JP5717244B2 - 基板処理装置及び基板処理方法 - Google Patents

基板処理装置及び基板処理方法 Download PDF

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JP5717244B2
JP5717244B2 JP2010244449A JP2010244449A JP5717244B2 JP 5717244 B2 JP5717244 B2 JP 5717244B2 JP 2010244449 A JP2010244449 A JP 2010244449A JP 2010244449 A JP2010244449 A JP 2010244449A JP 5717244 B2 JP5717244 B2 JP 5717244B2
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substrate
processing liquid
nozzle unit
nozzle
processing
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JP2012099570A (ja
JP2012099570A5 (enExample
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磯　明典
明典 磯
崇広 濱田
崇広 濱田
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010244449A 2010-10-29 2010-10-29 基板処理装置及び基板処理方法 Active JP5717244B2 (ja)

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JP2010244449A JP5717244B2 (ja) 2010-10-29 2010-10-29 基板処理装置及び基板処理方法

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JP2010244449A JP5717244B2 (ja) 2010-10-29 2010-10-29 基板処理装置及び基板処理方法

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JP2012099570A JP2012099570A (ja) 2012-05-24
JP2012099570A5 JP2012099570A5 (enExample) 2013-12-12
JP5717244B2 true JP5717244B2 (ja) 2015-05-13

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Publication number Priority date Publication date Assignee Title
CN102814295A (zh) * 2012-09-06 2012-12-12 上海市闵行第二中学 一种数字检测仪探头的冲洗装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3437702B2 (ja) * 1996-02-01 2003-08-18 大日本スクリーン製造株式会社 基板処理装置
JP2006130484A (ja) * 2004-11-09 2006-05-25 Dainippon Screen Mfg Co Ltd 基板処理装置

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