DE102010000032B4 - Laservorrichtung unter Benutzung eines Laserstrahl-Verstärkers - Google Patents

Laservorrichtung unter Benutzung eines Laserstrahl-Verstärkers Download PDF

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Publication number
DE102010000032B4
DE102010000032B4 DE102010000032.9A DE102010000032A DE102010000032B4 DE 102010000032 B4 DE102010000032 B4 DE 102010000032B4 DE 102010000032 A DE102010000032 A DE 102010000032A DE 102010000032 B4 DE102010000032 B4 DE 102010000032B4
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laser beam
point
laser
incident
amplifier
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German (de)
English (en)
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DE102010000032A1 (de
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Krzysztof NOWAK
Masato Moriya
Osamu Wakabayashi
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Gigaphoton Inc
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Gigaphoton Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H01S3/06754—Fibre amplifiers
    • H01S3/06758—Tandem amplifiers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0064—Anti-reflection devices, e.g. optical isolaters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H01S3/0387—Helical shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2341—Four pass amplifiers

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
DE102010000032.9A 2009-01-14 2010-01-11 Laservorrichtung unter Benutzung eines Laserstrahl-Verstärkers Active DE102010000032B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009-005771 2009-01-14
JP2009005771 2009-01-14

Publications (2)

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DE102010000032A1 DE102010000032A1 (de) 2010-08-05
DE102010000032B4 true DE102010000032B4 (de) 2025-06-12

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Country Status (3)

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US (2) US8559099B2 (cg-RX-API-DMAC7.html)
JP (1) JP5474576B2 (cg-RX-API-DMAC7.html)
DE (1) DE102010000032B4 (cg-RX-API-DMAC7.html)

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JP5666285B2 (ja) 2010-03-15 2015-02-12 ギガフォトン株式会社 再生増幅器、レーザ装置および極端紫外光生成装置
JP2012109417A (ja) 2010-11-17 2012-06-07 Komatsu Ltd スラブ型増幅装置、レーザ装置および極端紫外光源装置
DE102010064147B4 (de) * 2010-12-23 2013-09-12 Rofin-Sinar Laser Gmbh Bandleiter-Laserverstärker und Laseranordnung mit einem Bandleiter-Laserverstärker
US8810902B2 (en) * 2010-12-29 2014-08-19 Asml Netherlands B.V. Multi-pass optical apparatus
WO2012176253A1 (ja) * 2011-06-20 2012-12-27 三菱電機株式会社 ガスレーザ装置
JP2013207004A (ja) * 2012-03-27 2013-10-07 Gigaphoton Inc レーザ装置
JP2013207003A (ja) * 2012-03-27 2013-10-07 Gigaphoton Inc レーザ装置
JP2013207298A (ja) * 2012-03-29 2013-10-07 Gigaphoton Inc レーザ装置、レーザシステムおよび極端紫外光生成装置
WO2013144695A1 (en) * 2012-03-29 2013-10-03 Gigaphoton Inc. Laser apparatus, laser system, and extreme ultraviolet light generation apparatus
JP6170928B2 (ja) 2012-09-18 2017-07-26 ギガフォトン株式会社 スラブ型増幅器、それを含むレーザ装置および極短紫外光生成装置
DE102012217120A1 (de) * 2012-09-24 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh EUV-Strahlungserzeugungsvorrichtung und Betriebsverfahren dafür
CN205452776U (zh) 2013-07-18 2016-08-10 三菱电机株式会社 气体激光装置
WO2015033426A1 (ja) * 2013-09-05 2015-03-12 ギガフォトン株式会社 レーザ増幅器、及びレーザ装置、並びに極端紫外光生成システム
US10090628B2 (en) * 2014-01-30 2018-10-02 Kyocera Corporation Cylinder, plasma apparatus, gas laser apparatus, and method of manufacturing cylinder
JP6521870B2 (ja) * 2014-02-10 2019-05-29 ギガフォトン株式会社 レーザ装置
WO2016026523A1 (de) * 2014-08-20 2016-02-25 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Verfahren zum verlängern eines laufwegs eines lichtstrahls, optische verzögerungseinrichtung und treiberlaseranordnung damit
EP3248442B1 (de) * 2015-01-21 2019-01-09 TRUMPF Lasersystems for Semiconductor Manufacturing GmbH Strahlführungseinrichtung, euv-strahlungserzeugungsvorrichtung und verfahren zum einstellen eines strahldurchmessers und eines öffnungswinkels eines laserstrahls
RU2607839C2 (ru) * 2015-06-25 2017-01-20 Федеральное государственное бюджетное учреждение науки Институт прикладной физики Российской академии наук (ИПФ РАН) Многопроходный лазерный усилитель на дисковом активном элементе
US10268128B2 (en) 2015-07-08 2019-04-23 Asml Netherlands B.V. Lithographic apparatus
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
CN110231288B (zh) * 2018-03-06 2022-04-08 徐州旭海光电科技有限公司 一种紧凑和稳定的光程气室
EP3997518B1 (en) * 2019-07-11 2026-07-29 ASML Netherlands B.V. A measurement system for use with a light amplification cavity
EP3793044B1 (en) 2019-09-12 2021-11-03 Kern Technologies, LLC Output coupling from unstable laser resonators
DE102020113631B3 (de) 2020-05-20 2021-10-21 Helmut-Schmidt-Universität Universität der Bundeswehr Hamburg Vorrichtung zur spektralen Verbreiterung eines Laserimpulses und Lasersystem
KR102930386B1 (ko) * 2020-08-28 2026-02-24 삼성전자주식회사 극자외선 노광 방법 및 이를 이용한 반도체 제조 방법
CN117317786A (zh) * 2023-09-15 2023-12-29 中国科学院上海光学精密机械研究所 一种高重频单模三波长固体激光器
DE102025102744A1 (de) * 2025-01-27 2026-07-30 TRUMPF Lasersystems for Semiconductor Manufacturing SE Vorrichtung und Verfahren zum Verstärken von Laserstrahlung

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US20020167974A1 (en) * 2001-04-04 2002-11-14 Kennedy John T. Q-switched cavity dumped CO2 laser for material processing
US20050220164A1 (en) * 2004-03-31 2005-10-06 Fanuc Ltd Laser oscillator
DE102009024360A1 (de) * 2008-06-12 2010-01-07 Gigaphoton, Inc. Slab-Typ-Laser-Vorrichtung

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Publication number Priority date Publication date Assignee Title
DE10025874A1 (de) * 1999-06-01 2001-01-11 Fraunhofer Ges Forschung Optische Verstärker-Anordnung
US20020167974A1 (en) * 2001-04-04 2002-11-14 Kennedy John T. Q-switched cavity dumped CO2 laser for material processing
US20050220164A1 (en) * 2004-03-31 2005-10-06 Fanuc Ltd Laser oscillator
DE102009024360A1 (de) * 2008-06-12 2010-01-07 Gigaphoton, Inc. Slab-Typ-Laser-Vorrichtung

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US20100195196A1 (en) 2010-08-05
US9099836B2 (en) 2015-08-04
JP5474576B2 (ja) 2014-04-16
US8559099B2 (en) 2013-10-15
DE102010000032A1 (de) 2010-08-05
US20130250402A1 (en) 2013-09-26
JP2010186990A (ja) 2010-08-26

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