JP5746661B2 - ペリクルの製造方法 - Google Patents

ペリクルの製造方法 Download PDF

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Publication number
JP5746661B2
JP5746661B2 JP2012106550A JP2012106550A JP5746661B2 JP 5746661 B2 JP5746661 B2 JP 5746661B2 JP 2012106550 A JP2012106550 A JP 2012106550A JP 2012106550 A JP2012106550 A JP 2012106550A JP 5746661 B2 JP5746661 B2 JP 5746661B2
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JP
Japan
Prior art keywords
frame
pellicle
pellicle film
film
divided
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012106550A
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English (en)
Japanese (ja)
Other versions
JP2013235087A (ja
Inventor
一敏 関原
一敏 関原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2012106550A priority Critical patent/JP5746661B2/ja
Priority to KR1020130034297A priority patent/KR102020248B1/ko
Priority to TW102116131A priority patent/TWI491977B/zh
Priority to CN201310167125.9A priority patent/CN103389617B/zh
Publication of JP2013235087A publication Critical patent/JP2013235087A/ja
Priority to HK14101592.4A priority patent/HK1188487A1/zh
Application granted granted Critical
Publication of JP5746661B2 publication Critical patent/JP5746661B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/02—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor using sheet or web-like material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2012106550A 2012-05-08 2012-05-08 ペリクルの製造方法 Active JP5746661B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012106550A JP5746661B2 (ja) 2012-05-08 2012-05-08 ペリクルの製造方法
KR1020130034297A KR102020248B1 (ko) 2012-05-08 2013-03-29 펠리클의 제조 방법
TW102116131A TWI491977B (zh) 2012-05-08 2013-05-07 防塵薄膜組件的製造方法及由多個分割框並列結合而成的分割框組合體
CN201310167125.9A CN103389617B (zh) 2012-05-08 2013-05-08 防尘薄膜组件的制造方法
HK14101592.4A HK1188487A1 (zh) 2012-05-08 2014-02-19 防塵薄膜組件的製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012106550A JP5746661B2 (ja) 2012-05-08 2012-05-08 ペリクルの製造方法

Publications (2)

Publication Number Publication Date
JP2013235087A JP2013235087A (ja) 2013-11-21
JP5746661B2 true JP5746661B2 (ja) 2015-07-08

Family

ID=49533924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012106550A Active JP5746661B2 (ja) 2012-05-08 2012-05-08 ペリクルの製造方法

Country Status (5)

Country Link
JP (1) JP5746661B2 (ko)
KR (1) KR102020248B1 (ko)
CN (1) CN103389617B (ko)
HK (1) HK1188487A1 (ko)
TW (1) TWI491977B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI566033B (zh) * 2015-04-17 2017-01-11 Micro Lithography Inc Mask dustproof frame structure
CN108123671A (zh) * 2017-11-29 2018-06-05 北京创昱科技有限公司 一种框架压缩装置及薄膜拉伸方法
KR20230054032A (ko) 2021-10-15 2023-04-24 주식회사 이솔 Euv 리소그래피용 펠리클 구조 및 제조방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06230561A (ja) * 1993-01-29 1994-08-19 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル膜の製造方法
JPH09258433A (ja) * 1996-03-19 1997-10-03 Nikon Corp マスク
JP3386693B2 (ja) * 1997-06-09 2003-03-17 信越化学工業株式会社 ペリクルの製造方法
JP2004157229A (ja) 2002-11-05 2004-06-03 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル及びその製造方法
US20050157288A1 (en) * 2003-11-26 2005-07-21 Sematech, Inc. Zero-force pellicle mount and method for manufacturing the same
JP2010145264A (ja) * 2008-12-19 2010-07-01 Pioneer Electronic Corp Ｍｅｍｓデバイスの製造方法、ｍｅｍｓデバイスおよび接合マザー基板
JP5481106B2 (ja) * 2009-06-24 2014-04-23 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル
JP2011107230A (ja) * 2009-11-13 2011-06-02 Shin-Etsu Chemical Co Ltd ペリクルおよびその製造方法
JP2011158585A (ja) * 2010-01-29 2011-08-18 Shin-Etsu Chemical Co Ltd ペリクルおよびペリクルの製造方法

Also Published As

Publication number Publication date
KR102020248B1 (ko) 2019-09-10
HK1188487A1 (zh) 2014-05-02
TWI491977B (zh) 2015-07-11
CN103389617A (zh) 2013-11-13
JP2013235087A (ja) 2013-11-21
TW201404577A (zh) 2014-02-01
KR20130125295A (ko) 2013-11-18
CN103389617B (zh) 2016-03-02

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