JP5745573B2 - 製造ツールのレシピを生成する方法及びそのシステム - Google Patents

製造ツールのレシピを生成する方法及びそのシステム Download PDF

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Publication number
JP5745573B2
JP5745573B2 JP2013112636A JP2013112636A JP5745573B2 JP 5745573 B2 JP5745573 B2 JP 5745573B2 JP 2013112636 A JP2013112636 A JP 2013112636A JP 2013112636 A JP2013112636 A JP 2013112636A JP 5745573 B2 JP5745573 B2 JP 5745573B2
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periodic
stitches
periodicity
subarrays
array
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Japanese (ja)
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JP2013251542A (ja
JP2013251542A5 (enExample
Inventor
ゲシェル マーク
ゲシェル マーク
Original Assignee
アプライド マテリアルズ イスラエル リミテッド
アプライド マテリアルズ イスラエル リミテッド
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Publication of JP2013251542A5 publication Critical patent/JP2013251542A5/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2013112636A 2012-05-29 2013-05-29 製造ツールのレシピを生成する方法及びそのシステム Active JP5745573B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/482,955 2012-05-29
US13/482,955 US8640060B2 (en) 2012-05-29 2012-05-29 Method of generating a recipe for a manufacturing tool and system thereof

Publications (3)

Publication Number Publication Date
JP2013251542A JP2013251542A (ja) 2013-12-12
JP2013251542A5 JP2013251542A5 (enExample) 2014-09-18
JP5745573B2 true JP5745573B2 (ja) 2015-07-08

Family

ID=49671900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013112636A Active JP5745573B2 (ja) 2012-05-29 2013-05-29 製造ツールのレシピを生成する方法及びそのシステム

Country Status (4)

Country Link
US (1) US8640060B2 (enExample)
JP (1) JP5745573B2 (enExample)
KR (1) KR101521190B1 (enExample)
TW (1) TWI474208B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2789311B2 (ja) 1995-04-05 1998-08-20 株式会社十勝重機工作所 大動物移動式診療台

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9141730B2 (en) * 2011-09-12 2015-09-22 Applied Materials Israel, Ltd. Method of generating a recipe for a manufacturing tool and system thereof
US10012689B2 (en) 2015-03-25 2018-07-03 Applied Materials Israel Ltd. Method of inspecting a specimen and system thereof
US10671786B2 (en) 2016-11-29 2020-06-02 Taiwan Semiconductor Manufacturing Co., Ltd. Method of modeling a mask by taking into account of mask pattern edge interaction
US10466586B2 (en) 2016-11-29 2019-11-05 Taiwan Semiconductor Manufacturing Co., Ltd. Method of modeling a mask having patterns with arbitrary angles
CN109246257B (zh) * 2018-10-12 2021-10-08 平安科技（深圳）有限公司 流量调配方法、装置、计算机设备及存储介质
CN109446695A (zh) * 2018-11-08 2019-03-08 中铁山桥集团有限公司 一种基于acad快速拼图的方法
US12118726B2 (en) * 2021-01-15 2024-10-15 Kulicke And Soffa Industries, Inc. Intelligent pattern recognition systems for wire bonding and other electronic component packaging equipment, and related methods

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3191710B2 (ja) * 1997-01-20 2001-07-23 日本電気株式会社 図形一括電子線描画用マスク及び図形一括電子線描画用マスク作成方法並びに図形一括電子線描画装置
US6486066B2 (en) * 2001-02-02 2002-11-26 Matrix Semiconductor, Inc. Method of generating integrated circuit feature layout for improved chemical mechanical polishing
US6886153B1 (en) * 2001-12-21 2005-04-26 Kla-Tencor Corporation Design driven inspection or measurement for semiconductor using recipe
JP4868727B2 (ja) * 2004-09-27 2012-02-01 株式会社東芝 自動検査レシピ作成装置及び作成方法
US7869643B2 (en) * 2007-01-31 2011-01-11 Applied Materials South East Asia Pte. Ltd. Advanced cell-to-cell inspection
KR100924338B1 (ko) * 2007-06-25 2009-11-05 주식회사 하이닉스반도체 선형 패턴 어레이 형성 방법, 이에 따른 반도체 소자 및이에 사용되는 포토 마스크
US9141730B2 (en) * 2011-09-12 2015-09-22 Applied Materials Israel, Ltd. Method of generating a recipe for a manufacturing tool and system thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2789311B2 (ja) 1995-04-05 1998-08-20 株式会社十勝重機工作所 大動物移動式診療台

Also Published As

Publication number Publication date
US20130326443A1 (en) 2013-12-05
TW201407395A (zh) 2014-02-16
JP2013251542A (ja) 2013-12-12
KR20130133685A (ko) 2013-12-09
TWI474208B (zh) 2015-02-21
US8640060B2 (en) 2014-01-28
KR101521190B1 (ko) 2015-05-18

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