JP5537996B2 - 半導体装置 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims description 139
- 239000012535 impurity Substances 0.000 claims description 18
- 230000005684 electric field Effects 0.000 description 34
- 238000009826 distribution Methods 0.000 description 16
- 239000012212 insulator Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 11
- 230000015556 catabolic process Effects 0.000 description 10
- 238000005468 ion implantation Methods 0.000 description 9
- 239000000969 carrier Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
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- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
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- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
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- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/0619—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE] with a supplementary region doped oppositely to or in rectifying contact with the semiconductor containing or contacting region, e.g. guard rings with PN or Schottky junction
- H01L29/0623—Buried supplementary region, e.g. buried guard ring
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
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- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/063—Reduced surface field [RESURF] pn-junction structures
- H01L29/0634—Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
Description
図1は、第1の実施形態を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。このMOSFETでは、第1半導体領域としてn+ドレイン層2の一方の主面(表面)上に第2半導体領域としてnドリフト層3が形成されている。このn+ドレイン層2の一方の主面とは反対側となる他方の主面(裏面)上には、第1の主電極としてのドレイン電極1が形成されている。
図3は、第1の実施形態の他の例(その1)を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。ここでは、図1と同一部分の詳しい説明は省略し、異なる部分についてのみ説明する。
図4は、第1の実施形態の他の例(その2)を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。ここでは、図1と同一部分の詳しい説明は省略し、異なる部分についてのみ説明する。
図5は、第1の実施形態の他の例(その3)を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。ここでは、図1と同一部分の詳しい説明は省略し、異なる部分についてのみ説明する。
図6は、第1の実施形態の他の例(その4)を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。ここでは、図1と同一部分の詳しい説明は省略し、異なる部分についてのみ説明する。
図7は、第2の実施の形態を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。図1と同一部分の詳しい説明は省略し、ここでは異なる部分についてのみ説明する。
図8は、第2の実施形態の他の例(その1)を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。ここでは、図7と同一部分の詳しい説明は省略し、異なる部分についてのみ説明する。
図9は、第2の実施形態の他の例(その2)を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。ここでは、図7と同一部分の詳しい説明は省略し、異なる部分についてのみ説明する。
図10は、第3の実施形態を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。図1と同一部分の詳しい説明は省略し、ここでは異なる部分についてのみ説明する。
図12は、第3の実施形態の他の例(その1)を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。ここでは、図10と同一部分の詳しい説明は省略し、異なる部分についてのみ説明する。
図13は、第3の実施形態の他の例(その2)を説明するパワーMOSFETの構成の一例を模式的に示す断面図である。ここでは、図10と同一部分の詳しい説明は省略し、異なる部分についてのみ説明する。
Claims (5)
- 第1導電型の第1半導体領域と、
前記第1半導体領域の一方の主面上に形成された第1導電型の第2半導体領域と、
前記第1半導体領域の前記一方の主面とは反対側となる他方の主面側に形成された第1の主電極と、
前記第2半導体領域の前記第1半導体領域とは反対側となる主面に選択的に形成された第2導電型の第3半導体領域と、
前記第3半導体領域に接合するよう形成された第2の主電極と、
前記第2半導体領域において前記第1の主電極と前記第2の主電極との間に主電流経路が形成される素子領域の外側となる終端領域に設けられた第2導電型の複数の埋め込み半導体領域と、
を備え、
前記埋め込み半導体領域は、前記素子領域から外側に向かうほど前記第2半導体領域の前記第3半導体領域が形成された主面から遠くなり、
複数の前記埋め込み半導体領域中から任意に選択された第1の埋め込み半導体領域と、前記第1の埋め込み半導体領域よりも前記終端領域側に配置された第2の埋め込み半導体領域と、において、前記第1の埋め込み半導体領域の下には前記第2の埋め込み半導体領域が位置せず、
前記第1の埋め込み半導体領域および前記第2の埋め込み半導体領域は、前記第2半導体領域によって囲まれていることを特徴とする半導体装置。 - 第1導電型の第1半導体領域と、
前記第1半導体領域の一方の主面上に形成された第1導電型の第2半導体領域と、
前記第1半導体領域の前記一方の主面とは反対側となる他方の主面上に形成された第1の主電極と、
前記第2半導体領域の前記第1半導体領域とは反対側となる主面に選択的に形成された第2導電型の第3半導体領域と、
前記第3半導体領域に選択的に形成された第1導電型の第4半導体領域と、
前記第3半導体領域と前記第4半導体領域とに接合するよう形成された第2の主電極と、
前記第3半導体領域、前記第4半導体領域、および前記第2半導体領域の上にかかるゲート絶縁膜を介して形成された制御電極と、
前記第2半導体領域において前記第1の主電極と前記第2の主電極との間に主電流経路が形成される素子領域の外側となる終端領域に設けられた第2導電型の複数の埋め込み半導体領域と、
を備え、
前記埋め込み半導体領域は、前記素子領域から外側に向かうほど前記第2半導体領域の前記第3半導体領域が形成された主面から遠くなり、
複数の前記埋め込み半導体領域中から任意に選択された第1の埋め込み半導体領域と、前記第1の埋め込み半導体領域よりも前記終端領域側に配置された第2の埋め込み半導体領域と、において、前記第1の埋め込み半導体領域の下には前記第2の埋め込み半導体領域が位置せず、
前記第1の埋め込み半導体領域および前記第2の埋め込み半導体領域は、前記第2半導体領域によって囲まれていることを特徴とする半導体装置。 - 前記第2半導体領域内において前記第2半導体領域の主面と垂直な方向に前記第3半導体領域と接続して形成され、前記主面の方向に沿って周期的に配置された第2導電型の複数の半導体ピラー領域を備えたことを特徴とする請求項2記載の半導体装置。
- 前記半導体ピラー領域は、前記第2半導体領域の主面と垂直な方向に沿って不純物濃度が複数のピークを持つような濃度プロファイルを有しているとともに、前記埋め込み半導体領域の中央部の深さと前記半導体ピラー領域の不純物濃度のピークとなる深さとが一致していることを特徴とする請求項2または3に記載の半導体装置。
- 前記第1半導体領域と前記第1の主電極との間に第2導電型の第5半導体領域が設けられたことを特徴とする請求項2〜4のうちいずれか1つに記載の半導体装置。
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JP2010046394A JP5537996B2 (ja) | 2010-03-03 | 2010-03-03 | 半導体装置 |
US13/029,925 US8373247B2 (en) | 2010-03-03 | 2011-02-17 | Semiconductor device |
CN2011100509107A CN102194858B (zh) | 2010-03-03 | 2011-03-03 | 半导体装置 |
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US8564088B2 (en) * | 2008-08-19 | 2013-10-22 | Infineon Technologies Austria Ag | Semiconductor device having variably laterally doped zone with decreasing concentration formed in an edge region |
JP2012074441A (ja) * | 2010-09-28 | 2012-04-12 | Toshiba Corp | 電力用半導体装置 |
JP6062340B2 (ja) * | 2012-12-04 | 2017-01-18 | 株式会社デンソー | 半導体装置およびその製造方法 |
DE112013005788B4 (de) * | 2012-12-04 | 2019-02-07 | Denso Corporation | Halbleitervorrichtung und Verfahren zu deren Fertigung |
JP5725125B2 (ja) * | 2012-12-04 | 2015-05-27 | 株式会社デンソー | 半導体装置およびその製造方法 |
JP2014232838A (ja) * | 2013-05-30 | 2014-12-11 | 住友電気工業株式会社 | 炭化珪素半導体装置 |
JP6224454B2 (ja) * | 2013-12-27 | 2017-11-01 | 株式会社豊田中央研究所 | 縦型半導体装置 |
US9698256B2 (en) * | 2014-09-24 | 2017-07-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Termination of super junction power MOSFET |
JP6870516B2 (ja) * | 2017-07-18 | 2021-05-12 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
JP7081876B2 (ja) * | 2017-12-19 | 2022-06-07 | ラピスセミコンダクタ株式会社 | 半導体装置及び半導体装置の製造方法 |
JP7263286B2 (ja) * | 2020-03-24 | 2023-04-24 | 株式会社東芝 | 半導体装置 |
JP7056707B2 (ja) * | 2020-09-18 | 2022-04-19 | 富士電機株式会社 | 半導体装置 |
CN115579382A (zh) * | 2022-12-12 | 2023-01-06 | 深圳市森国科科技股份有限公司 | 半导体器件的终端结构及其半导体器件 |
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JP3392665B2 (ja) * | 1995-11-06 | 2003-03-31 | 株式会社東芝 | 半導体装置 |
DE19839970C2 (de) | 1998-09-02 | 2000-11-02 | Siemens Ag | Randstruktur und Driftbereich für ein Halbleiterbauelement sowie Verfahren zu ihrer Herstellung |
EP1011146B1 (en) | 1998-12-09 | 2006-03-08 | STMicroelectronics S.r.l. | Method of manufacturing an integrated edge structure for high voltage semiconductor devices |
JP3751463B2 (ja) | 1999-03-23 | 2006-03-01 | 株式会社東芝 | 高耐圧半導体素子 |
KR20030078867A (ko) * | 2002-01-28 | 2003-10-08 | 미쓰비시덴키 가부시키가이샤 | 반도체 장치 |
JP3908572B2 (ja) * | 2002-03-18 | 2007-04-25 | 株式会社東芝 | 半導体素子 |
JP4264285B2 (ja) * | 2002-09-09 | 2009-05-13 | 株式会社豊田中央研究所 | 半導体装置とその製造方法 |
JP2006073740A (ja) * | 2004-09-01 | 2006-03-16 | Toshiba Corp | 半導体装置及びその製造方法 |
JP5052025B2 (ja) | 2006-03-29 | 2012-10-17 | 株式会社東芝 | 電力用半導体素子 |
US7737469B2 (en) | 2006-05-16 | 2010-06-15 | Kabushiki Kaisha Toshiba | Semiconductor device having superjunction structure formed of p-type and n-type pillar regions |
JP5188037B2 (ja) * | 2006-06-20 | 2013-04-24 | 株式会社東芝 | 半導体装置 |
JP5342752B2 (ja) * | 2006-05-16 | 2013-11-13 | 株式会社東芝 | 半導体装置 |
JP4189415B2 (ja) * | 2006-06-30 | 2008-12-03 | 株式会社東芝 | 半導体装置 |
JP2009088345A (ja) | 2007-10-01 | 2009-04-23 | Toshiba Corp | 半導体装置 |
US20090166722A1 (en) * | 2007-12-28 | 2009-07-02 | Alpha & Omega Semiconductor, Ltd: | High voltage structures and methods for vertical power devices with improved manufacturability |
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US20110215418A1 (en) | 2011-09-08 |
US8373247B2 (en) | 2013-02-12 |
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