JP5474576B2 - レーザ光増幅器及びそれを用いたレーザ装置 - Google Patents

レーザ光増幅器及びそれを用いたレーザ装置 Download PDF

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Publication number
JP5474576B2
JP5474576B2 JP2010001421A JP2010001421A JP5474576B2 JP 5474576 B2 JP5474576 B2 JP 5474576B2 JP 2010001421 A JP2010001421 A JP 2010001421A JP 2010001421 A JP2010001421 A JP 2010001421A JP 5474576 B2 JP5474576 B2 JP 5474576B2
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laser
point
amplifier
incident
optical
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JP2010186990A5 (cg-RX-API-DMAC7.html
JP2010186990A (ja
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ノバック クリストフ
正人 守屋
理 若林
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Gigaphoton Inc
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Gigaphoton Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H01S3/06754—Fibre amplifiers
    • H01S3/06758—Tandem amplifiers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0064—Anti-reflection devices, e.g. optical isolaters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H01S3/0387—Helical shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2341—Four pass amplifiers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
JP2010001421A 2009-01-14 2010-01-06 レーザ光増幅器及びそれを用いたレーザ装置 Active JP5474576B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010001421A JP5474576B2 (ja) 2009-01-14 2010-01-06 レーザ光増幅器及びそれを用いたレーザ装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009005771 2009-01-14
JP2009005771 2009-01-14
JP2010001421A JP5474576B2 (ja) 2009-01-14 2010-01-06 レーザ光増幅器及びそれを用いたレーザ装置

Publications (3)

Publication Number Publication Date
JP2010186990A JP2010186990A (ja) 2010-08-26
JP2010186990A5 JP2010186990A5 (cg-RX-API-DMAC7.html) 2012-12-20
JP5474576B2 true JP5474576B2 (ja) 2014-04-16

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US (2) US8559099B2 (cg-RX-API-DMAC7.html)
JP (1) JP5474576B2 (cg-RX-API-DMAC7.html)
DE (1) DE102010000032B4 (cg-RX-API-DMAC7.html)

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JP5666285B2 (ja) 2010-03-15 2015-02-12 ギガフォトン株式会社 再生増幅器、レーザ装置および極端紫外光生成装置
JP2012109417A (ja) 2010-11-17 2012-06-07 Komatsu Ltd スラブ型増幅装置、レーザ装置および極端紫外光源装置
DE102010064147B4 (de) * 2010-12-23 2013-09-12 Rofin-Sinar Laser Gmbh Bandleiter-Laserverstärker und Laseranordnung mit einem Bandleiter-Laserverstärker
US8810902B2 (en) * 2010-12-29 2014-08-19 Asml Netherlands B.V. Multi-pass optical apparatus
WO2012176253A1 (ja) * 2011-06-20 2012-12-27 三菱電機株式会社 ガスレーザ装置
JP2013207004A (ja) * 2012-03-27 2013-10-07 Gigaphoton Inc レーザ装置
JP2013207003A (ja) * 2012-03-27 2013-10-07 Gigaphoton Inc レーザ装置
JP2013207298A (ja) * 2012-03-29 2013-10-07 Gigaphoton Inc レーザ装置、レーザシステムおよび極端紫外光生成装置
WO2013144695A1 (en) * 2012-03-29 2013-10-03 Gigaphoton Inc. Laser apparatus, laser system, and extreme ultraviolet light generation apparatus
JP6170928B2 (ja) 2012-09-18 2017-07-26 ギガフォトン株式会社 スラブ型増幅器、それを含むレーザ装置および極短紫外光生成装置
DE102012217120A1 (de) * 2012-09-24 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh EUV-Strahlungserzeugungsvorrichtung und Betriebsverfahren dafür
CN205452776U (zh) 2013-07-18 2016-08-10 三菱电机株式会社 气体激光装置
WO2015033426A1 (ja) * 2013-09-05 2015-03-12 ギガフォトン株式会社 レーザ増幅器、及びレーザ装置、並びに極端紫外光生成システム
US10090628B2 (en) * 2014-01-30 2018-10-02 Kyocera Corporation Cylinder, plasma apparatus, gas laser apparatus, and method of manufacturing cylinder
JP6521870B2 (ja) * 2014-02-10 2019-05-29 ギガフォトン株式会社 レーザ装置
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EP3248442B1 (de) * 2015-01-21 2019-01-09 TRUMPF Lasersystems for Semiconductor Manufacturing GmbH Strahlführungseinrichtung, euv-strahlungserzeugungsvorrichtung und verfahren zum einstellen eines strahldurchmessers und eines öffnungswinkels eines laserstrahls
RU2607839C2 (ru) * 2015-06-25 2017-01-20 Федеральное государственное бюджетное учреждение науки Институт прикладной физики Российской академии наук (ИПФ РАН) Многопроходный лазерный усилитель на дисковом активном элементе
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US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
CN110231288B (zh) * 2018-03-06 2022-04-08 徐州旭海光电科技有限公司 一种紧凑和稳定的光程气室
EP3997518B1 (en) * 2019-07-11 2026-07-29 ASML Netherlands B.V. A measurement system for use with a light amplification cavity
EP3793044B1 (en) 2019-09-12 2021-11-03 Kern Technologies, LLC Output coupling from unstable laser resonators
DE102020113631B3 (de) 2020-05-20 2021-10-21 Helmut-Schmidt-Universität Universität der Bundeswehr Hamburg Vorrichtung zur spektralen Verbreiterung eines Laserimpulses und Lasersystem
KR102930386B1 (ko) * 2020-08-28 2026-02-24 삼성전자주식회사 극자외선 노광 방법 및 이를 이용한 반도체 제조 방법
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US20100195196A1 (en) 2010-08-05
US9099836B2 (en) 2015-08-04
DE102010000032B4 (de) 2025-06-12
US8559099B2 (en) 2013-10-15
DE102010000032A1 (de) 2010-08-05
US20130250402A1 (en) 2013-09-26
JP2010186990A (ja) 2010-08-26

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