JP5678477B2 - 光学ガラス - Google Patents
光学ガラス Download PDFInfo
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- JP5678477B2 JP5678477B2 JP2010121942A JP2010121942A JP5678477B2 JP 5678477 B2 JP5678477 B2 JP 5678477B2 JP 2010121942 A JP2010121942 A JP 2010121942A JP 2010121942 A JP2010121942 A JP 2010121942A JP 5678477 B2 JP5678477 B2 JP 5678477B2
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- 239000005304 optical glass Substances 0.000 title claims description 26
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 39
- 238000000465 moulding Methods 0.000 claims description 37
- 230000003287 optical effect Effects 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 21
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 14
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 230000009477 glass transition Effects 0.000 claims description 10
- 239000002244 precipitate Substances 0.000 claims description 9
- 239000011521 glass Substances 0.000 description 125
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 24
- 239000013078 crystal Substances 0.000 description 19
- 238000004031 devitrification Methods 0.000 description 15
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 15
- 239000011787 zinc oxide Substances 0.000 description 12
- 230000005484 gravity Effects 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000007791 liquid phase Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 238000002845 discoloration Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229910005793 GeO 2 Inorganic materials 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 239000000156 glass melt Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 239000006060 molten glass Substances 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 4
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 4
- 229910052792 caesium Inorganic materials 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 238000010828 elution Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 150000003623 transition metal compounds Chemical class 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- 238000007088 Archimedes method Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- -1 Ga is 2 O 3 Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 101100349601 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) kpr-2 gene Proteins 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 206010040925 Skin striae Diseases 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- CUZMQPZYCDIHQL-VCTVXEGHSA-L calcium;(2s)-1-[(2s)-3-[(2r)-2-(cyclohexanecarbonylamino)propanoyl]sulfanyl-2-methylpropanoyl]pyrrolidine-2-carboxylate Chemical compound [Ca+2].N([C@H](C)C(=O)SC[C@@H](C)C(=O)N1[C@@H](CCC1)C([O-])=O)C(=O)C1CCCCC1.N([C@H](C)C(=O)SC[C@@H](C)C(=O)N1[C@@H](CCC1)C([O-])=O)C(=O)C1CCCCC1 CUZMQPZYCDIHQL-VCTVXEGHSA-L 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910001938 gadolinium oxide Inorganic materials 0.000 description 1
- 229940075613 gadolinium oxide Drugs 0.000 description 1
- CMIHHWBVHJVIGI-UHFFFAOYSA-N gadolinium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Gd+3].[Gd+3] CMIHHWBVHJVIGI-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Description
Claims (8)
- 酸化物基準の質量%表示で、
B2O3:10〜20%、
SiO2:0.5〜12%、
ZnO:5〜19%、
Ta2O5:2.5〜17%、
Li2O:0.2〜3%、
ZrO2:0.6〜4.9%、
WO3:1〜20%、
La2O3:25〜50%、
Gd2O3:0〜13%、
Y2O3:0.2〜20%、
ただし、La2O3+Gd2O3+Y2O3:35〜60%、
を含有し、Nb2O5を実質的に含有せず、
かつ、屈折率ndが1.82〜1.86、アッベ数νdが37〜44、ガラス転移点(Tg)が630℃以下、La 2 O 3 、Gd 2 O 3 、Y 2 O 3 、Yb 2 O 3 の合計含有量に対するLa 2 O 3 の含有量の質量%分率が0.67〜0.90である光学ガラス。 - Gd 2 O 3 とTa 2 O 5 の合量が30質量%以下である請求項1に記載の光学ガラス。
- 液相温度(T L )が1130℃以下である請求項1または2に記載の光学ガラス。
- 液相温度粘性(η TL )が5dPa・s以上である請求項1〜3のいずれかに記載の光学ガラス。
- 液相温度(TL)以下において、失透物が複数析出せず、LaBO3のみ析出する請求項2〜4のいずれかに記載の光学ガラス。
- 請求項1〜5のいずれか記載の光学ガラスからなる精密プレス成形用プリフォーム。
- 請求項1〜5のいずれか記載の光学ガラスを精密プレス成形することによって得られる光学素子。
- 酸化物基準のモル%表示で、
B2O3:20〜40%、
SiO2:1〜30%、
ZnO:10〜34%、
Ta2O5:0.8〜8%、
Li2O:0.5〜15%、
ZrO2:0.5〜10%、
WO3:3〜15%、
La2O3:10〜25%、
Gd2O3:0〜5%未満、
Y2O3:0.1〜15%、
ただし、La2O3+Gd2O3+Y2O3:15〜30%、
を含有し、Nb2O5を実質的に含有せず、
かつ、屈折率ndが1.82〜1.86、アッベ数νdが37〜44、ガラス転移点(Tg)が630℃以下、La 2 O 3 、Gd 2 O 3 、Y 2 O 3 、Yb 2 O 3 の合計含有量に対するLa 2 O 3 の含有量のモル%分率が0.67〜0.90である光学ガラス。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010121942A JP5678477B2 (ja) | 2009-05-28 | 2010-05-27 | 光学ガラス |
Applications Claiming Priority (3)
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JP2009129247 | 2009-05-28 | ||
JP2009129247 | 2009-05-28 | ||
JP2010121942A JP5678477B2 (ja) | 2009-05-28 | 2010-05-27 | 光学ガラス |
Publications (2)
Publication Number | Publication Date |
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JP2011006318A JP2011006318A (ja) | 2011-01-13 |
JP5678477B2 true JP5678477B2 (ja) | 2015-03-04 |
Family
ID=43220923
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2010121942A Active JP5678477B2 (ja) | 2009-05-28 | 2010-05-27 | 光学ガラス |
Country Status (3)
Country | Link |
---|---|
US (1) | US8377835B2 (ja) |
JP (1) | JP5678477B2 (ja) |
CN (1) | CN101898865B (ja) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5427460B2 (ja) * | 2009-04-14 | 2014-02-26 | 富士フイルム株式会社 | 光学ガラス |
JP5865579B2 (ja) * | 2010-04-30 | 2016-02-17 | 株式会社オハラ | 光学ガラス、プリフォーム材及び光学素子 |
CN102424523B (zh) * | 2011-09-08 | 2014-06-04 | 成都光明光电股份有限公司 | 光学玻璃、模压用预制件及光学元件 |
JP6096502B2 (ja) * | 2011-12-20 | 2017-03-15 | 株式会社オハラ | 光学ガラス及び光学素子 |
CN107285622A (zh) * | 2011-12-20 | 2017-10-24 | 株式会社小原 | 光学玻璃及光学元件 |
JP6095356B2 (ja) * | 2011-12-28 | 2017-03-15 | 株式会社オハラ | 光学ガラス及び光学素子 |
JP6096501B2 (ja) * | 2011-12-28 | 2017-03-15 | 株式会社オハラ | 光学ガラス及び光学素子 |
JP5874558B2 (ja) | 2012-07-23 | 2016-03-02 | 旭硝子株式会社 | プレス成形用プリフォームおよびプリフォームから作られる光学素子 |
CN107473583A (zh) * | 2012-10-19 | 2017-12-15 | 成都光明光电股份有限公司 | 光学玻璃 |
JP6014573B2 (ja) * | 2013-04-05 | 2016-10-25 | 株式会社オハラ | 光学ガラス、プリフォーム材及び光学素子 |
JP5979723B2 (ja) * | 2013-07-31 | 2016-08-31 | 株式会社オハラ | 光学ガラス及び光学素子 |
JP6611410B2 (ja) * | 2013-11-08 | 2019-11-27 | 株式会社オハラ | 光学ガラス、プリフォーム材及び光学素子 |
JP6626298B2 (ja) * | 2015-09-18 | 2019-12-25 | 株式会社オハラ | 光学ガラス、プリフォーム及び光学素子 |
TWI752046B (zh) * | 2016-06-29 | 2022-01-11 | 日商小原股份有限公司 | 光學玻璃、預成形材以及光學元件 |
CN106495465A (zh) * | 2016-10-27 | 2017-03-15 | 成都光明光电股份有限公司 | 光学玻璃 |
EP3686169A4 (en) * | 2017-09-21 | 2021-06-23 | Nikon Corporation | OPTICAL GLASS, OPTICAL ELEMENT OF OPTICAL GLASS, OPTICAL SYSTEM, INTERCHANGEABLE LENS AND OPTICAL DEVICE |
WO2020062009A1 (zh) * | 2018-09-28 | 2020-04-02 | 成都光明光电股份有限公司 | 光学玻璃、其预制件、光学元件和光学仪器 |
KR20210101269A (ko) | 2018-12-12 | 2021-08-18 | 코닝 인코포레이티드 | 이온-교환 가능한 리튬-함유 알루미노실리케이트 유리 |
JP7194082B2 (ja) * | 2019-06-28 | 2022-12-21 | Hoya株式会社 | リヒートプレス用ガラス材料、リヒートプレス済ガラス材料、研磨済ガラス及びそれらの製造方法 |
CN111943502B (zh) * | 2020-08-03 | 2022-03-22 | 成都光明光电股份有限公司 | 光学玻璃、玻璃预制件及光学元件 |
CN112028472B (zh) * | 2020-09-07 | 2022-04-15 | 成都光明光电股份有限公司 | 光学玻璃、光学元件和光学仪器 |
CN114524611A (zh) * | 2020-11-23 | 2022-05-24 | 肖特玻璃科技(苏州)有限公司 | 化学强化光学玻璃 |
CN115466050A (zh) * | 2022-08-26 | 2022-12-13 | 成都光明光电股份有限公司 | 光学玻璃和光学元件 |
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JP4917712B2 (ja) | 2000-02-24 | 2012-04-18 | 武田薬品工業株式会社 | 併用医薬 |
JP3750984B2 (ja) * | 2000-05-31 | 2006-03-01 | Hoya株式会社 | 光学ガラスおよび光学製品の製造方法 |
JP4003874B2 (ja) | 2001-10-24 | 2007-11-07 | Hoya株式会社 | 光学ガラス、プレス成形用プリフォームおよび光学部品 |
US6977232B2 (en) * | 2001-10-24 | 2005-12-20 | Hoya Corporation | Optical glass, preform for press molding and optical part |
JP3912774B2 (ja) * | 2002-03-18 | 2007-05-09 | Hoya株式会社 | 精密プレス成形用光学ガラス、精密プレス成形用プリフォームおよびその製造方法 |
CN100457658C (zh) * | 2002-12-17 | 2009-02-04 | 株式会社小原 | 光学玻璃 |
EP1433757B1 (en) * | 2002-12-27 | 2017-02-01 | Hoya Corporation | Optical glass, press-molding glass gob and optical element |
JP4133975B2 (ja) * | 2003-08-29 | 2008-08-13 | Hoya株式会社 | 精密プレス成形用ガラスプリフォーム、光学素子およよびそれらの製造方法 |
JP4218804B2 (ja) * | 2004-03-19 | 2009-02-04 | Hoya株式会社 | 光学ガラス、精密プレス成形用プリフォームとその製造方法および光学素子とその製造方法 |
JP2006016295A (ja) | 2004-06-02 | 2006-01-19 | Ohara Inc | 光学ガラス |
JP4471751B2 (ja) * | 2004-07-05 | 2010-06-02 | Hoya株式会社 | ガラス光学素子の製造方法 |
JP4334523B2 (ja) * | 2004-10-12 | 2009-09-30 | Hoya株式会社 | 光学ガラス、精密プレス成形用プリフォームとその製造方法および光学素子とその製造方法 |
JP4746995B2 (ja) * | 2006-02-02 | 2011-08-10 | 株式会社オハラ | 光学ガラス |
JP5336035B2 (ja) * | 2006-06-21 | 2013-11-06 | Hoya株式会社 | 光学ガラス、ガラス成形体、光学素子およびそれらの製造方法 |
JP2008088019A (ja) * | 2006-10-02 | 2008-04-17 | Ohara Inc | ガラス組成物 |
WO2009072335A1 (ja) * | 2007-12-06 | 2009-06-11 | Asahi Glass Co., Ltd. | 光学ガラス、およびそれを用いた精密プレス成形用プリフォームおよび光学素子 |
JP5138401B2 (ja) * | 2008-01-30 | 2013-02-06 | Hoya株式会社 | 光学ガラス、プレス成形用ガラスゴブおよび光学素子とその製造方法ならびに光学素子ブランクの製造方法 |
JP5427460B2 (ja) * | 2009-04-14 | 2014-02-26 | 富士フイルム株式会社 | 光学ガラス |
-
2010
- 2010-05-27 JP JP2010121942A patent/JP5678477B2/ja active Active
- 2010-05-28 US US12/790,141 patent/US8377835B2/en not_active Expired - Fee Related
- 2010-05-28 CN CN201010194216.8A patent/CN101898865B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101898865B (zh) | 2015-01-28 |
JP2011006318A (ja) | 2011-01-13 |
US20100304950A1 (en) | 2010-12-02 |
US8377835B2 (en) | 2013-02-19 |
CN101898865A (zh) | 2010-12-01 |
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