JP5656405B2 - スライディング手法を用いるウェーハの仮接合のための、高温およびスピンオン接合用組成物 - Google Patents
スライディング手法を用いるウェーハの仮接合のための、高温およびスピンオン接合用組成物 Download PDFInfo
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- JP5656405B2 JP5656405B2 JP2009531520A JP2009531520A JP5656405B2 JP 5656405 B2 JP5656405 B2 JP 5656405B2 JP 2009531520 A JP2009531520 A JP 2009531520A JP 2009531520 A JP2009531520 A JP 2009531520A JP 5656405 B2 JP5656405 B2 JP 5656405B2
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Description
本発明は、米陸軍研究開発技術司令部によって与えられた契約番号W911SR‐05‐C‐0019に基づく政府の支援の下でなされた。米国政府は、本発明において特定の権利を有する。
本出願は、2006年10月6日に出願された、スライディング手法を用いるウェーハの仮接合用の、高温およびスピンオン接着剤と題する米国仮特許出願第60/828,572号の優先権の利益を主張するものであり、上記仮特許出願の開示全体を、参照により本明細書に組み込む。
各種セルロース誘導体(イーストマンケミカル社、テネシー州、キングズポート(Eastman Chemical Company,Kingsport,TN)から入手)を、適した溶媒に溶解することにより配合物を調製した。使用した正確な物質および量を表Iに示す。
シクロオレフィン樹脂およびポリ(α‐ピネン)の混合物
D‐リモネン(フロリダケミカル社(Florida Chemical Company)から入手)に、Zeonex 480R樹脂(ゼオンケミカルズ、ケンタッキー州、ルーイビル(Zeon Chemicals,Louisville,KY)から入手)および/またはポリ(α‐ピネン)(アルドリッチ、ウィスコンシン州、ミルウォーキー(Aldrich,Milwaukee,WI)から入手)および/またはポリ(β‐ピネン)(アルドリッチ、ウィスコンシン州、ミルウォーキー(Aldrich,Milwaukee,WI)から入手)を溶解することにより配合物を調製した。ビス(トリメトキシシリルエチル)ベンゼン(アルドリッチ、ウィスコンシン州、ミルウォーキー(Aldrich,Milwaukee,WI)から入手)を接着促進剤として加えた。上記配合物の正確な組成を表IIに示す。
シクロオレフィン樹脂およびロジンエステルの混合物
Zeonex 480R樹脂およびEastotac H142W(イーストマンケミカル社、テネシー州、キングズポート(Eastman Chemicals,Kingsport,TN)から入手)を適した溶媒に溶解することにより、配合物を調製した。高温での熱酸化を防ぐために、Irganox(R)1010およびIrgafos(R)168(チバ スペシャルティ ケミカルズ、ニューヨーク州、タリタウン(Ciba Specialty Chemicals,Tarrytown,NY)から入手)を、上記配合物のうちの1つに加えた。ディウェッティング(脱濡れ)(de‐wetting)の問題を軽減するために、Triton X‐100(R)(アルドリッチ、ウィスコンシン州、ミルウォーキー(Aldrich,Milwaukee,WI)から入手)を加えた。また、接着を促進するために、ビス(トリメトキシシリルエチル)ベンゼンを加えた。上記配合物の正確な組成を表IIIに示す。
EPDMゴムおよびロジンエステルの混合物
異なるグレード(grade)のエチレンプロピレンジエンモノマーゴム(EPDMゴム:ランクセス株式会社、ペンシルベニア州、ピッツバーグ(Lanxess,Inc.,Pittsburgh,PA)から入手されるBuna EP T6250、およびVistalon 2504、エクソンモービル ケミカル、テキサス州、ヒューストン(Exxon‐Mobil Chemical,Houston,TX))およびEastotac H142Wを、適した溶媒に溶解することにより配合物を調製した。4つの配合物のうちの3つに、酸化防止剤であるIrganox(R)1010を加えた。上記配合物の正確な組成を表IVに示す。
塗布、接合および剥離
実施例1〜4の配合物について、様々な基板ウェーハ上へのスピンコーティングを行った。ベーキングを行い、溶媒を蒸発させて、上記接合用組成物をリフローさせた後、第2のウェーハを、加圧することにより、コーティングされた各ウェーハに接合した。これらの接合用組成物を用いたウェーハの仮接合の手順を、図2のフローチャートに示す。接合されたウェーハについて、機械的強度、熱安定性、耐薬品性の試験を行った。上記ウェーハについて、許容範囲内の温度で、それらのウェーハを離すように手動でスライドさせることによって剥離試験を行った。
接合用組成物の解析
試料1.4、2.2、3.4および4.4の組成物は、レオロジー解析により、ウェーハの仮接合のための好適な材料であると確認された。試料1.4、2.4、3.4および4.4に関するこれらの結果を、それぞれ、図3、4、5および6に示す。これらの材料の粘度値およびモジュラス値を表Vに示す。これらの材料は、剥離試験に成功した。上記の4つの組成物について、以下に記載するように、熱安定性および耐薬品性を更に検討した。
Claims (46)
- 溶媒系に溶解または分散されたポリマーを含有する接合用組成物で形成される接合層を介して接合された、第1の基板と第2の基板とを含むスタックを提供し、前記接合層が粘着付与剤およびゴム、スチレン−イソプレン−スチレン、スチレン−ブタジエン−スチレン、ハロゲン化ブチルゴムおよびこれらの混合物からなる群から選択される化合物を含む接合用組成物を含み、前記組成物は溶媒系に分散または溶解され、前記組成物の全質量を100質量%として30質量%以上の溶媒系を含有する、前記スタックを少なくとも190℃の温度に曝して前記接合層を軟化させ、
前記第1の基板および前記第2の基板の少なくとも一方に力を印加すると同時に、前記第1の基板および前記第2の基板の他方を、前記力に耐えられるようにすることを含み、前記力は、前記第1の基板と前記第2の基板とを分離するに足る十分な量で印加され、
前記第1の基板が、第1の面と、前記第1の面から離れており、かつ、少なくとも1つの活性部位および/または複数の凹凸形状を含む第2の面とを有し、前記接合層が、前記第2の面に接合されるウェーハの接合方法。 - 前記スタックが、前記第1の基板および前記第2の基板の両方を通る軸を有し、前記力が、前記軸に対して横方向に印加される請求項1に記載の方法。
- 前記力を印加することが、前記第1の基板および前記第2の基板の少なくとも一方を、前記第1の基板および前記第2の基板の他方から離れる方向に持ち上げることを含む請求項1に記載の方法。
- 更に、前記スタックを少なくとも190℃の温度に曝す前に、前記基板の一方を薄化することを含む請求項1に記載の方法。
- 更に、前記スタックを少なくとも190℃の温度に曝す前に、前記スタックに、裏面研削、金属被覆、パターニングおよびそれらの組み合わせからなる群から選択される処理を施すことを含む請求項1に記載の方法。
- 前記化合物の少なくとも95質量%が、非極性溶媒に可溶である請求項1に記載の方法。
- 前記組成物が、更に、接着促進剤、酸化防止剤、界面活性剤およびそれらの混合物からなる群から選択される成分を含有する請求項1に記載の方法。
- 前記第2の基板が、前記接合層に接合される接合面を含む請求項1に記載の方法。
- 前記凹凸形状が、前記第1の基板の前記第1の面から離れている各端面を成し、前記端面の少なくとも1つが、前記端面の他の面よりも、前記第1の基板の前記第1の面から更に離れており、前記更に離れている端面が、前記第1の面に平行な平面を規定しており、
前記平面から前記第2の基板上の前記接合面までの距離が、前記平面および第2の基板の接合面の全域で、10%未満、変化する請求項8に記載の方法。 - 前記第1の基板が、
第1の面と、前記第1の面から離れている第2の面とを有し、
前記第2の面上に、少なくとも1つの活性部位と複数の凹凸形状とを含み、
微小電気機械システム装置、表示装置、フレキシブル基板、化合物半導体、低誘電率の誘電体層、誘電体層、イオン注入層、およびシリコン、アルミニウム、タングステン、ケイ化タングステン、ヒ化ガリウム、ゲルマニウム、タンタル、亜硝酸タンタル、SiGe、およびそれらの混合物を含む基板からなる群から選択される請求項1に記載の方法。 - 前記第2の基板が、サファイア、セラミック、ガラス、石英、アルミニウム、銀およびシリコンからなる群から選択される材料を含むキャリアウェーハを含む請求項1に記載の方法。
- 前記スタックを提供することが、 前記接合用組成物を、前記第1の基板および前記第2の基板の一方に塗布して、接合用組成物で被覆された基板と、接合用組成物を含まない基板とを形成することと、 前記接合用組成物を含まない基板を、前記接合用組成物で被覆された基板と接触させて、それらの基板を接合することを含む請求項1に記載の方法。
- 前記塗布することが、前記接合用組成物を、前記第1の基板および前記第2の基板の一方にスピンコーティングすることを含む請求項12に記載の方法。
- 前記接触させることが、前記基板に加圧することを含む請求項12に記載の方法。
- 裏面と、少なくとも1つの活性部位および複数の凹凸形状を含む活性面とを有する第1の基板と、
接合面を有する第2の基板と、
前記活性面と前記接合面とに接合される熱可塑性接合層とを含む物品であって、
前記熱可塑性接合層が粘着付与剤およびゴム、スチレン−イソプレン−スチレン、スチレン−ブタジエン−スチレン、ハロゲン化ブチルゴムおよびこれらの混合物からなる群から選択される化合物を含む接合用組成物を含み、粘着付与剤および前記化合物は溶媒系に溶解または分散していて、組成物の全量を100質量%として接合組成物は30質量%以上の溶媒系を含み、
前記第1の基板が、第1の面と、前記第1の面から離れており、かつ、少なくとも1つの活性部位および/または複数の凹凸形状を含む第2の面とを有し、前記接合層が、前記第2の面に接合されるウェーハ、
前記凹凸形状は、前記第1の基板の前記裏面から離れている各端面を成し、前記端面の少なくとも1つは、前記端面の他の面よりも、前記第1の基板の前記裏面から更に離れており、前記更に離れている端面は、前記第1の面に平行な平面を規定しており、
前記平面から前記第2の基板上の前記接合面までの距離は、前記平面および第2の基板の接合面に沿って、5%未満、変化する物品。 - 前記接合層が、
前記活性面から前記接合面までの距離として規定される厚さを有し、
前記厚さの全域にわたって同一の組成物を含有する請求項15に記載の物品。 - 前記化合物の少なくとも95質量%が、非極性溶媒に可溶である請求項16に記載の物品。
- 前記組成物が、更に、粘着付与剤、接着促進剤、酸化防止剤、界面活性剤およびそれらの混合物からなる群から選択される成分を含有する請求項16に記載の物品。
- 前記第1の基板が、微小電気機械システム装置、表示装置、フレキシブル基板、化合物半導体、低誘電率の誘電体層、誘電体層、イオン注入層、およびシリコン、アルミニウム、タングステン、ケイ化タングステン、ヒ化ガリウム、ゲルマニウム、タンタル、亜硝酸タンタル、SiGe、およびそれらの混合物を含む基板からなる群から選択される請求項15に記載の物品。
- 前記第2の基板が、サファイア、セラミック、ガラス、石英、アルミニウム、銀およびシリコンからなる群から選択される材料を含む請求項15に記載の物品。
- 前記接合層が、少なくとも190℃の軟化温度を有する請求項15に記載の物品。
- 溶媒系に溶解または分散された、ポリマーとポリ(ピネン)とを含有し、前記ポリマーが、シクロオレフィン類を有する繰り返しモノマーを含む組成物。
- 前記組成物が、該組成物の総質量を100質量%として、5質量%から50質量%の前記ポリマーと、50質量%から95質量%の前記ピネンとを含有する請求項22に記載の組成物。
- 前記ピネンが、α‐ピネンおよびβ‐ピネンからなる群から選択される請求項22に記載の組成物。
- 前記溶媒系が、リモネンを含有し、前記組成物が、更に、接着促進剤を含有する請求項22に記載の組成物。
- 粘着付与剤と、シクロオレフィン類を有する繰り返しモノマーを含むポリマーとを含有する、流動性を有する接合用組成物であって、前記粘着付与剤および前記ポリマーは、溶媒系に分散または溶解され、前記組成物は、該組成物の総質量を100質量%として、少なくとも30質量%の溶媒系を含む、流動性を有する接合用組成物。
- 前記粘着付与剤が、炭化水素樹脂である請求項26に記載の組成物。
- 前記溶媒系が、リモネン、メシチレン、キシレン、ドデセン、プロピレングリコールモノメチルエーテル、メチルイソアミルケトン、エチルアセトアセテートおよびそれらの混合物からなる群から選択される溶媒を含有する請求項26に記載の組成物。
- 前記組成物が、更に、酸化防止剤、界面活性剤、接着促進剤およびそれらの混合物からなる群から選択される成分を含有する請求項26に記載の組成物。
- 前記成分が、酸化防止剤を含有し、前記酸化防止剤が、フェノール系酸化防止剤およびホスファイト系酸化防止剤からなる群から選択される請求項29に記載の組成物。
- 前記組成物が、本質的に、発泡剤および起泡剤を含有しない請求項26に記載の組成物。
- 前記組成物が、本質的に、架橋剤を含有しない請求項26に記載の組成物。
- 前記組成物が、35MU未満のムーニー粘度を有する請求項26に記載の組成物。
- 前記組成物が、250℃で1,000ポアズ未満の粘度を有する請求項26に記載の組成物。
- 粘着付与剤と、
ゴム類、スチレン‐イソプレン‐スチレン、スチレン‐ブタジエン‐スチレン、ハロゲン化ブチルゴムおよびそれらの混合物からなる群から選択される化合物とを含有する、流動性を有する接合用組成物であって、
前記粘着付与剤および化合物は、溶媒系に分散または溶解され、前記組成物は、該組成物の総質量を100質量%として、少なくとも30質量%の溶媒系を含有する、流動性を有する接合用組成物。 - 前記組成物が、更に、シクロオレフィン類を有する繰り返しモノマーを含むポリマーを含有する請求項35に記載の組成物。
- 前記化合物が、エチレンプロピレンターポリマー、エチレンプロピレンジエンモノマーおよびそれらの混合物からなる群から選択されるゴムである請求項35に記載の組成物。
- 前記粘着付与剤が、炭化水素樹脂である請求項37に記載の組成物。
- 前記溶媒系が、リモネン、メシチレン、キシレン、ドデセン、プロピレングリコールモノメチルエーテル、メチルイソアミルケトン、エチルアセトアセテートおよびそれらの混合物からなる群から選択される溶媒を含有する請求項35に記載の組成物。
- 前記組成物が、更に、酸化防止剤、界面活性剤、接着促進剤およびそれらの混合物からなる群から選択される成分を含有する請求項35に記載の組成物。
- 前記成分が、酸化防止剤を含有し、前記酸化防止剤が、フェノール系酸化防止剤およびホスファイト系酸化防止剤からなる群から選択される請求項40に記載の組成物。
- 前記組成物が、本質的に、発泡剤および起泡剤を含有しない請求項35に記載の組成物。
- 前記組成物が、本質的に、架橋剤を含有しない請求項35に記載の組成物。
- 前記組成物が、35MU未満のムーニー粘度を有する請求項35に記載の組成物。
- 前記組成物が、250℃で1,000ポアズ未満の粘度を有する請求項35に記載の組成物。
- 前記接合用組成物がさらにシクロオレフィンを有する繰り返しモノマーを含むポリマーを含有する請求項1〜14のいずれか1項に記載のウェーハの接合方法。
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US8268449B2 (en) * | 2006-02-06 | 2012-09-18 | Brewer Science Inc. | Thermal- and chemical-resistant acid protection coating material and spin-on thermoplastic adhesive |
US20080200011A1 (en) * | 2006-10-06 | 2008-08-21 | Pillalamarri Sunil K | High-temperature, spin-on, bonding compositions for temporary wafer bonding using sliding approach |
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2007
- 2007-06-14 US US11/763,253 patent/US20080200011A1/en not_active Abandoned
- 2007-09-21 SG SG2011072709A patent/SG175589A1/en unknown
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- 2007-09-21 KR KR1020097008585A patent/KR101477307B1/ko active IP Right Grant
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- 2007-09-21 WO PCT/US2007/079204 patent/WO2008045669A1/en active Application Filing
- 2007-09-28 TW TW096136190A patent/TWI508218B/zh active
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP7305308B2 (ja) | 2018-04-25 | 2023-07-10 | プレス工業株式会社 | アクスルケース構造 |
Also Published As
Publication number | Publication date |
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CN101523566B (zh) | 2011-10-05 |
KR101477307B1 (ko) | 2014-12-29 |
EP2078306A1 (en) | 2009-07-15 |
CN102167875B (zh) | 2013-08-07 |
US20100206479A1 (en) | 2010-08-19 |
WO2008045669A1 (en) | 2008-04-17 |
SG175589A1 (en) | 2011-11-28 |
JP2010506406A (ja) | 2010-02-25 |
CN101523566A (zh) | 2009-09-02 |
CN102167875A (zh) | 2011-08-31 |
US20080200011A1 (en) | 2008-08-21 |
TW200834795A (en) | 2008-08-16 |
TWI508218B (zh) | 2015-11-11 |
EP2078306B1 (en) | 2019-06-05 |
US9728439B2 (en) | 2017-08-08 |
KR20090064467A (ko) | 2009-06-18 |
EP2078306A4 (en) | 2012-11-07 |
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