JP5517766B2 - 露光装置およびデバイス製造方法 - Google Patents

露光装置およびデバイス製造方法 Download PDF

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Publication number
JP5517766B2
JP5517766B2 JP2010137473A JP2010137473A JP5517766B2 JP 5517766 B2 JP5517766 B2 JP 5517766B2 JP 2010137473 A JP2010137473 A JP 2010137473A JP 2010137473 A JP2010137473 A JP 2010137473A JP 5517766 B2 JP5517766 B2 JP 5517766B2
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JP
Japan
Prior art keywords
radiation plate
substrate
stage
exposure apparatus
mirror surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010137473A
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English (en)
Japanese (ja)
Other versions
JP2012004308A (ja
JP2012004308A5 (https=
Inventor
裕司 前原
伸茂 是永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2010137473A priority Critical patent/JP5517766B2/ja
Priority to US13/157,618 priority patent/US8810770B2/en
Publication of JP2012004308A publication Critical patent/JP2012004308A/ja
Publication of JP2012004308A5 publication Critical patent/JP2012004308A5/ja
Application granted granted Critical
Publication of JP5517766B2 publication Critical patent/JP5517766B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Epidemiology (AREA)
  • Manufacturing & Machinery (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Public Health (AREA)
  • Theoretical Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010137473A 2010-06-16 2010-06-16 露光装置およびデバイス製造方法 Expired - Fee Related JP5517766B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010137473A JP5517766B2 (ja) 2010-06-16 2010-06-16 露光装置およびデバイス製造方法
US13/157,618 US8810770B2 (en) 2010-06-16 2011-06-10 Exposure apparatus and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010137473A JP5517766B2 (ja) 2010-06-16 2010-06-16 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2012004308A JP2012004308A (ja) 2012-01-05
JP2012004308A5 JP2012004308A5 (https=) 2013-07-11
JP5517766B2 true JP5517766B2 (ja) 2014-06-11

Family

ID=45328373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010137473A Expired - Fee Related JP5517766B2 (ja) 2010-06-16 2010-06-16 露光装置およびデバイス製造方法

Country Status (2)

Country Link
US (1) US8810770B2 (https=)
JP (1) JP5517766B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150331338A1 (en) * 2012-12-17 2015-11-19 Asml Netherlands B.V. Substrate Support for a Lithographic Apparatus and Lithographic Apparatus
CN107771303B (zh) 2015-04-21 2021-06-04 Asml荷兰有限公司 光刻设备
US10394140B2 (en) 2016-09-02 2019-08-27 Asml Netherlands B.V. Lithographic apparatus
JP7060584B2 (ja) 2016-09-02 2022-04-26 エーエスエムエル ネザーランズ ビー．ブイ． 冷却装置およびリソグラフィ装置
JP7481390B2 (ja) * 2022-04-15 2024-05-10 トヨタ自動車株式会社 光軸調整治具

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5363196A (en) * 1992-01-10 1994-11-08 Ultratech Stepper, Inc. Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
JPH06124873A (ja) * 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP3448787B2 (ja) * 1994-08-30 2003-09-22 株式会社ニコン ステージ位置計測装置
US5661548A (en) * 1994-11-30 1997-08-26 Nikon Corporation Projection exposure method and apparatus including a changing system for changing the reference image-formation position used to generate a focus signal
JPH0992613A (ja) 1995-09-21 1997-04-04 Nikon Corp 温調装置及び走査型露光装置
US6012697A (en) * 1996-04-12 2000-01-11 Nikon Corporation Stage and supporting mechanism for supporting movable mirror on stage
JP4745556B2 (ja) * 2001-08-20 2011-08-10 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
US20040169832A1 (en) * 2001-08-24 2004-09-02 Nikon Corporation Vacuum chamber having instrument-mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same
JP2004273926A (ja) * 2003-03-11 2004-09-30 Canon Inc 露光装置
JP2005033179A (ja) * 2003-06-18 2005-02-03 Canon Inc 露光装置及びデバイス製造方法
JP2006317316A (ja) * 2005-05-13 2006-11-24 Canon Inc ステージ装置およびステージ装置を用いた露光装置
US7649611B2 (en) * 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008159677A (ja) * 2006-12-21 2008-07-10 Canon Inc ステージ装置および露光装置
JP4288309B2 (ja) * 2007-09-03 2009-07-01 キヤノンアネルバ株式会社 基板熱処理装置及び基板の熱処理方法

Also Published As

Publication number Publication date
JP2012004308A (ja) 2012-01-05
US8810770B2 (en) 2014-08-19
US20110310366A1 (en) 2011-12-22

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