JP5730210B2 - 板金属に対して直流電気浴を洗浄するための方法及び装置 - Google Patents
板金属に対して直流電気浴を洗浄するための方法及び装置 Download PDFInfo
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- JP5730210B2 JP5730210B2 JP2011536794A JP2011536794A JP5730210B2 JP 5730210 B2 JP5730210 B2 JP 5730210B2 JP 2011536794 A JP2011536794 A JP 2011536794A JP 2011536794 A JP2011536794 A JP 2011536794A JP 5730210 B2 JP5730210 B2 JP 5730210B2
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- 239000002184 metal Substances 0.000 title claims description 13
- 229910052751 metal Inorganic materials 0.000 title claims description 13
- 238000004140 cleaning Methods 0.000 title description 6
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- 239000003456 ion exchange resin Substances 0.000 claims description 31
- 229920003303 ion-exchange polymer Polymers 0.000 claims description 31
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 30
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 24
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- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 21
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 claims description 21
- 238000011069 regeneration method Methods 0.000 claims description 21
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- 239000011701 zinc Substances 0.000 claims description 21
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- 238000000151 deposition Methods 0.000 claims 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 3
- 229920001429 chelating resin Polymers 0.000 description 3
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- 238000009713 electroplating Methods 0.000 description 3
- LELOWRISYMNNSU-UHFFFAOYSA-N hydrogen cyanide Chemical class N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 3
- 239000003014 ion exchange membrane Substances 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 235000011152 sodium sulphate Nutrition 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 231100000331 toxic Toxicity 0.000 description 3
- 230000002588 toxic effect Effects 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
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- 239000000919 ceramic Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
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- 238000004876 x-ray fluorescence Methods 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 241000276425 Xiphophorus maculatus Species 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
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- 239000012670 alkaline solution Substances 0.000 description 1
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- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/22—Regeneration of process solutions by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Treatment Of Water By Ion Exchange (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
本発明は、電解質の寿命を延長するため、かつあらゆる所望でない分解生成物を取り出すためにイオン交換を使用して、板金属に対して、直流電気浴、特にアルカリ性の亜鉛−ニッケル合金浴を清浄するための方法及び装置に関する。
亜鉛−ニッケル被覆は、腐食を受ける場合に高品質の表面保護を要求する、全ての適用において使用される。適用の通常の分野は、エンジンベイにおいて、ブレーキシステムに対して、及びランディングギアベイにおいて使用される構成成分のための自動車製造である。この理由に関して、アルカリ性の亜鉛−ニッケル電解質は、例えば以下の電解質組成:
本発明の意図は、金属被覆法の間に形成されたシアニド及びニトリルを、電解質から選択的に除去することである。驚くべきことに、シアニドイオンを結合することができるイオン交換樹脂を使用することによって、シアニドイオンだけでなく、前記浴からのニトリルも除去することが可能である。この特定の目的のためのイオン交換樹脂の使用は、先行技術において公知ではない。
1.装填(イオン交換体)
2.交換体パックの洗浄
3.再生
4.交換体パックの洗浄。
試験を、電解質上で、第1表に従って亜鉛−ニッケル合金をメッキするために実施した。
Claims (13)
- 窒素含有有機添加物及び可溶性亜鉛塩を含有するアルカリ性の亜鉛もしくは亜鉛合金メッキ浴から亜鉛又は亜鉛合金の機能的層を堆積するために使用される方法であって、以下の工程:
(i)窒素含有有機添加物及び可溶性亜鉛塩を含有する亜鉛又は亜鉛合金浴を提供する工程、
(ii)亜鉛又は亜鉛合金層を被覆されるべき基材上に電気的に堆積する工程、
(iii)前記亜鉛又は亜鉛合金浴の少なくとも一部分を取り出し、そして工程(ii)の堆積中に形成されたシアニドイオン及びニトリルを含有する、取り出した一部分を、イオン交換樹脂を含む装置を介して運び出す工程、
(iv)運び出した前記一部分を前記亜鉛又は亜鉛合金浴に戻す工程
を含み、前記イオン交換樹脂を、塩化ナトリウム溶液との接触を介して、そして水酸化ナトリウムを使用する調整によって再生する、方法。 - アルカリ性の亜鉛もしくは亜鉛合金メッキ浴が、さらにFe、Ni、Co及びSn塩からなる群から選択される他の金属塩を含有することを特徴とする、請求項1に記載の方法。
- シアニドイオンを分離するために設計されたイオン交換樹脂であることを特徴とする、請求項1又は2に記載の方法。
- 次の方法工程:(v)使用した構成成分を前記亜鉛又は亜鉛合金浴から補充する工程をさらに含むことを特徴とする、請求項1から3までのいずれか1項に記載の方法。
- 前記亜鉛又は亜鉛合金浴の一部分の取り出し及びその戻しが、連続法又は不連続法であることを特徴とする、請求項1から4までのいずれか1項に記載の方法。
- 前記亜鉛又は亜鉛合金浴が、光沢剤、表面活性剤及び窒素含有錯化剤から選択される有機添加物を含有することを特徴とする、請求項1から5までのいずれか1項に記載の方法。
- 前記窒素含有錯化剤が、ポリアルキレンアミンを含有する群から選択されることを特徴とする、請求項6に記載の方法。
- 亜鉛−ニッケル合金をメッキするために使用される直流電気浴であることを特徴とする、請求項1から7までのいずれか1項に記載の方法。
- 前記イオン交換樹脂が、強アルカリのアニオン交換樹脂からなる群から選択されることを特徴とする、請求項1から8までのいずれか1項に記載の方法。
- 前記イオン交換樹脂が、官能基として第四級アミンを有するイオン交換樹脂からなる群から選択されることを特徴とする、請求項1から9までのいずれか1項に記載の方法。
- 前記塩化ナトリウム溶液が、5〜35質量%の塩化ナトリウム濃度で存在することを特徴とする、請求項1に記載の方法。
- 前記塩化ナトリウム溶液の温度が、イオン交換カラム上での再生中に10〜70℃であることを特徴とする、請求項1又は11に記載の方法。
- 前記方法が、追加の工程iii b)10℃未満である温度で炭酸ナトリウムの分離のために前記亜鉛又は亜鉛合金浴を冷却する工程、を含むことを特徴とする、請求項1から12までのいずれか1項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008058086.4 | 2008-11-18 | ||
DE102008058086A DE102008058086B4 (de) | 2008-11-18 | 2008-11-18 | Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen |
PCT/EP2009/008408 WO2010057675A2 (en) | 2008-11-18 | 2009-11-17 | Process and device for cleaning galvanic baths to plate metals |
Publications (2)
Publication Number | Publication Date |
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JP2012509401A JP2012509401A (ja) | 2012-04-19 |
JP5730210B2 true JP5730210B2 (ja) | 2015-06-03 |
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Application Number | Title | Priority Date | Filing Date |
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JP2011536794A Active JP5730210B2 (ja) | 2008-11-18 | 2009-11-17 | 板金属に対して直流電気浴を洗浄するための方法及び装置 |
Country Status (10)
Country | Link |
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US (1) | US20110210006A1 (ja) |
EP (1) | EP2358927B2 (ja) |
JP (1) | JP5730210B2 (ja) |
KR (1) | KR20110090934A (ja) |
CN (1) | CN102216498B (ja) |
BR (1) | BRPI0921037B1 (ja) |
CA (1) | CA2740644C (ja) |
DE (1) | DE102008058086B4 (ja) |
ES (1) | ES2402338T5 (ja) |
WO (1) | WO2010057675A2 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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PL2384800T3 (pl) * | 2010-05-07 | 2013-07-31 | Dr Ing Max Schloetter Gmbh & Co Kg | Regeneracja alkalicznych elektrolitów cynkowo-niklowych drogą usuwania jonów cynkowych |
ES2416984T3 (es) * | 2010-09-21 | 2013-08-05 | Dr.Ing. Max Schlötter Gmbh & Co. Kg | Regeneración de electrolitos de cinc-níquel alcalinos mediante la eliminación de iones cianuro con la ayuda de compuestos de amonio cuaternario solubles |
DE102014223169A1 (de) * | 2014-11-13 | 2016-05-19 | Henkel Ag & Co. Kgaa | Verfahren zur selektiven Entfernung von Zink-Ionen aus alkalischen Badlösungen in der Oberflächenbehandlung von metallischen Bauteilen in Serie |
DE102016008333A1 (de) * | 2015-11-12 | 2017-05-18 | Liebherr-Aerospace Lindenberg Gmbh | Verfahren zur wasserstoffarmen Zink-Nickel Beschichtung eines hochfesten Vergütungsstahls |
EP3358045A1 (de) * | 2017-02-07 | 2018-08-08 | Dr.Ing. Max Schlötter GmbH & Co. KG | Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen |
CN107367438A (zh) * | 2017-07-14 | 2017-11-21 | 东莞市同欣表面处理科技有限公司 | 一种利用方形霍尔槽测试电镀电流效率的方法 |
CN110373706B (zh) * | 2019-08-22 | 2021-05-14 | 电子科技大学 | 一种酸性光亮镀铜电镀液的在线维护方法 |
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US3661734A (en) * | 1970-07-02 | 1972-05-09 | Remington Arms Co Inc | Carbonate removal |
US4321145A (en) * | 1980-06-11 | 1982-03-23 | Carlson Lee G | Ion exchange treatment for removing toxic metals and cyanide values from waste waters |
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-
2008
- 2008-11-18 DE DE102008058086A patent/DE102008058086B4/de not_active Withdrawn - After Issue
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2009
- 2009-11-17 KR KR1020117011296A patent/KR20110090934A/ko not_active Application Discontinuation
- 2009-11-17 WO PCT/EP2009/008408 patent/WO2010057675A2/en active Application Filing
- 2009-11-17 CA CA2740644A patent/CA2740644C/en active Active
- 2009-11-17 JP JP2011536794A patent/JP5730210B2/ja active Active
- 2009-11-17 EP EP09771297.0A patent/EP2358927B2/en active Active
- 2009-11-17 US US13/123,934 patent/US20110210006A1/en not_active Abandoned
- 2009-11-17 ES ES09771297.0T patent/ES2402338T5/es active Active
- 2009-11-17 BR BRPI0921037-7A patent/BRPI0921037B1/pt active IP Right Grant
- 2009-11-17 CN CN200980145596.1A patent/CN102216498B/zh active Active
Also Published As
Publication number | Publication date |
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BRPI0921037A2 (pt) | 2015-12-29 |
WO2010057675A2 (en) | 2010-05-27 |
CA2740644A1 (en) | 2010-05-27 |
WO2010057675A3 (en) | 2010-08-05 |
EP2358927A2 (en) | 2011-08-24 |
CN102216498A (zh) | 2011-10-12 |
CN102216498B (zh) | 2014-08-06 |
ES2402338T5 (es) | 2017-07-25 |
EP2358927B2 (en) | 2017-03-01 |
EP2358927B1 (en) | 2013-01-02 |
JP2012509401A (ja) | 2012-04-19 |
KR20110090934A (ko) | 2011-08-10 |
CA2740644C (en) | 2016-07-26 |
DE102008058086A1 (de) | 2010-05-27 |
BRPI0921037B1 (pt) | 2020-01-07 |
US20110210006A1 (en) | 2011-09-01 |
ES2402338T3 (es) | 2013-04-30 |
DE102008058086B4 (de) | 2013-05-23 |
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