HK1188487A1 - 防塵薄膜組件的製造方法 - Google Patents

防塵薄膜組件的製造方法

Info

Publication number
HK1188487A1
HK1188487A1 HK14101592.4A HK14101592A HK1188487A1 HK 1188487 A1 HK1188487 A1 HK 1188487A1 HK 14101592 A HK14101592 A HK 14101592A HK 1188487 A1 HK1188487 A1 HK 1188487A1
Authority
HK
Hong Kong
Prior art keywords
dust
manufacturing
prevention film
film components
components
Prior art date
Application number
HK14101592.4A
Other languages
English (en)
Chinese (zh)
Inventor
关原敏
Original Assignee
信越化學工業株式會社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 信越化學工業株式會社 filed Critical 信越化學工業株式會社
Publication of HK1188487A1 publication Critical patent/HK1188487A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/02—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor using sheet or web-like material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
HK14101592.4A 2012-05-08 2014-02-19 防塵薄膜組件的製造方法 HK1188487A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012106550A JP5746661B2 (ja) 2012-05-08 2012-05-08 ペリクルの製造方法

Publications (1)

Publication Number Publication Date
HK1188487A1 true HK1188487A1 (zh) 2014-05-02

Family

ID=49533924

Family Applications (1)

Application Number Title Priority Date Filing Date
HK14101592.4A HK1188487A1 (zh) 2012-05-08 2014-02-19 防塵薄膜組件的製造方法

Country Status (5)

Country Link
JP (1) JP5746661B2 (ko)
KR (1) KR102020248B1 (ko)
CN (1) CN103389617B (ko)
HK (1) HK1188487A1 (ko)
TW (1) TWI491977B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI566033B (zh) * 2015-04-17 2017-01-11 Micro Lithography Inc Mask dustproof frame structure
CN108123671A (zh) * 2017-11-29 2018-06-05 北京创昱科技有限公司 一种框架压缩装置及薄膜拉伸方法
KR20230054032A (ko) 2021-10-15 2023-04-24 주식회사 이솔 Euv 리소그래피용 펠리클 구조 및 제조방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06230561A (ja) * 1993-01-29 1994-08-19 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル膜の製造方法
JPH09258433A (ja) * 1996-03-19 1997-10-03 Nikon Corp マスク
JP3386693B2 (ja) * 1997-06-09 2003-03-17 信越化学工業株式会社 ペリクルの製造方法
JP2004157229A (ja) 2002-11-05 2004-06-03 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル及びその製造方法
US20050157288A1 (en) * 2003-11-26 2005-07-21 Sematech, Inc. Zero-force pellicle mount and method for manufacturing the same
JP2010145264A (ja) * 2008-12-19 2010-07-01 Pioneer Electronic Corp Ｍｅｍｓデバイスの製造方法、ｍｅｍｓデバイスおよび接合マザー基板
JP5481106B2 (ja) * 2009-06-24 2014-04-23 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル
JP2011107230A (ja) * 2009-11-13 2011-06-02 Shin-Etsu Chemical Co Ltd ペリクルおよびその製造方法
JP2011158585A (ja) * 2010-01-29 2011-08-18 Shin-Etsu Chemical Co Ltd ペリクルおよびペリクルの製造方法

Also Published As

Publication number Publication date
KR20130125295A (ko) 2013-11-18
CN103389617A (zh) 2013-11-13
JP2013235087A (ja) 2013-11-21
KR102020248B1 (ko) 2019-09-10
JP5746661B2 (ja) 2015-07-08
TWI491977B (zh) 2015-07-11
TW201404577A (zh) 2014-02-01
CN103389617B (zh) 2016-03-02

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210508