JP2012004308A5 - - Google Patents

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Publication number
JP2012004308A5
JP2012004308A5 JP2010137473A JP2010137473A JP2012004308A5 JP 2012004308 A5 JP2012004308 A5 JP 2012004308A5 JP 2010137473 A JP2010137473 A JP 2010137473A JP 2010137473 A JP2010137473 A JP 2010137473A JP 2012004308 A5 JP2012004308 A5 JP 2012004308A5
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JP
Japan
Prior art keywords
substrate
stage
radiation plate
exposure apparatus
mirror surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010137473A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012004308A (ja
JP5517766B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2010137473A priority Critical patent/JP5517766B2/ja
Priority claimed from JP2010137473A external-priority patent/JP5517766B2/ja
Priority to US13/157,618 priority patent/US8810770B2/en
Publication of JP2012004308A publication Critical patent/JP2012004308A/ja
Publication of JP2012004308A5 publication Critical patent/JP2012004308A5/ja
Application granted granted Critical
Publication of JP5517766B2 publication Critical patent/JP5517766B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010137473A 2010-06-16 2010-06-16 露光装置およびデバイス製造方法 Expired - Fee Related JP5517766B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010137473A JP5517766B2 (ja) 2010-06-16 2010-06-16 露光装置およびデバイス製造方法
US13/157,618 US8810770B2 (en) 2010-06-16 2011-06-10 Exposure apparatus and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010137473A JP5517766B2 (ja) 2010-06-16 2010-06-16 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2012004308A JP2012004308A (ja) 2012-01-05
JP2012004308A5 true JP2012004308A5 (https=) 2013-07-11
JP5517766B2 JP5517766B2 (ja) 2014-06-11

Family

ID=45328373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010137473A Expired - Fee Related JP5517766B2 (ja) 2010-06-16 2010-06-16 露光装置およびデバイス製造方法

Country Status (2)

Country Link
US (1) US8810770B2 (https=)
JP (1) JP5517766B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150331338A1 (en) * 2012-12-17 2015-11-19 Asml Netherlands B.V. Substrate Support for a Lithographic Apparatus and Lithographic Apparatus
CN107771303B (zh) 2015-04-21 2021-06-04 Asml荷兰有限公司 光刻设备
US10394140B2 (en) 2016-09-02 2019-08-27 Asml Netherlands B.V. Lithographic apparatus
JP7060584B2 (ja) 2016-09-02 2022-04-26 エーエスエムエル ネザーランズ ビー．ブイ． 冷却装置およびリソグラフィ装置
JP7481390B2 (ja) * 2022-04-15 2024-05-10 トヨタ自動車株式会社 光軸調整治具

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5363196A (en) * 1992-01-10 1994-11-08 Ultratech Stepper, Inc. Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
JPH06124873A (ja) * 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP3448787B2 (ja) * 1994-08-30 2003-09-22 株式会社ニコン ステージ位置計測装置
US5661548A (en) * 1994-11-30 1997-08-26 Nikon Corporation Projection exposure method and apparatus including a changing system for changing the reference image-formation position used to generate a focus signal
JPH0992613A (ja) 1995-09-21 1997-04-04 Nikon Corp 温調装置及び走査型露光装置
US6012697A (en) * 1996-04-12 2000-01-11 Nikon Corporation Stage and supporting mechanism for supporting movable mirror on stage
JP4745556B2 (ja) * 2001-08-20 2011-08-10 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
US20040169832A1 (en) * 2001-08-24 2004-09-02 Nikon Corporation Vacuum chamber having instrument-mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same
JP2004273926A (ja) * 2003-03-11 2004-09-30 Canon Inc 露光装置
JP2005033179A (ja) * 2003-06-18 2005-02-03 Canon Inc 露光装置及びデバイス製造方法
JP2006317316A (ja) * 2005-05-13 2006-11-24 Canon Inc ステージ装置およびステージ装置を用いた露光装置
US7649611B2 (en) * 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008159677A (ja) * 2006-12-21 2008-07-10 Canon Inc ステージ装置および露光装置
JP4288309B2 (ja) * 2007-09-03 2009-07-01 キヤノンアネルバ株式会社 基板熱処理装置及び基板の熱処理方法

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