TWI491977B - Manufacturing method of pellicle and divided frame assembly formed by combining multiple divided frame parallely - Google Patents

Manufacturing method of pellicle and divided frame assembly formed by combining multiple divided frame parallely Download PDF

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Publication number
TWI491977B
TWI491977B TW102116131A TW102116131A TWI491977B TW I491977 B TWI491977 B TW I491977B TW 102116131 A TW102116131 A TW 102116131A TW 102116131 A TW102116131 A TW 102116131A TW I491977 B TWI491977 B TW I491977B
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frame
film
pellicle
attached
manufacturing
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TW102116131A
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Chinese (zh)
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TW201404577A (en
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Kazutoshi Sekihara
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Shinetsu Chemical Co
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/02Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor using sheet or web-like material
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274Photolithographic processes

Description

防塵薄膜組件的製造方法及由多個分割框並列結合而成的分割框組合體Method for manufacturing pellicle film assembly and split frame assembly formed by juxtaposing a plurality of divided frames

本發明,涉及製造LSI以及液晶顯示器的回路製造時,作為光刻用的光罩等的防塵罩使用的防塵薄膜組件的製造方法。The present invention relates to a method of manufacturing a pellicle for use as a dust cover for a photolithography mask or the like in the manufacture of a circuit for manufacturing an LSI or a liquid crystal display.

在LSI以及超LSI等的半導體製造或者液晶顯示器等的製造中,要進行對將半導體晶圓或液晶用原板進行光照射來進行圖案製作的光刻作業。此時,如在光罩或中間掩模上有灰塵附著的話,就會將灰塵轉印,如此就會發生圖案的變形,邊緣就會變的不整齊,並且基底髒汙等現象。由此該作業通常在無塵室中進行,但是即使如此要經常保持光罩的清浄也是困難的。如在例如在光刻時,將防塵薄膜組件在光罩上載置,這樣就可以在防止光罩上的異物附著。使焦點照準在光罩的圖案上進行曝光,就可以不受在防塵薄膜的上附著的灰塵的影響而轉印。In the manufacture of semiconductors such as LSI and super LSI, or in the manufacture of liquid crystal displays, etc., a photolithography operation for patterning a semiconductor wafer or a liquid crystal original plate is performed. At this time, if dust adheres to the mask or the reticle, the dust is transferred, so that the pattern is deformed, the edges become irregular, and the substrate is dirty. Thus, the work is usually carried out in a clean room, but even this is often difficult to keep the reticle clean. For example, in the photolithography, the pellicle is placed on the photomask, so that the foreign matter on the photomask can be prevented from adhering. By exposing the focus to the pattern of the mask, it is possible to transfer without being affected by the dust adhering to the dust-proof film.

近年,防塵薄膜組件的低成本化變的需求強烈。在防塵 薄膜組件的製造成本中,占最高比例的是防塵薄膜的製造工程。以往的防塵薄膜組件的製造工程中,防塵薄膜的成膜工程進行1回的工程僅可以得到1張的防塵薄膜,並且該工程至少需要數小時。在專利文獻1中,有防塵薄膜的製造方法的記載。In recent years, there has been a strong demand for low cost of the pellicle film assembly. In dustproof Among the manufacturing costs of the film module, the highest proportion is the manufacturing process of the pellicle film. In the manufacturing process of the conventional pellicle film assembly, only one pellicle film can be obtained in one filming process of the pellicle film, and the process requires at least several hours. Patent Document 1 describes the method for producing a pellicle film.

另外,以框架的撓曲盡可能小為優選,不能使在該框架上貼附的防塵薄膜有折皺。在專利文獻2中記載了防塵薄膜的張力進行調整以將折皺的發生加以防止的方法。Further, it is preferable that the deflection of the frame is as small as possible, and the pellicle film attached to the frame cannot be wrinkled. Patent Document 2 describes a method in which the tension of the pellicle film is adjusted to prevent the occurrence of wrinkles.

【專利文獻1】日本特開2004-157229號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-157229

【專利文獻2】日本特開2011-158585號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2011-158585

用成膜工程得到的防塵薄膜,膜內的張力被要求均一。將用1回的成膜工程得到的1張防塵薄膜分割為多個的場合,其方向以及分布,或其任一方變為不均一。在張力的大的緊張邊存在的場合,由於張力的作用,框架會產生撓曲;另一方面,在張力小的鬆弛邊存在的場合,雖然不發生框架的撓曲,但是,只要向框架施加一點力,防塵薄膜就會產生折皺。該折皺發生的防塵薄膜組件,會使光學曝光品質變壞,以及帶來曝光區域減少的毛病。With the pellicle film obtained by the film forming process, the tension in the film is required to be uniform. When one of the pellicle films obtained by one film forming process is divided into a plurality of pieces, the direction and distribution thereof or any one of them is not uniform. In the case where a large tension side of the tension exists, the frame is deflected due to the tension; on the other hand, in the case where the loose side of the tension is present, although the deflection of the frame does not occur, it is only applied to the frame. With a little force, the dust-proof film will wrinkle. The pellicle component in which the wrinkles occur deteriorates the optical exposure quality and causes a problem of reduced exposure area.

本發明就是為了對上述的課題進行解決之發明。本發明的目的就是提供用1回的成膜工程進行多個的防塵薄膜組件製造的方法,以及通過去除防塵薄膜的張力的不均一,來防止使框架的撓曲以及防塵薄膜的折皺的發生的方法。The present invention is an invention for solving the above problems. An object of the present invention is to provide a method for manufacturing a plurality of pellicle assemblies by one film forming process, and to prevent deflection of the frame and wrinkles of the pell film by removing the unevenness of the tension of the pellicle film. method.

本發明的目的,可以通過下述技術方案來達到:The object of the present invention can be achieved by the following technical solutions:

1.一種防塵薄膜組件的製造方法,其為將防塵薄膜在框架上繃緊貼附的防塵薄膜組件的製造方法,其特徵在於:將1張防塵薄膜貼附在暫用框上,將具有比該暫用框的內寸小的外寸的,多個並列結合的分割框,與暫用框上的防塵薄膜接著後,在將防塵薄膜沿分割框的外邊從暫用框上切離的同時,將結合的分割框分離,各個分割框上接著的防塵薄膜與框架貼附後,將分割框取掉。A method of manufacturing a pellicle according to a method of manufacturing a pellicle for attaching a pellicle to a frame, wherein a pellicle is attached to a temporary frame and has a ratio After the outer frame of the temporary frame is small, the plurality of side-by-side split frames are separated from the dust-proof film on the temporary frame, and the dust-proof film is cut off from the temporary frame along the outer side of the split frame. The split frame is separated, and the dust-proof film attached to each of the split frames is attached to the frame, and the split frame is removed.

2.一種防塵薄膜組件的製造方法,其為一種將防塵薄膜在框架上繃緊貼附的防塵薄膜組件的製造方法,其特徵在於:將成膜基板上的1張防塵薄膜,在多個並列結合的分割框上貼附,在將防塵薄膜沿著分割框的外邊,從成膜基板上切離的同時,將結合的分割框分離,各個的分割框上接著的防塵薄膜在框架上貼附後,將分割框取掉。A method for producing a pellicle film assembly, which is a method for producing a pellicle film assembly in which a pellicle film is stretched and attached to a frame, wherein a plurality of pellicle films on a film-forming substrate are juxtaposed Attached to the combined split frame, the pellicle is separated from the film-forming substrate along the outer edge of the split frame, and the combined split frame is separated, and the pellicle film on each of the split frames is attached to the frame. After that, remove the split box.

3.根據技術方案1或2的防塵薄膜組件的製造方法,其特徵在於:分割框上接著的防塵薄膜在框架上貼附時,在分割框上施加壓縮或拉伸的力,防塵薄膜貼附後,將所述力解除。3. The method of manufacturing a pellicle according to claim 1 or 2, characterized in that when the pellicle film attached to the frame is attached to the frame, a force of compression or stretching is applied to the frame, and the pellicle is attached. After that, the force is released.

4.根據技術方案1或2的防塵薄膜組件的製造方法,其特徵在於:使分割框上接著的防塵薄膜在框架進行貼附時,在框架上施加壓縮或拉伸的力,在防塵薄膜貼附後,將所述力解除。4. A method of manufacturing a pellicle according to claim 1 or 2, characterized in that when the pellicle film attached to the frame is attached to the frame, a force of compression or stretching is applied to the frame, and after the pellicle is attached , the force is released.

5.一種防塵薄膜組件,其特徵在於:所述防塵薄膜組件 為藉由技術方案1~4的任一項的方法製造的。A pellicle assembly characterized by: the pellicle assembly It is produced by the method of any one of the first to fourth aspects.

根據本發明的防塵薄膜組件的製造方法,可以用1回的成膜工程得到多個的防塵薄膜。另外,將防塵薄膜在框架上接著時,使防塵薄膜的張力均一,由此在滿足框架的撓曲量被要求精度的同時,可以得到防塵薄膜不發生折皺的充分實用的防塵薄膜組件。According to the method for producing a pellicle according to the present invention, a plurality of pellicle films can be obtained by one film forming process. Further, when the pellicle film is placed on the frame, the tension of the pellicle film is made uniform, whereby a sufficiently practical pellicle film assembly in which the pellicle film does not wrinkle can be obtained while satisfying the required accuracy of the amount of deflection of the frame.

2、2a‧‧‧框架2, 2a‧‧‧ framework

3‧‧‧防塵薄膜3‧‧‧Plastic film

3a‧‧‧防塵薄膜材料溶液3a‧‧‧Dust film material solution

4‧‧‧通氣孔4‧‧‧vents

5‧‧‧夾具孔5‧‧‧ Fixture hole

6‧‧‧光罩接著層6‧‧‧Photomask layer

7‧‧‧過濾器7‧‧‧Filter

8‧‧‧防塵薄膜接著層8‧‧‧Dust film adhesive layer

9‧‧‧分離片9‧‧‧Separator

10‧‧‧防塵薄膜組件10‧‧‧Pneumatic film assembly

21‧‧‧暫用框21‧‧‧Scratch box

22‧‧‧接著層22‧‧‧Next layer

24‧‧‧成膜基板24‧‧‧ Film Formation Substrate

31‧‧‧模31‧‧

32‧‧‧加熱裝置32‧‧‧ heating device

41‧‧‧分割框41‧‧‧ split box

42‧‧‧接著層42‧‧‧Next layer

43‧‧‧夾子43‧‧‧ clip

45‧‧‧針45‧‧‧ needle

46‧‧‧位置決定孔46‧‧‧Location decision hole

50‧‧‧膜貼附裝置50‧‧‧film attachment device

51‧‧‧載置臺51‧‧‧ mounting table

52‧‧‧固定部52‧‧‧Fixed Department

53‧‧‧升降載置臺53‧‧‧ Lifting platform

54‧‧‧把持部54‧‧‧Control Department

55‧‧‧壓縮拉伸裝置55‧‧‧Compression stretching device

56‧‧‧連結部56‧‧‧Connecting Department

57‧‧‧測力傳感器57‧‧‧ load cell

58‧‧‧臺58‧‧‧

X-X、Y-Y‧‧‧分割線X-X, Y-Y‧‧‧ dividing line

F‧‧‧力F‧‧‧ force

【圖1】用本發明的製造方法製造的防塵薄膜組件的一例的斜視圖。Fig. 1 is a perspective view showing an example of a pellicle film manufactured by the production method of the present invention.

【圖2】防塵薄膜的成膜工程的一例的工程圖。Fig. 2 is a view showing an example of a film formation process of a pellicle film.

【圖3】將分割框在防塵薄膜上接著後,對防塵薄膜分割的方法的一例進行說明的斜視圖。FIG. 3 is a perspective view illustrating an example of a method of dividing a dust-proof film after the split frame is placed on the pellicle film.

【圖4】對將施加了壓縮或拉伸的力的分割框貼附於框架的貼附的方法的一例進行說明的斜視圖。Fig. 4 is a perspective view for explaining an example of a method of attaching a dividing frame to which a force of compression or stretching is applied to a frame.

【圖5】對將分割框接著於防塵薄膜後,將防塵薄膜分割的方法的另一個例子進行說明的斜視圖。Fig. 5 is a perspective view for explaining another example of a method of dividing a dust-proof film after the split frame is attached to the pellicle film.

【圖6】對在施加了拉伸力而變形了的框架上,將防塵薄膜貼附,防塵薄膜的各邊的張力的不均一進行了解除了的方法的一例進行說明的斜視圖。FIG. 6 is a perspective view illustrating an example of a method of attaching a dust-proof film to a frame that has been deformed by applying a tensile force, and understanding the unevenness of the tension of each side of the dust-proof film.

以下,對本發明的優選實施方式進行詳細說明,但是本 發明的範圍並不限於此。Hereinafter, preferred embodiments of the present invention will be described in detail, but The scope of the invention is not limited thereto.

由本發明的製造方法製造的防塵薄膜組件10的斜視圖(圖1)。在框架2的上端面上由防塵薄膜接著層8形成,介於此,使防塵薄膜3繃緊貼附。框架2的長邊的側面上,形成通氣孔4和夾具孔5。通氣孔4中具有防灰塵的過濾器7。框架2的下端面上,具有為了將光罩進行裝著的光罩接著層6,進一步具有對光罩接著層6進行保護的分離片9。A perspective view of the pellicle assembly 10 manufactured by the manufacturing method of the present invention (Fig. 1). The upper end surface of the frame 2 is formed by a pellicle film subsequent layer 8, whereby the pellicle film 3 is stretched and attached. On the side of the long side of the frame 2, a vent hole 4 and a jig hole 5 are formed. The vent 4 has a dustproof filter 7 therein. The lower end surface of the frame 2 has a mask cover layer 6 for attaching the mask, and further has a separator 9 for protecting the mask cover layer 6.

圖2為本發明中使用的防塵薄膜的成膜工程的一個例子。如圖2中的(a)表示的那樣,在成膜基板24上使模31水平移動,將防塵薄膜材料溶液3a塗布。如圖2中的(b)中表示的那樣,將成膜基板24載置於加熱裝置32上,加熱使防塵薄膜材料溶液3a中含有的溶媒蒸發後,冷卻。如圖2中的(c)表示的那樣,在防塵薄膜3上,將接著層22在其一個端面塗布的暫用框21(一部分切掉的斷面)接著。如圖2中的(d)表示的那樣,將暫用框21提起,將防塵薄膜3從成膜基板24剝離,得到在暫用框21上暫時貼附的防塵薄膜3。Fig. 2 is an example of a film forming process of a pellicle film used in the present invention. As shown in (a) of FIG. 2, the mold 31 is horizontally moved on the film formation substrate 24, and the dust-proof film material solution 3a is applied. As shown in (b) of FIG. 2, the film formation substrate 24 is placed on the heating device 32, and the solvent contained in the pellicle material solution 3a is evaporated by heating, and then cooled. As shown in (c) of FIG. 2, on the pellicle film 3, the temporary frame 21 (a part of the cut-off section) on which the adhesive layer 22 is applied to one end surface is followed. As shown in (d) of FIG. 2, the temporary frame 21 is lifted, and the pellicle film 3 is peeled off from the film formation substrate 24, and the pellicle film 3 temporarily attached to the temporary frame 21 is obtained.

圖3中的(a)表示的分割框41,其由具有若干撓曲性的材料形成,在其一個端面上,接著層42形成。進一步多個並列,用針45和位置決定孔46(參照圖3中的(b))決定位置,用向內方向開口的夾子43來達成結合。結合的分割框41的外尺寸,以比暫用框21的內寸還要小。在暫用框21暫時貼附的防塵薄膜3上,介於接著層42將分割框41接著。用刀沿 著分割框41的外邊將防塵薄膜3切斷,將其從暫用框21卸掉後,將夾子43卸掉,在分割線X-X,Y-Y切斷。如在圖3中的(b)中表示的那樣,防塵薄膜3以與分割框41接著的狀態被分割。The division frame 41 shown in (a) of Fig. 3 is formed of a material having a plurality of flexibility, and a layer 42 is formed on one end surface thereof. Further, a plurality of parallel rows are used, and the position is determined by the needle 45 and the position determining hole 46 (see (b) in Fig. 3), and the joint is opened by the clip 43 opened in the inward direction. The outer size of the combined split frame 41 is smaller than the inner size of the temporary frame 21. On the pellicle film 3 temporarily attached to the temporary frame 21, the dividing frame 41 is placed next to the adhesive layer 42. Using a knife edge The pellicle film 3 is cut off from the outer side of the division frame 41, and after being removed from the temporary frame 21, the clip 43 is removed and cut off at the dividing line X-X, Y-Y. As shown in (b) of FIG. 3, the pellicle film 3 is divided in a state subsequent to the division frame 41.

圖4為,用膜貼附裝置50將防塵薄膜3在框架2上貼附的工程的斜視圖。框架2上具有在本圖中省略了的帶有光罩接著層6,防塵薄膜接著層8以及分離片9(參照圖1)。膜接著裝置50為四邊形狀,其包括:將分割框41載置的載置臺51,於其各角部中的至少1個所設置的固定部52,在載置臺51的內側設置的升降載置臺53以及在載置臺51的各邊中的至少1個上設置的壓縮拉伸裝置55。4 is a perspective view showing a process in which the pellicle film 3 is attached to the frame 2 by the film attaching device 50. The frame 2 has a mask back layer 6, a pellicle film 8 and a separator 9 (refer to Fig. 1) which are omitted in the figure. The film joining device 50 has a rectangular shape, and includes a mounting table 51 on which the dividing frame 41 is placed, and a fixing portion 52 provided at at least one of the corner portions, and a lifting load provided on the inside of the mounting table 51. The table 53 and the compression stretching device 55 provided on at least one of the sides of the mounting table 51.

分割框41藉由固定部52來進行位置決定,從而在載置臺51上載置。升降載置臺53的下面設置有升降機構(未圖示),其上升使載置的框架2向上方移動,在防塵薄膜3上貼附。The division frame 41 is positionally determined by the fixing unit 52, and is placed on the mounting table 51. An elevating mechanism (not shown) is provided on the lower surface of the elevating mount 53 and is raised to move the frame 2 placed upward and attached to the pellicle film 3.

壓縮拉伸裝置55在與分割框41各邊垂直的方向上可動,將用測力傳感器(load cell)57檢測的壓縮或拉伸的力,通過連結部56而施加於把持部54上。在此,所謂壓縮,是指施加力的方向對於框的邊為從外側向內側,所謂拉伸,為在實質相反的方向上施加力。二點以及線段構成的雙點畫線表示了施加力的狀態,對分割框41的一對的長邊施加壓縮的力,對短邊施加拉伸的力。防塵薄膜3的張力各邊不均一時,使臺58移動,向分割框41施加壓縮或拉伸的力,張力在各邊變為均一後,將 框架2貼附於防塵薄膜3。其後將力解除,防塵薄膜3的多餘部分用切刀進行切除,圖1表示的防塵薄膜組件10完成。The compression stretching device 55 is movable in a direction perpendicular to each side of the division frame 41, and applies a force of compression or stretching detected by a load cell 57 to the grip portion 54 via the coupling portion 56. Here, the term "compression" means that the direction in which the force is applied is from the outer side to the inner side with respect to the side of the frame, and the stretching is performed in a substantially opposite direction. The two-dot line and the double-dotted line formed by the line segment indicate the state in which the force is applied, and a compressive force is applied to the long sides of the pair of the divided frames 41, and a tensile force is applied to the short sides. When the tension of the pellicle film 3 is not uniform, the table 58 is moved to apply a compressive or tensile force to the dividing frame 41, and after the tension becomes uniform on each side, The frame 2 is attached to the pellicle film 3. Thereafter, the force is released, and the excess portion of the pellicle 3 is cut by a cutter, and the pellicle assembly 10 shown in Fig. 1 is completed.

圖5表示了本發明的防塵薄膜的分割方法的另一個實施方式。將分割框41與在成膜基板24上的防塵薄膜3上接著,從成膜基板24分離後,防塵薄膜3有分割框41來支持。然後,夾子43被卸下,防塵薄膜3被沿著分割線X-X,Y-Y和分割框41的外邊切斷,得到防塵薄膜3被接著的分割框41。根據本實施形態,由於不使用暫用框,與上述的實施形態相比工序少,具有防塵薄膜的分割可以迅速進行的優點。Fig. 5 shows another embodiment of the method of dividing the pellicle of the present invention. The split frame 41 is placed on the pellicle film 3 on the film formation substrate 24, and after being separated from the film formation substrate 24, the pellicle film 3 is supported by the division frame 41. Then, the clip 43 is removed, and the pellicle film 3 is cut along the outer sides of the dividing lines X-X, Y-Y and the dividing frame 41, and the divided frame 41 to which the pellicle film 3 is attached is obtained. According to the present embodiment, since the temporary frame is not used, the number of steps is smaller than that of the above-described embodiment, and the division of the pellicle film can be quickly performed.

圖4的防塵薄膜在框架上接著的工程中的另一個實施方式,為替代框架2,使用施加壓縮或拉伸的力使其變形的框架。Another embodiment of the pellard film of Fig. 4 in the subsequent engineering of the frame is a frame that replaces the frame 2 and deforms it by applying a compressive or tensile force.

圖6表示了使框架變形,將防塵薄膜的張力的不均一解除的方法的例子。防塵薄膜的張力高的場合,對各邊施加拉伸的力使其成為向框架2a的外側成凸狀的圓弧形狀。如使防塵薄膜貼附後解除拉伸的力,各邊向內側返回的力F產生,變成直線狀,由此,防塵薄膜的張力減少,框架的撓曲就會被防止。作為施加力的手段,可以使用與圖4表示的壓縮拉伸裝置55同樣之物。用測力傳感器等的負荷檢測機構對框架的各邊施加的力的方向以及大小進行適宜調節,以消除防塵薄膜的張力的不均一。Fig. 6 shows an example of a method of deforming the frame and releasing the unevenness of the tension of the pellicle film. When the tension of the pellicle film is high, a tensile force is applied to each side to form an arc shape that is convex toward the outside of the frame 2a. When the force of releasing the pellicle film and releasing the tension, the force F returning to the inner side of each side is generated and becomes linear, whereby the tension of the pellicle film is reduced, and the deflection of the frame is prevented. As means for applying the force, the same thing as the compression stretching device 55 shown in Fig. 4 can be used. The direction and magnitude of the force applied to each side of the frame by the load detecting means such as a load cell are appropriately adjusted to eliminate the unevenness of the tension of the pellicle film.

另外,用圖4的膜接著裝置50使防塵薄膜的張力均一的方法以及使圖6的框架變形使防塵薄膜的張力均一的方法的任一個都可以,使兩方組合同時使用也可以。進而,將框架各邊對 外側成凸狀的圓弧形狀那樣進行預先製作以及通過防塵薄膜的張力而成為略直線狀的方法進行組合也可以。Further, the method of making the tension of the pellicle film uniform by the film following device 50 of Fig. 4 and the method of deforming the frame of Fig. 6 to make the tension of the pellicle film uniform may be used, and the two may be used in combination. Furthermore, the sides of the frame The outer side may be formed in advance as a circular arc shape, and may be combined by a method in which the tension of the pellicle film is slightly linear.

作為框架2的材質,可以使用鋁,不銹鋼,聚乙烯等。透光的防塵薄膜3可以使用硝化纖維素,醋酸纖維素或氟樹脂等。光罩接著層6可以使用聚丁烯樹脂,聚醋酸乙烯基樹脂,丙烯酸樹脂,矽樹脂等。As the material of the frame 2, aluminum, stainless steel, polyethylene, or the like can be used. As the light-transmitting dustproof film 3, nitrocellulose, cellulose acetate or fluororesin or the like can be used. The photomask adhesive layer 6 may be a polybutene resin, a polyvinyl acetate resin, an acrylic resin, a enamel resin or the like.

成膜基板24可以使用石英,低膨脹玻璃等。將防塵薄膜材料溶液3a進行塗布方法,可以使用狹縫塗布法,旋轉塗布法,狹縫以及旋轉法以及卷塗法。加熱裝置32可以使用熱板,紅外線燈以及烤箱等。As the film formation substrate 24, quartz, low expansion glass, or the like can be used. The method of applying the pellicle material solution 3a can be carried out by a slit coating method, a spin coating method, a slit, a spin method, and a roll coating method. The heating device 32 can use a hot plate, an infrared lamp, an oven, or the like.

作為暫用框21和分割框41的有撓曲性的材料,可以使用鋁合金,鎂合金等的輕合金,不銹鋼,碳鋼,工具鋼等的鐵系合金,以及也可以使用GFRP,CFRP等的樹脂復合材料等。暫用框21,從使各邊的撓曲變少,使防塵薄膜3的張力變高的觀點,優選使用具有高剛性的不銹鋼。分割框41,由於使用集光燈進行異物檢査,優選輕量並且黒色塗色容易的鋁合金。As the flexible material of the temporary frame 21 and the split frame 41, a light alloy such as an aluminum alloy or a magnesium alloy, an iron-based alloy such as stainless steel, carbon steel or tool steel, or GFRP, CFRP or the like can be used. Resin composites, etc. In the temporary frame 21, it is preferable to use stainless steel having high rigidity from the viewpoint of reducing the deflection of each side and increasing the tension of the pellicle film 3. In the division frame 41, since the foreign matter inspection is performed using the spotlight, an aluminum alloy which is lightweight and easy to apply color is preferable.

圖3以及圖5中,分割框41由4個形成,但是根據必要可以適宜地増減,例如2個,6個或更多也可以。In FIG. 3 and FIG. 5, the division frame 41 is formed by four, but may be appropriately reduced as necessary, for example, two or six or more.

圖4中,把持部54為口字去掉左邊一豎的形狀或鉤形狀的夾具(jig),為分割框41的各邊一個,多個設置也可。另外施加力的方向,並不僅限於圖示的方向,在相對的邊施加力的方向以及施加的力的大小不同也可以。In Fig. 4, the grip portion 54 is a jig in which a left vertical shape or a hook shape is removed from the mouth, and one of the sides of the divided frame 41 may be provided in plurality. Further, the direction in which the force is applied is not limited to the illustrated direction, and the direction in which the force is applied to the opposite side and the magnitude of the applied force may be different.

【實施例】[Examples]

以下以實施例,對本發明進行具體地說明,但是本發明不受它們的限制。The invention will be specifically described below by way of examples, but the invention is not limited thereto.

在級別10的無塵室內,用在圖2中的(a)~(d)中表示的工程進行防塵薄膜的製造。在圖2中的(a)中表示的成膜基板24上,用1220×1400mm的平滑研磨的石英基板,使被溶媒稀釋的氟樹脂(商品名:CYTOP旭硝子(株)製)構成的防塵薄膜材料溶液3a從模31邊吐出邊移動塗布。原封不動地在無塵室的氣流下將溶媒乾燥後,如圖2中的(b)那樣,在加熱裝置32(鋁合金製熱板)上將成膜基板24移動加熱,被塗布的防塵薄膜材料溶液3a中含有的溶媒完全蒸發,使防塵薄膜3成膜。In the clean room of level 10, the production of the pellicle film is performed by the work shown in (a) to (d) of Fig. 2 . A pellicle film made of a fluororesin (trade name: manufactured by CYTOP Asahi Glass Co., Ltd.) diluted with a solvent by a smooth-polished quartz substrate of 1220 × 1400 mm is used for the film-forming substrate 24 shown in Fig. 2 (a). The material solution 3a is moved and coated from the die 31 while being discharged. After the solvent is dried in the airflow of the clean room as it is, the film formation substrate 24 is moved and heated on the heating device 32 (aluminum alloy heating plate) as shown in FIG. 2(b), and the applied pellicle film is applied. The solvent contained in the material solution 3a is completely evaporated to form the pellicle film 3 into a film.

成膜基板24被冷卻到室溫後,如圖2中的(c)那樣,在防塵薄膜3上將暫用框21介於接著層22接著。然後如圖2中的(d)那樣,用除電手段(未圖示)邊進行除電邊將暫用框21慢慢的向上方提起,從成膜基板24剝離,暫用框21上貼附防塵薄膜3。After the film formation substrate 24 is cooled to room temperature, the temporary frame 21 is interposed between the pellicle film 3 and the subsequent layer 22 as shown in FIG. 2(c). Then, as shown in (d) of FIG. 2, the temporary frame 21 is gradually lifted upward by the static elimination means (not shown), and is peeled off from the film formation substrate 24, and the temporary frame 21 is attached with dustproof. Film 3.

將與上述的防塵薄膜3在暗室內用集光燈進行異物檢査後,如圖3中的(a)那樣,用支架(未圖示)保持垂直。在多個並列結合的分割框41(外寸1190×1360mm)的一端面上將接著層42塗布,使其與防塵薄膜3接著。其後,將夾子43全部卸下,如圖3中的(b)那樣在分割框41的外邊, 沿分割線X-X,Y-Y用刀將防塵薄膜3切斷。After the foreign matter inspection with the above-mentioned pellicle film 3 in the dark room by the spotlight, as shown in FIG. 3(a), the holder (not shown) is held vertically. The adhesive layer 42 is applied to one end surface of a plurality of side-by-side divided frame 41 (outer size 1190 × 1360 mm) to be adhered to the pellicle film 3. Thereafter, the clips 43 are all removed, as shown in (b) of FIG. 3, outside the division frame 41, The pellicle film 3 is cut by a knife along the dividing line X-X, Y-Y.

在上述的4個構成的防塵薄膜3接著的分割框41之中,用1個進行防塵薄膜組件的製作。如圖4表示的那樣,在分割框41的各邊中央安裝鉤形狀的把持部54,在載置臺51載置,由壓縮拉伸裝置55施加壓縮或拉伸的力。該施加的力,用事前的實驗來求值。在保持施加力的狀態下,將框架2貼附在防塵薄膜3,將周圍的多餘膜用刀切斷。框架2為鋁合金製,外寸353×592mm,內寸340×580mm,高4.8mm,表面進行了黒色氧化膜處理。作為防塵薄膜接著層8和光罩接著層6(參照圖1),用矽粘著劑(信越化學工業(株)製),在光罩接著層6的表面上用PET薄膜製的分離片9進行覆蓋,以便進行保護。另外,在通氣孔4,PTFE製的膜過濾器7,介於丙烯酸接著層被設置。In the division frame 41 following the pellicle film 3 of the above-described four configurations, the pellicle assembly is produced by one. As shown in FIG. 4, a hook-shaped grip portion 54 is attached to the center of each side of the division frame 41, and is placed on the mounting table 51, and a compressive or tensile force is applied by the compression stretching device 55. The applied force is evaluated by an experiment beforehand. The frame 2 is attached to the pellicle 3 while the applied force is maintained, and the excess film around is cut by a knife. The frame 2 is made of aluminum alloy, the outer inch is 353×592 mm, the inner inch is 340×580 mm, the height is 4.8 mm, and the surface is treated with a ruthenium oxide film. The pellicle film 8 and the photomask adhesive layer 6 (see FIG. 1) are made of a separator (9) made of a PET film on the surface of the photomask adhesive layer 6 by a ruthenium adhesive (manufactured by Shin-Etsu Chemical Co., Ltd.). Cover for protection. Further, in the vent hole 4, a membrane filter 7 made of PTFE is provided in an acrylic adhesive layer.

如此,完成圖1表示的防塵薄膜組件10。該防塵薄膜組件10,在測量器上對框架2的撓曲量進行測定。其結果,對邊的撓曲量0.3mm以及0.25mm,相鄰的另一對邊的撓曲量為0.2mm以及0.23mm,在撓曲量處於允許範圍的同時,相對的邊幾乎具有同程度的撓曲量。在對防塵薄膜組件10進行處理時,框架2上接著的防塵薄膜3上折皺發生等的毛病都沒有觀察到。Thus, the pellicle assembly 10 shown in Fig. 1 is completed. The pellicle assembly 10 measures the amount of deflection of the frame 2 on the measuring device. As a result, the amount of deflection of the opposite side is 0.3 mm and 0.25 mm, and the amount of deflection of the other adjacent side is 0.2 mm and 0.23 mm, while the amount of deflection is within the allowable range, the opposite side It has almost the same amount of deflection. When the pellicle film assembly 10 was processed, defects such as occurrence of wrinkles on the pellicle film 3 on the frame 2 were not observed.

【比較例】[Comparative example]

由上述實施例同樣的工程來進行防塵薄膜的成膜,其後 在防塵薄膜的張力不均一的條件下,進行上述實施例同樣,進行防塵薄膜組件的製作。The film formation of the pellicle film is performed by the same process as in the above embodiment, and thereafter Under the condition that the tension of the pellicle film is not uniform, the pellicle film assembly is produced in the same manner as in the above embodiment.

對完成防塵薄膜組件,進行框架的撓曲量的測定,得知對邊的撓曲量為0.9mm以及0.1mm,相鄰的另一對邊的撓曲量為0.5mm以及0.15mm。該值處於不能允許的狀態的同時,為非常不整齊的撓曲狀態。進一步,如使該防塵薄膜組件垂直站立,使撓曲量為0.1mm的長邊朝上,防塵薄膜的長邊中央附近可以觀察到數條的折皺。從框架的形狀和防塵薄膜發生的折皺的狀態,其作為防塵薄膜組件是不能使用的。When the pellicle was completed, the amount of deflection of the frame was measured, and the amount of deflection of the opposite side was 0.9 mm and 0.1 mm, and the deflection of the other pair of sides was 0.5 mm and 0. 15mm. While the value is in an unacceptable state, it is a very irregular state of deflection. Further, if the pellicle assembly is vertically stood, the long side with a deflection amount of 0.1 mm is faced upward, and a plurality of wrinkles can be observed near the center of the long side of the pell film. From the shape of the frame and the state of wrinkles occurring in the pellicle film, it is not usable as a pellicle.

【產業上的利用可能性】[Industrial use possibilities]

印刷基板用,IC封裝用或半導體製造用的防塵薄膜可以使用將1張液晶製造用的大型防塵薄膜分割成的小型薄膜。For the printed circuit board, a pellicle for IC packaging or semiconductor manufacturing can be a small film in which a large pellicle for liquid crystal production is divided.

3‧‧‧防塵薄膜3‧‧‧Plastic film

21‧‧‧暫用框21‧‧‧Scratch box

22‧‧‧接著層22‧‧‧Next layer

41‧‧‧分割框41‧‧‧ split box

42‧‧‧接著層42‧‧‧Next layer

43‧‧‧夾子43‧‧‧ clip

45‧‧‧針45‧‧‧ needle

46‧‧‧位置決定孔46‧‧‧Location decision hole

X-X、Y-Y‧‧‧分割線X-X, Y-Y‧‧‧ dividing line

Claims (5)

一種防塵薄膜組件的製造方法,其為一種將防塵薄膜繃緊貼附於框架的防塵薄膜組件的製造方法,其特徵在於:將1張防塵薄膜貼附在暫用框上,將具有比該暫用框的內寸小的外寸的多個並列結合的分割框,與暫用框上的防塵薄膜接著後,在將防塵薄膜沿分割框的外邊從暫用框上切離的同時,將結合的分割框分離,並且於各個的分割框上接著的防塵薄膜貼附在框架後,將分割框取掉。 A method for manufacturing a pellicle film assembly, which is a method for manufacturing a pellicle film assembly for attaching a pellicle film to a frame, characterized in that a pneumatic film is attached to a temporary frame, which has a temporary ratio After the dust-proof film on the temporary frame is followed by the dust-proof film on the temporary frame, the dust-proof film is separated from the temporary frame by the outer edge of the frame, and the combination is combined. The split frame is separated, and the dust-proof film attached to each of the split frames is attached to the frame, and the split frame is removed. 一種防塵薄膜組件的製造方法,其為一種將防塵薄膜繃緊貼附於框架的防塵薄膜組件的製造方法,其特徵在於:將成膜基板上的1張防塵薄膜貼附在多個並列結合的分割框,在將防塵薄膜沿著分割框的外邊從成膜基板上切離的同時,將結合的分割框分離,並且於各個的分割框上接著的防塵薄膜貼附在框架後,將分割框取掉。 A method for manufacturing a pellicle film assembly, which is a method for manufacturing a pellicle film assembly for attaching a pellicle film to a frame, wherein a plurality of pellicle films on a film formation substrate are attached to a plurality of side-by-side bonding The dividing frame separates the combined dividing frame while cutting the dust-proof film from the film forming substrate along the outer side of the dividing frame, and the dust-proof film attached to each of the divided frames is attached to the frame, and the dividing frame is Take it off. 如申請專利範圍第1項或第2項所述的防塵薄膜組件的製造方法,其中:使分割框上接著的防塵薄膜在框架進行貼附時,對分割框施加壓縮或拉伸的力,並且 在防塵薄膜貼附後,將所述力解除。 The method for producing a pellicle according to the first or second aspect of the invention, wherein the pellicle is attached to the frame when the pellicle film is attached to the frame, and a force of compression or stretching is applied to the frame, and After the pellicle is attached, the force is released. 如申請專利範圍第1項或第2項所述的防塵薄膜組件的製造方法,其中:使分割框上接著的防塵薄膜在框架進行貼附時,對框架施加壓縮或拉伸的力,並且在防塵薄膜貼附後,將所述力解除。 The method for manufacturing a pellicle according to the first or second aspect of the invention, wherein: when the pellicle film attached to the frame is attached to the frame, a force of compressing or stretching is applied to the frame, and After the dustproof film is attached, the force is released. 一種由多個分割框並列結合而成的分割框組合體,其用於將防塵薄膜繃緊貼附於防塵薄膜組件框架的防塵薄膜組件的製造方法,其特徵在於:各分割框由具有一定可撓性的材料形成,在其一個端面形成接著層,所述多個分割框其相互位置由釘以及位置決定孔來決定,由夾子向內方向夾住而結合。 A split frame assembly in which a plurality of split frames are combined in parallel, and a method for manufacturing a dustproof film assembly for attaching a dustproof film to a pellicle assembly frame, wherein each of the divided frames has a certain The flexible material is formed by forming an adhesive layer on one end surface thereof, and the positions of the plurality of divided frames are determined by the nails and the position determining holes, and are sandwiched and joined by the clips inward.
TW102116131A 2012-05-08 2013-05-07 Manufacturing method of pellicle and divided frame assembly formed by combining multiple divided frame parallely TWI491977B (en)

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