JP5617371B2 - 反りを抑えた基板、それを用いた発光装置及びそれらの製造方法 - Google Patents
反りを抑えた基板、それを用いた発光装置及びそれらの製造方法 Download PDFInfo
- Publication number
- JP5617371B2 JP5617371B2 JP2010140333A JP2010140333A JP5617371B2 JP 5617371 B2 JP5617371 B2 JP 5617371B2 JP 2010140333 A JP2010140333 A JP 2010140333A JP 2010140333 A JP2010140333 A JP 2010140333A JP 5617371 B2 JP5617371 B2 JP 5617371B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- manufacturing
- temperature
- heating
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 144
- 238000004519 manufacturing process Methods 0.000 title claims description 41
- 239000011521 glass Substances 0.000 claims description 68
- 239000000919 ceramic Substances 0.000 claims description 56
- 238000000034 method Methods 0.000 claims description 45
- 238000010438 heat treatment Methods 0.000 claims description 43
- 238000006243 chemical reaction Methods 0.000 claims description 41
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 39
- 150000002902 organometallic compounds Chemical class 0.000 claims description 32
- 238000003825 pressing Methods 0.000 claims description 32
- 239000010954 inorganic particle Substances 0.000 claims description 27
- 230000008569 process Effects 0.000 claims description 26
- 229910052604 silicate mineral Inorganic materials 0.000 claims description 24
- 229920000592 inorganic polymer Polymers 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 239000011259 mixed solution Substances 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 10
- -1 siloxane compound Chemical class 0.000 claims description 10
- 229920001709 polysilazane Polymers 0.000 claims description 6
- 229910021647 smectite Inorganic materials 0.000 claims description 6
- 239000002734 clay mineral Substances 0.000 claims description 5
- 229910010272 inorganic material Inorganic materials 0.000 claims description 5
- 239000011147 inorganic material Substances 0.000 claims description 5
- 150000002736 metal compounds Chemical class 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 53
- 239000002243 precursor Substances 0.000 description 25
- 239000000243 solution Substances 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 16
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000002245 particle Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 239000010419 fine particle Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 230000000630 rising effect Effects 0.000 description 5
- 230000005284 excitation Effects 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 150000007942 carboxylates Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 239000002223 garnet Substances 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 230000008719 thickening Effects 0.000 description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- PZHIWRCQKBBTOW-UHFFFAOYSA-N 1-ethoxybutane Chemical compound CCCCOCC PZHIWRCQKBBTOW-UHFFFAOYSA-N 0.000 description 1
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- CYPPCCJJKNISFK-UHFFFAOYSA-J kaolinite Chemical group [OH-].[OH-].[OH-].[OH-].[Al+3].[Al+3].[O-][Si](=O)O[Si]([O-])=O CYPPCCJJKNISFK-UHFFFAOYSA-J 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Led Device Packages (AREA)
- Led Devices (AREA)
- Manufacturing & Machinery (AREA)
Description
(有機金属化合物)
(無機ポリマー)
(R1R2SiNR3)n (1)
式(1)において、R1〜R3は、それぞれ独立して水素原子又はアルキル基、アリール基、ビニル基、シクロアルキル基を表し、R1〜R3のうち少なくとも1つは水素原子であり、全てが水素原子である場合がパーハイドロポリシラザンである。nは1〜60の整数である。
(蛍光体)
(層状ケイ酸塩鉱物)
(無機粒子)
(前駆体溶液)
(発光装置の製造方法)
(蛍光体の調製例)
(ガラス基板)
(セラミック層を有する基板の作製)
3 LED素子(発光素子)
5 ガラス基板
6 波長変換部
100、101 発光装置
Claims (14)
- セラミック層を有する基板の製造方法において、
片面に、有機金属化合物又は無機ポリマーと、溶媒と、蛍光体と、無機粒子と、層状ケイ酸塩鉱物と、水とを含む混合液が塗布された基板を、反りを抑える方向に押圧しながら加熱する工程を有することを特徴とする基板の製造方法。 - 昇温過程、保温過程及び降温過程の全過程において前記反りを抑える方向に押圧することを特徴とする請求項1記載の基板の製造方法。
- 前記基板が、透光性の無機材料であることを特徴とする請求項1又は2記載の基板の製造方法。
- 前記有機金属化合物が、有機シロキサン化合物であることを特徴とする請求項1〜3の何れかに記載の基板の製造方法。
- 前記無機ポリマーが、パーハイドロポリシラザンであることを特徴とする請求項1〜3の何れかに記載の基板の製造方法。
- 前記層状ケイ酸塩鉱物が、膨潤性粘土鉱物であることを特徴とする請求項1〜5の何れかに記載の基板の製造方法。
- 前記膨潤性粘土鉱物が、スメクタイト構造であることを特徴とする請求項6記載の基板の製造方法。
- 前記押圧の圧力を前記基板の厚みで除した値が、106〜109Pa/mであることを特徴とする請求項1〜7の何れかに記載の基板の製造方法。
- 前記基板の加熱条件は、昇温過程及び降温過程が10〜1000℃/時の温度変化であることを特徴とする請求項1〜8の何れかに記載の基板の製造方法。
- 前記基板の加熱温度が、150〜700℃であることを特徴とする請求項1〜9の何れかに記載の基板の製造方法。
- 前記基板がガラスである場合、前記基板の加熱温度が、150℃〜屈伏温度+100℃であることを特徴とする請求項1〜10の何れかに記載の基板の製造方法。
- 請求項1〜11の何れかに記載の基板の製造方法によって製造された基板。
- 有機金属化合物又は無機ポリマーと、溶媒と、蛍光体と、無機粒子と、層状ケイ酸塩鉱物と、水とを含む混合液を透光性の無機材料からなる基板の片面に塗布する工程と、
前記混合液が塗布された基板を、反りを抑える方向に押圧しながら加熱することで、波長変換部を有する基板を作製する工程と、
前記波長変換部を有する基板を発光素子の発光面側に設置する工程と、を有する発光装置の製造方法。 - 請求項13記載の発光装置の製造方法によって製造された発光装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010140333A JP5617371B2 (ja) | 2010-06-21 | 2010-06-21 | 反りを抑えた基板、それを用いた発光装置及びそれらの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010140333A JP5617371B2 (ja) | 2010-06-21 | 2010-06-21 | 反りを抑えた基板、それを用いた発光装置及びそれらの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012004474A JP2012004474A (ja) | 2012-01-05 |
JP5617371B2 true JP5617371B2 (ja) | 2014-11-05 |
Family
ID=45536085
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010140333A Expired - Fee Related JP5617371B2 (ja) | 2010-06-21 | 2010-06-21 | 反りを抑えた基板、それを用いた発光装置及びそれらの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5617371B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015090887A (ja) * | 2013-11-05 | 2015-05-11 | 株式会社日本セラテック | 発光素子及び発光装置 |
JP2015119172A (ja) * | 2013-11-13 | 2015-06-25 | 株式会社日本セラテック | 発光素子、発光装置、及びそれらの製造方法 |
JP6484982B2 (ja) | 2014-09-30 | 2019-03-20 | 日亜化学工業株式会社 | 発光装置の製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0762339A (ja) * | 1993-08-30 | 1995-03-07 | Fuji Xerox Co Ltd | 蛍光体膜およびその作製方法 |
JP2924961B1 (ja) * | 1998-01-16 | 1999-07-26 | サンケン電気株式会社 | 半導体発光装置及びその製法 |
JP3716783B2 (ja) * | 2001-11-22 | 2005-11-16 | 株式会社村田製作所 | セラミック多層基板の製造方法及び半導体装置 |
JP2007036030A (ja) * | 2005-07-28 | 2007-02-08 | Nichia Chem Ind Ltd | 発光装置及びその製造方法 |
JP5378666B2 (ja) * | 2007-09-03 | 2013-12-25 | 日東電工株式会社 | 光半導体装置の製造方法 |
KR20120068831A (ko) * | 2009-07-17 | 2012-06-27 | 덴끼 가가꾸 고교 가부시키가이샤 | Led 칩 접합체, led 패키지, 및 led 패키지의 제조 방법 |
JP5500927B2 (ja) * | 2009-09-29 | 2014-05-21 | シチズン電子株式会社 | 発光装置の製造方法 |
JP2011084415A (ja) * | 2009-10-13 | 2011-04-28 | Advance:Kk | セラミックス工芸品用の成形材料 |
US9112122B2 (en) * | 2010-04-13 | 2015-08-18 | Konica Minolta Advanced Layers, Inc. | Light-emitting device and method for manufacturing same |
JP2011238778A (ja) * | 2010-05-11 | 2011-11-24 | Konica Minolta Opto Inc | 波長変換素子の製造方法、波長変換素子および発光装置 |
-
2010
- 2010-06-21 JP JP2010140333A patent/JP5617371B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2012004474A (ja) | 2012-01-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5742839B2 (ja) | 発光装置及びその製造方法 | |
WO2013051281A1 (ja) | Led装置の製造方法、およびそれに用いる蛍光体分散液 | |
JP5870923B2 (ja) | 発光装置の製造方法 | |
US20150333233A1 (en) | Light emitting device | |
WO2011065322A1 (ja) | 発光ダイオードユニットの製造方法 | |
JP2011238778A (ja) | 波長変換素子の製造方法、波長変換素子および発光装置 | |
JP5617372B2 (ja) | 反りを抑えた基板、それを用いた発光装置及びそれらの製造方法 | |
JP5768816B2 (ja) | 波長変換素子及びその製造方法、発光装置及びその製造方法 | |
WO2013121903A1 (ja) | 波長変換素子及びその製造方法、発光装置及びその製造方法 | |
JP2011068791A (ja) | 被覆蛍光体及びled発光装置 | |
JP5803541B2 (ja) | Led装置およびその製造方法、並びにそれに用いる蛍光体分散液 | |
JP2014135400A (ja) | 発光装置及び波長変換素子 | |
JP5617371B2 (ja) | 反りを抑えた基板、それを用いた発光装置及びそれらの製造方法 | |
JP2014138081A (ja) | 発光装置、波長変換・光拡散素子及びそれらの製造方法、光拡散セラミック層形成用組成物 | |
JP2014130903A (ja) | 半導体発光装置及びその製造方法 | |
JP2014019844A (ja) | 蛍光体分散液及びled装置の製造方法 | |
JP5747994B2 (ja) | 波長変換素子及びその製造方法、発光装置及びその製造方法 | |
JP5803940B2 (ja) | 発光装置およびその製造方法 | |
JP5880566B2 (ja) | Led装置 | |
JP5910340B2 (ja) | Led装置、及びその製造方法 | |
JP5765428B2 (ja) | Led装置の製造方法 | |
JP2013165223A (ja) | 波長変換素子及びその製造方法、発光装置及びその製造方法、蛍光体分散液 | |
JP2013168480A (ja) | Led装置の製造方法 | |
JP5803941B2 (ja) | 発光装置の製造方法 | |
JP2013258339A (ja) | 発光装置及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20130418 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130604 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20131209 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131224 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140221 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140318 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140514 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140819 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140901 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5617371 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |