JP5512102B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP5512102B2 JP5512102B2 JP2008184209A JP2008184209A JP5512102B2 JP 5512102 B2 JP5512102 B2 JP 5512102B2 JP 2008184209 A JP2008184209 A JP 2008184209A JP 2008184209 A JP2008184209 A JP 2008184209A JP 5512102 B2 JP5512102 B2 JP 5512102B2
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Description
例えば特許文献1には、以下に示す製造方法によって得られる半導体装置が開示されている。まず、積層する一方のウエハにトレンチ(深溝)を形成し、トレンチ内部を熱酸化した後、そのトレンチ内に導体としてポリシリコンを埋め込んで埋込配線を形成する。その後、埋込配線が露出するまでウエハを薄型化し、ウエハの裏面の埋込配線の位置に裏面バンプを形成する。その後、このウエハの裏面バンプと、積層するためのもう一方のウエハの表面に形成された表面バンプとを積層し、積層された2枚のウエハ間に絶縁性接着剤を注入することにより3次元半導体集積回路装置を製造する。
「第1実施形態」
図1〜図20は、本発明の半導体装置を説明するための図である。図19は、本発明の半導体装置の一例を示した要部断面図であり、図1は、図19に示す半導体装置の一部のみを模式的に示した拡大断面図であり、図2は、図1に示す半導体装置における貫通配線部の寸法とバンプの寸法との関係を説明するための平面図である。また、図3〜図18は、図19に示す半導体装置の製造工程を説明するための図であり、図20は、図19に示す半導体装置の製造工程を説明するためのフロー図である。
貫通配線部9は、図19に示すように、基板1SAを貫通して形成されており、タングステンなどからなる主導体膜と、主導体膜の厚さよりも薄くて主導体膜の側面および底面を覆うように形成された窒化チタンなどからなるバリア導体膜とから形成されている。図19に示すように、貫通配線部9は、配線15a,15b,15cを介してボンディングパッドBPやMOS・FET6と電気的に接続されている。
図2は、バンプ26の平面形状を説明するための平面図である。図2において、符号A1は基本形状を示し、符号A2は位置合わせマージン形状を示し、符号A3は加工後に発生する位置合わせマージン形状を示し、符号A4は補正形状を示している。
図19に示す半導体装置においては、貼り合わせ面30bにおけるバンプ26の平面形状が、図2に示す位置合わせマージン形状A2よりも大きいものとされている。したがって、図19に示す半導体装置においては、上下のウエハ1WA,1WBの位置合わせを行う装置の精度に起因する範囲内で貫通配線部9とバンプ26との位置がずれたとしても、バンプ26と貫通配線部9とが接続されている面積が貫通配線部9の半分の面積よりも大きいものとなり、ウエハ間接続部30cの平面積が十分に確保されるものとなる。また、ウエハ1WA,1WBを製造する際に基板1SA、1SBの変形が生じたとしても、バンプ26の平面形状が、基本形状A1である場合や、位置合わせマージン形状A2である場合と比較して、貫通配線部9とバンプ26とが接続されやすいものとなり、貫通配線部9とバンプ26とが接続されない部分の発生を防止できるものとなり、ウエハ1WA,1WB間の接続に対する高い信頼性が得られる。
貼り合わせ面30bにおけるバンプ26の平面形状が、図2に示す加工後に発生する位置合わせマージン形状A3とされている場合、ウエハ1WAを製造する際に基板1SAの変形が生じたため、貫通配線部9とバンプ26との位置がずれたとしても、貫通配線部9の少なくとも半分の面積が、バンプ26と接続されるものとなり、より一層広いウエハ間接続部30cの平面積を確保できるものとなる。
さらに、補正形状A4が、加工後に発生する位置合わせマージン形状A3の縁部から補正寸法M3で外方に向かって広げられることにより、基本形状A1と相似形状でなく、凹凸が少なく容易に形成可能な正方形や円形などの形状、または加工後に発生する位置合わせマージン形状A3の形状を正方形や円形に近づける形状とされている場合には、バンプ26の形状が容易に形成可能なものとなり、好ましい。
貫通配線部が複数の配線部からなるものであるときには、隣接する配線部に対応する位置合わせマージン形状A2同士や、加工後に発生する位置合わせマージン形状A3同士、補正形状A4同士が重なり合う場合がある。また、貫通配線部が輪郭に凹部を有する形状であるときには、凹部に対応する位置合わせマージン形状A2同士や、加工後に発生する位置合わせマージン形状A3同士、補正形状A4同士が重なり合う場合がある。
この場合、貫通配線部の位置合わせマージン形状は、重なり合う位置合わせマージン形状の輪郭形状からなる包括的な位置合わせマージン形状とみなすことができ、加工後に発生する位置合わせマージン形状は、重なり合う加工後に発生する位置合わせマージン形状の輪郭形状からなる包括的な加工後に発生する位置合わせマージン形状とみなすことができ、補正形状は、重なり合う補正形状の輪郭形状からなる包括的な補正形状とみなすことができる。
最初に上側のウエハの製造工程(図20における1層目の上側ウエハの製造工程)を説明する。まず、上側のウエハ1WAを用意する(図20の工程100A)。続いて、図3に示すように、基板1SAの主面(すなわち、ウエハ1WAの主面)に、素子分離用の溝型の分離部2を形成する(図20の工程101A)。分離部2は、基板1SAの主面に分離溝2aを形成した後、分離溝2a内に、例えば酸化シリコン(SiO2)のような絶縁膜2bを埋め込むことにより形成する。また、基板1SAの活性領域の主面上に、例えば熱酸化法等により酸化シリコン等からなる絶縁膜3を形成する。
続いて、レジストパターンRAをエッチングマスクとして、そこから露出する絶縁膜3および基板1SAをエッチングすることにより、図4に示すように、基板1SAに深い分離溝5aを形成する。深い分離溝5aは、図4に示すように、基板1SAの主面から、その主面に対して交差(垂直に交差)する方向(すなわち、基板1SAの厚さ方向)に沿って延びており、素子分離用の分離溝2aよりも深い位置で終端している。
その後、第2薄型化処理として、ウエハ1WAの裏面に対して研磨処理を施す。第2薄型化処理は研磨で例示されるようにCMPのような機械的な要素と化学的な要素とを併せ持つ薄型化処理である。第2薄型化処理は、図13に示すように、貫通分離部5および貫通配線部9に達する状態(すなわち、貫通分離部5および貫通配線部9がウエハ1WAの裏面から露出する状態)で処理を終了する。
このようにして上側のウエハ1WAの製造工程を終了する。
このようにして下側のウエハ1WBの製造工程を終了する。
このとき、下側のウエハ1WBの各バンプ26と、それに対応する上側のウエハ1WAの各貫通配線部9とは、中心位置がずれている。このずれは、ウエハ同士の位置合わせを行う装置の位置合わせ精度や、ウエハ1WA、1WBの製造工程において生じる基板の変形(ウエハBow)などによって発生したものである。
その後、図18に示すように、上下のウエハ1WA,1WBの対向面(貼り合わせ面30a、30b)を近づけて下側のウエハ1WBと上側のウエハ1WAとを積み重ね、下側のウエハ1WBの主面上のバンプ26と、上側のウエハ1WAの裏面の貫通配線部9とを接触させて電気的に接続する。これにより、上下のウエハ1WA,1WBの半導体回路部同士を電気的に接続し、所望の半導体回路を形成する(図2の工程202)。
その後、上下のウエハ1WA,1WBの対向する貼り合わせ面30a、30bの隙間に絶縁性の接着剤30を注入する(図2の工程203)。その後、上側のウエハ1WAの主面からガラス支持基板21を剥離し、図19に示す半導体装置とする。
さらに、図20の工程100B〜106Bを経て中間層のウエハ1WCを用意する。この中間層のウエハ1WCには、最上層のウエハ1WAと同様に、貫通分離部5、貫通配線部9が形成されている。中間層のウエハ1WCが最上層のウエハ1WAと異なるのは、中間層のウエハ1WCの主面上にバンプ下地導体パターン25とバンプ26とが形成されていることである。なお、この段階での中間層のウエハ1WCは、上記の第1〜第3薄型化処理が施されておらず厚いままとされている。
その後、上側の最上層のウエハ1WAの主面にガラス支持基板21を貼り合わせたままの状態で、下側の中間層のウエハ1WCを裏面側から図13および図14で説明したのと同様の薄型化処理により薄型化する(図20の中央の工程107A)。これにより、下側の中間層のウエハ1WCの裏面(貼り合わせ面30a)から貫通分離部5および貫通配線部9を露出(突出)させる。中間層のウエハ1WCの薄型化は、2枚のウエハ1WA,1WCを貼り合わせたままの状態で行うので、薄型化処理時におけるウエハ1WCの機械的強度を確保でき、ウエハ1WCのハンドリングの安定性を向上させることができる。
図22〜図42は、本発明の半導体装置の他の例を説明するための図である。図41は、本発明の半導体装置の一例を示した要部断面図であり、図22は、図41に示す半導体装置の一部のみを模式的に示した拡大断面図であり、図23は、図22に示す半導体装置における貫通配線部の寸法とバンプの寸法との関係を説明するための平面図である。また、図24〜図40は、図41に示す半導体装置の製造工程を説明するための図であり、図42は、図41に示す半導体装置の製造工程を説明するためのフロー図である。
なお、図22〜図42に示す本実施形態の半導体装置において、図19と同じ部材については、同じ符号を付し、説明を省略する。
さらに、補正形状A4が、加工後に発生する位置合わせマージン形状A3の縁部から補正寸法M3で外方に向かって広げられることにより、基本形状A1と相似形状でなく、凹凸が少なく容易に形成可能な正方形や円形などの形状、または正方形や円形に近づけられた形状とされている場合、バンプ26の形状が容易に形成可能なものとなり、好ましい。
最初に上側のウエハの製造工程(図42における1層目の上側ウエハの製造工程)を説明する。まず、図19に示す半導体装置の製造方法と同様に、上側のウエハ1WAを用意(図42の工程100A)し、図24に示すように、基板1SAの主面(すなわち、ウエハ1WAの主面)に、素子分離用の溝型の分離部2を形成する(図42の工程101A)。
その後、基板1SAの主面上に、例えば酸化シリコンからなる絶縁膜をCVD法等によって堆積し、その絶縁膜の上面を平坦化することにより、図25に示す層間絶縁膜8aを形成する。
続いて、レジストパターンRAをエッチングマスクとして、そこから露出する層間絶縁膜8a、絶縁膜7、基板1SAをエッチングすることにより、図26に示すように、基板1SAに深い分離溝5aを形成する。深い分離溝5aは、図26に示すように、基板1SAの主面から、その主面に対して交差する方向に沿って延びており、素子分離用の分離溝2aよりも深い位置で終端している。
なお、貫通配線部91の貫通配線部本体91aとなる導電部は、CVD法によって形成できるが、メッキ法などにより形成してもよく、形成方法は特に限定されない。
このことにより、図33に示すように、ウエハ1WAの裏面から貫通分離部51を露出させる。
まず、図34に示すように、薄型化処理後のウエハ1WAの裏面に、第1層間絶縁層8eを形成する。その後、第1層間絶縁層8e上にレジストパターンRCを形成し、図35に示すように、レジストパターンRCをエッチングマスクとして、そこから露出する第1層間絶縁層8eをエッチングすることにより、溝81を形成する。この時、ウエハWA1の裏面から露出していた貫通分離部51の底面の、貫通配線部91aの底面に当たる部分の酸化膜も同時にエッチングする。溝81は、図35に示すように、貫通配線部本体91aと平面視で重なる位置に形成されている。また、溝81の横断面の面積は、貫通配線部本体91aの横断面の面積と同じとなっており、溝81の側面が平面視で貫通分離部51の縁部の位置よりも内側に配置されている。
プラグ配線91bは、図47に示すように、その側面方向において第1層間絶縁層8eにより基板1SAとの分離が行われ、完全に基板1SAから電気的に分離される。
このようにして上側のウエハ1WAの製造工程を終了する。
ここで上側のウエハ1WAの製造工程と異なるのは、最下層のウエハの製造工程においては、図42に示す多層配線層の形成工程(工程105B)の後に、図19に示す半導体装置の製造工程と同様にしてバンプ形成工程(工程106B)を行うことと、ウエハ薄型化工程(工程107A)、貫通分離部の形成工程(工程102B)、貫通配線部の形成工程(工程104B)を行わないことである。なお、下側のウエハ1WBを構成するバンプ26の平面配置は、各バンプ26中心位置が、上側のウエハ1WAとなる加工前の基板1SAにおいて配置されるべき各貫通配線部91の中心位置に対向するように配置される。
このとき、下側のウエハ1WBの各バンプ26と、それに対応する上側のウエハ1WAの各貫通配線部91とは、中心位置がずれている。このずれは、ウエハ同士の位置合わせを行う装置の位置合わせ精度や、ウエハ1WA、1WBの製造工程において生じる基板の変形(ウエハBow)などによって発生したものである。
その後、図40に示すように、上下のウエハ1WA,1WBの対向面(貼り合わせ面30a、30b)を近づけて下側のウエハ1WBと上側のウエハ1WAとを積み重ねて加圧し、下側のウエハ1WBの主面上のバンプ26と貫通配線部91の接続導電部91cとを接触させて電気的に接続する。これにより、上下のウエハ1WA,1WBの半導体回路部同士を電気的に接続し、所望の半導体回路を形成する(図42の工程202)。
その後、上側のウエハ1WAの主面からガラス支持基板21を剥離し、図41に示す半導体装置とする。
なお、バンプの平面形状よりも貫通配線部の平面形状が大きいものである場合には、貫通配線部が図41に示す構造であることが好ましい。図41に示す貫通配線部91では、他の部材の配置を変更したり、製造工程を変更したりすることなく、容易に接続導電部91cの平面形状を変化させることができる。
直径200mm(8インチ)、厚さ30μmのシリコンからなる基板を用い、貫通分離部および貫通配線部が形成された上側のウエハを、図19に示す半導体装置の上側のウエハ1WAと同様にして形成した。
なお、上側のウエハ1WAの貫通配線部は、タングステンからなり、2.6μmの間隔を空けて平行に配置された縦5.6μm、横1.5μmの長方形の横断面形状を有する2つの配線部からなるものであり、貫通突出部のウエハ1WAの厚み方向の長さは40μmであった。また、加工前の基板において、各貫通配線部の配置されるべき設計上のピッチは50μmに設定した。また、貫通分離部は、外形寸法が縦、横13.4μmの正方形の枠状のものであった。
図43は、バンプの平面形状を説明するための平面図である。図43において、符号A20は下側のウエハのバンプの平面形状を示し、符号A1、A11は基本形状を示し、符号A2、A12は位置合わせマージン形状を示し、符号A3、A13は加工後に発生する位置合わせマージン形状を示し、符号A4、A14は補正形状の最大領域を示している。ここでは、下側のウエハのバンプの平面形状A20として、第1の基本形状を用いて決定される場合と第2の基本形状を用いて決定される場合とについて説明する。
基本形状A1、A11は、貼り合わせ面における貫通配線部の面積の半分が重なり合う平面形状である。図43に示す例において、基本形状A1、A11の平面形状は、貫通配線部を構成する長方形の2つの配線部について、長辺の長さを半分にした縦2.8μm、横1.5μm長方形の形状の面積となる縦4.0μm、横1.1μm長方形の形状を、2つの配線部とそれぞれ中心位置を合わせた状態で配置した形状とされている。
したがって、位置合わせマージン形状A2、A12は、それぞれ縦6.0μm、横3.1μm長方形の形状とされている。
ここで、加工後に発生する位置合わせマージン寸法M2、M12は7.5μmであるので、加工後に発生する位置合わせマージン形状A3、A13は、それぞれ縦21.0μm、横18.1μm長方形の形状とされている。
図43に示すように、包括的な加工後に発生する位置合わせマージン形状A10の縦の寸法は、加工後に発生する位置合わせマージン形状A3および加工後に発生する位置合わせマージン形状A13と同じであるが、横の寸法は、貫通配線部を構成する2つの配線部間の間隔である2.6μmに配線部の短辺寸法である1.5μmを加えた寸法である4.1μm分だけ1つの加工後に発生する位置合わせマージン形状の寸法よりも広くなる。
上述した例においては、基本形状A1、A11の平面形状として、縦4.0μm、横1.1μm長方形の形状としたが、基本形状A1、A11の平面形状として、貫通配線部を構成する長方形の2つの配線部について、それぞれ中心位置を合わせた状態で長辺の長さを半分にした縦2.8μm、横1.5μm長方形の形状を用いてもよい。
この場合、図43に示す位置合わせマージン形状A2、A12は、それぞれ縦4.8μm、横3.5μm長方形の形状とされる。また、加工後に発生する位置合わせマージン形状A3、A13は、それぞれ縦19.8μm、横18.5μm長方形の形状とされ、包括的な加工後に発生する位置合わせマージン形状A10(図43に示す斜線の領域)の平面形状は、縦19.8μm、横22.6μmの長方形とされる。
そして、図44に示す半導体装置において、図44に示す升目のうち、斜線部分の升目の位置に配置された58箇所を測定箇所について、貫通配線部とバンプとの電気的な接続がなされているかどうかを調べた。その結果、すべての貫通配線部とバンプとにおいて正常に電気的な接続がなされており、ウエハの最外部に配置された貫通配線部とバンプとにおいても正常に電気的な接続がなされていることが確認できた。
Claims (5)
- 基板を加工して製造された複数枚のウエハが貼り合わされてなり、各ウエハにおける別のウエハとの貼り合わせ面には複数の電気信号接続部が設けられており、基板を貫通する貫通分離部に取り囲まれて貼り合わせ面から突出している電気信号接続部と、対向する別のウエハの対向する位置に設けられたバンプからなる電気信号接続部とが、前記貫通分離部と前記バンプとを平面視で重ねて配置して電気的に接続されることにより複数のウエハ間接続部が形成されて所望の半導体回路が形成されている半導体装置において、
前記ウエハ間接続部が、隣接する別のウエハ間接続部と絶縁されたものであり、
前記バンプの貼り合わせ面における平面形状が、貼り合わされるウエハ同士の位置合わせを行う際の位置合わせマージン寸法の幅で、前記対向する別のウエハに設けられた前記貼り合わせ面から突出している電気信号接続部の貼り合わせ面における面積の半分が重なり合う平面形状を取り囲んでなる位置合わせマージン形状よりも大きいものであることを特徴とする半導体装置。 - 前記バンプの貼り合わせ面における平面形状が、前記対向する別のウエハにおける中心と最外部に配置された前記貼り合わせ面から突出している電気信号接続部との距離と、前記対向する別のウエハとなる加工前の前記基板における中心と最外部に配置されるべき前記貼り合わせ面から突出している電気信号接続部の距離との差である加工後に発生する位置合わせマージン寸法の幅で、前記位置合わせマージン形状を取り囲んでなる加工後に発生する位置合わせマージン形状とされていることを特徴とする請求項1に記載の半導体装置。
- 前記バンプの貼り合わせ面における平面形状が、前記加工後に発生する位置合わせマージン形状の縁部から2.5μm以下の補正寸法で外方に向かって広げられた補正形状とされていることを特徴とする請求項2に記載の半導体装置。
- 前記対向する別のウエハが、前記基板の厚みを薄くするウエハの薄型化処理のなされた薄型ウエハであることを特徴とする請求項1〜請求項3のいずれかに記載の半導体装置。
- 前記貼り合わせ面から突出している電気信号接続部が、前記ウエハの一方の面と他方の面とを導通させる貫通配線部であり、
前記貫通配線部の平面形状よりも前記バンプの平面形状が大きいことを特徴とする請求項1〜請求項4のいずれかに記載の半導体装置。
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JP4869664B2 (ja) | 2005-08-26 | 2012-02-08 | 本田技研工業株式会社 | 半導体装置の製造方法 |
KR100621438B1 (ko) * | 2005-08-31 | 2006-09-08 | 삼성전자주식회사 | 감광성 폴리머를 이용한 적층 칩 패키지 및 그의 제조 방법 |
KR100837269B1 (ko) * | 2006-05-22 | 2008-06-11 | 삼성전자주식회사 | 웨이퍼 레벨 패키지 및 그 제조 방법 |
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