘ線発生装置、並びに、ｘ線ｘ線撮影装置
JP6253233B2 (ja) 2013-01-18 2017-12-27 キヤノン株式会社 透過型ｘ線ターゲットおよび、該透過型ｘ線ターゲットを備えた放射線発生管、並びに、該放射線発生管を備えた放射線発生装置、並びに、該放射線発生装置を備えた放射線撮影装置
KR101417604B1 (ko) * 2013-03-04 2014-07-08 한국원자력연구원 엑스선 발생용 복합구조의 레이저 조사용 타겟
JP6316019B2 (ja) * 2013-03-06 2018-04-25 キヤノン株式会社 Ｘ線発生管、該ｘ線発生管を備えたｘ線発生装置及びｘ線撮影システム
JP6100036B2 (ja) * 2013-03-12 2017-03-22 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備える放射線発生管、放射線発生装置、及び、放射線撮影装置
JP6207246B2 (ja) 2013-06-14 2017-10-04 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備える放射線発生管、放射線発生装置、及び、放射線撮影装置
JP2015028879A (ja) * 2013-07-30 2015-02-12 東京エレクトロン株式会社 Ｘ線発生用ターゲット及びｘ線発生装置
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6335729B2 (ja) * 2013-12-06 2018-05-30 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備えるｘ線発生管
JP6272043B2 (ja) * 2014-01-16 2018-01-31 キヤノン株式会社 Ｘ線発生管及びこれを用いたｘ線発生装置、ｘ線撮影システム
JP6381269B2 (ja) * 2014-04-21 2018-08-29 キヤノン株式会社 ターゲットおよび前記ターゲットを備えるｘ線発生管、ｘ線発生装置、ｘ線撮影システム
CN104409304B (zh) * 2014-11-17 2017-01-11 中国科学院电工研究所 一种工业ct机x射线管用透射靶及其制备方法
JP6573380B2 (ja) * 2015-07-27 2019-09-11 キヤノン株式会社 Ｘ線発生装置及びｘ線撮影システム
US10692685B2 (en) 2016-06-30 2020-06-23 General Electric Company Multi-layer X-ray source target
US10475619B2 (en) 2016-06-30 2019-11-12 General Electric Company Multilayer X-ray source target
JP6324561B2 (ja) * 2017-02-22 2018-05-16 キヤノン株式会社 透過型ｘ線ターゲットおよび透過型ｘ線ターゲットの製造方法
US10847336B2 (en) * 2017-08-17 2020-11-24 Bruker AXS, GmbH Analytical X-ray tube with high thermal performance
JP6381756B2 (ja) * 2017-09-07 2018-08-29 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備える放射線発生管、放射線発生装置、及び、放射線撮影装置
JP6516896B2 (ja) * 2018-04-04 2019-05-22 キヤノン株式会社 Ｘ線ターゲット
CN112424591B (zh) 2018-06-04 2024-05-24 斯格瑞公司 波长色散x射线光谱仪
CN112470245B (zh) 2018-07-26 2025-03-18 斯格瑞公司 高亮度x射线反射源
DE112019004433B4 (de) 2018-09-04 2024-09-12 Sigray, Inc. System und verfahren für röntgenstrahlfluoreszenz mit filterung
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11315751B2 (en) * 2019-04-25 2022-04-26 The Boeing Company Electromagnetic X-ray control
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
US12278080B2 (en) 2022-01-13 2025-04-15 Sigray, Inc. Microfocus x-ray source for generating high flux low energy x-rays
US12360067B2 (en) 2022-03-02 2025-07-15 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
WO2024029474A1 (ja) * 2022-08-05 2024-02-08 株式会社島津製作所 Ｘ線撮影装置およびｘ線管
US12288662B2 (en) * 2022-08-23 2025-04-29 KETEK GmbH Halbleiter-und Reinraumtechnik X-ray source and transmission window
US12488956B2 (en) 2022-08-23 2025-12-02 KETEK GmbH Halbleiter- und Reinraumtechnik X-ray source
CN116437549B (zh) * 2023-04-18 2025-10-17 四川轻化工大学 一种高能x射线靶
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources

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EP0432568A3 (en) * 1989-12-11 1991-08-28 General Electric Company X ray tube anode and tube having same
JP2000306533A (ja) 1999-02-19 2000-11-02 Toshiba Corp 透過放射型ｘ線管およびその製造方法
DE19934987B4 (de) * 1999-07-26 2004-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Röntgenanode und ihre Verwendung
JP2002042705A (ja) * 2000-07-28 2002-02-08 Toshiba Corp 透過放射型ｘ線管およびその製造方法
JP2005276760A (ja) 2004-03-26 2005-10-06 Shimadzu Corp Ｘ線発生装置
US7359487B1 (en) * 2005-09-15 2008-04-15 Revera Incorporated Diamond anode
GB2453570A (en) 2007-10-11 2009-04-15 Kratos Analytical Ltd Electrode for x-ray apparatus

Also Published As

Publication number Publication date
JP2012256444A (ja) 2012-12-27
US20140112450A1 (en) 2014-04-24
WO2012169141A1 (en) 2012-12-13
US9281158B2 (en) 2016-03-08

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