JP5456711B2 - Deposition equipment - Google Patents

Description

  The present invention relates to a film forming apparatus for forming a film forming material on a film forming material.

  Conventionally, as a technique in such a field, a film forming apparatus described in Patent Document 1 below is known. This film forming apparatus accommodates a film forming material in a vacuum container and forms a film forming material on the surface of the film forming material.

JP 2007-217767 A

  In this type of film forming apparatus, it is necessary to detect the presence or absence of the film forming material at a predetermined position in order to control the movement of the film forming material in the vacuum container. As such a detecting means, for example, a type of sensor that detects light by applying light to a tray or the like on which a film-forming material is placed can be considered. However, when this type of sensor is used outside the vacuum vessel, it is necessary to provide a transmission portion that transmits sensor light at least on the wall of the vacuum vessel. However, since the film forming material is floating in the vacuum vessel, the film forming material can also adhere to the transmission part. Then, when the film forming material adheres to and accumulates on the transmission part, the light transmission property of the transmission part is lost, and the detection function by the sensor may not be ensured.

  In view of this problem, an object of the present invention is to provide a film forming apparatus capable of ensuring a detection function for detecting the presence or absence of a film forming material.

  A film forming apparatus of the present invention is a film forming apparatus for forming a film forming material on a film forming material, and stores a film forming material in a film forming chamber in which a film forming material is stored and a film forming process is performed. It is provided on the wall that defines the film forming chamber and the transport means for transporting the film forming material, and has a transmission part that transmits light, allowing light to be projected from the outside to the inside of the film forming chamber. And a detecting means that is provided outside the film forming chamber, detects the presence / absence of a film forming material inside the film forming chamber by transmitting sensor light through the transmitting portion of the window portion, and transmission And a deposition suppressing means for suppressing deposition of the film forming material on the part.

  In this film forming apparatus, deposition of the film forming material on the transmission part is suppressed by the deposition suppressing means, so that deterioration of the transmission state of the sensor light due to the deposited film forming material can be suppressed. A detection function for detecting the presence or absence of the film forming material can be ensured.

  Specifically, the deposition suppressing means may evaporate the film forming material attached to the transmission part and suppress the adhesion of the film forming material to the transmission part.

  More specifically, the deposition suppressing unit may include a heating unit that heats the transmission unit. According to this structure, the film-forming material adhering to the transmission part can be heated and evaporated to suppress adhesion.

  Further, the heating unit may be provided on the inner side of the film formation chamber than the wall portion. If the heating part is provided on the inner side of the wall part, it is possible to suppress complication of the structure around the transmission part related to heating.

  Further, as a specific configuration, the window portion is provided on the inner side of the film forming chamber with respect to the wall portion and includes a cylindrical portion that allows sensor light to pass through the hollow portion, and the transmission portion is provided in the hollow portion of the cylindrical portion. The heating part may be provided so as to surround the side surface of the end part of the cylindrical part and the transmission part. According to this structure, the heat of a heating part is efficiently transmitted to a permeation | transmission part through a cylindrical part.

  In addition, the heating unit may be provided on the outer side of the film formation chamber with respect to the wall portion. If the heating part is provided outside the wall part, the space in the film forming chamber can be saved.

  Further, as a specific configuration, the window portion is provided on the outer side of the film forming chamber with respect to the wall portion and includes a cylindrical portion that allows the sensor light to pass through the hollow portion, and the transmission portion is provided in the hollow portion of the cylindrical portion. The heating part may be provided so as to surround the side surface of the end part of the cylindrical part and the transmission part. According to this structure, the heat of a heating part is efficiently transmitted to a permeation | transmission part through a cylindrical part.

  As a specific configuration, the window portion is provided on the inner side of the film forming chamber with respect to the transmission portion, and a cylindrical body having a hollow portion that allows sensor light to pass therethrough, and a window portion that is provided in the hollow portion and transmits the sensor light. The transmission part is partitioned from the space where the film forming material floats by the cylinder and the second transmission part, and the second transmission part is detachable from the cylinder. It may be provided. In this case, the 2nd permeation | transmission part functions as a deposition suppression means. In addition, since the second transmission part is detachable from the cylindrical body, the second transmission part can be easily replaced even when the film forming material is deposited on the second transmission part, and the sensor light A transmission state can be secured.

  The film forming material may be selenium. Selenium has a property of thickly adhering to the transmissive part, and also has a low light transmittance when adhering to it, and thus tends to hinder light transmission in the transmissive part. Therefore, when the film forming material is selenium, the necessity for the above-described deposition suppressing means is particularly high.

  According to the film forming apparatus of the present invention, it is possible to secure a detection function for detecting the presence or absence of a film forming material.

It is sectional drawing which looked at the film-forming apparatus which concerns on 1st Embodiment of this invention from the side. It is sectional drawing which looked at the film-forming apparatus of FIG. 1 from upper direction. It is a figure explaining the multi-source vapor deposition method performed with the film-forming apparatus of FIG. It is sectional drawing of a CIGS solar cell provided with a CIGS electric power generation layer. It is sectional drawing of the film-forming apparatus which performs the multi-source vapor deposition method by a stationary film-forming method. It is sectional drawing which looked at the film-forming apparatus which concerns on 2nd Embodiment of this invention from the side. It is sectional drawing which looked at the film-forming apparatus of FIG. 6 from upper direction. It is sectional drawing which looked at the film-forming apparatus which concerns on 3rd Embodiment of this invention from the side. It is sectional drawing which looked at the film-forming apparatus of FIG. 8 from upper direction.

  Hereinafter, preferred embodiments of a film forming apparatus according to the present invention will be described in detail with reference to the drawings. If necessary, an XYZ coordinate system in which the Z axis is a vertical axis and the XY plane is a horizontal plane is set, and X, Y, and Z may be used for explanation as shown in the drawings. In addition, with the Z direction facing upward, words including the concepts of “upper” and “lower” may be used in the description.

(First embodiment)
A film forming apparatus 1 shown in FIGS. 1 and 2 includes a chamber 3 that internally defines a vacuum film forming chamber 2, and a workpiece (film forming material) W accommodated in the film forming chamber 2. This is an apparatus for performing a film forming process using selenium or the like as a film forming material by a multi-source deposition method (MSD). For example, the film forming apparatus 1 is used for forming a selenium deposited film on a glass substrate that is a material of a solar cell.

  As shown in FIG. 3, the multi-source vapor deposition method performed in the film forming apparatus 1 according to the present embodiment is performed while conveying the work W with the mask in the film forming chamber 2. As shown in the figure, a heater 44 is disposed above the transfer path of the workpiece W in the film forming chamber 2 of the film forming apparatus 1. Further, two selenium vapor deposition source units 45, 45 are arranged in the Y direction below the work W conveyance path. A selenium vapor deposition source 45 a installed outside the film forming chamber 2 is connected to the selenium vapor deposition source units 45, 45.

  Further, below the selenium vapor deposition source units 45, 45, vapor deposition sources 46, 47, 48 of other vapor deposition materials (copper, indium, gallium) are provided. In FIG. 3, the vapor deposition sources 46, 47, 48 appear to overlap because they are arranged in the Y direction perpendicular to the paper surface, but in a plan view, the vapor deposition is performed between the two selenium vapor deposition source units 45, 45. Sources 46, 47, and 48 are sequentially arranged in the Y direction. The tray 5 on which the workpiece W is placed is provided with an opening (not shown), and the vapor deposition material generated from the selenium vapor deposition source unit 45 and the vapor deposition sources 46, 47, 48 passes through the opening. Vapor deposition is mainly performed on the lower surface, and a selenium vapor deposition film is formed on the workpiece W.

  As shown in FIG. 1 and FIG. 2, in the film forming chamber 2 of the film forming apparatus 1, a tray 5 on which the work W is placed and moved so as to move the work W in the film forming chamber 2. And a transport device 7 for transporting the tray 5. The transfer device 7 is a known device that uses a motor as a power source, and in the film forming chamber 2, a plurality of trays 5 arranged in the Y direction can be continuously transferred in the Y direction. There is an outlet from the film forming chamber 2 downstream of the transfer of the tray 5, and there is an openable / closable door for pressure control in the film forming chamber 2. For example, in order to control the timing of opening and closing the door, it is necessary to detect whether or not the tray 5 has reached a predetermined position, and thus whether or not the workpiece W exists at the predetermined position.

  Therefore, the film forming apparatus 1 includes a detecting unit that detects whether or not the tray 5 exists at a predetermined position in the film forming chamber 2. The detection means includes a travel sensor (detection means) 11 provided outside the film formation chamber 2, and a view port (window portion) that passes the sensor light emitted from the travel sensor 11 and guides it into the film formation chamber 2. 13). Due to the presence of the view port 13, it is possible to project light from the traveling sensor 11 outside the film forming chamber 2 into the film forming chamber 2. The travel sensor 11 and the viewport 13 are provided on a wall 3 a parallel to the YZ plane among the partition walls of the chamber 3.

  The sensor light emitted from the travel sensor 11 toward the inside of the film formation chamber 2 passes through the view port 13 and is emitted in the X direction. The optical axis of the sensor light is indicated by “A”. The wall 3d facing the wall 3a is provided with a view port 13 ′ and a light receiving unit 17 located on the optical axis A, and the sensor light passes through the view port 13 ′ and enters the light receiving unit 17. It is in a positional relationship. Although the detailed illustration of the viewport 13 ′ is omitted, the viewport 13 ′ may have the same configuration as the viewport 13. When the sensor light is incident on the light receiving portion 17, it is recognized that the tray 5 does not exist at a predetermined position between the traveling sensor 11 and the light receiving portion 17. And when the tray 5 exists in the predetermined position in the film-forming chamber 2, the light shielding part 5a of the tray 5 is located on the optical axis A and blocks the sensor light, so that the sensor light does not enter the light receiving part 17, The presence of the tray 5 at the predetermined position is recognized.

  Next, the viewport 13 will be described in more detail. Hereinafter, in the description of the components of the viewport 13, the inner side (left side in FIGS. 1 and 2) of the film forming chamber 2 is “front” and the outer side of the film forming chamber 2 (FIGS. 1 and 2). In this case, the word “front” and “back” may be used to describe the positional relationship.

  The viewport 13 includes a transparent partition glass 21 that partitions the vacuum in the film formation chamber 2 from the outside atmosphere. The partition glass 21 is fixed to the outside of the wall 3a through an O-ring 21a, is positioned on the optical axis A, and transmits sensor light. The partition glass 21 is a transparent heat-resistant glass having a thickness of 6 mm or more, for example. Further, the viewport 13 includes a cylindrical portion 23 made of SUS positioned in front of the partition glass 21 and closer to the inside of the film forming chamber 2 than the wall 3a. The optical axis A passes through the hollow portion 23 a of the cylindrical portion 23. The rear end side of the cylindrical portion 23 is embedded in the wall 3a, and an anti-adhesion glass (transmission portion) 27 located on the optical axis A is fitted into the hollow portion 23a on the front end side of the cylindrical portion 23. It is. The deposition preventing glass 27 transmits sensor light. In addition, since the communication hole 23b is provided in the upper part of the cylindrical part 23, the inside of the hollow part 23a is also evacuated similarly to the film-forming chamber 2. With the configuration of the view port 13 described above, the sensor light emitted from the travel sensor 11 passes through the partition glass 21, passes through the hollow portion 23 a, passes through the deposition glass 27, and is irradiated into the film forming chamber 2. Is done.

  The film forming material floats in the film forming chamber 2, and when the film forming material adheres and deposits on a transparent member such as the partition glass 21 or the deposition preventing glass 27, the transmission state of the sensor light deteriorates, and the tray 5 It becomes impossible to detect the presence or absence. In this film forming apparatus 1, the deposition glass 27 is placed in front of the partition glass 21 to suppress deposition of the film forming material on the partition glass 21. The deposition and deposition of the film forming material causes the same problem. Therefore, a means for suppressing the deposition of the film forming material on the deposition preventing glass 27 is desired. In particular, selenium used as a film forming material in the film forming apparatus 1 has a property of adhering thickly to the anti-adhesion glass 27 and the like, and the light transmittance when adhering is low. It tends to be an obstacle. Therefore, when selenium is used as a film forming material, the necessity for suppressing deposition is particularly high.

  Therefore, the view port 13 of the film forming apparatus 1 includes a heater (heating unit, deposition suppressing means) 31 for heating the deposition preventing glass 27. The heater 31 is wound around the side surface on the front end side of the tubular portion 23. And the cylindrical part 23 is heated by supplying with electricity to the heater 31 from the electric power feeding part 33, and the deposition prevention glass 27 is heated indirectly. Since the heater 31 is provided so as to surround the side surface of the cylindrical portion 23 and the deposition preventing glass 27, the heat of the heater 31 is efficiently transmitted to the deposition preventing glass 27. Moreover, it is also a factor which improves the heat-transfer efficiency that the cylindrical part 23 is a product made from SUS. Further, a reflection plate 35 that reflects the radiant heat from the heater 31 is provided so as to surround the heater 31, and the heat transfer efficiency to the deposition preventing glass 27 is further enhanced.

  According to this configuration, since the deposition preventing glass 27 is heated, the film forming material attached to the deposition preventing glass 27 is sublimated (evaporated) by the heat of the deposition preventing glass 27. Further, since the film forming material to be attached to the deposition preventing glass 27 is sublimated immediately after the deposition, the deposition itself of the deposition material to the deposition preventing glass 27 is suppressed. Therefore, the deposition of the film forming material on the deposition preventing glass 27 is suppressed, and deterioration of the transmission state of the sensor light due to the deposited film forming material can be suppressed. As a result, the detection function of the travel sensor 11 can be ensured, and the workpiece W conveyance can be accurately controlled. In order to obtain such effects, the heating temperature of the deposition preventing glass 27 is about 150 ° C. in consideration of the evaporation temperature of selenium (120 ° C.). In the case where another film forming material is used, the heating temperature of the deposition preventing glass 27 may be appropriately set in consideration of the evaporation temperature of the film forming material.

  In addition, since the heater 31, the cylindrical portion 23, and the deposition glass 27 are provided at a position on the inner side of the film forming chamber 2 with respect to the wall 3a, the structure in which the film forming chamber 2 is vacuum-sealed in the view port 13 is also provided. It is not complicated and the increase in the number of parts can be suppressed.

  Here, as another configuration for securing the transmission state of the sensor light, a configuration in which the deposition preventing glass 27 is omitted and a heating unit for heating the partition glass 21 is also conceivable. However, since the partition glass 21 seals the vacuum film formation chamber 2 from the atmosphere, it is attached via the O-ring 21a. Therefore, when the configuration for heating the partition glass 21 is employed, a special O-ring 21a made of a material with little thermal degradation may be employed in order to avoid degradation of the sealing function due to thermal degradation of the O-ring 21a. I need it. If such a special O-ring 21a is adopted, the partition glass 21 can be directly heated to suppress adhesion of the film forming material to the partition glass 21, and the deposition preventing glass 27 and its surrounding components are omitted. Thus, the number of parts can be reduced.

  On the other hand, in the film forming apparatus 1 described above, the deposition glass 27 is provided in front of the partition glass 21 in order to eliminate the need for the special O-ring as described above, and the space (hollow portion) where the film forming material is thin. 23a) is formed between the deposition preventing glass 27 and the partition glass 21, and the deposition preventing glass 27 is heated. Since the protective glass 27 is not a partition between spaces having different pressures and an O-ring is not required, problems such as deterioration of the O-ring do not occur even if the protective glass 27 is heated.

  The film formation apparatus 1 demonstrated above is used for film-forming of the CIGS electric power generation layer of a CIGS solar cell as a suitable one application example, for example. FIG. 4 shows an example of a CIGS solar cell. As shown in the figure, a CIGS solar cell 70 is formed by laminating a Mo back electrode 72, a CIGS power generation layer 73, a buffer layer 74, and a transparent conductive film 75 in this order on a soda lime glass 71. It becomes. The Mo back electrode 72 is formed by sputtering, the CIGS power generation layer 73 is formed by selenization or multi-source evaporation, the buffer layer 74 is formed by sputtering, and the transparent conductive film 75 is formed by RPD or sputtering. Alternatively, the film is formed by a CVD method. Among these, the film formation of the CIGS power generation layer 73 is performed by the film formation apparatus 1 using a multi-source deposition method.

  In addition to the method using the film forming apparatus 1, as another general multi-source vapor deposition method, there is a static film forming method in which a workpiece is kept stationary without being conveyed. In the stationary film forming method, as shown in FIG. 5, the work W provided with a mask is placed in the film forming chamber 52 of the film forming apparatus 51. For example, in the film forming chamber 52, the temperature sensor 53 and the heater 54 are sequentially disposed above the work W, and the opening plate 56 having the opening 56 a and the shutter 58 are sequentially disposed below the work W. And 1st-nth vapor deposition source 60a, 60b, 60c, ... is arrange | positioned under a shutter. In the case of generating a selenium vapor deposition film, copper, indium, gallium and selenium are applied to the first to nth vapor deposition sources (film formation materials). Since the multi-source deposition method is a known method, further detailed description is omitted.

(Second Embodiment)
A film forming apparatus 201 shown in FIGS. 6 and 7 includes a view port 213 instead of the view port 13 in the film forming apparatus 1. Hereinafter, in the film forming apparatus 201, the same or equivalent components as those of the above-described film forming apparatus 1 are denoted by the same reference numerals, and redundant description is omitted.

  The view port 213 includes a deposition prevention tube 251 that penetrates the wall 3 a of the chamber 3. The optical axis A passes through the hollow portion 251a of the deposition preventing tube 251. An adhesion prevention glass (transmission part) 227 is provided immediately behind the rear end of the adhesion prevention pipe 251. Furthermore, the view port 213 includes a cylindrical portion (cylindrical portion) 223 made of SUS provided behind the protection tube 251. The anti-adhesion glass 227 is fitted into the hollow portion 223 a at the front end portion of the cylindrical portion 223. A partition glass 221 is provided behind the tubular portion 223, and the travel sensor 11 is provided behind the partition glass 221. With the configuration of the view port 213 described above, the sensor light emitted from the travel sensor 11 passes through the partition glass 221, passes through the hollow portion 223 a of the cylindrical portion 223, passes through the deposition glass 227, and is installed on the deposition tube. The film 251 is irradiated into the film forming chamber 2 through the hollow portion 251a. As with the film forming apparatus 1 (FIG. 1), the wall 3d facing the wall 3a is provided with a view port 13 ′ and a light receiving unit 17 located on the optical axis A, but the illustration thereof is omitted. doing.

  Further, in this film forming apparatus 201, since the hollow portion 251a of the deposition preventing tube 251 is exposed to the film forming material in the film forming chamber 2, the film forming material adheres to the inner wall surface of the hollow portion 251a. Therefore, the deposition tube 251 is periodically replaced so that the film forming material deposited and deposited on the hollow portion 251a does not block the sensor light.

  Further, the viewport 213 includes a heater (heating unit, deposition suppressing means) 231 for heating the deposition preventing glass 227. The heater 231 is wound around the side surface on the front end side of the cylindrical portion 223. And the cylindrical part 223 is heated by supplying electric power to the heater 231 from the electric power feeding part 233, and the deposition prevention glass 227 is heated indirectly. Since the heater 231 is provided so as to surround the side surface of the cylindrical portion 223 and the deposition preventing glass 227, the heat of the heater 231 is efficiently transmitted to the deposition preventing glass 227. Moreover, it is also a factor which improves the heat-transfer efficiency that the cylindrical part 223 is a product made from SUS. Further, a reflection plate 235 that reflects the radiant heat from the heater 231 is provided so as to surround the heater 231, and the heat transfer efficiency to the deposition preventing glass 227 is further enhanced.

  Further, in such a configuration of the viewport 213, since the cylindrical portion 223, the deposition preventing glass 227, and the heater 231 are provided outside the film forming chamber 2, the vacuum case portion 253 for housing them is provided with the wall 3a. It protrudes from the outside and is provided. The partition glass 221 is attached to the rear end portion of the vacuum case portion 253 via an O-ring 221a, and seals the vacuum film formation chamber 2 from the atmosphere. In order to cool the rear end portion of the vacuum case portion 253 in order to suppress the deterioration of the O-ring 221a due to the heat of the heater 231, a cooling water passage 253a for flowing the cooling water is provided at the rear end portion of the vacuum case portion 253. Yes.

  In the film forming apparatus 201, the same effect as that of the film forming apparatus 1 described above is achieved by heating the deposition preventing glass 227 with the heater 231. That is, the deterioration of the transmission state of the sensor light can be suppressed, the detection function of the travel sensor 11 can be ensured, and the workpiece W conveyance can be accurately controlled. In addition, since the configuration in which the cylindrical portion 223, the deposition glass 227, and the heater 231 are provided on the outer side of the film forming chamber 2 with respect to the wall 3a is adopted, the space inside the film forming chamber 2 can be saved. it can. Further, when a viewport is added to an existing film formation apparatus, each element of the viewport 213 can be attached to the outside of the wall 3a even if there is no room in the film formation chamber 2. it can.

(Third embodiment)
A film deposition apparatus 301 shown in FIGS. 8 and 9 includes a view port 313 instead of the view port 13 in the film deposition apparatus 1. Hereinafter, in the film forming apparatus 301, the same or equivalent components as those of the above-described film forming apparatuses 1 and 201 are denoted by the same reference numerals, and redundant description is omitted.

  The viewport 313 includes an adhesion-preventing tube (tubular body) 351 provided in front of the partition glass 21. The optical axis A passes through the hollow portion 351a of the deposition preventing tube 351. The rear end side of the protection tube 351 is inserted into a through hole 3b formed in the wall 3a. An adhesion-preventing glass (second transmission part) 327 is detachably attached to the center part in the longitudinal direction of the adhesion-preventing tube 351. For example, the deposition tube 351 is formed with a slit for inserting a plate-shaped deposition glass 327 parallel to the YZ plane from above, and the deposition glass 327 can be inserted into and removed from the slit. . The deposition preventing glass 327 is inserted so as to divide the hollow portion 351a of the deposition preventing tube 351 in the front-rear direction, and is disposed so as to cross the optical axis A. Sensor light from the travel sensor 11 passes through the partition glass 21 and passes through the through hole 3b. Further, the sensor light is transmitted through the deposition preventing glass 327 when passing through the hollow portion 351 a of the deposition preventing tube 351 and is irradiated into the film forming chamber 2. As with the film forming apparatus 1 (FIG. 1), the wall 3d facing the wall 3a is provided with a view port 13 ′ and a light receiving unit 17 located on the optical axis A, but the illustration thereof is omitted. doing.

  According to this configuration, the deposition preventing tube 351 is provided in front of the partition glass (transmission portion) 21, and the deposition preventing glass (deposition suppressing means) 327 exists in the hollow portion 351 a of the deposition preventing tube 351. The partition glass 21 is partitioned from the space of the film forming chamber 2 where the film forming material floats. Therefore, it is difficult for the film forming material floating in the film forming chamber 2 to reach the partition glass 21. Therefore, deposition of the film forming material on the partition glass 21 is suppressed, and deterioration of the transmission state of the sensor light due to the film forming material deposited on the partition glass 21 can be suppressed. In this case, the deposition material is relatively in contact with the deposition glass 327, but the deposition glass 327 can be easily attached and detached even when the deposition material is deposited on the deposition glass 327. The transmission state of the sensor light can be recovered. In addition, by periodically replacing the deposition glass 327, the sensor light transmission state in the deposition glass 327 can be favorably maintained. As a result, the detection function of the travel sensor 11 can be ensured, and the workpiece W conveyance can be accurately controlled.

  The present invention is not limited to the first to third embodiments described above. For example, in the first and second embodiments, an optical frequency heater may be used to heat the deposition preventing glasses 27 and 227. Further, a heater may be built in the deposition preventing glass 27, 227 and the heater may be directly heated. Further, the means for suppressing the adhesion / deposition of the film forming material is not limited to heating the deposition preventing glass 27, 227, and the deposition preventing glass 27, 227 may be charged. In the first to third embodiments, the presence / absence of the tray 5 is detected in order to indirectly detect the presence / absence of the work W. However, the sensor W is irradiated with the sensor light to directly detect the presence / absence of the work W. May be. In the first to third embodiments, a transmissive sensor is used as the detection unit, but a reflective sensor may be used. In the first to third embodiments, the present invention is applied to a film forming apparatus using a multi-source deposition method (MSD). However, a film forming method using another film forming method (for example, a plasma film forming method or a sputtering method) is used. It is also applicable to the device.

  DESCRIPTION OF SYMBOLS 1,201,301 ... Film formation apparatus, 2 ... Film formation chamber, 3 ... Chamber, 3a ... Wall part, 5 ... Tray, 7 ... Conveyance apparatus (conveyance means), 11 ... Travel sensor (detection means), 13,213 , 313 ... Viewport (window part), 21 ... Partition glass, 23, 223 ... Cylindrical part, 23a, 223a ... Hollow part of the cylindrical part, 27, 227 ... Anti-adhesion glass (transmission part), 31, 231, 331... Heater (heating unit, deposition suppressing means), 327 .. deposition preventing glass (second transmission part), 351... Cylindrical body, 351a.

Claims (9)

A film forming apparatus for forming a film forming material on a film forming material,
A film forming chamber for storing the film forming material and performing a film forming process;
A transfer means provided in the film forming chamber for transferring the film forming material;
A window that is provided on a wall that defines the film formation chamber, has a transmission part that transmits light, and allows light to be projected from the outside to the inside of the film formation chamber;
A detecting means provided outside the film forming chamber, for detecting the presence or absence of the film forming material inside the film forming chamber by transmitting sensor light through the transmitting portion of the window portion;
Deposition suppression means for suppressing deposition of the film forming material on the transmission part;
A film forming apparatus comprising:   2. The film forming apparatus according to claim 1, wherein the deposition suppressing unit evaporates the film forming material attached to the transmission part and suppresses the adhesion of the film forming material to the transmission part.   The film deposition apparatus according to claim 1, wherein the deposition suppressing unit includes a heating unit that heats the transmission unit.   The film forming apparatus according to claim 3, wherein the heating unit is provided closer to the inside of the film forming chamber than the wall portion. The window portion is provided on the inner side of the film forming chamber with respect to the wall portion and includes a cylindrical portion that allows the sensor light to pass through a hollow portion.
The transmission part is provided in the hollow part of the cylindrical part,
The film forming apparatus according to claim 4, wherein the heating unit is provided so as to surround a side surface of the end portion of the cylindrical portion and the transmission unit.   The film forming apparatus according to claim 3, wherein the heating unit is provided outside the film forming chamber with respect to the wall. The window portion is provided on the outer side of the film forming chamber with respect to the wall portion and includes a cylindrical portion that allows the sensor light to pass through a hollow portion.
The transmission part is provided in the hollow part of the cylindrical part,
The film forming apparatus according to claim 6, wherein the heating unit is provided so as to surround a side surface of the end portion of the cylindrical portion and the transmission unit. The window is
A cylindrical body provided on the inner side of the film forming chamber with respect to the transmission portion, and having a hollow portion that allows the sensor light to pass through;
A second transmission part provided in the hollow part and transmitting the sensor light,
The transmission part is partitioned from the space in which the film forming material floats by the cylindrical body and the second transmission part,
The film forming apparatus according to claim 1, wherein the second transmission unit is detachably attached to the cylindrical body.   The film forming apparatus according to claim 1, wherein the film forming material is selenium.

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