JP5654588B2 - 電極およびその製造方法 - Google Patents

電極およびその製造方法 Download PDF

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Publication number
JP5654588B2
JP5654588B2 JP2012517905A JP2012517905A JP5654588B2 JP 5654588 B2 JP5654588 B2 JP 5654588B2 JP 2012517905 A JP2012517905 A JP 2012517905A JP 2012517905 A JP2012517905 A JP 2012517905A JP 5654588 B2 JP5654588 B2 JP 5654588B2
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JP
Japan
Prior art keywords
electrode
photosensitive paste
boron
weight
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012517905A
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English (en)
Japanese (ja)
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JP2012532420A (ja
JP2012532420A5 (cg-RX-API-DMAC7.html
Inventor
黒木　正勝
正勝 黒木
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EIDP Inc
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EI Du Pont de Nemours and Co
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Publication of JP2012532420A5 publication Critical patent/JP2012532420A5/ja
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Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/14—Conductive material dispersed in non-conductive inorganic material
    • H01B1/16—Conductive material dispersed in non-conductive inorganic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/14—Solid thermionic cathodes characterised by the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/22—Electrodes, e.g. special shape, material or configuration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20—Constructional details
    • H01J2211/22—Electrodes
    • H01J2211/225—Material of electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Conductive Materials (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Transforming Electric Information Into Light Information (AREA)
  • Materials For Photolithography (AREA)
JP2012517905A 2009-07-02 2010-07-01 電極およびその製造方法 Expired - Fee Related JP5654588B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/496,920 2009-07-02
US12/496,920 US8129088B2 (en) 2009-07-02 2009-07-02 Electrode and method for manufacturing the same
PCT/US2010/040719 WO2011002964A1 (en) 2009-07-02 2010-07-01 Electrode and method of manufacturing the same

Publications (3)

Publication Number Publication Date
JP2012532420A JP2012532420A (ja) 2012-12-13
JP2012532420A5 JP2012532420A5 (cg-RX-API-DMAC7.html) 2013-07-18
JP5654588B2 true JP5654588B2 (ja) 2015-01-14

Family

ID=42537876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012517905A Expired - Fee Related JP5654588B2 (ja) 2009-07-02 2010-07-01 電極およびその製造方法

Country Status (7)

Country Link
US (1) US8129088B2 (cg-RX-API-DMAC7.html)
EP (1) EP2449571A1 (cg-RX-API-DMAC7.html)
JP (1) JP5654588B2 (cg-RX-API-DMAC7.html)
KR (1) KR20120032551A (cg-RX-API-DMAC7.html)
CN (1) CN102473563B (cg-RX-API-DMAC7.html)
TW (1) TW201115593A (cg-RX-API-DMAC7.html)
WO (1) WO2011002964A1 (cg-RX-API-DMAC7.html)

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US20110083874A1 (en) * 2009-10-09 2011-04-14 E. I. Du Pont De Nemours And Company Electrode and method for manufacturing the same
US8728355B2 (en) * 2011-01-14 2014-05-20 E. I. Du Pont De Nemours And Company Electrode and method for manufacturing the same
US8709294B2 (en) * 2011-01-28 2014-04-29 E. I. Du Pont De Nemours And Company Electrode and method for manufacturing the same
US8647815B1 (en) 2012-07-26 2014-02-11 E I Du Pont De Nemours And Company Method of manufacturing copper electrode
US10015887B2 (en) 2013-02-18 2018-07-03 Orbotech Ltd. Two-step, direct-write laser metallization
US10622244B2 (en) 2013-02-18 2020-04-14 Orbotech Ltd. Pulsed-mode direct-write laser metallization
US10537027B2 (en) 2013-08-02 2020-01-14 Orbotech Ltd. Method producing a conductive path on a substrate
US20150197645A1 (en) * 2014-01-16 2015-07-16 E I Du Pont De Nemours And Company Method of manufacturing non-firing type electrode
CN106663493A (zh) * 2014-08-28 2017-05-10 E.I.内穆尔杜邦公司 含铜导电浆料和由含铜导电浆料制成的电极
DE112014006903B4 (de) 2014-08-28 2022-07-21 Solar Paste, Llc Solarzellen mit Kupferelektroden
DE112014006910B4 (de) 2014-08-28 2024-11-28 Solar Paste, Llc Kupferhaltige leitfähige Pasten
WO2016063270A1 (en) 2014-10-19 2016-04-28 Orbotech Ltd. Llift printing of conductive traces onto a semiconductor substrate
KR101972676B1 (ko) 2014-11-10 2019-04-25 다이켄카가쿠 코교 가부시키가이샤 대기 분위기 소성용 도전성 페이스트 및 그 제조 방법
EP3247816A4 (en) 2015-01-19 2018-01-24 Orbotech Ltd. Printing of three-dimensional metal structures with a sacrificial support
US9966480B2 (en) * 2015-04-28 2018-05-08 Samsung Sdi Co., Ltd. Electrode composition, electrode manufactured using the same, and solar cell
EP3377290B1 (en) 2015-11-22 2023-08-02 Orbotech Ltd. Control of surface properties of printed three-dimensional structures
TW201901887A (zh) 2017-05-24 2019-01-01 以色列商奧寶科技股份有限公司 於未事先圖樣化基板上電器互連電路元件
US10515737B2 (en) * 2017-10-12 2019-12-24 Korea Electronics Technology Institute Conductive paste composition, method for preparing the composition and electrode formed by the composition
KR102367611B1 (ko) * 2017-10-12 2022-02-25 한국전자기술연구원 전도성 페이스트 조성물, 이의 제조방법 및 이로부터 형성된 전극
KR102367615B1 (ko) * 2017-10-12 2022-02-25 한국전자기술연구원 전도성 페이스트 조성물, 이의 제조방법 및 이로부터 형성된 전극
KR102608305B1 (ko) * 2021-11-25 2023-11-30 한국화학연구원 포지티브형 감광성 페이스트 조성물과, 이를 이용한 전도성 패턴이 마련된 전극 및 그 제조방법

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KR100852705B1 (ko) 2006-09-15 2008-08-19 삼성에스디아이 주식회사 전극 형성용 조성물과 이로부터 제조되는 플라즈마디스플레이 패널
US7887992B2 (en) * 2008-12-23 2011-02-15 E. I. Du Pont De Nemours And Company Photosensitive paste and process for production of pattern using the same

Also Published As

Publication number Publication date
KR20120032551A (ko) 2012-04-05
JP2012532420A (ja) 2012-12-13
WO2011002964A1 (en) 2011-01-06
US20110003246A1 (en) 2011-01-06
CN102473563B (zh) 2014-07-23
US8129088B2 (en) 2012-03-06
TW201115593A (en) 2011-05-01
EP2449571A1 (en) 2012-05-09
CN102473563A (zh) 2012-05-23

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