JP5661950B2 - 磁気ディスク用ガラス基板の製造方法 - Google Patents
磁気ディスク用ガラス基板の製造方法 Download PDFInfo
- Publication number
- JP5661950B2 JP5661950B2 JP2013551871A JP2013551871A JP5661950B2 JP 5661950 B2 JP5661950 B2 JP 5661950B2 JP 2013551871 A JP2013551871 A JP 2013551871A JP 2013551871 A JP2013551871 A JP 2013551871A JP 5661950 B2 JP5661950 B2 JP 5661950B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- base plate
- glass base
- glass
- side wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011521 glass Substances 0.000 title claims description 317
- 239000000758 substrate Substances 0.000 title claims description 98
- 238000004519 manufacturing process Methods 0.000 title claims description 48
- 238000005498 polishing Methods 0.000 claims description 289
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 177
- 239000006061 abrasive grain Substances 0.000 claims description 98
- 239000002245 particle Substances 0.000 claims description 91
- 238000000034 method Methods 0.000 claims description 48
- 239000007788 liquid Substances 0.000 claims description 33
- 238000007517 polishing process Methods 0.000 claims description 10
- 238000000227 grinding Methods 0.000 description 32
- 229910000420 cerium oxide Inorganic materials 0.000 description 27
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 27
- 239000010410 layer Substances 0.000 description 24
- 230000008569 process Effects 0.000 description 23
- 238000003426 chemical strengthening reaction Methods 0.000 description 20
- 230000002093 peripheral effect Effects 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 11
- 239000000203 mixture Substances 0.000 description 9
- 238000000465 moulding Methods 0.000 description 8
- 230000003746 surface roughness Effects 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 229910003460 diamond Inorganic materials 0.000 description 7
- 239000010432 diamond Substances 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 5
- 238000003754 machining Methods 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 239000005354 aluminosilicate glass Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000006060 molten glass Substances 0.000 description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 238000006124 Pilkington process Methods 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000008119 colloidal silica Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- 229910018979 CoPt Inorganic materials 0.000 description 2
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 2
- 229910018068 Li 2 O Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 238000004554 molding of glass Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 235000010333 potassium nitrate Nutrition 0.000 description 2
- 239000004323 potassium nitrate Substances 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910005335 FePt Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000005337 ground glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013551871A JP5661950B2 (ja) | 2011-12-29 | 2012-12-28 | 磁気ディスク用ガラス基板の製造方法 |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011290432 | 2011-12-29 | ||
| JP2011290431 | 2011-12-29 | ||
| JP2011290432 | 2011-12-29 | ||
| JP2011290431 | 2011-12-29 | ||
| PCT/JP2012/084234 WO2013100154A1 (fr) | 2011-12-29 | 2012-12-28 | Procédé de fabrication d'un substrat en verre de disque magnétique |
| JP2013551871A JP5661950B2 (ja) | 2011-12-29 | 2012-12-28 | 磁気ディスク用ガラス基板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP5661950B2 true JP5661950B2 (ja) | 2015-01-28 |
| JPWO2013100154A1 JPWO2013100154A1 (ja) | 2015-05-11 |
Family
ID=48697631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013551871A Expired - Fee Related JP5661950B2 (ja) | 2011-12-29 | 2012-12-28 | 磁気ディスク用ガラス基板の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5661950B2 (fr) |
| CN (1) | CN104011795B (fr) |
| MY (1) | MY168037A (fr) |
| WO (1) | WO2013100154A1 (fr) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG10201912466TA (en) | 2015-03-31 | 2020-02-27 | Hoya Corp | Magnetic-disk substrate, magnetic disk, and method for manufacturing magnetic-disk substrate |
| JP6637816B2 (ja) * | 2016-03-31 | 2020-01-29 | 株式会社フジミインコーポレーテッド | 研磨用組成物、基板の研磨方法および基板の製造方法 |
| CN109712648B (zh) * | 2017-10-25 | 2022-02-22 | 新科实业有限公司 | 研磨用的坯体及其制造方法、金刚石研磨坯的制造方法 |
| JP6695318B2 (ja) * | 2017-12-27 | 2020-05-20 | Hoya株式会社 | 円盤状ガラス基板の製造方法、薄板ガラス基板の製造方法、導光板の製造方法及び円盤状ガラス基板 |
| CN115816267A (zh) * | 2022-12-29 | 2023-03-21 | 西安奕斯伟材料科技有限公司 | 硅片双面抛光装置的承载件及硅片双面抛光装置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10121034A (ja) * | 1996-03-18 | 1998-05-12 | Showa Denko Kk | 磁気ディスク基板の研磨用組成物 |
| JP2001162510A (ja) * | 1999-09-30 | 2001-06-19 | Hoya Corp | 研磨方法並びに磁気記録媒体用ガラス基板の製造方法及び磁気記録媒体の製造方法 |
| JP2006053965A (ja) * | 2004-08-10 | 2006-02-23 | Fuji Electric Device Technology Co Ltd | 磁気記録媒体用基板の製造方法並びにそれに用いる両面研磨装置及び基板研磨用キャリア |
| JP2008176843A (ja) * | 2007-01-17 | 2008-07-31 | Konica Minolta Opto Inc | 磁気記録媒体用基板、及び磁気記録媒体用基板の製造方法 |
| JP2009173538A (ja) * | 2001-09-26 | 2009-08-06 | Hitachi Maxell Ltd | 非磁性板状粒子とその製造方法 |
| JP2011207626A (ja) * | 2009-06-04 | 2011-10-20 | Ohara Inc | 情報記録媒体用結晶化ガラス基板およびその製造方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7429209B2 (en) * | 2002-12-26 | 2008-09-30 | Hoya Corporation | Method of polishing a glass substrate for use as an information recording medium |
| JP2008226349A (ja) * | 2007-03-13 | 2008-09-25 | Showa Denko Kk | 円盤状基板の製造方法、洗浄装置 |
| CN101796582A (zh) * | 2007-09-04 | 2010-08-04 | 柯尼卡美能达精密光学株式会社 | 信息记录介质用玻璃基板的制造方法、信息记录介质用玻璃基板以及磁记录介质 |
-
2012
- 2012-12-28 CN CN201280064360.7A patent/CN104011795B/zh active Active
- 2012-12-28 WO PCT/JP2012/084234 patent/WO2013100154A1/fr active Application Filing
- 2012-12-28 MY MYPI2014701698A patent/MY168037A/en unknown
- 2012-12-28 JP JP2013551871A patent/JP5661950B2/ja not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10121034A (ja) * | 1996-03-18 | 1998-05-12 | Showa Denko Kk | 磁気ディスク基板の研磨用組成物 |
| JP2001162510A (ja) * | 1999-09-30 | 2001-06-19 | Hoya Corp | 研磨方法並びに磁気記録媒体用ガラス基板の製造方法及び磁気記録媒体の製造方法 |
| JP2009173538A (ja) * | 2001-09-26 | 2009-08-06 | Hitachi Maxell Ltd | 非磁性板状粒子とその製造方法 |
| JP2006053965A (ja) * | 2004-08-10 | 2006-02-23 | Fuji Electric Device Technology Co Ltd | 磁気記録媒体用基板の製造方法並びにそれに用いる両面研磨装置及び基板研磨用キャリア |
| JP2008176843A (ja) * | 2007-01-17 | 2008-07-31 | Konica Minolta Opto Inc | 磁気記録媒体用基板、及び磁気記録媒体用基板の製造方法 |
| JP2011207626A (ja) * | 2009-06-04 | 2011-10-20 | Ohara Inc | 情報記録媒体用結晶化ガラス基板およびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| MY168037A (en) | 2018-10-11 |
| CN104011795A (zh) | 2014-08-27 |
| WO2013100154A1 (fr) | 2013-07-04 |
| CN104011795B (zh) | 2017-02-22 |
| JPWO2013100154A1 (ja) | 2015-05-11 |
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