JP5746661B2 - Pellicle manufacturing method - Google Patents

Pellicle manufacturing method Download PDF

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JP5746661B2
JP5746661B2 JP2012106550A JP2012106550A JP5746661B2 JP 5746661 B2 JP5746661 B2 JP 5746661B2 JP 2012106550 A JP2012106550 A JP 2012106550A JP 2012106550 A JP2012106550 A JP 2012106550A JP 5746661 B2 JP5746661 B2 JP 5746661B2
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frame
pellicle
pellicle film
film
divided
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JP2013235087A (en
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一敏 関原
一敏 関原
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Priority to JP2012106550A priority Critical patent/JP5746661B2/en
Priority to KR1020130034297A priority patent/KR102020248B1/en
Priority to TW102116131A priority patent/TWI491977B/en
Priority to CN201310167125.9A priority patent/CN103389617B/en
Publication of JP2013235087A publication Critical patent/JP2013235087A/en
Priority to HK14101592.4A priority patent/HK1188487A1/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/02—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor using sheet or web-like material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

本発明は、ＬＳＩや液晶ディスプレイの回路を製造するリソグラフィーのフォトマスク等の防塵カバーとして使用されるペリクルの製造方法に関するものである。   The present invention relates to a method for manufacturing a pellicle used as a dustproof cover for a lithography photomask or the like for manufacturing an LSI or liquid crystal display circuit.

ＬＳＩや超ＬＳＩ等の半導体製造或は液晶ディスプレイ等の製造において、半導体ウエハー或いは液晶用原板に光を照射してパターンを作製するリソグラフィーの作業が行われる。この際に、フォトマスク或いはレチクルにゴミが付着していると、ゴミが写し込こまれて転写したパターンが変形したり、エッジがガサツいたものとなる他、下地が黒く汚れたりする等の現象が発生することがある。この作業は通常クリーンルームで行われているが、フォトマスクを常に清浄に保つことは難しい。例えばリソグラフィーの際に、ペリクルをフォトマスク上に載置して、フォトマスクへの異物付着を防止しつつ、焦点をフォトマスクのパターン上に合わせて露光することにより、ペリクル膜の上に付着したゴミに影響されることなく転写できる。   In the manufacture of semiconductors such as LSI and VLSI, or in the manufacture of liquid crystal displays and the like, a lithography operation is performed in which a pattern is formed by irradiating a semiconductor wafer or a liquid crystal original plate with light. At this time, if dust is attached to the photomask or reticle, the transferred pattern will be deformed, the transferred pattern will be deformed, the edges will be rugged, and the ground will be blackened. May occur. This operation is normally performed in a clean room, but it is difficult to always keep the photomask clean. For example, during lithography, the pellicle was placed on the photomask, and was attached to the pellicle film by exposing the focus on the pattern of the photomask while preventing foreign matter from adhering to the photomask. Can be transferred without being affected by dust.

近年、ペリクルにも低コスト化が強く求められるようになってきている。ペリクルの製造コストのうち、最も高い割合を占めているのはペリクル膜の製造工程である。従来のペリクルの製造工程のうち、ペリクル膜の成膜工程は１回の工程で１枚のペリクル膜しか得られず、かつこの工程には少なくとも数時間を要していた。特許文献１にはペリクル膜の製造方法が記載されている。   In recent years, the cost reduction of the pellicle has been strongly demanded. The manufacturing process of the pellicle film occupies the highest percentage of the manufacturing cost of the pellicle. Of the conventional pellicle manufacturing processes, only one pellicle film is obtained in one process, and this process takes at least several hours. Patent Document 1 describes a method for manufacturing a pellicle film.

また、フレームの撓みはできるだけ小さいことが好ましく、これに貼り付けされたペリクル膜にはシワがあってはならない。特許文献２にはペリクル膜の張力を調整してシワの発生を防止する方法が記載されている。   Further, it is preferable that the frame bend as little as possible, and the pellicle film affixed thereto should not be wrinkled. Patent Document 2 describes a method for preventing the generation of wrinkles by adjusting the tension of the pellicle film.

特開２００４−１５７２２９号公報JP 2004-157229 A 特開２０１１−１５８５８５号公報JP 2011-158585 A

成膜工程で得られたペリクル膜は、面内における張力が均一であることが求められるが、１回の成膜工程で得られた１枚のペリクル膜を複数に分割した場合には、その方向および分布、またはそのどちらかが不均一となる。張力の大きい緊張した辺が存在する場合には、張力の作用によって、フレームに撓みが生ずる。一方、張力の小さい弛緩した辺が存在する場合にはフレームの撓みは生じないが、フレームへのわずかの力によって、ペリクル膜にシワが生ずる。これらが生じたペリクルは、光学的な露光品質に悪影響を与えたり、露光領域を減少させたりとの不具合を招来している。   The pellicle film obtained in the film forming process is required to have a uniform in-plane tension. However, when one pellicle film obtained in one film forming process is divided into a plurality of pieces, Direction and / or distribution is non-uniform. When a tensioned side having a high tension exists, the frame is bent by the action of the tension. On the other hand, when there is a relaxed side with a small tension, the frame does not bend, but a slight force on the frame causes wrinkles on the pellicle film. The pellicle in which these occur causes a problem that the optical exposure quality is adversely affected and the exposure area is reduced.

本発明は前記の課題を解決するためになされたもので、１回の成膜工程で複数のペリクルを製造する方法と、ペリクル膜の張力の不均一を解消してペリクルを製造することにより、フレームの撓みとペリクル膜へのシワの発生を防止する方法を提供することを目的とする。   The present invention has been made to solve the above-mentioned problems, and a method for manufacturing a plurality of pellicles in one film formation process, and manufacturing a pellicle by eliminating non-uniform tension of the pellicle film, It is an object of the present invention to provide a method for preventing the bending of the frame and the generation of wrinkles on the pellicle film.

前記の目的を達成するためになされた、特許請求の範囲の請求項１に記載されたペリクルの製造方法は、ペリクル膜をフレームに緊締して貼り付けるペリクルの製造方法において、１枚のペリクル膜を仮枠上に貼り付け、該仮枠の内寸よりも小さい外寸の、複数並べて結合された分割枠を、仮枠上のペリクル膜に接着してから、ペリクル膜を分割枠の外辺に沿って仮枠から切離すとともに、結合された分割枠を分離し、個々の分割枠上に接着したペリクル膜を、フレームに貼り付けてから、分割枠を取り去ることを特徴とする。   The method for manufacturing a pellicle according to claim 1, which has been made to achieve the above object, is a method for manufacturing a pellicle in which the pellicle film is fastened and attached to a frame. A plurality of divided frames, which are smaller than the inner dimension of the temporary frame and bonded in a row, are bonded to the pellicle film on the temporary frame, and then the pellicle film is attached to the outer edge of the divided frame. The separated divided frames are separated from each other, the pellicle film bonded onto each divided frame is attached to the frame, and then the divided frames are removed.

請求項２に記載されたペリクル膜の製造方法は、ペリクル膜をフレームに緊締して貼り付けるペリクルの製造方法において、成膜基板上の１枚のペリクル膜を、複数並べて結合された分割枠に貼り付け、ペリクル膜を分割枠の外辺に沿って成膜基板から切離すとともに、結合された分割枠を分離し、個々の分割枠上に接着したペリクル膜を、フレームに貼り付けてから、分割枠を取り去ることを特徴とするペリクルの製造方法。   The method for manufacturing a pellicle film according to claim 2 is a method for manufacturing a pellicle in which the pellicle film is fastened and attached to a frame, and a plurality of pellicle films on a film formation substrate are combined into a divided frame joined together. Attaching and separating the pellicle film from the film formation substrate along the outer edge of the dividing frame, separating the combined dividing frame, and attaching the pellicle film adhered on each dividing frame to the frame, A method for producing a pellicle, comprising removing a dividing frame.

請求項３に記載されたペリクル膜の製造方法は、請求項１または２に記載のペリクルの製造方法であって、分割枠上に接着したペリクル膜をフレームに貼り付ける際、分割枠に圧縮または引張の力を加えて、ペリクル膜を貼り付けてから、該力を解放することを特徴とする。   A method for producing a pellicle film according to claim 3 is the method for producing a pellicle according to claim 1 or 2, wherein when the pellicle film adhered on the divided frame is attached to the frame, the pellicle film is compressed into the divided frame. A tensile force is applied to attach the pellicle film, and then the force is released.

請求項４に記載されたペリクル膜の製造方法は、請求項１または２に記載のペリクルの製造方法であって、分割枠上に接着したペリクル膜をフレームに貼り付ける際、フレームに圧縮または引張の力を加えて、ペリクル膜を貼り付けてから、該力を解放することを特徴とする。   The method for producing a pellicle film according to claim 4 is the method for producing a pellicle according to claim 1 or 2, wherein when the pellicle film adhered on the divided frame is attached to the frame, the pellicle film is compressed or tensioned to the frame. The pellicle film is affixed by applying this force, and then the force is released.

ペリクルは、例えば、上記いずれかの方法により製造される。 Pellicle, for example, Ru is produced by any of the above methods.

本発明のペリクルの製造方法によれば、１回の成膜工程で複数のペリクル膜を得ることができる。また、ペリクル膜をフレームに接着する際にペリクル膜の張力を均一にすることで、フレームの撓み量が要求精度を満足するとともに、ペリクル膜にシワが発生することもない、十分に実用に供し得るペリクルを得ることができる。   According to the method for producing a pellicle of the present invention, a plurality of pellicle films can be obtained in one film formation step. In addition, by making the tension of the pellicle film uniform when bonding the pellicle film to the frame, the amount of flexure of the frame satisfies the required accuracy, and the pellicle film does not wrinkle. An obtained pellicle can be obtained.

本発明に係る製造方法により製造されたペリクルの一例を示す斜視図である。It is a perspective view which shows an example of the pellicle manufactured by the manufacturing method which concerns on this invention. ペリクル膜の成膜工程の一例を示す工程図である。It is process drawing which shows an example of the film-forming process of a pellicle film. 分割枠をペリクル膜に接着した後、ペリクル膜を分割する方法の一例を説明する斜視図である。It is a perspective view explaining an example of a method of dividing a pellicle film after adhering a division frame to the pellicle film. 圧縮または引張の力を加えた分割枠を、フレームに貼り付ける方法の一例を説明する斜視図である。It is a perspective view explaining an example of the method of sticking the division frame which applied the force of compression or tension on a frame. 分割枠をペリクル膜に接着した後、ペリクル膜を分割する方法の別な例を説明する斜視図である。It is a perspective view explaining another example of the method of dividing the pellicle film after bonding the dividing frame to the pellicle film. 引張の力を加えて変形させたフレームに、ペリクル膜を貼り付けることで、ペリクル膜の各辺の張力の不均一を解消する方法の一例を説明する斜視図である。FIG. 6 is a perspective view for explaining an example of a method for eliminating uneven tension on each side of the pellicle film by attaching the pellicle film to a frame deformed by applying a tensile force.

以下、本発明を実施するための好ましい形態について詳細に説明するが、本発明の範囲はこれらの形態に限定されるものではない。   Hereinafter, although the preferable form for implementing this invention is demonstrated in detail, the scope of the present invention is not limited to these forms.

本発明に係る製造方法により製造されたペリクル１０の斜視図を図１に示す。フレーム２の上端面にはペリクル膜接着層８が形成され、これを介してペリクル膜３が緊締して貼り付けされている。フレーム２の長辺部の側面には通気孔４と治具穴５とが形成されている。通気孔４にはゴミ止めのフィルタ７が設けられている。フレーム２の下端面にはフォトマスクに装着するためのマスク接着層６が形成され、さらにこれを保護するための離型層であるセパレータ９が形成されている。   FIG. 1 is a perspective view of a pellicle 10 manufactured by the manufacturing method according to the present invention. A pellicle film adhesive layer 8 is formed on the upper end surface of the frame 2, and the pellicle film 3 is fastened and bonded thereto. A vent hole 4 and a jig hole 5 are formed on the side surface of the long side portion of the frame 2. The vent hole 4 is provided with a dust-preventing filter 7. A mask adhesive layer 6 for mounting on a photomask is formed on the lower end surface of the frame 2, and a separator 9 is formed as a release layer for protecting the mask adhesive layer 6.

図２に本発明で用いられるペリクル膜の成膜工程の一例を示す。（ａ）に示すように、成膜基板２４にダイ３１を水平に移動させてペリクル膜材料溶液３ａを塗布する。（ｂ）に示すように、成膜基板２４を加熱装置３２に載置、加熱してペリクル膜材料溶液３ａに含まれる溶媒を蒸発させた後、冷却する。（ｃ）に示すように、ペリクル膜３に、接着層２２が一端面に塗布された仮枠２１（一部切欠き断面）を接着する。（ｄ）に示すように、仮枠２１を引き上げてペリクル膜３を成膜基板２４から剥離し、仮枠２１に仮付されたペリクル膜３を得る。   FIG. 2 shows an example of a film forming process of the pellicle film used in the present invention. As shown in (a), the pellicle film material solution 3a is applied to the film formation substrate 24 by moving the die 31 horizontally. As shown in (b), the film formation substrate 24 is placed on the heating device 32, heated to evaporate the solvent contained in the pellicle film material solution 3a, and then cooled. As shown in (c), a temporary frame 21 (partially cut-out cross section) having an adhesive layer 22 applied to one end face is bonded to the pellicle film 3. As shown in FIG. 4D, the temporary frame 21 is pulled up and the pellicle film 3 is peeled off from the film formation substrate 24 to obtain the pellicle film 3 temporarily attached to the temporary frame 21.

図３（ａ）に示す分割枠４１は、若干の撓み性のある材質からなり、一端面に接着層４２が形成されている。さらに複数並べられて、ピン４５と位置決め穴４６（（ｂ）参照）とにより位置決めされ、内方向に銜え込むクリップ４３で結合されている。結合された分割枠４１の外寸は、仮枠２１の内寸よりも小さく形成されている。仮枠２１に仮付されたペリクル膜３に、接着層４２を介して分割枠４１を接着する。カッターを用いて分割枠４１の外辺に沿ってペリクル膜３を切断し、仮枠２１から取り外した後、クリップ４３を取り外し、分割線Ｘ−Ｘ、Ｙ−Ｙで切断する。（ｂ）に示すように、ペリクル膜３は分割枠４１に接着された状態で分割される。   The divided frame 41 shown in FIG. 3A is made of a material having a slight flexibility, and an adhesive layer 42 is formed on one end surface. Further, a plurality of them are arranged, positioned by a pin 45 and a positioning hole 46 (see (b)), and coupled by a clip 43 that is held inward. The outer dimension of the combined divided frame 41 is smaller than the inner dimension of the temporary frame 21. The divided frame 41 is bonded to the pellicle film 3 temporarily attached to the temporary frame 21 via the adhesive layer 42. The pellicle film 3 is cut along the outer side of the dividing frame 41 using a cutter, and after removing it from the temporary frame 21, the clip 43 is removed, and cutting is performed along the dividing lines XX and YY. As shown in (b), the pellicle film 3 is divided while being adhered to the dividing frame 41.

図４に、膜貼付装置５０を用いてペリクル膜３をフレーム２に貼り付ける工程の斜視図を示す。フレーム２には、本図では省略したが、マスク接着層６、ペリクル膜接着層８およびセパレータ９（図１参照）が付されている。膜接着装置５０は、四角形状であって分割枠４１を載置する載置台５１と、これの各角部のうちの少なくとも１つに設けられた固定部５２と、載置台５１の内側に設けられた昇降載置台５３と、載置台５１の各辺のうち少なくとも１つに設けられた圧縮引張装置５５とからなる。   FIG. 4 shows a perspective view of a process of attaching the pellicle film 3 to the frame 2 using the film attaching apparatus 50. Although not shown in the figure, the frame 2 is provided with a mask adhesive layer 6, a pellicle film adhesive layer 8, and a separator 9 (see FIG. 1). The film bonding apparatus 50 has a rectangular shape and a mounting table 51 on which the divided frame 41 is mounted, a fixing unit 52 provided at at least one of the corners of the mounting table 51, and an inner side of the mounting table 51. And a compression / tensile device 55 provided on at least one of the sides of the mounting table 51.

分割枠４１は固定部５２により位置決めされて載置台５１に載置される。昇降載置台５３の下面には昇降機構（不図示）が設けられており、上昇することで載置されたフレーム２が上方へと移動し、ペリクル膜３に貼り付けされる。   The division frame 41 is positioned by the fixing portion 52 and placed on the placement table 51. An elevating mechanism (not shown) is provided on the lower surface of the elevating mounting table 53, and the frame 2 placed thereon moves upward and is attached to the pellicle film 3.

圧縮引張装置５５は分割枠４１各辺と直交する方向に可動し、ロードセル５７にて検出した圧縮または引張の力を、連結部５６を通じて把持部５４へ加える。ここで、圧縮とは力を加える方向が枠の辺に対して外側から内側方向であることを、引張とはその逆であることを意味する。二点鎖線は力を加えた状態を示しており、分割枠４１の一対の長辺に圧縮の力を、短辺に引張の力を加えた場合を示している。ペリクル膜３の張力が各辺で不均一のときはステージ５８を移動させることで分割枠４１に圧縮または引張の力を加え、張力が各辺で均一になるようにした後、フレーム２をペリクル膜３に貼り付ける。その後力を解放し、ペリクル膜３の余剰部をカッターで切除することで、図１に示すペリクル１０が完成する。   The compression and tension device 55 is movable in a direction orthogonal to each side of the divided frame 41 and applies the compression or tension force detected by the load cell 57 to the grip portion 54 through the connecting portion 56. Here, compression means that the direction in which force is applied is from the outside to the inside with respect to the sides of the frame, and tension means the opposite. An alternate long and two short dashes line indicates a state in which a force is applied, and shows a case where a compression force is applied to a pair of long sides of the split frame 41 and a tensile force is applied to a short side. When the tension of the pellicle film 3 is not uniform on each side, a compression or tension force is applied to the divided frame 41 by moving the stage 58 so that the tension becomes uniform on each side, and then the frame 2 is moved to the pellicle. Affix to film 3. Thereafter, the force is released, and the excess part of the pellicle film 3 is cut off with a cutter, whereby the pellicle 10 shown in FIG. 1 is completed.

図５に本発明に係るペリクル膜を分割する方法についての別な実施形態を示す。分割枠４１を成膜基板２４上のペリクル膜３に接着し、成膜基板２４から離すとペリクル膜３は分割枠４１に支持される。ついでクリップ４３を取り外し、ペリクル膜３を分割線Ｘ−Ｘ、Ｙ−Ｙと分割枠４１の外辺に沿って切断してペリクル膜３が接着された分割枠４１を得る。本実施形態によれば、仮枠を用いないため、前記した実施形態と比較して工程数が少なく、ペリクル膜の分割を速やかに行うことができるという利点がある。   FIG. 5 shows another embodiment of a method for dividing a pellicle film according to the present invention. When the divided frame 41 is bonded to the pellicle film 3 on the film formation substrate 24 and separated from the film formation substrate 24, the pellicle film 3 is supported by the division frame 41. Next, the clip 43 is removed, and the pellicle film 3 is cut along the dividing lines XX and YY and the outer side of the dividing frame 41 to obtain the dividing frame 41 to which the pellicle film 3 is bonded. According to this embodiment, since a temporary frame is not used, there are advantages in that the number of steps is smaller than in the above-described embodiment, and the pellicle film can be divided quickly.

図４のペリクル膜をフレームに接着する工程における別な実施形態としては、フレーム２に代えて、圧縮または引張の力を加えて変形させたフレームを用いることもできる。   As another embodiment in the step of adhering the pellicle membrane of FIG. 4 to the frame, a frame deformed by applying a compression or tension force may be used instead of the frame 2.

図６にフレームを変形させてペリクル膜の張力の不均一を解消する方法の例を示す。ペリクル膜の張力が高い場合には、フレーム２ａの外側に対して凸状の円弧形状をなすように各辺に引張の力を加えて変形させておく。ペリクル膜を貼り付けた後に引張の力を解放すると、各辺には内側へ戻ろうとする力Ｆが生じているので直線状に推移し、このことによりペリクル膜の張力は減少して、フレームの撓みを防止することができる。力を加える手段としては、図４に示す圧縮引張装置５５と同様のものを用いることができる。ロードセルなどの荷重検出機構によってフレームの各辺に加える力の方向および大きさを適宜調節することで、ペリクル膜の張力の不均一を解消する。   FIG. 6 shows an example of a method for eliminating the uneven tension of the pellicle film by deforming the frame. When the tension of the pellicle film is high, each side is deformed by applying a tensile force so as to form a convex arc shape with respect to the outside of the frame 2a. When the tensile force is released after the pellicle film is attached, a force F that tries to return to the inside is generated on each side, so that it changes linearly. As a result, the tension of the pellicle film decreases, and the frame Bending can be prevented. As means for applying the force, the same means as the compression / tensile device 55 shown in FIG. 4 can be used. By appropriately adjusting the direction and magnitude of the force applied to each side of the frame by a load detection mechanism such as a load cell, uneven tension of the pellicle film is eliminated.

なお、図４の膜接着装置５０を用いてペリクル膜の張力を均一にする方法と、図６のフレームを変形させてペリクル膜の張力を均一にする方法のいずれか一を用いてもよいし、両方を組み合わせて同時に用いてもよい。さらに、フレーム各辺が外側に対して凸状の円弧形状をなすようにあらかじめ作製し、ペリクル膜の張力により略直線状に推移させる方法を組み合わせることもよい。   Note that either the method of making the tension of the pellicle film uniform using the film bonding apparatus 50 of FIG. 4 or the method of making the frame of FIG. 6 uniform to make the tension of the pellicle film uniform may be used. A combination of both may be used simultaneously. Furthermore, it is also possible to combine a method in which each side of the frame is formed in advance so as to form a convex arc shape with respect to the outside, and the frame is changed to a substantially linear shape by the tension of the pellicle film.

フレーム２の材質としてはアルミニウム、ステンレス、ポリエチレンなどを用いることができる。光を透過するペリクル膜３はニトロセルロース、酢酸セルロースまたはフッ素樹脂などを用いることができる。マスク接着層６はポリブデン樹脂、ポリ酢酸ビニル樹脂、アクリル樹脂、シリコーン樹脂などを用いることができる。   As the material of the frame 2, aluminum, stainless steel, polyethylene or the like can be used. As the pellicle film 3 that transmits light, nitrocellulose, cellulose acetate, fluororesin, or the like can be used. The mask adhesive layer 6 can be made of polybudene resin, polyvinyl acetate resin, acrylic resin, silicone resin, or the like.

成膜基板２４は石英、低膨張ガラスなどを用いることができる。ペリクル膜材料溶液３ａを塗布する方法についてはスリットコート法、スピンコート法、スリットアンドスピン法およびロールコート法を用いることができる。加熱装置３２はホットプレート、赤外線ランプおよびオーブンなどを用いることができる。   For the film formation substrate 24, quartz, low expansion glass, or the like can be used. As a method of applying the pellicle film material solution 3a, a slit coat method, a spin coat method, a slit and spin method, and a roll coat method can be used. The heating device 32 can be a hot plate, an infrared lamp, an oven, or the like.

仮枠２１と分割枠４１の撓み性のある材質としてはアルミニウム合金、マグネシウム合金などの軽合金、ステンレス鋼、炭素鋼、工具鋼などの鉄系合金の他、ＧＦＲＰ、ＣＦＲＰなどの樹脂複合材などを用いることができる。仮枠２１は、各辺の撓みを少なくしてペリクル膜３の張力を高くするとの観点から、高い剛性を有するステンレス鋼が好ましい。分割枠４１は、集光ランプを用いた異物検査を行うことから、軽量かつ黒色へ着色が容易なアルミニウム合金が好ましい。   Examples of the flexible material of the temporary frame 21 and the dividing frame 41 include light alloys such as aluminum alloy and magnesium alloy, iron-based alloys such as stainless steel, carbon steel, and tool steel, and resin composite materials such as GFRP and CFRP. Can be used. The temporary frame 21 is preferably made of stainless steel having high rigidity from the viewpoint of increasing the tension of the pellicle film 3 by reducing the bending of each side. The divided frame 41 is preferably an aluminum alloy that is lightweight and easily colored to black because foreign matter inspection using a condenser lamp is performed.

図３および図５においては、分割枠４１が４体から形成されているが、必要に応じて適宜数を増減でき、例えば２体でも、６体でもそれ以上であってもよい。   In FIG. 3 and FIG. 5, the dividing frame 41 is formed of four bodies, but the number can be increased or decreased as necessary, and may be two, six, or more, for example.

図４中、把持部５４はコ字形状またはフック形状の治具であり、分割枠４１の各辺にひとつでも複数設けてもよい。また力を加える方向は、図示した方向に限定されるものではなく、対向する辺で力を加える向きや大きさが異なっていてもよい。   In FIG. 4, the gripping portion 54 is a U-shaped or hook-shaped jig, and one or a plurality of gripping portions 54 may be provided on each side of the dividing frame 41. Further, the direction in which the force is applied is not limited to the illustrated direction, and the direction and the size in which the force is applied may be different on opposite sides.

以下に実施例を挙げて、本発明を具体的に説明するが、本発明はこれらになんら制限されるものではない。   EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.

クラス１０のクリーンルーム内において、図２（ａ）〜（ｄ）に示す工程でペリクル膜を製造した。（ａ）に示す成膜基板２４には１２２０×１４００ｍｍの平滑に研磨した石英基板を用い、溶媒に希釈したフッ素樹脂（商品名：サイトップ 旭硝子（株）製）からなるペリクル膜材料溶液３ａをダイ３１から吐出しながら移動させて塗布した。そのままクリーンルームの気流下で溶媒を乾燥させた後、（ｂ）のように、加熱装置３２（アルミニウム合金製ホットプレート）の上に成膜基板２４を移動して加熱し、塗布したペリクル膜材料溶液３ａに含まれる溶媒を完全に蒸発させてペリクル膜３を成膜した。   In a class 10 clean room, a pellicle film was manufactured by the steps shown in FIGS. A film substrate 24 shown in (a) is a 1220 × 1400 mm smooth polished quartz substrate, and a pellicle film material solution 3a made of fluororesin (trade name: manufactured by Cytop Asahi Glass Co., Ltd.) diluted in a solvent is used. The coating was carried out while discharging from the die 31. After the solvent is dried as it is in a clean room air stream, the film formation substrate 24 is moved and heated on the heating device 32 (aluminum alloy hot plate) as shown in FIG. The pellicle film 3 was formed by completely evaporating the solvent contained in 3a.

成膜基板２４が室温まで冷却された後、図２（ｃ）のように、ペリクル膜３に仮枠２１を、接着層２２を介して接着した。そして（ｄ）のように、除電手段（不図示）により除電を行いながら仮枠２１をゆっくりと上方に引き上げて成膜基板２４から剥離し、仮枠２１に貼り付けされたペリクル膜３を得た。   After the film formation substrate 24 was cooled to room temperature, the temporary frame 21 was bonded to the pellicle film 3 through the adhesive layer 22 as shown in FIG. Then, as shown in (d), the temporary frame 21 is slowly lifted upward while being neutralized by a neutralizing means (not shown), and peeled off from the film formation substrate 24 to obtain the pellicle film 3 attached to the temporary frame 21. It was.

前記のペリクル膜３を暗室内で集光ランプを用いた異物検査を行った後、図３（ａ）のように、スタンド（不図示）を用いて垂直に保持した。複数並べて結合された分割枠４１（外寸１１９０×１３６０ｍｍ）の一端面に接着層４２を塗布して、ペリクル膜３に接着した。その後、クリップ４３をすべて取り外して（ｂ）のように分割枠４１の外辺、分割線Ｘ−Ｘ、Ｙ−Ｙに沿ってカッターでペリクル膜３を切断した。   The pellicle film 3 was inspected for foreign matter using a condenser lamp in a dark room, and then held vertically using a stand (not shown) as shown in FIG. An adhesive layer 42 was applied to one end surface of a plurality of divided frames 41 (outer dimensions 1190 × 1360 mm) joined side by side and adhered to the pellicle film 3. Thereafter, all the clips 43 were removed, and the pellicle film 3 was cut with a cutter along the outer side of the dividing frame 41 and the dividing lines XX and YY as shown in FIG.

前記の４体のペリクル膜３が接着された分割枠４１のうち１体を用いてペリクルを作製した。図４に示すように分割枠４１の各辺中央にフック形状の把持部５４を取り付けて載置台５１に載置し、圧縮引張装置５５により圧縮または引張の力を加えた。この加えた力は、事前の実験により値を求めておいた。力を加えた状態を保ったまま、フレーム２をペリクル膜３に貼り付け、周囲の余剰膜をカッターにて切断した。フレーム２はアルミニウム合金製で外寸３５３×５９２ｍｍ、内寸３４０×５８０ｍｍ、高さ４．８ｍｍであって、表面は黒色アルマイト処理を施した。ペリクル膜接着層８とマスク接着層６（図１参照）としてはシリコーン粘着剤（信越化学工業（株）製）を用い、マスク接着層６の表面は保護のためＰＥＴフィルム製のセパレータ９で被覆した。また、通気孔４はＰＴＦＥ製のメンブレンフィルタ７を、アクリル接着層を介して設けた。   A pellicle was produced using one of the divided frames 41 to which the four pellicle films 3 were bonded. As shown in FIG. 4, a hook-shaped gripping portion 54 is attached to the center of each side of the divided frame 41 and placed on the mounting table 51, and a compression or tension force is applied by a compression and tension device 55. The value of this applied force was obtained by a prior experiment. The frame 2 was affixed to the pellicle film 3 while keeping the applied force, and the surrounding excess film was cut with a cutter. The frame 2 is made of an aluminum alloy and has an outer size of 353 × 592 mm, an inner size of 340 × 580 mm, and a height of 4.8 mm, and the surface is subjected to black alumite treatment. Silicone adhesive (manufactured by Shin-Etsu Chemical Co., Ltd.) is used as the pellicle film adhesive layer 8 and the mask adhesive layer 6 (see FIG. 1), and the surface of the mask adhesive layer 6 is covered with a PET film separator 9 for protection. did. The vent hole 4 was provided with a PTFE membrane filter 7 via an acrylic adhesive layer.

こうして図１に示すペリクル１０が完成した。このペリクル１０について、定盤上でフレーム２の撓み量を測定した。その結果、一辺の撓み量は０．３ｍｍおよび０．２５ｍｍ、これと隣り合う他の辺の撓み量は０．２ｍｍおよび０．２３ｍｍとなっており、撓み量が許容範囲であるとともに、対向する辺同士はほぼ同程度の撓み量となっていた。加えて、ペリクル１０をハンドリングする際に、フレーム２に接着されたペリクル膜３にシワが発生するなどの不具合は一切観察されなかった。   Thus, the pellicle 10 shown in FIG. 1 was completed. For this pellicle 10, the amount of deflection of the frame 2 was measured on a surface plate. As a result, the amount of deflection on one side is 0.3 mm and 0.25 mm, and the amount of deflection on the other side adjacent to this is 0.2 mm and 0.23 mm. The sides had almost the same amount of deflection. In addition, when handling the pellicle 10, no defects such as wrinkles were observed on the pellicle film 3 adhered to the frame 2.

比較例Comparative example

前記実施例と同様の工程にてペリクル膜を成膜し、その後ペリクル膜の張力を均一にせず前記実施例と同じペリクルを作製した。   A pellicle film was formed in the same process as in the above example, and then the same pellicle as in the above example was produced without making the tension of the pellicle film uniform.

完成したペリクルについて、フレームの撓み量を測定したところ、一辺の撓み量は０．９ｍｍおよび０．１ｍｍ、これと隣り合う他の辺の撓み量は０．５ｍｍおよび０．１５ｍｍであった。これは許容できない大きさの撓み量であるとともに、非常に不揃いな撓み状態となっていた。さらに、このペリクルを垂直に立て、撓み量が０．１ｍｍとなっていた長辺を上方に向けると、ペリクル膜の長辺中央付近に数本のシワが観察された。フレームの形状とペリクル膜に発生したシワの状態から、これはペリクルとして使用することができないものであった。   When the bending amount of the frame was measured for the completed pellicle, the bending amount of one side was 0.9 mm and 0.1 mm, and the bending amount of the other side adjacent thereto was 0.5 mm and 0.15 mm. This is an unacceptably large amount of bending and a very uneven bending state. Further, when this pellicle was set up vertically and the long side where the deflection amount was 0.1 mm was directed upward, several wrinkles were observed near the center of the long side of the pellicle film. Due to the shape of the frame and the wrinkles generated on the pellicle membrane, this cannot be used as a pellicle.

液晶製造用途で使用される大型のペリクルだけでなく、プリント基板用、ＩＣパッケージ用または半導体製造用の小型のペリクル膜を１枚の液晶製造用の大型ペリクル膜から多数分割して使用することも可能である。   Not only large pellicles used in liquid crystal manufacturing applications, but also small pellicle films for printed circuit boards, IC packages, or semiconductor manufacturing can be divided into a large number of large pellicle films for liquid crystal manufacturing. Is possible.

２はフレーム、２ａは変形させたフレーム、３はペリクル膜、３ａはペリクル膜材料溶液、４は通気孔、５は治具穴、６はマスク接着層、７はフィルタ、８はペリクル膜接着層、９はセパレータ、１０はペリクル、２１は仮枠、２２は接着層、２４は成膜基板、３１はダイ、３２は加熱装置、４１は分割枠、４２は接着層、４３クリップ、５０は膜貼付装置、５１は載置台、５２は固定部、５３は昇降載置台、５４は把持部、５５は圧縮引張装置、５６は連結部、５７はロードセル、５８はステージ、Ｘ−Ｘ，Ｙ−Ｙは分割枠の分割線である。   2 is a frame, 2a is a deformed frame, 3 is a pellicle film, 3a is a pellicle film material solution, 4 is a vent hole, 5 is a jig hole, 6 is a mask adhesive layer, 7 is a filter, 8 is a pellicle film adhesive layer , 9 is a separator, 10 is a pellicle, 21 is a temporary frame, 22 is an adhesive layer, 24 is a film formation substrate, 31 is a die, 32 is a heating device, 41 is a divided frame, 42 is an adhesive layer, 43 clips, 50 is a film Affixing device, 51 is a mounting table, 52 is a fixing unit, 53 is an elevating mounting table, 54 is a gripping unit, 55 is a compression / tensioning device, 56 is a connecting unit, 57 is a load cell, 58 is a stage, XX, YY Is a dividing line of the dividing frame.

Claims (4)

ペリクル膜をフレームに緊締して貼り付けるペリクルの製造方法において、
１枚のペリクル膜を仮枠上に貼り付け、
該仮枠の内寸よりも小さい外寸の、複数並べて結合された分割枠を、仮枠上のペリクル膜に接着してから、
ペリクル膜を分割枠の外辺に沿って仮枠から切離すとともに、結合された分割枠を分離し、
個々の分割枠上に接着したペリクル膜を、フレームに貼り付けてから、分割枠を取り去ることを特徴とするペリクルの製造方法。 In the manufacturing method of the pellicle in which the pellicle film is fastened and attached to the frame,
Paste one pellicle film on the temporary frame,
After bonding a plurality of divided frames, which are smaller than the inner dimension of the temporary frame and joined together, to the pellicle film on the temporary frame,
While separating the pellicle membrane from the temporary frame along the outer edge of the dividing frame, separating the combined dividing frame,
A method of manufacturing a pellicle, comprising: attaching a pellicle film adhered on each divided frame to the frame, and then removing the divided frame. ペリクル膜をフレームに緊締して貼り付けるペリクルの製造方法において、
成膜基板上の１枚のペリクル膜を、複数並べて結合された分割枠に貼り付け、
ペリクル膜を分割枠の外辺に沿って成膜基板から切離すとともに、結合された分割枠を分離し、
個々の分割枠上に接着したペリクル膜を、フレームに貼り付けてから、分割枠を取り去ることを特徴とするペリクルの製造方法。 In the manufacturing method of the pellicle in which the pellicle film is fastened and attached to the frame,
A single pellicle film on a film formation substrate is attached to a divided frame joined in a line,
The pellicle film is separated from the film formation substrate along the outer side of the dividing frame, and the combined dividing frame is separated.
A method of manufacturing a pellicle, comprising: attaching a pellicle film adhered on each divided frame to the frame, and then removing the divided frame. 分割枠上に接着したペリクル膜をフレームに貼り付ける際、分割枠に圧縮または引張の力を加えて、ペリクル膜を貼り付けてから、該力を解放することを特徴とする請求項１または２に記載のペリクルの製造方法。   3. When the pellicle film adhered on the divided frame is attached to the frame, a compressive or tensile force is applied to the divided frame to attach the pellicle film, and then the force is released. A method for producing a pellicle according to 1. 分割枠上に接着したペリクル膜をフレームに貼り付ける際、フレームに圧縮または引張の力を加えて、ペリクル膜を貼り付けてから、該力を解放することを特徴とする請求項１または２に記載のペリクルの製造方法。   3. The method according to claim 1, wherein when the pellicle film adhered on the divided frame is attached to the frame, a compression or tension force is applied to the frame to attach the pellicle film, and then the force is released. The manufacturing method of the pellicle of description.
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