WO2012176253A1 - ガスレーザ装置 - Google Patents
ガスレーザ装置 Download PDFInfo
- Publication number
- WO2012176253A1 WO2012176253A1 PCT/JP2011/064014 JP2011064014W WO2012176253A1 WO 2012176253 A1 WO2012176253 A1 WO 2012176253A1 JP 2011064014 W JP2011064014 W JP 2011064014W WO 2012176253 A1 WO2012176253 A1 WO 2012176253A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- laser
- discharge
- gas
- pulse
- laser beam
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
- H01S3/073—Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
- H01S3/076—Folded-path lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
- H01S3/0816—Configuration of resonator having 4 reflectors, e.g. Z-shaped resonators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
Definitions
- the present invention relates to a pulsed laser technique using a laser gas containing CO 2 .
- a pulse width less than 100ns of short pulse CO 2 laser amplifier, CO 2 laser amplifier for cooling by forced convection a CO 2 laser gas is continuously (CW) discharge excitation laser the direction of gas flow by forced convection amplifies The direction was substantially the same as the optical axis of the light (see, for example, Patent Document 1). That is, conventionally, a high-speed axial flow type carbon dioxide laser has been used as the carbon dioxide laser (see, for example, Non-Patent Document 1).
- the laser gas is excited in a cylindrical discharge tube.
- Laser gas is flowed from one end of the cylindrical tube to the other end.
- the optical axis of the laser light is also parallel to the central axis of the cylindrical tube. That is, the laser gas flow direction is parallel to the optical axis.
- the direction of the laser gas flow refers to a direction in which most of the laser gas flows in the laser gas existing in the discharge region determined by the shape of the discharge electrode.
- the direction of gas flow represents this meaning.
- the resonator mirror may be replaced with a window. That is, the laser beam output from the oscillator is amplified by the laser gas excited in the amplifier.
- the laser gas cools the CO 2 laser gas by forced convection, and the direction of the gas flow by forced convection is substantially the same as the optical axis of the laser beam to be amplified.
- a pulse CO 2 laser having an output of 10 W is arranged in an oscillation stage, and two CW (continuous wave) -CO 2 lasers are arranged in an amplification stage.
- the pulsed CO 2 laser in the oscillation stage can generate pulsed light at a high repetition frequency (for example, 100 kHz).
- the pulsed CO 2 laser in the oscillation stage operates in a transverse mode and a single mode, and generates a laser beam having a wavelength in the vicinity of 10 ⁇ m.
- Pulsed light low power incident from the pulse CO 2 laser CW-CO 2 laser amplifier stages of the oscillation stage is amplified by progression through the carbon dioxide laser, also high laser beam high energy light harvesting is amplified Output from the stage CW-CO 2 laser.
- Non-Patent Document 2 when used as an oscillator, two lasers with a rating of 5 kW and one laser with a rating of 15 kW are connected in series and amplified, and when a pulse laser with an average input of 10 W and a pulse width of 15 ns is amplified, It is shown that the average output is about 2 kW (see, for example, Non-Patent Document 2).
- the conventional CO 2 laser amplifier has a problem that the amplification factor of the pulse laser is small.
- An object of the present invention is to provide a CO 2 laser device having a high amplification factor of a pulse laser. Specifically, when used as an oscillator, constituted the amplifier of the present invention using a CO 2 laser one having an output rating 5 kW, pulse width 10ns order, repetition frequency 100kHz, the pulsed laser light having an average output 10W It is an object of the present invention to provide an amplified pulse whose average output exceeds 2 kW when amplified.
- the laser gas flow is substantially parallel to the optical axis, and therefore, the laser gas flows along the long side of the discharge region due to this, so that the laser gas is easily heated.
- the present invention in order to suppress the temperature rise of the laser gas, in which to cool the CO 2 laser gas a CO 2 gas laser apparatus for amplifying a CO 2 laser beam to repetitively oscillated in the following short pulse pulse width 100ns ,
- the angle ⁇ formed by the optical axis of the CO 2 laser light to be amplified and the flow direction of forced convection of the CO 2 laser gas (where the angle ⁇ is defined as 0 degrees or more and 90 degrees or less) is defined as the CO 2 laser gas. Is determined by the discharge cross-sectional area and the discharge length of the space where the discharge is excited.
- the direction of the flow of the optical axis of the CO 2 laser light to be amplified and the forced convection is different from a predetermined angle determined by the discharge cross-sectional area and the discharge length.
- the guideline for the flow along the short side is that the length of the laser gas crossing the discharge region is smaller than the third root of the volume of the discharge region.
- Small signal gain of a laser medium decreases as the medium gas temperature increases. For example, in a CO 2 laser, it is inversely proportional to the medium gas temperature to the power of 2.5 (see FIG. 2 of Non-Patent Document 3). In the gas laser, it is desirable that the temperature rise of the medium gas is small.
- the direction of the optical axis of the CO 2 laser light to be amplified and the flow of the forced convection is different from a predetermined angle determined by the discharge cross-sectional area and the discharge length.
- oscillator constitutes the amplifier of the present invention using a CO 2 laser medium having an output rating 5 kW, pulse width 10ns order, repetition frequency 100kHz
- An object of the present invention is to provide a CO 2 laser device in which, when a pulse laser beam having an average output of 10 W is amplified, the average output of the amplified pulses exceeds 2 kW.
- ADVANTAGE OF THE INVENTION it becomes possible to provide an apparatus with a large amplification factor of a pulse laser.
- the average output of the amplified pulse can be over 2 kW.
- FIG. 1 is a perspective view of a pulse CO 2 laser amplifier according to a first embodiment of the present invention. It is a functional part illustration of the pulsed CO 2 laser amplifier of the first embodiment of the present invention. Is a perspective view showing an example of a typical pulsed CO 2 laser amplifier. It shows a comparison of the laser gas temperature rise in the case of using a pulsed CO 2 laser amplifier of the prior art and the present invention. It is a perspective view of a pulsed CO 2 laser amplifier of the second embodiment of the present invention. It is a functional part illustration of the pulsed CO 2 laser amplifier of the second embodiment of the present invention. It is another illustration of the functional portion of the pulse CO 2 laser amplifier of the second embodiment of the present invention. It is a block diagram showing an example of a pulse CO 2 laser amplifier system according to the third embodiment of the present invention. Is a block diagram showing an example of a pulse CO 2 laser amplifier system according to Embodiment 4 of the present invention.
- FIG. 1 A perspective view of the pulsed CO 2 laser amplifier of the present invention is shown in FIG.
- the discharge electrode is composed of an upper discharge electrode 11a and a lower discharge electrode 11b.
- Duct and window holders 15a and 15b are attached to the upper discharge electrode 11a and the lower discharge electrode 11b.
- a duct 16b is attached to the duct / window holder 15b, a heat exchanger 14 is attached to the duct 16b, a blower 13 is attached to the heat exchanger 14, and a duct 16a is attached to the blower 13.
- a pulse input side window 12a is attached to the duct / window holder 15a, and a pulse output side window 12b is attached to the duct / window holder 15b.
- the laser gas is excited substantially continuously (CW) in a discharge region D determined by a pair of discharge electrodes 11a and 11b. Discharge excitation is performed by applying an alternating voltage between the discharge electrodes 11a and 11b.
- the pulse CO 2 laser amplifier of this embodiment amplifies pulse CO 2 laser light having a pulse width on the order of 10 ns.
- the laser gas is circulated by forced convection by the function of the blower 13 and is cooled by the heat exchanger 14.
- the forced convection flow paths are duct and window holders 15a and 15b and ducts 16a and 16b, and the laser gas sent out from the blower 13 is a discharge determined by the inside of the duct 16a, the duct and window holder 15a, and the discharge electrodes 11a and 11b.
- the structure returns to the blower 13 through the region, the duct / window holder 15b, the inside of the duct 16b, and the heat exchanger 14 in this order.
- the pulse input side window 12a is held in the duct / window holder 15a
- the pulse output side window 12b is held in the duct / window holder 15b.
- the laser gas is sealed at a pressure of about 50 Torr in a space closed by the blower 13, the heat exchanger 14, the discharge electrodes 11a and 11b, the ducts 16a and 16b, the window holders 15a and 15b, and the windows 12a and 12b.
- the direction of the forced convection gas flow G in the discharge excitation space is set to be different from the optical axis of the amplified laser beam B.
- pulse CO 2 laser light having a pulse width of the order of 10 ns is introduced into the discharge region D determined by the discharge electrodes 11a and 11b through the window 12a.
- the pulse laser beam B is amplified in the discharge region D and then extracted through the window 12b.
- the periphery of the discharge region of the amplifier of the present invention is clearly shown in FIG. 2, and the length and area are defined. That is, regarding the discharge region, the length in the optical axis direction (discharge length) is L, the cross-sectional area perpendicular to the optical axis, that is, the area of the discharge cross section (same as the discharge cross-sectional area) is S D , and the area of the laser beam cross section is S r , the area of the cross section of the gas flow path of the laser gas flow is S, and the angle formed by the optical axis and the gas flow (in this case, the direction of the laser gas flow) is ⁇ (provided that the angle ⁇ is defined as 0 to 90 degrees). )
- the temperature rise of the laser gas when the same discharge power W di is input to the region where the laser beam is amplified will be compared.
- the discharge power of W di is input to a region where the laser beam is amplified (a laser beam cross-sectional area S r ⁇ cylinder region having a discharge length L).
- the shape of the discharge cross section Dc, the area S D, Gc the shape of the gas flow path section has an area with a S.
- the discharge space has a rectangular parallelepiped shape, and as a case for efficient amplification without wasting discharge power, the diameter of the circular laser beam is the length of the side of the discharge cross section.
- the discharge power of W di is input to the region (laser beam cross-sectional area S r ⁇ discharge length L cylinder) where the laser beam is amplified as described above. think of.
- the cross-sectional area S of the gas channel cross-section shape is Gc
- the cross-section area SD of the discharge cross-section shape is Gc
- the graph of FIG. 4 shows the conventional gas temperature increase (Formula 7) and the gas temperature increase of the present invention (Formula 5).
- the horizontal axis represents the angle (unit: degrees) formed by the laser optical axis and the gas flow direction
- the vertical axis represents the laser gas temperature rise (arbitrary scale).
- the broken line indicated by ⁇ T a indicates the temperature increase of the conventional example
- the solid line indicated by ⁇ T indicates the temperature increase of the present invention. Comparing the gas temperature rise of the conventional example (Formula 7) and the gas temperature rise of the present invention (Formula 5), the laser gas flow path is shifted in the direction different from the amplified laser beam by an angle represented by the following (Formula 8).
- the increase in the laser gas temperature when the same discharge power as in the conventional example is input to the region where the laser beam is amplified can be made smaller than that in the conventional example (see FIG. 4).
- the right side of (Equation 8), which is the angle threshold, is displayed as ⁇ 1 in FIG.
- the present invention can provide a pulse CO 2 laser amplifier having a large small signal gain of the laser medium.
- the small signal gain is about 3 (1 / m).
- an amplifier of the present invention when configured using a CO 2 laser medium having a rated output of 5 kW when used as an oscillator, a pulse laser beam having a pulse width of the order of 10 ns, a repetition frequency of 100 kHz, and an average output of 10 kW is amplified,
- the amplifier increases the output by 4 kW, and the average output of the amplified pulse is 14 kW.
- Embodiment 2 The second embodiment will be described below with reference to FIG.
- the pulse CO 2 laser amplifier of the second embodiment amplifies pulse CO 2 laser light having an average output of 10 W and a pulse width of 10 ns.
- the discharge electrode is composed of an upper discharge electrode 21a and a lower discharge electrode 21b.
- Duct and window holders 25a and 25b are attached to the upper discharge electrode 21a and the lower discharge electrode 21b.
- a duct 26b is attached to the duct / window holder 25b
- a heat exchanger 24 is attached to the duct 26b
- a blower 23 is attached to the heat exchanger 24, and a duct 26a is attached to the blower 23.
- a pulse input side window 22a and a mirror 27a are attached to the duct / window holder 25a
- a pulse output side window 22b and a mirror 27b are attached to the duct / window holder 25b.
- the discharge electrodes 21a and 21b, the windows 22a and 22b, the blower 23, the heat exchanger 24, the duct / window holders 25a and 25b, and the ducts 26a and 26b are the same as those in the first embodiment, and thus the description thereof is omitted.
- the mirrors 27a and 27b are installed to turn back the path of the pulse laser beam B introduced into the discharge region between the discharge electrodes 21a and 21b. Also in the second embodiment, the direction of the forced convection gas flow G is different from the optical axis of the amplified laser beam.
- pulse CO 2 laser light having a pulse width of the order of 10 ns is introduced into the discharge region through the window 22a.
- the pulsed laser beam B is sequentially folded by the mirrors 27a and 27b and travels along a Z-shaped path.
- Discharge electrodes 21a between proceeds pulsed CO 2 laser beam along the path of the Z-type, is amplified by the discharge region between 21b, Thereafter, are taken out to the outside of the housing through the window 22b.
- FIG. 7 is a functional explanatory diagram according to the second embodiment of the present invention.
- the above configuration has an optical path 1 from the window 22a to the mirror 27b, an optical path 2 from the mirror 27b to the mirror 27a, and an optical path 3 from the mirror 27a to the window 22b.
- the thick broken lines or thick solid lines indicated by P1, P2, and P3 indicate the center line of the laser beam in each optical path
- the thin broken lines indicate the laser beam radius position (the outer edge of the laser beam region) in each optical path.
- the optical path 1 and the optical path 2 share the same space in the hatched portion, and the optical path 2 and the optical path 3 also have a portion that shares the same space.
- the optical path 1 and the optical path 3 do not share the same space.
- the optical path length corresponding to the hatched portion in each optical path is shorter than the optical path length corresponding to the non-hatched portion (occupying the non-hatched portion).
- the optical path length means the length of the center line of the laser beam in each optical path.
- the pulse CO 2 laser amplifier configured as described above, it is possible to suppress an increase in the laser gas temperature as compared with the conventional amplifier. This will be described below.
- the periphery of the discharge region of the amplifier of the present invention (see FIG. 5) is clearly shown in FIG. 6, and the length and area are defined.
- a cross section obtained by cutting the discharge region along a plane perpendicular to the optical path is shown at the left end of FIG. 6, and the discharge cross section (the shape of the discharge cross section is Dc and the area is S D ) and the laser beam cross section (the shape of the laser beam cross section is Bc, The area is drawn as S r ).
- the discharge power of W di is input to a region where the laser beam is amplified (laser beam cross-sectional area S r ⁇ cylinder of discharge length L ⁇ 2).
- the discharge cross section (area S D ) has a square shape.
- the discharge power of W di is applied to the region (laser beam cross-sectional area S r ⁇ discharge length L cylinder) where the laser beam is amplified as described above.
- the region laser beam cross-sectional area S r ⁇ discharge length L cylinder
- the laser beam is amplified as described above.
- the present invention can provide a pulse CO 2 laser amplifier having a large small signal gain of the laser medium.
- an amplifier of the present invention when used as an oscillator, when an amplifier of the present invention is configured using a CO 2 laser medium having a rated output of 5 kW, and a pulse laser beam with a pulse width of the order of 10 ns, a repetition frequency of 100 kHz, and an average output of 10 W is amplified,
- the average power of the amplified pulse is about 2 kW.
- the conventional technology Becomes a pulse CO 2 laser amplifier with excellent amplification performance. Further, when ⁇ is 90 degrees, the most effective effect is obtained.
- the interaction length between the laser beam and the medium can be increased, and a laser beam with a relatively low power is used in the conventional method.
- the pulse CO 2 laser light is amplified along the Z-shaped path, but the pulse CO 2 laser may be a folded path other than the Z-shaped path. Further, a configuration may be adopted in which a plurality of pulse laser beams are amplified before being incident on the amplifier, and the respective pulse laser beams are amplified in parallel in the amplifier. The same effects as those of the present embodiment can be obtained even with the above-described configuration using a folded path other than the Z-type or the configuration in which the amplifier is amplified in parallel.
- FIG. 8 is a diagram showing an example of a pulsed CO 2 laser amplification system according to Embodiment 3 of the present invention.
- pulse amplifiers 31 and 32 are the pulse amplifiers described in the second embodiment
- pulse amplifiers 33, 34, and 35 indicate the pulse amplifiers described in the first embodiment.
- pulse CO 2 laser beam is pulsed CO 2 laser amplifier 31 having a pulse width 10 ns
- the laser beam shaping optical system 36, a pulse CO 2 laser amplifier 32, the laser beam shaping optical system 37, a pulse CO 2 laser amplifier 33, the laser beam shaping optical system 38, a pulse CO 2 laser amplifier 34 is amplified by passing through the laser beam shaping optical system 39, a pulse CO 2 laser amplifier 35 in order to obtain a CO 2 laser beam finally averaged output 20 kW.
- the laser beam shaping optical systems 36, 37, 38, and 39 are lasers of optimum sizes described in the first and second embodiments for the subsequent pulse CO 2 laser amplifiers 32, 33, 34, and 35, respectively. Has the role of supplying a beam.
- the sizes of the discharge regions of the pulse amplifiers 31, 32, 33, 34, and 35 arranged in each stage are equal. Therefore, when the pulse amplifier of the second embodiment (see FIG. 5) arranged at the front stage is compared with the pulse amplifier of the first embodiment (see FIG. 1) arranged at the rear stage, the apparatus of the second embodiment is implemented.
- the cross-sectional area of the laser beam is 1 ⁇ 4, and the interaction length of the laser beam and the medium (discharge excitation laser gas) is about three times. That is, if it is considered that the laser beam having the same power is amplified in the first or second embodiment, the light intensity of the laser beam is higher in the apparatus of the second embodiment than in the apparatus of the first embodiment.
- the interaction length of the laser beam and the medium (discharge excitation laser gas) is about 3 times.
- the saturation intensity is on the order of 1 kW. Therefore, when a pulse with an average output of 10 W order sufficiently lower than the saturation intensity is amplified, the saturation of the gain is almost negligible.
- the device of the second embodiment whose interaction length is about three times longer than that of the first device, has a gain several times higher.
- the pulse amplifier according to the second embodiment suitable for the amplification performance of the laser beam with the output number of 10 W class is preceded by the pulse amplifier according to the first embodiment suitable for the amplification performance of the laser beam with the output number of kW class.
- An amplifier is arranged in the subsequent stage to improve the efficiency of the entire amplification system.
- the amplification system is configured by five units in series. However, if the amplifier is configured by connecting two or more amplifiers including the amplifier of the first embodiment or the second embodiment in series, Similar effects can be achieved.
- FIG. 9 is a diagram showing an example of a pulsed CO 2 laser amplification system according to Embodiment 4 of the present invention.
- pulse amplifiers 31, 32, 41, and 42 are the pulse amplifiers described in the second embodiment
- pulse amplifiers 33, 34, 35, 43, 44, and 45 are the pulse amplifiers described in the first embodiment. Show.
- a pulsed CO 2 laser beam having an average output of 10 W and a pulse width of 10 ns enters the beam splitter 30 and is split into two laser beams having an output of 5 W.
- One of the two laser beams is a pulse CO 2 laser amplifier 31, a laser beam shaping optical system 36, a pulse CO 2 laser amplifier 32, a laser beam shaping optical system 37, a pulse CO 2 laser amplifier 33, a laser.
- the beam shaping optical system 38, the pulsed CO 2 laser amplifier 34, the laser beam shaping optical system 39, and the pulsed CO 2 laser amplifier 35 are sequentially amplified to obtain a CO 2 laser beam having an average output of about 20 kW.
- the other laser beam includes a pulse CO 2 laser amplifier 41, a laser beam shaping optical system 46, a pulse CO 2 laser amplifier 42, a laser beam shaping optical system 47, and a pulse CO 2 laser amplifier 43.
- the laser beam shaping optical system 48, a pulse CO 2 laser amplifier 44 is amplified by passing through the laser beam shaping optical system 49, a pulse CO 2 laser amplifier 45 in order to obtain a CO 2 laser beam finally average output of about 20kW .
- Laser beam shaping optics 36, 37, 38, 39, 46, 47, 48, 49 are implemented for the following pulse CO 2 laser amplifiers 32, 33, 34, 35, 42, 43, 44, 45, respectively. It has a role of supplying the laser beam having the optimum diameter described in Embodiment Mode 1 and Embodiment Mode 2.
- the dimensions of the discharge regions of the pulse amplifiers 31, 32, 33, 34, 35, 41, 42, 43, 44, 45 arranged in each stage are equal. Therefore, when the pulse amplifier of the second embodiment (see FIG. 5) arranged at the front stage is compared with the pulse amplifier of the first embodiment (see FIG. 1) arranged at the rear stage, the apparatus of the second embodiment is implemented. Compared to the apparatus of aspect 1, the cross-sectional area of the laser beam is 1 ⁇ 4, and the interaction length of the laser beam and the medium (discharge excitation laser gas) is about three times.
- the light intensity of the laser beam is higher in the apparatus of the second embodiment than in the apparatus of the first embodiment.
- the interaction length of the laser beam and the medium (discharge excitation laser gas) is about 3 times.
- the saturation intensity is on the order of 1 kW. Therefore, when a pulse with an average output of 10 W order sufficiently lower than the saturation intensity is amplified, the saturation of the gain is almost negligible.
- the device of the second embodiment whose interaction length is about three times longer than that of the first device, has a gain several times higher.
- the pulse amplifier according to the second embodiment suitable for the amplification performance of the laser beam with the output number of 10 W class is preceded by the pulse amplifier according to the first embodiment suitable for the amplification performance of the laser beam with the output number of kW class.
- An amplifier is arranged in the subsequent stage to improve the efficiency of the entire amplification system.
- the laser beam of one oscillator that generates pulse laser light before amplification in FIG. 9 is divided and amplified in parallel.
- two oscillators are required.
- the output is the same as when two systems of the third embodiment are prepared, that is, two laser beams of about 20 kW, and the oscillator is compared with two systems of the third embodiment. Obtained with one less configuration. Since an oscillator includes an optical crystal, it is more expensive than an amplifier. In the present embodiment, an inexpensive system is provided as compared with the case where two systems of the third embodiment are prepared.
- the amplification system is configured by 5 series ⁇ 2 parallel, but two or more amplifiers including the amplifier of Embodiment 1 or Embodiment 2 are connected in series or in parallel.
- a configured amplifier can produce the same effect.
Abstract
Description
本発明のパルスCO2レーザ増幅器の斜視図を図1に示す。
図1において、放電電極は上側の放電電極11a、下側の放電電極11bから構成されている。上側の放電電極11a、下側の放電電極11bに対して、ダクト兼ウィンドウホルダ15a、15bが取り付けられている。ダクト兼ウィンドウホルダ15bにダクト16bが、ダクト16bに熱交換器14が、熱交換器14にブロワ13が、ブロワ13にダクト16aが取り付けられている。また、ダクト兼ウィンドウホルダ15aにパルス入力側のウィンドウ12aが、ダクト兼ウィンドウホルダ15bにパルス出力側のウィンドウ12bが取り付けられている。
図1において、レーザガスは対になる放電電極11a、11bによって決まる放電領域Dにおいて実質的に連続(CW)に放電励起されている。放電励起は放電電極11a、11b間に交流電圧を印加することによって行われる
レーザガスは放電励起されると分子と電子の衝突等によって温度が上昇する。レーザが正常に動作するためには、レーザガスの温度をある温度以下に保つ必要がある。そのため、レーザガスはブロワ13の働きで強制対流によって循環させ、熱交換器14による冷却を行っている。強制対流の流路はダクト兼ウィンドウホルダ15a、15b、および、ダクト16a、16bであり、ブロワ13から送り出されたレーザガスがダクト16aの内部、ダクト兼ウィンドウホルダ15a、放電電極11a、11bによって決まる放電領域、ダクト兼ウィンドウホルダ15b、ダクト16bの内部、熱交換器14を順に通ってブロワ13に戻ってくる構造である。
パルス入力側のウィンドウ12aはダクト兼ウィンドウホルダ15aに、パルス出力側のウィンドウ12bはダクト兼ウィンドウホルダ15bに、それぞれ保持されている。
本実施の形態では、放電励起空間中における強制対流のガス流Gの方向を、増幅レーザ光Bの光軸に対して異なる方向にしている。
まず、本発明の構成の場合。図2において、レーザビームが増幅される領域(レーザビーム断面の面積Sr×放電長Lの円柱の領域)にWdiの放電電力を投入することを考える。この図において、放電断面の形状をDc、面積をSD、ガス流路断面の形状をGc、面積をSとしている。できるだけ効率的なガス流路を確保するために、放電空間は直方体形状とし、放電電力を無駄にしない効率的な増幅を行うためのケースとして円形のレーザビームの直径が放電断面の辺の長さとほぼ等しい状態、すなわちレーザビーム断面積:Sr≒(π/4)×放電断面積SDでの動作を考え、以下議論をすすめる。
Wdi=(π/4)×Wd …(式1)
である。
Wd=C・Q・ΔT …(式2)
が成り立つ。
Q=S・v …(式3)
が成り立つ(Sはガス流路の断面積[m2]、vはガスの流速[m/s])。また、
S=sqrt(SD)・L・sinθ …(式4)
である(sqrt()は平方根、以下同様)。(式1)(式2)(式3)(式4)より、ガス温度上昇は
ΔT=(4/π)Wdi/(C・sqrt(SD)・L・v・sinθ) …(式5)
である。
放電空間(放電断面積SD×放電長Lの円柱)全体に供給される放電電力をWdとすると、
Wdi=Wd …(式6)
である。
Wd=C・Q・ΔT …(式2)
は同様に成立し、ガス流量に関しては、レーザガス流が光軸とほぼ平行に放電管内を流れるため、
Q=S・v=SD・v …(式3a)
となる。
ΔT=Wdi/(C・SD・v) …(式7)
である。
θ≧arcsin(4/π×sqrt(SD)/L) …(式8)
角度の閾値である(式8)の右辺を図4ではθ1として表示した。
実施の形態2について、図5を用いて以下説明する。
本実施の形態2のパルスCO2レーザ増幅器は平均出力10W、パルス幅10nsを持つパルスCO2レーザ光を増幅する。図5において、放電電極は上側の放電電極21a、下側の放電電極21bから構成されている。上側の放電電極21a、下側の放電電極21bに対して、ダクト兼ウィンドウホルダ25a、25bが取り付けられている。ダクト兼ウィンドウホルダ25bにダクト26bが、ダクト26bに熱交換器24が、熱交換器24にブロワ23が、ブロワ23にダクト26aが取り付けられている。また、ダクト兼ウィンドウホルダ25aにパルス入力側のウィンドウ22aおよびミラー27aが、ダクト兼ウィンドウホルダ25bにパルス出力側のウィンドウ22bおよびミラー27bが取り付けられている。
本実施の形態2においても、強制対流のガス流Gの方向を、増幅レーザ光の光軸と異なる方向にしている。
本発明の増幅器(図5参照)の放電領域周辺を図6に明示して、各長さ・面積の定義をする。放電領域を光路に垂直な平面で切った断面を図6の左端に示し、放電断面(この放電断面の形状はDc、面積はSD)とレーザビーム断面(このレーザビーム断面の形状はBc、面積はSr)とを描いた。
Wdi=(π/8)×Wd …(式1a)
である。また、ガスの流量をQ[m3/s]、ガスの体積比熱をC[J/m3K]、放電場を通り抜ける際のガスの温度上昇をΔT[K]とすると、一般に
Wd=C・Q・ΔT …(式2)
が成り立つ。
Q=S・v …(式3)
が成り立つ(Sはガス流路の断面積[m2]、vはガスの流速[m/s])。また、
S=sqrt(SD)・L・sinθ …(式4)
である。(式1a)(式2)(式4)(式3)より、ガス温度上昇は
ΔT=(8/π)Wdi/(C・sqrt(SD)・L・v・sinθ) …(式5a)
である。
Wdi=Wd …(式6)
である。また、
Wd=C・Q・ΔT …(式2)
は同様に成立し、ガス流量に関しては、レーザガス流が光軸とほぼ平行に放電管内を流れるため、
Q=S・v=SD・v …(式3a)
となる。
ΔT=Wdi/(C・SD・v) …(式7)
である。
θ≧arcsin(8/π×sqrt(SD)/L) …(式8a)
だけ異なる方向にすれば、従来例と同じ放電電力をレーザビームが増幅される領域に投入したときのレーザガス温度の上昇を小さくすることができる。
また、パルス幅10nsオーダ、繰り返し周波数100kHzにおいて平均出力10Wオーダの比較的パワーの小さな入力では増幅器の利得はg0(g0=単位長さあたりの小信号利得)×(レーザビームと媒質の相互作用長)であるから、レーザビームが同一の媒質の異なる位置を2度以上通過することにより、レーザビームと媒質の相互作用長を長くすることができ、比較的パワーの小さなレーザビームを従来方式よりも高効率で増幅できる。
すなわち、本発明の効果は、従来よりも大きい電力をレーザビームが増幅される領域に投入できる構成において、比較的パワーの小さなレーザビームを従来方式よりも高効率で増幅したことである。
図8はこの発明の実施の形態3におけるパルスCO2レーザ増幅システムの一例を示す図である。図8において、パルス増幅器31および32は実施の形態2で述べたパルス増幅器であり、パルス増幅器33、34、35は実施の形態1で述べたパルス増幅器を示す。
平均出力10W、パルス幅10nsを持つパルスCO2レーザ光がパルスCO2レーザ増幅器31、レーザビーム整形光学系36、パルスCO2レーザ増幅器32、レーザビーム整形光学系37、パルスCO2レーザ増幅器33、レーザビーム整形光学系38、パルスCO2レーザ増幅器34、レーザビーム整形光学系39、パルスCO2レーザ増幅器35を順に通過して増幅され、最終的に平均出力20kWのCO2レーザ光を得る。レーザビーム整形光学系36、37、38、39は、それぞれ後に続くパルスCO2レーザ増幅器32、33、34、35に対して実施の形態1および実施の形態2で説明した最適な大きさのレーザビームを供給する役割を持つ。
すなわち、仮に同じパワーのレーザビームを実施の形態1もしくは実施の形態2で増幅することを考えた場合、実施の形態2の装置が実施の形態1の装置にくらべて、レーザビームの光強度が4倍であり、レーザビームと媒質(放電励起レーザガス)の相互作用長が約3倍であることになる。
本実施の形態においては、出力数10Wクラスのレーザビームの増幅性能に適した実施の形態2のパルス増幅器を前段に、出力数kWクラスのレーザビームの増幅性能に適した実施の形態1のパルス増幅器を後段に配し、増幅システム全体を効率化している。
図9はこの発明の実施の形態4におけるパルスCO2レーザ増幅システムの一例を示す図である。図9において、パルス増幅器31、32、41、42は実施の形態2で述べたパルス増幅器であり、パルス増幅器33、34、35、43、44、45は実施の形態1で述べたパルス増幅器を示す。
平均出力10W、パルス幅10nsを持つパルスCO2レーザ光がビームスプリッタ30に入射し、出力5Wの2本のレーザビームに分割されている。前記2本のレーザビームのうち1本のレーザビームはパルスCO2レーザ増幅器31、レーザビーム整形光学系36、パルスCO2レーザ増幅器32、レーザビーム整形光学系37、パルスCO2レーザ増幅器33、レーザビーム整形光学系38、パルスCO2レーザ増幅器34、レーザビーム整形光学系39、パルスCO2レーザ増幅器35を順に通過して増幅され、最終的に平均出力約20kWのCO2レーザ光を得る。前記2本のレーザビームのうち、もう1本のレーザビームはパルスCO2レーザ増幅器41、レーザビーム整形光学系46、パルスCO2レーザ増幅器42、レーザビーム整形光学系47、パルスCO2レーザ増幅器43、レーザビーム整形光学系48、パルスCO2レーザ増幅器44、レーザビーム整形光学系49、パルスCO2レーザ増幅器45を順に通過して増幅され、最終的に平均出力約20kWのCO2レーザ光を得る。レーザビーム整形光学系36、37、38、39、46、47、48、49は、それぞれ後に続くパルスCO2レーザ増幅器32、33、34、35、42、43、44、45に対して実施の形態1および実施の形態2で説明した最適な径のレーザビームを供給する役割を持つ。
すなわち、仮に同じパワーのレーザビームを実施の形態1もしくは実施の形態2で増幅することを考えた場合、実施の形態2の装置が実施の形態1の装置にくらべて、レーザビームの光強度が4倍であり、レーザビームと媒質(放電励起レーザガス)の相互作用長が約3倍であることになる。
本実施の形態においては、出力数10Wクラスのレーザビームの増幅性能に適した実施の形態2のパルス増幅器を前段に、出力数kWクラスのレーザビームの増幅性能に適した実施の形態1のパルス増幅器を後段に配し、増幅システム全体を効率化している。
Claims (6)
- パルス幅100ns以下の短パルスで繰り返し発振するCO2レーザ光を増幅するCO2ガスレーザ装置であって、連続放電励起されるCO2レーザガスを強制対流により循環させることによって上記CO2レーザガスの冷却を行うものにおいて、
上記増幅するCO2レーザ光の光軸と上記CO2レーザガスの強制対流の流れ方向とのなす角度θ(0度≦θ≦90度)を、上記CO2レーザガスが放電励起される空間の放電断面積と放電長とで決定することを特徴とするCO2ガスレーザ装置。 - 上記増幅するCO2レーザ光の光軸と上記強制対流の流れの方向を、上記放電断面積と上記放電長とで決まる所定の角度以上の異なる方向とすることを特徴とする請求項1に記載のCO2ガスレーザ装置。
- 上記所定の角度θは、上記放電断面積をSD、上記放電長をLとした場合、arcsin(4/π×sqrt(SD)/L)であることを特徴とする請求項2に記載のCO2ガスレーザ装置。
- 上記所定の角度θは、上記放電断面積をSD、上記放電長をLとした場合、arcsin(8/π×sqrt(SD)/L)であることを特徴とする請求項2に記載のCO2ガスレーザ装置。
- 上記CO2レーザ光が上記CO2レーザガス中を2度以上通過し、当該レーザ光の光路は、他の光路と重なる光路長が重ならない光路長より短い、2つ以上の光路を含むことを特徴とする請求項1または請求項2に記載のCO2ガスレーザ装置。
- 2つ以上の増幅器を直列あるいは並列に接続し、または直列と並列との組み合わせで接続して構成されることを特徴とする請求項1または請求項2に記載のCO2ガスレーザ装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/123,903 US8885684B2 (en) | 2011-06-20 | 2011-06-20 | Gas laser device |
DE112011105360.6T DE112011105360B4 (de) | 2011-06-20 | 2011-06-20 | Gaslaser-vorrichtung |
PCT/JP2011/064014 WO2012176253A1 (ja) | 2011-06-20 | 2011-06-20 | ガスレーザ装置 |
KR1020137033634A KR101518164B1 (ko) | 2011-06-20 | 2011-06-20 | 가스 레이저 장치 |
TW100125938A TWI495214B (zh) | 2011-06-20 | 2011-07-22 | 氣體雷射裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2011/064014 WO2012176253A1 (ja) | 2011-06-20 | 2011-06-20 | ガスレーザ装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2012176253A1 true WO2012176253A1 (ja) | 2012-12-27 |
Family
ID=47422135
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2011/064014 WO2012176253A1 (ja) | 2011-06-20 | 2011-06-20 | ガスレーザ装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8885684B2 (ja) |
KR (1) | KR101518164B1 (ja) |
DE (1) | DE112011105360B4 (ja) |
TW (1) | TWI495214B (ja) |
WO (1) | WO2012176253A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160019550A (ko) | 2013-07-18 | 2016-02-19 | 미쓰비시덴키 가부시키가이샤 | 가스 레이저 장치 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102323993B1 (ko) * | 2017-03-15 | 2021-11-10 | 에이에스엠엘 네델란즈 비.브이. | 가스를 전달하는 장치 및 고조파 방사선을 발생시키는 조명 소스 |
EP3376288A1 (en) * | 2017-03-15 | 2018-09-19 | ASML Netherlands B.V. | Apparatus for delivering gas |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04501036A (ja) * | 1988-04-22 | 1992-02-20 | フラウンホッファー―ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ. | レーザ |
JPH0590680A (ja) * | 1991-09-26 | 1993-04-09 | Amada Co Ltd | ガスレーザ発振器 |
JPH05136488A (ja) * | 1991-04-15 | 1993-06-01 | Max Planck Ges Foerderung Wissenschaft Ev | 横放電励起ガスレーザ |
JP2001015836A (ja) * | 1999-07-01 | 2001-01-19 | Nippon Steel Corp | 高出力パルスレーザ装置 |
JP2007221053A (ja) * | 2006-02-20 | 2007-08-30 | Komatsu Ltd | レーザ装置 |
JP2009246345A (ja) * | 2008-03-12 | 2009-10-22 | Komatsu Ltd | レーザシステム |
JP2010186990A (ja) * | 2009-01-14 | 2010-08-26 | Komatsu Ltd | レーザ光増幅器及びそれを用いたレーザ装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6028288A (ja) | 1983-07-27 | 1985-02-13 | Mitsubishi Electric Corp | 直交型ガスレ−ザ発振器 |
JP3301120B2 (ja) | 1992-08-21 | 2002-07-15 | 三菱電機株式会社 | ガスレーザ装置 |
JP3826228B2 (ja) * | 1997-11-28 | 2006-09-27 | 独立行政法人 日本原子力研究開発機構 | レーザー発振装置 |
JP4963149B2 (ja) | 2001-09-19 | 2012-06-27 | ギガフォトン株式会社 | 光源装置及びそれを用いた露光装置 |
WO2005104308A1 (ja) | 2004-04-21 | 2005-11-03 | Mitsubishi Denki Kabushiki Kaisha | ガスレーザ発振器およびガスレーザ加工機 |
KR100694072B1 (ko) | 2004-12-15 | 2007-03-12 | 삼성전자주식회사 | 레이저 반점을 제거한 조명계 및 이를 채용한 프로젝션시스템 |
JP5675127B2 (ja) | 2009-02-27 | 2015-02-25 | ギガフォトン株式会社 | レーザ装置および極端紫外光源装置 |
-
2011
- 2011-06-20 KR KR1020137033634A patent/KR101518164B1/ko not_active IP Right Cessation
- 2011-06-20 DE DE112011105360.6T patent/DE112011105360B4/de active Active
- 2011-06-20 WO PCT/JP2011/064014 patent/WO2012176253A1/ja active Application Filing
- 2011-06-20 US US14/123,903 patent/US8885684B2/en active Active
- 2011-07-22 TW TW100125938A patent/TWI495214B/zh not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04501036A (ja) * | 1988-04-22 | 1992-02-20 | フラウンホッファー―ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ. | レーザ |
JPH05136488A (ja) * | 1991-04-15 | 1993-06-01 | Max Planck Ges Foerderung Wissenschaft Ev | 横放電励起ガスレーザ |
JPH0590680A (ja) * | 1991-09-26 | 1993-04-09 | Amada Co Ltd | ガスレーザ発振器 |
JP2001015836A (ja) * | 1999-07-01 | 2001-01-19 | Nippon Steel Corp | 高出力パルスレーザ装置 |
JP2007221053A (ja) * | 2006-02-20 | 2007-08-30 | Komatsu Ltd | レーザ装置 |
JP2009246345A (ja) * | 2008-03-12 | 2009-10-22 | Komatsu Ltd | レーザシステム |
JP2010186990A (ja) * | 2009-01-14 | 2010-08-26 | Komatsu Ltd | レーザ光増幅器及びそれを用いたレーザ装置 |
Non-Patent Citations (1)
Title |
---|
TATSUYA ARIGA ET AL.: "High Power Pulsed C02 Laser for EUV Lithography", PROCEEDINGS OF SPIE, vol. 6151, 21 February 2006 (2006-02-21), pages 61513M * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160019550A (ko) | 2013-07-18 | 2016-02-19 | 미쓰비시덴키 가부시키가이샤 | 가스 레이저 장치 |
US9515446B2 (en) | 2013-07-18 | 2016-12-06 | Mitsubishi Electric Corporation | Gas laser device |
Also Published As
Publication number | Publication date |
---|---|
KR101518164B1 (ko) | 2015-05-15 |
US8885684B2 (en) | 2014-11-11 |
KR20140015552A (ko) | 2014-02-06 |
TWI495214B (zh) | 2015-08-01 |
DE112011105360T5 (de) | 2014-03-06 |
US20140112362A1 (en) | 2014-04-24 |
DE112011105360B4 (de) | 2023-05-04 |
TW201301694A (zh) | 2013-01-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2980788B2 (ja) | レーザ装置 | |
US7720126B2 (en) | Multi-pass laser amplifier with staged gain mediums of varied absorption length | |
JP6665106B2 (ja) | 連続波方式および疑似連続波方式で動作する超高出力の単一モード緑色ファイバレーザ | |
EP1721370A2 (en) | A laser apparatus | |
US8587863B2 (en) | Wavelength conversion device, solid-state laser apparatus, and laser system | |
JP2013222173A (ja) | レーザ装置 | |
WO2012176253A1 (ja) | ガスレーザ装置 | |
TWI499147B (zh) | Co2雷射裝置及co2雷射加工裝置 | |
US20170063018A1 (en) | Fiber-laser pumped crystal-laser | |
US11316319B2 (en) | High-power, rare-earth-doped crystal amplifier based on ultra-low-quantum-defect pumping scheme Utilizing single or low-mode fiber lasers | |
JP5414556B2 (ja) | Co2ガスレーザ装置 | |
Li et al. | 980 nm Yb-doped double-clad photonic crystal fiber amplifier and its frequency doubling | |
Russbueldt et al. | 1100 W Yb: YAG femtosecond Innoslab amplifier | |
JP2004296671A (ja) | 固体レーザ装置 | |
Noh et al. | High power generation of adaptive laser beams in a Nd: YVO 4 MOPA system | |
JP5001598B2 (ja) | 固体レーザ発振装置および固体レーザ増幅装置 | |
CN104269731B (zh) | 一种和频钠信标激光器 | |
JP2006203117A (ja) | 固体レーザ装置 | |
JP4824284B2 (ja) | 半導体レーザ励起固体レーザ装置 | |
DeMaria et al. | The CO2 laser: the workhorse of the laser material processing industry | |
Panahi et al. | Design and construction of a tunable pulsed Ti: sapphire laser | |
US9647414B2 (en) | Optically pumped micro-plasma | |
Kuznetsov et al. | Thin-disk multipass amplifier with composite Yb: YAG/YAG active element | |
JP4001077B2 (ja) | 固体レーザ増幅装置及び固体レーザ装置 | |
Nowak et al. | Efficient and compact short pulse MOPA system for laser-produced-plasma extreme-UV sources employing RF-discharge slab-waveguide CO2 amplifiers |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 11868090 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14123903 Country of ref document: US |
|
ENP | Entry into the national phase |
Ref document number: 20137033634 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1120111053606 Country of ref document: DE Ref document number: 112011105360 Country of ref document: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 11868090 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: JP |