JP2012532420A5 - - Google Patents

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Publication number
JP2012532420A5
JP2012532420A5 JP2012517905A JP2012517905A JP2012532420A5 JP 2012532420 A5 JP2012532420 A5 JP 2012532420A5 JP 2012517905 A JP2012517905 A JP 2012517905A JP 2012517905 A JP2012517905 A JP 2012517905A JP 2012532420 A5 JP2012532420 A5 JP 2012532420A5
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JP
Japan
Prior art keywords
photosensitive paste
boron powder
powder
electrode
organic
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JP2012517905A
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English (en)
Japanese (ja)
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JP2012532420A (ja
JP5654588B2 (ja
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Publication date
Priority claimed from US12/496,920 external-priority patent/US8129088B2/en
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Publication of JP2012532420A publication Critical patent/JP2012532420A/ja
Publication of JP2012532420A5 publication Critical patent/JP2012532420A5/ja
Application granted granted Critical
Publication of JP5654588B2 publication Critical patent/JP5654588B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012517905A 2009-07-02 2010-07-01 電極およびその製造方法 Expired - Fee Related JP5654588B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/496,920 2009-07-02
US12/496,920 US8129088B2 (en) 2009-07-02 2009-07-02 Electrode and method for manufacturing the same
PCT/US2010/040719 WO2011002964A1 (en) 2009-07-02 2010-07-01 Electrode and method of manufacturing the same

Publications (3)

Publication Number Publication Date
JP2012532420A JP2012532420A (ja) 2012-12-13
JP2012532420A5 true JP2012532420A5 (cg-RX-API-DMAC7.html) 2013-07-18
JP5654588B2 JP5654588B2 (ja) 2015-01-14

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012517905A Expired - Fee Related JP5654588B2 (ja) 2009-07-02 2010-07-01 電極およびその製造方法

Country Status (7)

Country Link
US (1) US8129088B2 (cg-RX-API-DMAC7.html)
EP (1) EP2449571A1 (cg-RX-API-DMAC7.html)
JP (1) JP5654588B2 (cg-RX-API-DMAC7.html)
KR (1) KR20120032551A (cg-RX-API-DMAC7.html)
CN (1) CN102473563B (cg-RX-API-DMAC7.html)
TW (1) TW201115593A (cg-RX-API-DMAC7.html)
WO (1) WO2011002964A1 (cg-RX-API-DMAC7.html)

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US20110083874A1 (en) * 2009-10-09 2011-04-14 E. I. Du Pont De Nemours And Company Electrode and method for manufacturing the same
US8728355B2 (en) * 2011-01-14 2014-05-20 E. I. Du Pont De Nemours And Company Electrode and method for manufacturing the same
US8709294B2 (en) * 2011-01-28 2014-04-29 E. I. Du Pont De Nemours And Company Electrode and method for manufacturing the same
US8647815B1 (en) 2012-07-26 2014-02-11 E I Du Pont De Nemours And Company Method of manufacturing copper electrode
US10015887B2 (en) 2013-02-18 2018-07-03 Orbotech Ltd. Two-step, direct-write laser metallization
US10622244B2 (en) 2013-02-18 2020-04-14 Orbotech Ltd. Pulsed-mode direct-write laser metallization
US10537027B2 (en) 2013-08-02 2020-01-14 Orbotech Ltd. Method producing a conductive path on a substrate
US20150197645A1 (en) * 2014-01-16 2015-07-16 E I Du Pont De Nemours And Company Method of manufacturing non-firing type electrode
CN106663493A (zh) * 2014-08-28 2017-05-10 E.I.内穆尔杜邦公司 含铜导电浆料和由含铜导电浆料制成的电极
DE112014006903B4 (de) 2014-08-28 2022-07-21 Solar Paste, Llc Solarzellen mit Kupferelektroden
DE112014006910B4 (de) 2014-08-28 2024-11-28 Solar Paste, Llc Kupferhaltige leitfähige Pasten
WO2016063270A1 (en) 2014-10-19 2016-04-28 Orbotech Ltd. Llift printing of conductive traces onto a semiconductor substrate
KR101972676B1 (ko) 2014-11-10 2019-04-25 다이켄카가쿠 코교 가부시키가이샤 대기 분위기 소성용 도전성 페이스트 및 그 제조 방법
EP3247816A4 (en) 2015-01-19 2018-01-24 Orbotech Ltd. Printing of three-dimensional metal structures with a sacrificial support
US9966480B2 (en) * 2015-04-28 2018-05-08 Samsung Sdi Co., Ltd. Electrode composition, electrode manufactured using the same, and solar cell
EP3377290B1 (en) 2015-11-22 2023-08-02 Orbotech Ltd. Control of surface properties of printed three-dimensional structures
TW201901887A (zh) 2017-05-24 2019-01-01 以色列商奧寶科技股份有限公司 於未事先圖樣化基板上電器互連電路元件
US10515737B2 (en) * 2017-10-12 2019-12-24 Korea Electronics Technology Institute Conductive paste composition, method for preparing the composition and electrode formed by the composition
KR102367611B1 (ko) * 2017-10-12 2022-02-25 한국전자기술연구원 전도성 페이스트 조성물, 이의 제조방법 및 이로부터 형성된 전극
KR102367615B1 (ko) * 2017-10-12 2022-02-25 한국전자기술연구원 전도성 페이스트 조성물, 이의 제조방법 및 이로부터 형성된 전극
KR102608305B1 (ko) * 2021-11-25 2023-11-30 한국화학연구원 포지티브형 감광성 페이스트 조성물과, 이를 이용한 전도성 패턴이 마련된 전극 및 그 제조방법

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JP2007012371A (ja) * 2005-06-29 2007-01-18 E I Du Pont De Nemours & Co 導電組成物およびプラズマディスプレイの背面基板の製造方法
US7655864B2 (en) * 2006-07-13 2010-02-02 E.I Du Pont De Nemours And Company Photosensitive conductive paste for electrode formation and electrode
KR100829667B1 (ko) * 2006-09-07 2008-05-16 엘지전자 주식회사 전극용 페이스트 조성물, 이를 이용하여 제조된 플라즈마디스플레이 패널의 상판구조 및 그 제조방법
KR100852705B1 (ko) 2006-09-15 2008-08-19 삼성에스디아이 주식회사 전극 형성용 조성물과 이로부터 제조되는 플라즈마디스플레이 패널
US7887992B2 (en) * 2008-12-23 2011-02-15 E. I. Du Pont De Nemours And Company Photosensitive paste and process for production of pattern using the same

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