JP5541782B2 - 多元金属系硫黄化合物及びその製造方法 - Google Patents
多元金属系硫黄化合物及びその製造方法 Download PDFInfo
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- JP5541782B2 JP5541782B2 JP2010043997A JP2010043997A JP5541782B2 JP 5541782 B2 JP5541782 B2 JP 5541782B2 JP 2010043997 A JP2010043997 A JP 2010043997A JP 2010043997 A JP2010043997 A JP 2010043997A JP 5541782 B2 JP5541782 B2 JP 5541782B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 71
- 150000003464 sulfur compounds Chemical class 0.000 title description 67
- 229910052751 metal Inorganic materials 0.000 claims description 85
- 239000000843 powder Substances 0.000 claims description 85
- 239000002184 metal Substances 0.000 claims description 75
- 150000001875 compounds Chemical class 0.000 claims description 59
- 239000010949 copper Substances 0.000 claims description 55
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 51
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 46
- 239000003960 organic solvent Substances 0.000 claims description 39
- 239000011669 selenium Substances 0.000 claims description 35
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 33
- 125000004354 sulfur functional group Chemical group 0.000 claims description 33
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 30
- 229910052711 selenium Inorganic materials 0.000 claims description 27
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 26
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 25
- 229910052738 indium Inorganic materials 0.000 claims description 24
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 23
- 229910052733 gallium Inorganic materials 0.000 claims description 23
- 239000011858 nanopowder Substances 0.000 claims description 23
- 229910052802 copper Inorganic materials 0.000 claims description 21
- 238000006243 chemical reaction Methods 0.000 claims description 19
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 19
- -1 sulfur group compound Chemical class 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 17
- 229910000846 In alloy Inorganic materials 0.000 claims description 15
- 238000003786 synthesis reaction Methods 0.000 claims description 15
- 239000013077 target material Substances 0.000 claims description 13
- 229910000807 Ga alloy Inorganic materials 0.000 claims description 12
- 238000009835 boiling Methods 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 claims description 12
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 230000002194 synthesizing effect Effects 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 5
- 150000004982 aromatic amines Chemical group 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 239000011593 sulfur Substances 0.000 claims description 5
- 229910052714 tellurium Inorganic materials 0.000 claims description 5
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 5
- HLCPWBZNUKCSBN-UHFFFAOYSA-N 2-aminobenzonitrile Chemical compound NC1=CC=CC=C1C#N HLCPWBZNUKCSBN-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 4
- 125000002560 nitrile group Chemical group 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000001307 helium Substances 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- 238000007639 printing Methods 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims description 3
- ULHFFAFDSSHFDA-UHFFFAOYSA-N 1-amino-2-ethoxybenzene Chemical compound CCOC1=CC=CC=C1N ULHFFAFDSSHFDA-UHFFFAOYSA-N 0.000 claims description 2
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 claims description 2
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 claims description 2
- TWBPWBPGNQWFSJ-UHFFFAOYSA-N 2-phenylaniline Chemical compound NC1=CC=CC=C1C1=CC=CC=C1 TWBPWBPGNQWFSJ-UHFFFAOYSA-N 0.000 claims description 2
- OGIQUQKNJJTLSZ-UHFFFAOYSA-N 4-butylaniline Chemical compound CCCCC1=CC=C(N)C=C1 OGIQUQKNJJTLSZ-UHFFFAOYSA-N 0.000 claims description 2
- QNGVNLMMEQUVQK-UHFFFAOYSA-N 4-n,4-n-diethylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1 QNGVNLMMEQUVQK-UHFFFAOYSA-N 0.000 claims description 2
- 125000003158 alcohol group Chemical group 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims description 2
- 239000012046 mixed solvent Substances 0.000 claims description 2
- GTWJETSWSUWSEJ-UHFFFAOYSA-N n-benzylaniline Chemical compound C=1C=CC=CC=1CNC1=CC=CC=C1 GTWJETSWSUWSEJ-UHFFFAOYSA-N 0.000 claims description 2
- ZEMODTUZIWTRPF-UHFFFAOYSA-N 1-n,4-n-diethylbenzene-1,4-diamine Chemical compound CCNC1=CC=C(NCC)C=C1 ZEMODTUZIWTRPF-UHFFFAOYSA-N 0.000 claims 1
- 150000004984 aromatic diamines Chemical group 0.000 claims 1
- XAHAOEIIQYSRHJ-UHFFFAOYSA-N benzene-1,2-diamine Chemical compound NC1=CC=CC=C1N.NC1=CC=CC=C1N XAHAOEIIQYSRHJ-UHFFFAOYSA-N 0.000 claims 1
- XUYGNGMQMDMYHW-UHFFFAOYSA-N benzene-1,3-diamine Chemical compound NC1=CC=CC(N)=C1.NC1=CC=CC(N)=C1 XUYGNGMQMDMYHW-UHFFFAOYSA-N 0.000 claims 1
- WRPSKOREVDHZHP-UHFFFAOYSA-N benzene-1,4-diamine Chemical compound NC1=CC=C(N)C=C1.NC1=CC=C(N)C=C1 WRPSKOREVDHZHP-UHFFFAOYSA-N 0.000 claims 1
- OCIDXARMXNJACB-UHFFFAOYSA-N n'-phenylethane-1,2-diamine Chemical compound NCCNC1=CC=CC=C1 OCIDXARMXNJACB-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 239000010409 thin film Substances 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000013078 crystal Substances 0.000 description 12
- 229940065287 selenium compound Drugs 0.000 description 12
- 239000010408 film Substances 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- 239000000470 constituent Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 238000001308 synthesis method Methods 0.000 description 8
- 229910052736 halogen Inorganic materials 0.000 description 7
- 239000007791 liquid phase Substances 0.000 description 7
- UIPVMGDJUWUZEI-UHFFFAOYSA-N copper;selanylideneindium Chemical compound [Cu].[In]=[Se] UIPVMGDJUWUZEI-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000005477 sputtering target Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 150000004770 chalcogenides Chemical class 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000005424 photoluminescence Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 2
- 229910000058 selane Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000005486 sulfidation Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical group NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- KVCJTITZJDCOQS-UHFFFAOYSA-N N'-phenylethane-1,2-diamine Chemical compound NCCNC1=CC=CC=C1.NCCNC1=CC=CC=C1 KVCJTITZJDCOQS-UHFFFAOYSA-N 0.000 description 1
- 101100030361 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) pph-3 gene Proteins 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- KTLOQXXVQYUCJU-UHFFFAOYSA-N [Cu].[Cu].[Se] Chemical compound [Cu].[Cu].[Se] KTLOQXXVQYUCJU-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 229910052795 boron group element Inorganic materials 0.000 description 1
- 150000001640 boron group elements Chemical class 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 description 1
- QUYWYNLWBNODFK-UHFFFAOYSA-I copper indium(3+) pentachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cu++].[In+3] QUYWYNLWBNODFK-UHFFFAOYSA-I 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- ZZEMEJKDTZOXOI-UHFFFAOYSA-N digallium;selenium(2-) Chemical compound [Ga+3].[Ga+3].[Se-2].[Se-2].[Se-2] ZZEMEJKDTZOXOI-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- DWRNSCDYNYYYHT-UHFFFAOYSA-K gallium(iii) iodide Chemical compound I[Ga](I)I DWRNSCDYNYYYHT-UHFFFAOYSA-K 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- 238000007144 microwave assisted synthesis reaction Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- IRPLSAGFWHCJIQ-UHFFFAOYSA-N selanylidenecopper Chemical compound [Se]=[Cu] IRPLSAGFWHCJIQ-UHFFFAOYSA-N 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- VPQBLCVGUWPDHV-UHFFFAOYSA-N sodium selenide Chemical compound [Na+].[Na+].[Se-2] VPQBLCVGUWPDHV-UHFFFAOYSA-N 0.000 description 1
- 238000004729 solvothermal method Methods 0.000 description 1
- 238000009718 spray deposition Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- RMUKCGUDVKEQPL-UHFFFAOYSA-K triiodoindigane Chemical compound I[In](I)I RMUKCGUDVKEQPL-UHFFFAOYSA-K 0.000 description 1
- ZAKSIRCIOXDVPT-UHFFFAOYSA-N trioctyl(selanylidene)-$l^{5}-phosphane Chemical compound CCCCCCCCP(=[Se])(CCCCCCCC)CCCCCCCC ZAKSIRCIOXDVPT-UHFFFAOYSA-N 0.000 description 1
- RMZAYIKUYWXQPB-UHFFFAOYSA-N trioctylphosphane Chemical compound CCCCCCCCP(CCCCCCCC)CCCCCCCC RMZAYIKUYWXQPB-UHFFFAOYSA-N 0.000 description 1
- ZMBHCYHQLYEYDV-UHFFFAOYSA-N trioctylphosphine oxide Chemical compound CCCCCCCCP(=O)(CCCCCCCC)CCCCCCCC ZMBHCYHQLYEYDV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M14/00—Electrochemical current or voltage generators not provided for in groups H01M6/00 - H01M12/00; Manufacture thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B17/00—Sulfur; Compounds thereof
- C01B17/20—Methods for preparing sulfides or polysulfides, in general
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
- C01B19/002—Compounds containing, besides selenium or tellurium, more than one other element, with -O- and -OH not being considered as anions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
- C01G15/006—Compounds containing, besides gallium, indium, or thallium, two or more other elements, with the exception of oxygen or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/033—Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0322—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/58—Selection of substances as active materials, active masses, active liquids of inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy; of polyanionic structures, e.g. phosphates, silicates or borates
- H01M4/581—Chalcogenides or intercalation compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/50—Solid solutions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
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Description
多元金属系硫黄化合物のナノ粉末を合成するとき、含有する一種以上の金属元素はすべて、構成元素の純元素粉体から使用し、及び/又は一種以上の金属合金粉末を原子比により調合し、常圧の液相合成法で合成して、該多元金属系硫黄化合物を直接に塗布成膜し、及び/又はターゲット材にしてスパッタリング成膜して行われるので、セレン化工程は不要で、製造工程も簡単化し、製品の良品率も生産効率も向上する。
このような高品質のCIGS(Cu、In、Ga、Se)薄膜は、従来、同時多源高真空蒸着銅(Cu)、インジウム(In)、ガリウム(Ga)及びセレン(Se)などの元素を使用し、基板を高温500℃〜600℃で加熱し、化学変化を起こさせて合成されたものである。
該蒸着法は原理として、同一の真空室内に銅、インジウム、ガリウム、セレンの四つを蒸着源として配置し、それぞれの蒸着速度を制御し、基板に沈積させると同時に、基板を高温で加熱し、化合させ、該CIGS薄膜を形成させる方法である。
しかし、この方法では、材料の利用率が低く、膜厚均一性が悪く、混合均一性が悪く、基板を高温で加熱する必要があるという問題点があり、良品率が低く、材料や設備コストが高く、製造サイズが拡大できないため、製造性にマイナスな影響を与えた。
しかしながら、セレン化または硫化工程は、複雑で時間がかかり、そして高温工程で行われるため、生産コストがかかり、生産効率が低下する。また、劇毒ガスのスセレン化水素の使用に対応するためのハイクラス設備を使用することで、設備コストも増加する。
例えば、銅−インジウム−ガリウム−セレン元素化合物のCIGS粉体を例として、多元金属系硫黄化合物(Chalcogenide)(例えば、銅−インジウム−ガリウム−セレン化合物)のナノ粉体製造工程において、含有する一種以上の金属元素はすべて、構成元素の純元素粉体(例えば、銅、インジウム、ガリウム、セレンなど、純元素の物質粉体)を有機溶剤の中に配置し、加熱して化合させ、及び/又は原子比により、一種以上の金属合金粉末(例えば、銅/インジウム合金粉末、銅/ガリウム合金粉末、及びセレン粉末)を有機溶剤に配置し、加熱して化合させる。化合反応するとき、反応温度は240℃以上にして行われる。該有機溶剤は少なくとも、沸点240℃以上で、pH値7〜10の弱アルカリ性を有することを特徴とする。
ここで、x値の区間は0.8〜1.2、y値の区間は0〜1.0、z値の区間は1.6〜2.4であり、しかも、y値が0より大きい場合は、合成反応温度は必ず240℃以上にする。本発明の四つの金属元素類硫黄化合物からなる構造式はCux(In1ーyGay)Sez、その中、0.8≦x≦1.2、0≦y≦1.0、そして1.6≦z≦2.4 である。
大気圧環境下で、ナノ寸法の銅ーインジウムーガリウムーセレン元素化合物のCIGS粉体は、ハロゲンイオンを含まず、簡単で低コストでかつ大量生産され、該銅ーインジウムーガリウムーセレン化合物の材料は製造工程のニーズに応じて、一定範囲内で、銅、インジウム、ガリウム、セレンの原子比を好きなように変化させて、太陽電池ユニットの效率を高められる。しかも、該銅ーインジウムーガリウムーセレン化合物の材料を使用して、材料成分が均一なインク及びスパッタリングターゲット材を作り、製造工程の安定性と成膜の品質を高められる。
本発明の多元金属系硫黄化合物製造方法で作られた、銅ーインジウムーガリウムーセレン元素化合物(CIGS materials)は、半導体薄膜太陽電池に必要とされる化合物であり、直接に塗布成膜し、ターゲット材に作られ、スパッタリング成膜される。そのため、セレン化工程は不要で、製造工程を簡単化して、塗膜層の組成の一致性をアップさせることで、製品の良品率も生産効率も向上できる。
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Claims (16)
- 少なくとも一つの容器を使用し、
一種以上の金属元素の純元素粉体、及び/又は一種以上の金属合金粉末、及び一つの硫黄族元素を該容器の中に入れ、
一つの有機溶剤を該容器の中へ入れ、
該有機溶剤は沸点が240℃以上で、pH値が7〜10にある弱アルカリ性の特性を有するものであり、
合成反応を行い、一種以上の該金属元素の純元素粉体、及び/又は一種以上の該金属合金粉末、一つの該硫黄族元素、及び該有機溶剤を反応温度まで加熱し、多元金属系硫黄族元素化合物を合成させ、該反応温度は200℃以上で行われるという手順が含まれる
ことを特徴とする多元金属系硫黄族元素化合物の製造方法。 - 前記一種以上の該金属合金粉末は、銅元素、インジウム元素、ガリウム元素からなるグループから選択される一種以上であり、
前記一つの該硫黄族元素は、硫黄元素、セレン元素及びテルル元素からなるグループから選択される一つ
であることを特徴とする請求項1に記載の該多元金属系硫黄族元素化合物の製造方法。 - 前記一種以上の該金属合金粉末は、銅/インジウム合金、及び銅/ガリウム合金からなるグループから選択される一種以上であり、
前記一つの該硫黄族元素は、硫黄元素、セレン元素及びテルル元素からなるグループから選択される一つであり、
前記多元金属系硫黄族元素化合物は、銅ーインジウムーガリウムーセレン元素化合物であることを特徴とする請求項1に記載の該多元金属系硫黄族元素化合物の製造方法。 - 該有機溶剤は、ジフェニルアミン(diphenylamine)、Nーフェニルベンジルアミン(Nーphenylbenzylamine)、2ーアニリノエタノール(2ーanilinoethanol)、Nーフェニルエチレンジアミン(Nーphenylethyleneーdiamine)からなるグループから選択される一つであることを特徴とする請求項4に記載の該多元金属系硫黄族元素化合物の製造方法。
- 該有機溶剤は、4ーブチルアニリン(4ーbutylaniline)、2ーフェニルベンジルアミン(2ーbiphenylylamine)、2ーアミノベンゾニトリル(2ーaminobenzonitrile)、N,Nージエチル1,4ーフェニレンジアミン(N,Nーdiethylー 1,4ーphenylenediamine)及びoーフェネチジン(oーphenetidine)からなるグループから選択される一つであることを特徴とする請求項4に記載の該多元金属系硫黄族元素化合物の製造方法。
- 該有機溶剤化合物は少なくとも、1,2−フェニレンジアミン(1,2−phenylenediamine)、1,3−フェニレンジアミン(1,3−phenylenediamine)、1,4−フェニレンジアミン(1,4−phenylenediamine)、4−メチル− 1,3−フェニレンジアミン(4−methyl− 1,3−phenylenediamine)からなるグループから選択される一つであることを特徴とする請求項7に記載の該多元金属系硫黄族元素化合物の製造方法。
- 前記合成反応を行う前に、使用する該容器を100℃以上まで加熱し、不活性ガスを注入し、除水・酸素除去をしてから、該合成反応を行う方法であって、
前記不活性ガスは、窒素ガス、ヘリウムガス及びアルゴンガスからなるグループから選択される一つであることを特徴とする請求項1〜3のいずれかに記載の該多元金属系硫黄族元素化合物の製造方法。 - 該合成反応に使用される有機溶剤は、少なくとも二種からなる混合溶剤であることを特徴とする請求項1〜3のいずれかに記載の該多元金属系硫黄族元素化合物の製造方法。
- 該多元金属系硫黄族元素化合物は、構造式Cux(In1ーyGay)Sezで、0.8≦x≦1.2、0≦y≦1.0及び1.6≦z≦2.4であることを特徴とする請求項1〜3のいずれかに記載の該多元金属系硫黄族元素化合物の製造方法。
- 少なくとも一つの容器を使用し、
一種以上の金属元素の純元素粉体、及び/又は一種以上の金属合金粉末、及び一つの硫黄族元素を該容器の中に入れ、
一つの有機溶剤を該容器の中へ入れ、該有機溶剤は沸点が240℃以上で、pH値が7〜10にある弱アルカリ性の特性を有するものであり、
合成反応を行い、一種以上の該金属元素の純元素粉体、及び/又は一種以上の該金属合金粉末、一つの該硫黄族元素、及び該有機溶剤を反応温度まで加熱し、多元金属系硫黄族元素化合物を合成させるが、該反応温度は200℃以上で行われ、そして、
該多元金属系硫黄族元素化合物に対して、降温ステップ、分離ステップ、ろ過ステップ、洗浄ステップと乾燥ステップを行って、該多元金属系硫黄族元素化合物のナノ粉体を形成するという手順が含まれることを特徴とする多元金属系硫黄族元素化合物の製造方法。 - 該降温ステップは、該多元金属系硫黄族元素化合物の温度を80℃以下まで下げるステップであり、
該分離ステップは、非溶剤を加えて、該多元金属系硫黄族元素化合物を分離させるステップであり、該非溶剤は、メタノールまたはトルエンのいずれかの一つであり、及び/又は、
該洗浄ステップは、非溶剤で該多元金属系硫黄族元素化合物を洗浄するステップであり、該非溶剤は、メタノールまたはトルエンのいずれかの一つであり、及び/又は、
該乾燥ステップは、真空で50℃以上で該多元金属系硫黄族元素化合物を1時間乾燥するステップであること
を特徴とする請求項12に記載の該多元金属系硫黄族元素化合物の製造方法。 - 該ナノ粉体は、スパッタリング工程または塗布印刷工程のいずれかの一つに応用されることを特徴とする請求項13に記載の該多元金属系硫黄族元素化合物の製造方法。
- ナノ粉体は、ターゲット材に高温で加圧焼結される手順が含まれ、該ナノ粉体は請求項13に記載の該多元金属系硫黄族元素化合物の該ナノ粉体であることを特徴とするスパッタリング工程に用いられるターゲット材の製造方法。
- ナノ粉体をインクに分散させる手順が含まれ、該ナノ粉体は、請求項13に記載の該多元金属系硫黄族元素化合物の該ナノ粉体であることを特徴とする塗布印刷工程に用いられる塗布材料の製造方法。
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JP2008540304A (ja) * | 2005-05-06 | 2008-11-20 | トランスファート プラス エスイーシー | 黄銅鉱型化合物およびその他の無機化合物の調製方法 |
KR100829601B1 (ko) * | 2006-09-27 | 2008-05-14 | 삼성전자주식회사 | 칼코겐 화합물 타겟, 이의 제조 방법 및 상변화 메모리장치의 제조 방법 |
US20090107834A1 (en) * | 2007-10-29 | 2009-04-30 | Applied Materials, Inc. | Chalcogenide target and method |
KR101030780B1 (ko) * | 2007-11-14 | 2011-04-27 | 성균관대학교산학협력단 | Ⅰ-ⅲ-ⅵ2 나노입자의 제조방법 및 다결정 광흡수층박막의 제조방법 |
US20090260670A1 (en) * | 2008-04-18 | 2009-10-22 | Xiao-Chang Charles Li | Precursor ink for producing IB-IIIA-VIA semiconductors |
US20100108503A1 (en) * | 2008-10-31 | 2010-05-06 | Applied Quantum Technology, Llc | Chalcogenide alloy sputter targets for photovoltaic applications and methods of manufacturing the same |
TWI382095B (zh) * | 2009-03-04 | 2013-01-11 | Jun Wen Chung | 多元金屬硫族元素化合物之製造方法 |
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TWI382095B (zh) | 2013-01-11 |
US20100227066A1 (en) | 2010-09-09 |
DE102010009734A1 (de) | 2010-11-11 |
US7968075B2 (en) | 2011-06-28 |
DE102010009734B4 (de) | 2012-02-23 |
TW201033376A (en) | 2010-09-16 |
JP2010215499A (ja) | 2010-09-30 |
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