JP5682496B2 - 半導体装置、マルチチップ半導体装置、デバイス、及び半導体装置の製造方法 - Google Patents
半導体装置、マルチチップ半導体装置、デバイス、及び半導体装置の製造方法 Download PDFInfo
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- JP5682496B2 JP5682496B2 JP2011165227A JP2011165227A JP5682496B2 JP 5682496 B2 JP5682496 B2 JP 5682496B2 JP 2011165227 A JP2011165227 A JP 2011165227A JP 2011165227 A JP2011165227 A JP 2011165227A JP 5682496 B2 JP5682496 B2 JP 5682496B2
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Description
(1)構成
図1は、本実施の形態の半導体装置2の平面図である。図2は、図1のII-II線に沿った断面図である。尚、図2には、II-II線のうち矢印4で示される範囲の断面図が示されている。
図8は、半導体装置2の製造方法を説明する平面図である。図9乃至14は、半導体装置2の製造方法を説明する工程断面図である。尚、図9乃至14は、図8のix−ix線のうち、矢印4bに示す範囲における工程断面図である。
まず、半導体基板10aの表面(第一の面)に、図8および図9(a)に示すように、複数の端子19,21(外部端子)を形成する。半導体基板10aの表面には、例えば半導装置の内部回路(集積回路等)が設けられていている。
図9(b)に示すように、半導体基板10aの表面に、例えばバリアメタル(例えば、Ti、Cr、Ni等の積層膜及び単層膜)40を堆積する。その後、バリアメタル40の上に、図9(c)に示すように、レジスト膜42aを形成する。このレジスト膜42aに、第一の端子19の中央部上のバリアメタル40を露出させる開口部44aが設けられる。
Cuピラー46が形成された半導体基板10aの表面に、例えばSOD(spin-on-dielectric)法により、絶縁膜48aを形成する(図10(b))。
まず、半導体基板10aの表面、突出部12の頂上、および突出部12の側面を覆う導電膜50a(例えば、Al膜)を形成する(図11(a))。
レジスト膜42bの上に、突出部12の頂上とその側面の一部を露出させるレジスト膜42cを形成する(図12(a))。
図14(b)に示すように、第一接合部14および第三接合部18に、メッキとリフロー処理によりバンプ20,22を形成する。
図19は、半導体装置2の変形例2cの断面図である。図20は、変形例2cが他の半導体装置2dに接合された状態の断面図である。
図25は、本実施の形態のマルチチップ半導体装置28aを説明する断面図である。尚、実施の形態1と共通する部分については、説明を省略する。
図29は、本実施の形態のデバイス76の部分断面図である。
半導体装置の第一の面に形成された複数の突出部と、
前記複数の突出部の上部に形成された第一接合部と、
前記複数の突出部の側面に形成された第二接合部と、
前記複数の突出部の間の前記第一の面に形成された複数の第三接合部とを有し、
前記第一ないし第三接合部を介して他の半導体装置に接合される
ことを特徴とする半導体装置。
前記第二接合部は、前記複数の突出部の上部側と下部側に分離されている
ことを特徴とする付記1記載の半導体装置。
前記複数の突出部は、絶縁体であり、
前記絶縁体を貫通する導電体を介して前記第一接合部が前記半導体装置の内部回路と接続されている
ことを特徴とする付記1記載の半導体装置。
前記第一接合部の上に形成された突起電極を介して、前記他の半導体装置に接合される
ことを特徴とする付記1記載の半導体装置。
半導体装置の第一の面に形成された複数の突出部と、前記複数の突出部の上部に形成された第一接合部と、前記複数の突出部の側面に形成された第二接合部と、前記複数の突出部の間の前記第一の面に形成された複数の第三接合部とを有する第一及び第二の半導体装置を備え、
前記第一及び第二の半導体装置が、対向配置された前記複数の突出部の前記第二接合部が隣接した状態で接合される
ことを特徴とするマルチチップ半導体装置。
前記第二の半導体装置の前記第三接合部は、基板貫通ビアホールに設けられた導電体を介して前記第二の半導体装置の内部回路に接続されている
ことを特徴とする付記5記載のマルチチップ半導体装置。
半導体装置の第一の面に形成された複数の第一突出部と、前記複数の第一突出部の上部に形成された第一接合部と、前記複数の第一突出部の側面に形成された第二接合部と、前記複数の第一突出部の間の前記第一の面に形成された第三接合部とを有する半導体装置と、
基板の第二の面に形成された複数の第二突出部と、前記複数の第二突出部の上部に形成された第四接合部と、前記複数の第二突出部の側面に形成された第五接合部と、前記複数の第二突出部の間の前記第二の面に形成された複数の第六接合部とを有する基板とを有し、
前記半導体装置と前記基板が、対向配置された前記複数の第一突出部と前記複数の第二突出部の前記第二接合部と前記第五接合部とが隣接した状態で接合されている
ことを特徴とするデバイス。
半導体装置の第一の面に複数の端子を形成する工程と、
前記複数の端子のうち、第一の方向および前記第一の方向と直交する第二の方向に一つおきに配置された端子上に柱状の導電体を形成する工程と、
前記柱状の導電体を取り囲む柱状の絶縁体を形成する工程と、
前記柱状の絶縁体の上部および側面に導電性の接合部を形成する工程とを有する
ことを特徴とする半導体装置の製造方法。
半導体装置の第一の面に複数の端子を形成する工程と、
前記複数の端子のうち、第一の方向および前記第一の方向と直交する第二の方向に一つおき配置された端子上に貫通孔を有する柱状の絶縁体を形成する工程と、
前記貫通孔に導電体を設ける工程と、
前記柱状の絶縁体の上部および側面に導電性の接合部を形成する工程とを有する
ことを特徴とする半導体装置の製造方法。
半導体装置の第一の面に複数の端子を形成する工程と、
前記複数の端子のうち第一の方向および前記第一の方向と直交する第二の方向に一つおき配置された端子の上方に貫通孔が設けられた絶縁膜、前記貫通孔に設けられた導電体を有する複数の導電体埋め込み層を、前記第一の面に積層する工程と、
前記複数の導電体埋め込み層をエッチングして、前記導電体および導電性パッドを取り囲む柱状の絶縁体を形成する工程と、
前記柱状の絶縁体の上部および側面に導電性の接合部を形成する工程とを有する
ことを特徴とする半導体装置の製造方法。
半導体装置の第一の面に形成された複数の突出部と、
前記複数の突出部の上部に形成された第一接合部と、
前記複数の突出部の側面に形成された第二接合部と、
前記第一および第二接合部を介して他の半導体装置に接合される
ことを特徴とする半導体装置。
10・・・集積回路チップ
12・・・突出部
14・・・第一接合部
16・・・第二接合部
18・・・第三接合部
28・・・マルチチップ半導体装置
46・・・Cuピラー
52・・・貫通孔
54・・・導電体
60・・・導電体埋め込み層
76・・・デバイス
78・・・基板
Claims (10)
- 半導体装置の第一の面に形成された複数の突出部と、
前記複数の突出部の上部に形成された導電性の第一接合部と、
前記複数の突出部の側面に上部側と下部側に分離して形成された導電性の第二接合部と、
前記複数の突出部の間の前記第一の面に形成された導電性の複数の第三接合部とを有し、
前記第一ないし第三接合部を介して他の半導体装置に接合される
ことを特徴とする半導体装置。 - 前記第二接合部の上部側の各々は前記第一接合部の各々に接続され、前記第二接合部の下部側の各々は前記複数の第三接合部の少なくとも一つに接続される
ことを特徴とする請求項1記載の半導体装置。 - 前記複数の突出部は、絶縁体であり、
前記絶縁体を貫通する導電体を介して前記第一接合部が前記半導体装置の内部回路と接続されている
ことを特徴とする請求項1記載の半導体装置。 - 前記第一接合部の上に形成された突起電極を介して、前記他の半導体装置に接合される
ことを特徴とする請求項1記載の半導体装置。 - 半導体装置の第一の面に形成された複数の突出部と、前記複数の突出部の上部に形成された導電性の第一接合部と前記複数の突出部の側面に上部側と下部側に分離して形成された導電性の第二接合部と、前記複数の突出部の間の前記第一の面に形成された導電性の複数の第三接合部とを有する第一及び第二の半導体装置を備え、
前記第一及び第二の半導体装置が、対向配置された前記複数の突出部の前記第二接合部が隣接した状態で接合される
ことを特徴とするマルチチップ半導体装置。 - 前記第二の半導体装置の前記第三接合部は、基板貫通ビアホールに設けられた導電体を介して前記第二の半導体装置の内部回路に接続されている
ことを特徴とする請求項5記載のマルチチップ半導体装置。 - 半導体装置の第一の面に形成された複数の第一突出部と、前記複数の第一突出部の上部に形成された導電性の第一接合部と、前記複数の第一突出部の側面に上部側と下部側に分離して形成された導電性の第二接合部と、前記複数の第一突出部の間の前記半導体装置の前記第一の面に形成された導電性の複数の第三接合部とを有する半導体装置と、
基板の第二の面に形成された複数の第二突出部と、前記複数の第二突出部の上部に形成された第四接合部と、前記複数の第二突出部の側面に上部側と下部側に分離して形成された導電性の第五接合部と、前記複数の第二突出部の間の前記基板の前記第二の面に形成された複数の第六接合部とを有する基板とを有し、
前記半導体装置と前記基板が、対向配置された前記複数の第一突出部と前記複数の第二突出部の前記第二接合部と前記第五接合部とが隣接した状態で接合されている
ことを特徴とするデバイス。 - 半導体装置の第一の面に、第一の方向および前記第一の方向とは異なる第二の方向に交互に配置された第一の端子と第二の端子とを形成する工程と、
前記第一の端子上に柱状の導電体を形成する工程と、
前記柱状の導電体の側面を取り囲み前記柱状の導電体の上部を露出させる柱状の絶縁体を形成する工程と、
前記柱状の絶縁体の上部上の導電性の第一接合部と、前記柱状の絶縁体の側面の上部側と下部側に分離した導電性の第二接合部と、前記第二の端子に接続された前記第一の面上の導電性の第三接合部とを形成する工程とを有する
ことを特徴とする半導体装置の製造方法。 - 半導体装置の第一の面に、第一の方向および前記第一の方向とは異なる第二の方向に交互に配置された第一の端子と第二の端子とを形成する工程と、
前記第一の端子上に貫通孔を有する柱状の絶縁体を形成する工程と、
前記貫通孔に導電体を設ける工程と、
前記柱状の絶縁体の上部上の導電性の第一接合部と、前記柱状の絶縁体の側面の上部側と下部側に分離した導電性の第二接合部と、前記第二の端子に接続された前記第一の面上の導電性の第三接合部とを形成する工程とを有する
ことを特徴とする半導体装置の製造方法。 - 半導体装置の第一の面に、第一の方向および前記第一の方向とは異なる第二の方向に交互に配置された第一の端子と第二の端子とを形成する工程と、
前記第一の端子の上方に貫通孔が設けられた絶縁膜と、前記貫通孔に設けられた導電体と、前記絶縁膜上に設けられ前記導電体に接続された導電性パッドとを有する複数の導電体埋め込み層を、前記第一の面に積層する工程と、
前記複数の導電体埋め込み層をエッチングして、前記導電体および前記導電性パッドを取り囲む柱状の絶縁体を形成する工程と、
前記柱状の絶縁体の上部上の導電性の第一接合部と、前記柱状の絶縁体の側面の上部側と下部側に分離した導電性の第二接合部と、前記第二の端子に接続された前記第一の面上の導電性の第三接合部とを形成する工程とを有する
ことを特徴とする半導体装置の製造方法。
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US7713861B2 (en) * | 2007-10-13 | 2010-05-11 | Wan-Ling Yu | Method of forming metallic bump and seal for semiconductor device |
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