JP5790196B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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Description
この要求を満足するための一つの接合方法であるワイヤボンディング技術にも高い信頼性が求められる。
図11は、超音波ボンディング装置300の概略図である。この超音波ボンディング装置300は超音波ワイヤボンダとも言われる。
しかし、半導体チップ55の表面電極57上にワイヤ60をボンディングする構造の故障にいたる箇所に着目すると、このワイヤ60に起因する場合が少なくない。したがって、半導体チップ55の表面電極57とワイヤ60との接合部60aの信頼性を上げることは半導体装置200の信頼性を向上させる上から重要である。
また、前記の特許文献1〜4には、ワイヤボンディングした後、熱時効処理を行い、その後の冷却において、冷却速度を小さくすることで、熱ひずみの導入を抑制し、半導体チップの表面電極とワイヤの接合部の信頼性を高めることについては記載されていない。
また、特許請求の範囲の請求項3記載の発明によれば、請求項1または2に記載の発明において、前記アルミニウムワイヤの素材が、0.03質量%以下のNi元素が添加されたアルミニウムもしくは純アルミニウムであるとよい。
<実施例>
図1〜図6は、この発明の一実施例の半導体装置の製造方法であり、工程順に示した要部製造工程断面図である。この半導体装置は、例えば、IGBTチップとダイオードが逆並列接続されたパワーモジュールなどである。
つぎに、図6に示すように、ユニット100b上にケース13を被せて、ケース13内に保護材として例えばゲル14を充填し、外部導出端子9をケース13上から露出させてパワーモジュールである半導体装置100が出来上がる。この半導体装置100が、本発明の製造方法を用いて製作される半導体装置である。
これは、ボンディングした後の熱時効処理の有無と冷却速度によるワイヤ10と表面電極7の接合部10aの硬度変化を示す図である。
また、熱時効処理温度を250℃とした場合、冷却速度を0.5℃/minとすると、ボンディングしないワイヤ単体の硬度とほぼ同等(変化率100→98)になる。さらに、図示しないが、熱時効処理温度を300℃に上昇させた場合もボンディングしないワイヤ単体の硬度とほぼ同等になる。但し、300℃超に熱時効処理温度を上昇させると前記したように接合材2,8が軟化するため好ましくない。
以上のことをまとめると、ワイヤ母材として微量のNi添加のアルミニウムワイヤを用い、表面電極7として微量のSi添加のアルミニウム膜を用いた場合に、熱時効処理温度が200℃〜300℃、冷却速度が1℃/min以下とすることで、故障サイクル数が目標の3万回を達成できる。
2,8 接合材
3 導電パターン付き絶縁基板
4a,4b 導電パターン
5 半導体チップ
6 裏面電極
7 表面電極
9 外部導出端子
10 ワイヤ
10a 接合部
11 加熱炉
12 N2雰囲気
13 ケース
14 ゲル
Claims (4)
- 半導体チップの表面電極にアルミニウムワイヤがボンディングされた半導体装置の製造方法において、
前記アルミニウムワイヤを前記表面電極にボンディングした後、前記アルミニウムワイヤと前記表面電極を200℃以上、300℃以下の高温に保持し、前記アルミニウムワイヤの結晶粒を最低粒径が10μm以上で平均粒径が15〜100μmとなるように処理する工程と、
1℃/min以下の冷却速度で前記アルミニウムワイヤを徐冷する工程と、
を含むことを特徴とする半導体装置の製造方法。 - 前記冷却速度が0.5℃/min以下であることを特徴とする請求項1に記載の半導体装置の製造方法。
- 前記アルミニウムワイヤの素材が、0.03質量%以下のNi元素が添加されたアルミニウムもしくは純アルミニウムであることを特徴とする請求項1または2に記載の半導体装置の製造方法。
- 前記表面電極の素材が、微量のSi元素が添加されたアルミニウムであることを特徴とする請求項1〜3のいずれか一項に記載の半導体装置の製造方法。
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JP2011139018A JP5790196B2 (ja) | 2011-06-23 | 2011-06-23 | 半導体装置の製造方法 |
CN201210210563.4A CN102842516B (zh) | 2011-06-23 | 2012-06-20 | 半导体器件的制造方法 |
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JP5978589B2 (ja) * | 2011-10-18 | 2016-08-24 | 富士電機株式会社 | パワー半導体装置の製造方法 |
CN103794578A (zh) * | 2014-01-24 | 2014-05-14 | 嘉兴斯达微电子有限公司 | 一种高频大功率碳化硅mosfet模块 |
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JPS63293933A (ja) * | 1987-05-27 | 1988-11-30 | Hitachi Ltd | ワイヤボンディング方法およびワイヤボンディング装置 |
JP2865973B2 (ja) * | 1993-05-11 | 1999-03-08 | 株式会社カイジョー | ワイヤループ変形防止ワイヤボンディング装置 |
JPH07135234A (ja) * | 1993-11-09 | 1995-05-23 | Hitachi Ltd | パワー半導体モジュール |
JP3055511B2 (ja) * | 1997-12-02 | 2000-06-26 | 日本電気株式会社 | 半導体装置の製造方法 |
JPH11330134A (ja) * | 1998-05-12 | 1999-11-30 | Hitachi Ltd | ワイヤボンディング方法およびその装置並びに半導体装置 |
JP2001110840A (ja) * | 1999-10-13 | 2001-04-20 | Sony Corp | ワイヤボンド装置及び方法 |
DE112008003425B4 (de) * | 2007-12-20 | 2023-08-31 | Aisin Aw Co., Ltd. | Verfahren zum Herstellen eines Halbleiterbauelements |
JP2010182911A (ja) * | 2009-02-06 | 2010-08-19 | Renesas Electronics Corp | 半導体装置の製造方法及びワイヤボンダ |
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