JP5499736B2 - 電気光学装置及び電子機器 - Google Patents
電気光学装置及び電子機器 Download PDFInfo
- Publication number
- JP5499736B2 JP5499736B2 JP2010018233A JP2010018233A JP5499736B2 JP 5499736 B2 JP5499736 B2 JP 5499736B2 JP 2010018233 A JP2010018233 A JP 2010018233A JP 2010018233 A JP2010018233 A JP 2010018233A JP 5499736 B2 JP5499736 B2 JP 5499736B2
- Authority
- JP
- Japan
- Prior art keywords
- electro
- electrode
- optical device
- microlens
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 claims description 122
- 239000004065 semiconductor Substances 0.000 claims description 53
- 239000000463 material Substances 0.000 claims description 15
- 239000010410 layer Substances 0.000 description 82
- 239000004973 liquid crystal related substance Substances 0.000 description 29
- 239000010408 film Substances 0.000 description 26
- 238000000034 method Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 239000011229 interlayer Substances 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 239000003990 capacitor Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 239000003566 sealing material Substances 0.000 description 4
- 239000003086 colorant Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000000382 optic material Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010018233A JP5499736B2 (ja) | 2010-01-29 | 2010-01-29 | 電気光学装置及び電子機器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010018233A JP5499736B2 (ja) | 2010-01-29 | 2010-01-29 | 電気光学装置及び電子機器 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014049850A Division JP5804113B2 (ja) | 2014-03-13 | 2014-03-13 | 電気光学装置及び電子機器 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011158556A JP2011158556A (ja) | 2011-08-18 |
| JP2011158556A5 JP2011158556A5 (enExample) | 2013-03-14 |
| JP5499736B2 true JP5499736B2 (ja) | 2014-05-21 |
Family
ID=44590586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010018233A Active JP5499736B2 (ja) | 2010-01-29 | 2010-01-29 | 電気光学装置及び電子機器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5499736B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6167740B2 (ja) * | 2013-08-08 | 2017-07-26 | セイコーエプソン株式会社 | 電気光学装置用基板、電気光学装置、および電子機器 |
| JP6269266B2 (ja) * | 2014-04-01 | 2018-01-31 | セイコーエプソン株式会社 | 液晶装置及び電子機器並びに液晶装置の製造方法 |
| CN107632451B (zh) * | 2017-10-26 | 2020-05-12 | 京东方科技集团股份有限公司 | 一种显示面板、显示装置及显示方法 |
| JP6617778B2 (ja) * | 2018-01-29 | 2019-12-11 | セイコーエプソン株式会社 | 透過型液晶表示装置、および電子機器 |
| JP6743865B2 (ja) | 2018-10-30 | 2020-08-19 | セイコーエプソン株式会社 | 液晶装置、及び電子機器 |
| JP6927275B2 (ja) * | 2019-11-11 | 2021-08-25 | セイコーエプソン株式会社 | 液晶装置および電子機器 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001305315A (ja) * | 2000-02-14 | 2001-10-31 | Fuji Photo Film Co Ltd | 光拡散板および液晶表示装置ならびにリアプロジェクタ装置 |
| JP4207599B2 (ja) * | 2003-02-24 | 2009-01-14 | ソニー株式会社 | 液晶パネルの製造方法 |
| JP2005070157A (ja) * | 2003-08-28 | 2005-03-17 | Omron Corp | レンズアレイおよび投写型画像表示装置 |
| JP2005333042A (ja) * | 2004-05-21 | 2005-12-02 | Sony Corp | 電気光学表示装置の製造方法及び電気光学表示装置 |
| JP4696503B2 (ja) * | 2004-08-27 | 2011-06-08 | ソニー株式会社 | 画像表示装置 |
| JP2008065249A (ja) * | 2006-09-11 | 2008-03-21 | Seiko Epson Corp | 電気光学装置用基板の製造方法 |
-
2010
- 2010-01-29 JP JP2010018233A patent/JP5499736B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011158556A (ja) | 2011-08-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5589359B2 (ja) | 電気光学装置及び電子機器 | |
| JP5488136B2 (ja) | 電気光学装置及び電子機器並びにトランジスター | |
| JP5217752B2 (ja) | 電気光学装置及び電子機器 | |
| JP5423548B2 (ja) | 電気光学装置及び電子機器 | |
| JP5724531B2 (ja) | 電気光学装置及び電子機器 | |
| JP5287100B2 (ja) | 電気光学装置及び電子機器 | |
| JP5499736B2 (ja) | 電気光学装置及び電子機器 | |
| JP5018336B2 (ja) | 電気光学装置及び電子機器 | |
| JP6048553B2 (ja) | 電気光学装置及び電子機器 | |
| JP5909919B2 (ja) | 電気光学装置及び電子機器 | |
| JP2010096966A (ja) | 電気光学装置及びその製造方法、並びに電子機器 | |
| JP5298480B2 (ja) | 電気光学装置及び電子機器 | |
| JP5470894B2 (ja) | 電気光学装置及び電子機器 | |
| JP5804113B2 (ja) | 電気光学装置及び電子機器 | |
| JP2010129733A (ja) | 薄膜トランジスタ及び電気光学装置並びに電子機器 | |
| JP2009069247A (ja) | 電気光学装置、その製造方法及び電子機器、並びに配線構造 | |
| JP2010191163A (ja) | 電気光学装置及び電子機器 | |
| JP5182116B2 (ja) | 電気光学装置及び電子機器 | |
| JP2011191475A (ja) | 電気光学装置及びその製造方法、並びに電子機器 | |
| JP2009300477A (ja) | 電気光学装置及び電子機器 | |
| JP2010186118A (ja) | 電気光学装置及び電子機器 | |
| JP2011180524A (ja) | 電気光学装置及び電子機器 | |
| JP5176852B2 (ja) | 電気光学装置及び電子機器 | |
| JP5182138B2 (ja) | 電気光学装置及び電子機器 | |
| JP2011186365A (ja) | 電気光学装置及びその製造方法、並びに電子機器 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20120327 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130124 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130124 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130814 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130903 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131022 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140212 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140225 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5499736 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |