JP5658457B2 - 低温重合性／硬化性ベンゾオキサジン含有処方物 - Google Patents

低温重合性／硬化性ベンゾオキサジン含有処方物 Download PDF

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Publication number
JP5658457B2
JP5658457B2 JP2009528704A JP2009528704A JP5658457B2 JP 5658457 B2 JP5658457 B2 JP 5658457B2 JP 2009528704 A JP2009528704 A JP 2009528704A JP 2009528704 A JP2009528704 A JP 2009528704A JP 5658457 B2 JP5658457 B2 JP 5658457B2
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Japan
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composition
composition according
group
benzoxazine
formula
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Expired - Fee Related
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JP2009528704A
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Japanese (ja)
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JP2010504386A5 (enExample
JP2010504386A (ja
Inventor
須藤　篤
篤 須藤
遠藤　剛
剛 遠藤
アンドレアス・ターデン
ライナー・シェーンフェルト
トーマス・フーヴァー
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Henkel AG and Co KGaA
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Henkel AG and Co KGaA
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Publication of JP2010504386A5 publication Critical patent/JP2010504386A5/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F10/00—Homopolymers and copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
JP2009528704A 2006-09-21 2007-09-18 低温重合性／硬化性ベンゾオキサジン含有処方物 Expired - Fee Related JP5658457B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06019761.3 2006-09-21
EP06019761 2006-09-21
PCT/EP2007/059814 WO2008034814A2 (en) 2006-09-21 2007-09-18 Benzoxazine-containing formulations polymerizable/curable at low temperature

Publications (3)

Publication Number Publication Date
JP2010504386A JP2010504386A (ja) 2010-02-12
JP2010504386A5 JP2010504386A5 (enExample) 2010-11-11
JP5658457B2 true JP5658457B2 (ja) 2015-01-28

Family

ID=38819382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009528704A Expired - Fee Related JP5658457B2 (ja) 2006-09-21 2007-09-18 低温重合性／硬化性ベンゾオキサジン含有処方物

Country Status (7)

Country Link
US (1) US8318878B2 (enExample)
EP (1) EP2064260B1 (enExample)
JP (1) JP5658457B2 (enExample)
CN (1) CN101516922B (enExample)
BR (1) BRPI0717583A2 (enExample)
ES (1) ES2550540T3 (enExample)
WO (1) WO2008034814A2 (enExample)

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WO2008034753A1 (en) * 2006-09-21 2008-03-27 Henkel Ag & Co. Kgaa Catalytic low temperature polymerization
WO2008145526A1 (en) 2007-05-25 2008-12-04 Henkel Ag & Co. Kgaa Benzoxazine-formulations with reduced outgassing behaviour
WO2009115488A1 (en) * 2008-03-19 2009-09-24 Henkel Ag & Co. Kgaa Copolymerization method
US8389758B2 (en) 2009-06-05 2013-03-05 3M Innovative Properties Company Benzoxazine-thiol adducts
US8383706B2 (en) 2009-06-05 2013-02-26 3M Innovative Properties Company Benzoxazine-thiol adducts
US20110054100A1 (en) * 2009-08-26 2011-03-03 3M Innovative Properties Company Polybenzoxazine composition
AU2010306807A1 (en) * 2009-10-15 2012-05-03 Henkel Corporation Anaerobically curable compositions
EP2336221A1 (en) * 2010-12-10 2011-06-22 Henkel AG & Co. KGaA Curable compositions
JP6273213B2 (ja) * 2012-02-17 2018-01-31 ハンツマン・アドバンスド・マテリアルズ・アメリカズ・エルエルシー ベンズオキサジン、エポキシ及び無水物の混合物
KR20160003641A (ko) * 2013-04-30 2016-01-11 쓰리엠 이노베이티브 프로퍼티즈 컴파니 폴리(벤족사진)의 제조 방법
WO2017072678A1 (en) 2015-10-26 2017-05-04 Oti Lumionics Inc. Method for patterning a coating on a surface and device including a patterned coating
JP6855482B2 (ja) 2015-12-16 2021-04-07 ソルベイ スペシャルティ ポリマーズ イタリー エス．ピー．エー． 多層アセンブリ
WO2017196805A1 (en) * 2016-05-10 2017-11-16 Huntsman Advanced Materials Americas Llc Benzothiazoles as latent catalysts for benzoxazine resins
CN106047270A (zh) * 2016-05-26 2016-10-26 合肥市田源精铸有限公司 一种可用于低温的金属胶黏剂及其制备方法
KR102383690B1 (ko) 2016-06-30 2022-04-06 코오롱인더스트리 주식회사 벤족사진계 혼합물, 및 이의 용도
WO2018051268A1 (en) * 2016-09-15 2018-03-22 3M Innovative Properties Company Benzoxazine composition
KR102802931B1 (ko) 2016-12-02 2025-05-08 오티아이 루미오닉스 인크. 방출 영역 위에 배치된 전도성 코팅을 포함하는 디바이스 및 이를 위한 방법
US11043636B2 (en) 2017-05-17 2021-06-22 Oti Lumionics Inc. Method for selectively depositing a conductive coating over a patterning coating and device including a conductive coating
CN108047870B (zh) * 2017-11-23 2019-11-22 中国航发北京航空材料研究院 一种用于钛合金紧固件外表面的防护涂料及其制备方法
US11751415B2 (en) 2018-02-02 2023-09-05 Oti Lumionics Inc. Materials for forming a nucleation-inhibiting coating and devices incorporating same
KR102868464B1 (ko) 2018-05-07 2025-10-10 오티아이 루미오닉스 인크. 보조 전극을 제공하는 방법 및 보조 전극을 포함하는 장치
CN112889162A (zh) 2018-11-23 2021-06-01 Oti照明公司 包括光透射区域的光电装置
WO2020169785A1 (en) 2019-02-22 2020-08-27 Universitat Autonoma De Barcelona Process for polymerizing 1,3-benzoxazines
CN116456753A (zh) 2019-03-07 2023-07-18 Oti照明公司 一种光电子器件
CN113950630A (zh) 2019-04-18 2022-01-18 Oti照明公司 用于形成成核抑制涂层的材料和结合所述成核抑制涂层的装置
US12069938B2 (en) 2019-05-08 2024-08-20 Oti Lumionics Inc. Materials for forming a nucleation-inhibiting coating and devices incorporating same
CN114097102B (zh) 2019-06-26 2023-11-03 Oti照明公司 包括具有光衍射特征的光透射区域的光电设备
KR102915293B1 (ko) 2019-08-09 2026-01-21 오티아이 루미오닉스 인크. 보조 전극 및 파티션을 포함하는 광전자 디바이스
JP7403883B2 (ja) 2019-12-24 2023-12-25 オーティーアイ ルミオニクス インコーポレーテッド キャッピング層を含む発光デバイスおよびそれを製造するための方法
JP2023553379A (ja) 2020-12-07 2023-12-21 オーティーアイ ルミオニクス インコーポレーテッド 核形成抑制被膜及び下地金属被膜を用いた導電性堆積層のパターニング

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Also Published As

Publication number Publication date
US8318878B2 (en) 2012-11-27
WO2008034814A3 (en) 2008-07-03
CN101516922B (zh) 2013-03-06
JP2010504386A (ja) 2010-02-12
WO2008034814A2 (en) 2008-03-27
BRPI0717583A2 (pt) 2013-10-29
CN101516922A (zh) 2009-08-26
EP2064260A2 (en) 2009-06-03
US20100144964A1 (en) 2010-06-10
ES2550540T3 (es) 2015-11-10
EP2064260B1 (en) 2015-08-26

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