KR101361289B1 - Film forming apparatus - Google Patents

Abstract

[PROBLEMS] To provide a film forming apparatus capable of securing a detection function for detecting the presence or absence of a film forming material.
[Fixing means] The film forming apparatus 1 is a film forming apparatus for forming a film forming material onto the work W. The film forming apparatus 2 accommodates the work W and performs the film forming process, and the interior of the film forming chamber 2. Installed on the conveying apparatus 7 for conveying the workpiece W and the wall 3a for partitioning the film forming chamber 2, and having an anti-glare glass 27 that transmits light. It is provided in the viewport 13 which enables light transmission from the outside of 2) to the inside, and is formed outside the film forming chamber 2, and transmits the sensor light by transmitting the adhesion glass 27 of the viewport 13 to the film forming room. The traveling sensor 11 which detects the presence or absence of the workpiece | work W in (2), and the heater 31 for suppressing deposition of the film-forming material on the adhesion glass 27 are provided.

Description

Film forming apparatus

The present invention relates to a film forming apparatus for forming a film forming material on a film forming material.

Conventionally, the film-forming apparatus of following patent document 1 is known as a technique of this field. This film forming apparatus accommodates a film forming material in a vacuum container and forms a film forming material on the surface of the film forming material.

Japanese Patent Publication No. 2007-217767

In this type of film forming apparatus, it is necessary to detect the presence or absence of the film forming material at a predetermined position in order to control the movement of the film forming material in the vacuum container. As such detection means, for example, a sensor or the like that detects light by applying light to a tray or the like on which a film is formed can be considered. However, when using this type of sensor disposed outside the vacuum vessel, it is necessary to provide a transmissive portion that transmits the sensor light at least on the wall of the vacuum vessel. However, since the film forming material is suspended in the vacuum vessel, the film forming material may be attached to the permeable part. When the film-forming material adheres to and is deposited on the transmissive portion, the light transmittance of the transmissive portion is lost, and the detection function by the sensor may not be secured.

In view of such a problem, an object of the present invention is to provide a film forming apparatus capable of securing a detection function for detecting the presence or absence of a film forming material.

The film forming apparatus according to the present invention is a film forming apparatus for forming a film forming material onto a film forming material, and is formed inside a film forming chamber for storing the film forming material and performing a film forming process, and conveys the film forming material. A window portion provided at the wall portion for partitioning the deposition chamber and having a transmission portion for transmitting light, and allowing light transmission from the outside of the deposition chamber to the interior; Detecting means for detecting the presence or absence of a film forming material in the film forming chamber by transmitting the sensor light through the transmission part of the window, and depositing suppressing means for suppressing deposition of the film forming material in the transmitting part. It is characterized by being provided.

This film deposition apparatus suppresses the deterioration of the transmission state of the sensor light due to the deposited film deposition material because deposition of the film deposition material on the transmission portion is suppressed by the deposition inhibiting means, and as a result, the presence or absence of the film formation material can be detected. The detection function can be ensured.

In addition, the deposition inhibiting means may evaporate the film forming material adhering to the permeable part and suppress the adhesion of the film forming material to the permeable part.

More specifically, the deposition inhibiting means may be provided with a heating section for heating the permeation section. According to this structure, deposition can be suppressed by heating and evaporating the film-forming material adhering to the permeation part.

In addition, the heating section may be provided on the inside of the film formation chamber rather than the wall section. If the heating portion is provided on the inner side of the wall portion, the complexity of the structure around the permeation portion related to the heating can be suppressed.

Moreover, as a specific structure, the window part is provided in the inside of the film-forming chamber rather than the wall part, and is provided with the cylindrical part which passes a sensor light in a hollow part, and the transmission part is provided in the hollow part of a cylindrical part. The heating part may be provided so as to surround the side surface and the permeation | transmission part of the edge part of a cylindrical part. According to this structure, the heat of a heating part is efficiently transmitted to a permeation | transmission part through a cylindrical part.

In addition, the heating section may be provided on the outside of the deposition chamber rather than the wall section. If the heating section is provided on the side outside the wall section, the space in the film formation chamber can be saved.

Moreover, as a specific structure, the window part is provided in the outer side of the film-forming chamber rather than the wall part, is provided with the cylindrical part which passes a sensor light in a hollow part, the permeable part is provided in the hollow part of a cylindrical part, and a heating part is It may be provided so as to surround the side surface of the end part of a cylindrical part, and a permeable part. According to this structure, the heat of a heating part is efficiently transmitted to a permeation | transmission part through a cylindrical part.

Moreover, as a specific structure, a window part is provided in the inside of a film-forming chamber rather than a transmission part, and has a cylindrical body which has a hollow part which let a sensor light pass, and a 2nd transmission part which is provided in a hollow part and permeate | transmits a sensor light. The permeable portion may be partitioned from a space in which the film forming material floats by the cylindrical body and the second permeable portion, and the second permeable portion may be detachably attached to the cylindrical body. In this case, the second transmission portion functions as a deposition inhibiting means. In addition, since the second transmission part is detachable from the cylinder, even when the film-forming material is deposited on the second transmission part, the second transmission part can be easily replaced, thereby ensuring the transmission state of the sensor light.

The film forming material may be selenium. Since selenium has a property of thickly adhering to the transmissive part and also has a low transmittance of light in the case of adhering, selenium tends to inhibit light transmission in the transmissive part. Therefore, in the case where the film forming material is selenium, the necessity of the above-described deposition inhibiting means is particularly high.

According to the film forming apparatus of the present invention, a detection function for detecting the presence or absence of a film forming material can be ensured.

1: is sectional drawing which looked at the film-forming apparatus which concerns on the 1st Embodiment of this invention from the side.
FIG. 2 is a cross-sectional view of the film forming apparatus of FIG. 1 viewed from above. FIG.
FIG. 3 is a view for explaining a multiple deposition method performed by the film forming apparatus of FIG. 1.
4 is a cross-sectional view of a CIGS solar cell having a CIGS power generation layer.
5 is a cross-sectional view of a film forming apparatus for performing a multiple deposition method according to a still film forming method.
6 is a cross-sectional view of the film forming apparatus according to the second embodiment of the present invention as seen from the side.
FIG. 7 is a cross-sectional view of the film forming apparatus of FIG. 6 viewed from above. FIG.
8 is a cross-sectional view of the film forming apparatus according to the third embodiment of the present invention as seen from the side.
9 is a cross-sectional view of the film forming apparatus of FIG. 8 viewed from above.

EMBODIMENT OF THE INVENTION Hereinafter, preferred embodiment of the film-forming apparatus which concerns on this invention is described in detail, referring drawings. In addition, when necessary, as shown in each figure, the XYZ coordinate system which makes a Z axis a vertical axis and an XY plane a horizontal plane may be set, and X, Y, and Z may be conveniently used for description. In addition, the word which includes the concept of "up" and "down" may be used for description, with the Z direction upward.

(First embodiment)

The film forming apparatus 1 shown in FIG. 1 and FIG. 2 is provided with the chamber 3 which partitions the vacuum film forming chamber 2 inside, and the workpiece | work (film-forming material) accommodated in the film forming chamber 2 ( W) is an apparatus for performing a film forming process using selenium or the like as a film forming material by a multi-element deposition method (MSD). For example, the film forming apparatus 1 is used for forming a selenium deposition film on a glass substrate which is a material of a solar cell.

As shown in FIG. 3, the multiple deposition method performed in the film forming apparatus 1 of the present embodiment is performed while conveying the masked workpiece W in the film forming chamber 2. As shown in the figure, the heater 44 is arranged above the conveyance path of the workpiece | work W in the film-forming chamber 2 of the film-forming apparatus 1. Further, two selenium deposition source units 45 and 45 are arranged in the Y direction below the conveyance path of the work W. As shown in FIG. The selenium deposition source units 45 and 45 are connected to the selenium deposition source 45a provided outside the deposition chamber 2.

Further, below the selenium deposition source units 45 and 45, deposition sources 46, 47, and 48 of different deposition materials (copper, indium, gallium) are provided. In FIG. 3, the deposition sources 46, 47, and 48 are overlapped because they are arranged in the Y direction perpendicular to the ground, but in the plan view, the two selenium deposition source units 45 and 45 are shown. ), Vapor deposition sources 46, 47, and 48 are arranged in the Y direction in order. An opening (not shown) is provided in the tray 5 on which the work W is placed, and deposition materials generated from the selenium deposition source unit 45 and the deposition sources 46, 47, and 48 are passed through the openings. It is mainly deposited on the lower surface of the workpiece | work W, and the selenium deposition film is formed in the workpiece | work W. As shown in FIG.

As shown in FIG. 1 and FIG. 2, in the film forming chamber 2 of the film forming apparatus 1, the work W is placed on the upper surface so that the work W can be moved in the film forming chamber 2. The tray 5 which moves and the conveyance apparatus 7 which conveys this tray 5 is provided. The conveying apparatus 7 is a well-known thing which uses a motor as a power source, and can carry the several tray 5 arrange | positioned in the Y direction continuously in the film-forming chamber 2 to a Y direction. Downstream of the conveyance of the tray 5, there exists an exit from the film-forming chamber 2, and there exists a door which can be opened and closed for pressure control in the film-forming chamber 2. For example, in order to control the timing of opening and closing this door, it is necessary to detect whether or not the tray 5 has reached a predetermined position, and furthermore, whether the work W is present at the predetermined position.

Therefore, the film forming apparatus 1 includes detection means for detecting whether or not the tray 5 exists at a predetermined position in the film forming chamber 2. The detection means passes through a travel sensor (detection means) 11 provided outside the film formation chamber 2 and a sensor light emitted from the travel sensor 11 and is introduced into the film formation chamber 2. (Window part) 13 is provided. The presence of the viewport 13 enables light projection from the traveling sensor 11 outside the film formation chamber 2 into the film formation chamber 2. The travel sensor 11 and the viewport 13 are provided in the wall 3a parallel to the YZ plane among the partitions of the chamber 3.

The sensor light emitted from the travel sensor 11 toward the inside of the deposition chamber 2 passes through the viewport 13 and is emitted in the X direction. The optical axis of this sensor light is shown by the symbol "A". On the wall 3d facing the wall 3a, a viewport 13 'and a light receiving portion 17 located on the optical axis A are provided. The sensor light passes through the viewport 13' and receives the light receiving portion ( 17) is a positional relationship incident on. Although the detailed illustration of the viewport 13 'is abbreviate | omitted, the viewport 13' may have the structure similar to the viewport 13. FIG. When sensor light enters the light receiving unit 17, it is recognized that the tray 5 does not exist at a predetermined position between the travel sensor 11 and the light receiving unit 17. And when the tray 5 exists in the predetermined position in the film-forming chamber 2, the light shielding part 5a of the tray 5 will be located in the optical axis A, and will block the said sensor light, Light does not enter, and the presence of the tray 5 in a predetermined position is recognized.

Next, the viewport 13 will be described in more detail. Hereinafter, in description of the component of the viewport 13, it is "before" the inside side (left side in FIG. 1, FIG. 2) of the film-forming chamber 2, and the outside side of the film-forming chamber 2. 1 (the right side in FIG. 1, 2) is set to "after", and "before" and "after" may be used for description of a positional relationship.

The viewport 13 is provided with the transparent partition glass 21 which partitions the vacuum of the film-forming chamber 2 and the external atmosphere. The partition glass 21 is fixed to the outside of the wall 3a via the O-ring 21a, is located on the optical axis A, and transmits sensor light. The partition glass 21 is, for example, a transparent heat resistant glass having a thickness of 6 mm or more. In addition, the viewport 13 is formed in the tubular portion 23 made of SUS located on the inside of the film formation chamber 2 rather than the wall 3a in front of the partition glass 21. Equipped with. The optical axis A has passed through the hollow part 23a of the cylindrical part 23. As shown in FIG. The rear end side of the cylindrical portion 23 is embedded in the wall 3a, and the anti-sticking glass (transmission portion) (located on the optical axis A) located on the front end side of the cylindrical portion 23 ( 27 is fitted in the hollow part 23a. The adhesion glass 27 transmits sensor light. However, since the communication hole 23b is provided in the upper part of the cylindrical part 23, the inside of the hollow part 23a becomes a vacuum similarly to the film-forming chamber 2. As shown in FIG. By the above-described configuration of the viewport 13, the sensor light emitted from the traveling sensor 11 passes through the partition glass 21, passes through the hollow portion 23a, and passes through the anti-glare glass 27 to form a film. It irradiates in the chamber 2.

When the film forming material is suspended in the film forming chamber 2 and the film forming material is deposited and deposited on a transparent member such as the partition glass 21 or the anti-glare glass 27, the transmission state of the sensor light is deteriorated and the tray 5 is removed. You will not be able to detect the presence or absence of. In this film-forming apparatus 1, deposition-proof glass 27 is provided in front of the partition glass 21, and deposition of the film-forming material on the partition glass 21 is suppressed, but in this case, the deposition glass 27 The same problem arises as adhesion and deposition of the film forming material. Therefore, a means for suppressing deposition of the film forming material on the anti-glare glass 27 is desired. In particular, the selenium used as the film forming material in the film forming apparatus 1 has a property of thickly adhering to the anti-glare glass 27 and the like, and also has low light transmittance when attached thereto, and therefore, light in the anti-glare glass 27 is reduced. Permeation is likely to be inhibited. Therefore, when selenium is used as the film forming material, the necessity of suppression of deposition is particularly high.

Therefore, the viewport 13 of the film-forming apparatus 1 is equipped with the heater (heating part, deposition suppression means) 31 for heating the adhesion glass 27. As shown in FIG. The heater 31 is wound around the side surface at the front end side of the cylindrical portion 23. Then, by feeding the heater 31 from the feed section 33, the tubular portion 23 is heated to indirectly heat the anti-glare glass 27. Since the heater 31 is provided so as to surround the cylindrical part 23 side surface and the adhesion glass 27, the heat of the heater 31 is transmitted to the adhesion glass 27 efficiently. In addition, the cylindrical portion 23 made of SUS is also a factor for increasing the heat transfer efficiency. Moreover, the reflecting plate 35 which reflects the radiant heat from the heater 31 is provided so that the circumference | surroundings of the heater 31 may be provided, and the heat transfer efficiency to the adhesion glass 27 is further improved.

According to this structure, since the adhesion glass 27 is heated, the film-forming material adhering to the adhesion glass 27 sublimes (evaporates) by the heat of the adhesion glass 27. Moreover, since the film-forming material which is going to adhere to the adhesion glass 27 also sublimes immediately after adhesion, adhesion of the film-forming material to the adhesion glass 27 is suppressed itself. Therefore, deposition of the film-forming material on the adhesion glass 27 can be suppressed, and deterioration of the transmission state of the sensor light by the deposited film-forming material can be suppressed. As a result, the detection function of the travel sensor 11 can be ensured, and accurate control of conveyance of the workpiece | work W becomes possible. However, in order to obtain such an effect, in consideration of the evaporation temperature (120 degreeC) of selenium, the heating temperature of the adhesion glass 27 becomes about 150 degreeC. In addition, when another film-forming material is used, what is necessary is just to set the heating temperature of the adhesion glass 27 suitably in consideration of the evaporation temperature of the film-forming material.

Moreover, since the heater 31, the cylindrical part 23, and the adhesion glass 27 are installed in the position inside the film-forming chamber 2 rather than the wall 3a, the film-forming chamber 2 in the viewport 13 is carried out. ), The structure of vacuum sealing does not become complicated, and an increase in the number of parts can be suppressed.

Here, as another structure for ensuring the transmission state of a sensor light, the structure which installs the heating means for heating the partition glass 21 is abbreviate | omitted, and the anti-glare glass 27 can also be considered. By the way, since the partition glass 21 seals the vacuum film-forming chamber 2 from air | atmosphere, it is attached through O-ring 21a. Therefore, in the case of adopting the configuration for heating the partition glass 21, in order to avoid deterioration of the sealing function due to thermal deterioration of the O-ring 21a, a special O-ring 21a made of a material having less thermal deterioration. It is necessary to adopt). By adopting such a special O-ring 21a, the partition glass 21 can be directly heated to suppress adhesion of the film formation material to the partition glass 21, and thus the anti-glare glass 27 and its surrounding components can be omitted. It can reduce the parts score.

In contrast, in the film forming apparatus 1 described above, the anti-glare glass 27 is provided in front of the partition glass 21 so as not to require the special O-ring as described above. 23a)) is formed between the adhesion glass 27 and the partition glass 21, and the adhesion glass 27 is heated. Since the O-ring is unnecessary because the anti-glare glass 27 is not a partition between spaces having different pressures, the same problem as deterioration of the O-ring does not occur even when the anti-glare glass 27 is heated.

As a suitable application example, the film-forming apparatus 1 demonstrated above is used for film-forming of the CIGS power generation layer of CIGS solar cell, for example. 4 shows an example of a CIGS solar cell. As shown in this figure, the CIGS solar cell 70 includes a Mo back electrode 72, a CIGS power generation layer 73, a buffer layer 74, and a transparent conductive film 75 on a soda lime glass 71. Films are formed and stacked in this order. The Mo back electrode 72 is formed by the sputtering method, the CIGS power generation layer 73 is formed by the selenization method or the plural deposition method, the buffer layer 74 is formed by the sputtering method, and the transparent conductive film 75 is formed by the RPD method or the sputtering method. Or a CVD method. Among these, the film formation of the CIGS power generation layer 73 is performed by the film-forming apparatus 1 using the multiple source deposition method.

In addition to the method of using the film forming apparatus 1, there is also a general film forming method in which a general multiple plural evaporation method is performed by stopping the workpiece without conveying it. In the still film forming method, as shown in FIG. 5, the masked workpiece W is provided in the film forming chamber 52 of the film forming apparatus 51. For example, in the film formation chamber 52, the temperature sensor 53 and the heater 54 are sequentially arranged above the work W, and the opening plate 56 having an opening 56a below the work W. ) And the shutter 58 are sequentially arranged. Then, the first to nth vapor deposition sources 60a, 60b, 60c, ... are disposed below the shutter. In the case of producing a selenium deposited film, copper, indium, gallium, and selenium are applied to the first to nth evaporation sources (film forming materials). Since multiple deposition is a well-known method, further detailed description is omitted.

(Second Embodiment)

The film forming apparatus 201 illustrated in FIGS. 6 and 7 includes a view port 213 instead of the view port 13 in the film forming apparatus 1. Hereinafter, in the film forming apparatus 201, the same or equivalent components as those of the film forming apparatus 1 described above are denoted by the same reference numerals, and description thereof will be omitted.

The viewport 213 has an anti-corrosion tube 251 that penetrates the wall 3a of the chamber 3. The optical axis A passes through the hollow part 251a of the adhesion tube 251. The adhesion glass (transmission part) 227 is provided just behind the rear end part of the adhesion tube 251. As shown in FIG. In addition, the viewport 213 is provided with the cylindrical part (cylindrical part) 223 made from SUS provided in the back of the anti-expansion pipe 251. As shown in FIG. The anti-glare glass 227 is fitted to the hollow portion 223a at the front end of the cylindrical portion 223. And the partition glass 221 is provided in the back of the cylindrical part 223, and the traveling sensor 11 is provided in the rear of the partition glass 221. As shown in FIG. By the above-described configuration of the viewport 213, the sensor light emitted from the traveling sensor 11 passes through the partition glass 221, passes through the hollow portion 223a of the tubular portion 223, and the anti-glare glass ( 227 passes through the hollow portion 251a of the adhesion tube 251 and is irradiated to the inside of the deposition chamber 2. However, similar to the film forming apparatus 1 (FIG. 1), the view port 13 ′ and the light receiving portion 17 located on the optical axis A are provided on the wall 3d facing the wall 3a. The illustration is omitted.

In the film forming apparatus 201, since the hollow portion 251a of the deposition tube 251 is exposed to the film forming material in the film forming chamber 2, the film forming material adheres to the inner wall surface of the hollow portion 251a. . Accordingly, the deposition pipe 251 is periodically replaced so that the deposition material deposited on the hollow portion 251a does not block the sensor light.

In addition, the viewport 213 is provided with the heater (heating part, deposition suppression means) 231 for heating the anti-glare glass 227. The heater 231 is wound around the side surface at the front end side of the cylindrical portion 223. Then, by feeding the heater 231 from the feed section 233, the tubular portion 223 is heated to indirectly heat the anti-glare glass 227. Since the heater 231 is provided to surround the cylindrical part 223 side surface and the adhesion glass 227, the heat of the heater 231 is transmitted to the adhesion glass 227 efficiently. In addition, the cylindrical portion 223 made of SUS is also a factor for increasing the heat transfer efficiency. Moreover, the reflecting plate 235 which reflects the radiant heat from the heater 231 is provided so that the circumference | surroundings of the heater 231 may be provided, and the heat transfer efficiency to the adhesion glass 227 is further improved.

In addition, in the structure of this viewport 213, since the cylindrical part 223, the adhesion glass 227, and the heater 231 are provided in the exterior of the film-forming chamber 2, the vacuum case part 253 for accommodating them is provided. Protruding outward from the wall 3a is provided. The partition glass 221 is attached to the rear end of the vacuum case part 253 via the O-ring 221a, and seals the vacuum film forming chamber 2 from the atmosphere. In order to suppress the deterioration of the O-ring 221a due to the heat of the heater 231, in order to cool the rear end of the vacuum case part 253, a cooling water passage 253a for flowing the cooling water is provided after the vacuum case part 253. It is formed at the end.

In the film forming apparatus 201, the same effect as the film forming apparatus 1 described above is obtained by heating the adhesion glass 227 with the heater 231. That is, deterioration of the transmission state of sensor light can be suppressed, the detection function of the traveling sensor 11 can be ensured, and accurate control of conveyance of the workpiece | work W is attained. Moreover, since the cylindrical part 223, the adhesion glass 227, and the heater 231 are provided in the outer side of the film-forming chamber 2 rather than the wall 3a, the inside of the film-forming chamber 2 is employ | adopted. Can save space. In addition, when adding a viewport to the existing film forming apparatus, even if there is no space in the inside of the film forming chamber 2, the above elements of the viewport 213 can be mounted on the outside of the wall 3a. .

(Third Embodiment)

The film forming apparatus 301 shown in FIG. 8 and FIG. 9 includes a view port 313 instead of the view port 13 in the film forming apparatus 1. Hereinafter, in the film forming apparatus 301, the same or equivalent components as those of the film forming apparatuses 1 and 201 described above are denoted by the same reference numerals and description thereof will be omitted.

The viewport 313 is equipped with the anti-corrosion tube (cylinder) 351 provided in front of the partition glass 21. As shown in FIG. The optical axis A has passed through the hollow part 351a of the adhesion tube 351. As shown in FIG. The rear end side of the adhesion tube 351 is inserted into the through hole 3b formed in the wall 3a. The adhesion glass (2nd permeation | transmission part) 327 is attached to the longitudinal center part of the adhesion pipe 351 so that attachment or detachment is possible. For example, the slit which inserts the plate-shaped adhesion glass 327 parallel to a YZ plane from upper direction is formed in the adhesion pipe 351, and it is set as the structure which can remove the adhesion glass 327 to this slit. The adhesion glass 327 is inserted so that the hollow part 351a of the adhesion tube 351 may be divided back and forth, and is arrange | positioned so that it may cross the optical axis A. FIG. The sensor light from the traveling sensor 11 passes through the partition glass 21 and passes through the through hole 3b. In addition, when passing through the hollow part 351a of the adhesion tube 351, sensor light permeate | transmits the adhesion glass 327 and is irradiated in the film-forming chamber 2. However, similar to the film forming apparatus 1 (FIG. 1), the view port 13 ′ and the light receiving portion 17 located on the optical axis A are provided on the wall 3d facing the wall 3a. The illustration is omitted.

According to this structure, the anti-glare tube 351 is provided in front of the partition glass (transmissive part) 21, and the anti-glare glass (sedimentation suppression means) 327 is provided in the hollow part 351a of this anti-glare tube 351 Since it exists, the partition glass 21 is partitioned from the space of the film-forming chamber 2 in which film-forming material floats. Therefore, the film-forming material floating in the film-forming chamber 2 hardly reaches the partition glass 21. Therefore, deposition of the film formation material on the partition glass 21 can be suppressed, and deterioration of the transmission state of the sensor light by the film deposition material deposited on the partition glass 21 can be suppressed. In this case, although the film forming material is relatively easy to contact the anti-glare glass 327, even when the film-forming material is deposited on the anti-glare glass 327, the anti-glare glass 327 can be easily detached and replaced, so that the transmission of the sensor light can be achieved. You can recover your condition. In addition, by regularly replacing the anti-glare glass 327, the transmission state of the sensor light in the anti-glare glass 327 can be maintained satisfactorily. As a result, the detection function of the travel sensor 11 can be ensured, and accurate control of conveyance of the workpiece | work W becomes possible.

This invention is not limited to the 1st-3rd embodiment mentioned above. For example, in 1st and 2nd embodiment, in order to heat the adhesion glass 27 and 227, you may use a high frequency heater. In addition, a heater may be incorporated in the adhesion glass 27 and 227 and heated directly by the heater. In addition, as a means of suppressing adhesion and deposition of film-forming materials, not only the heating of the adhesion glass 27 and 227, but also the adhesion glass 27 and 227 may be charged. In addition, in 1st-3rd embodiment, in order to indirectly detect the presence or absence of the workpiece | work W, the presence or absence of the tray 5 is detected, but the sensor light is irradiated to the workpiece | work W, and The presence or absence may be detected directly. In the first to third embodiments, a transmissive sensor is used as the detection means, but a reflective sensor may be used. In addition, in the first to third embodiments, the present invention is applied to a film forming apparatus using a multiple deposition method (MSD). However, the present invention can also be applied to a film forming apparatus using other film forming methods (e.g., a plasma film forming method and a sputtering method).

1, 201, 301... Film forming apparatus, 2... Tabernacle, 3. Chamber, 3a... Wall portion, 5.. Tray, 7.. Conveying apparatus (conveying means), 11... Travel sensor (detecting means) 13, 213, 313... Viewport, 21... Partition glass, 23, 223... Cylindrical portion 23a, 223a... Hollow portion 27, 227... Anti-corrosion glass (permeable), 31, 231, 331... Heater (heating unit, deposition inhibiting means), 327... Anti-glare glass (second transmission portion), 351... Whole body, 351a... Hollow part of cylinder, W…; Work (blood deposition material)

Claims (9)

A film forming apparatus for depositing a film forming material on a film forming material,
A film forming chamber which stores the film forming material and performs film forming processing;
A conveying means provided in the film forming chamber and conveying the film forming material;
A window portion provided in a wall portion that partitions the deposition chamber, and having a transmission portion that transmits light, and allowing light transmission from the outside to the interior of the deposition chamber;
Detection means which is provided outside the film formation chamber and transmits sensor light by transmitting the transmission portion of the window portion to detect the presence or absence of the film forming material inside the film formation chamber;
Deposition inhibiting means for suppressing deposition of the film forming material on the permeable portion
And,
The window portion,
A partition unit positioned on an optical axis of the sensor light and capable of transmitting the sensor light and partitioning the vacuum of the deposition chamber and the outside atmosphere;
The hollow portion is provided on the optical axis, the cylindrical portion embedded in the wall portion
Lt; / RTI &
The transmission portion is sandwiched in the hollow portion of the tubular portion,
The deposition inhibiting means has a heating section for heating the permeation section.
The film forming apparatus comprising: The method according to claim 1,
Wherein said deposition inhibiting means evaporates the film forming material adhering to said permeable part and inhibits adhesion of said film forming material to said permeable part.
The film forming apparatus comprising: The method according to claim 1,
The said heating part is provided in the inside of the said film-forming chamber rather than the said wall part.
The film forming apparatus comprising: The method according to claim 3,
The cylindrical portion is provided on the inside of the film formation chamber rather than the wall portion,
The said heating part is provided so that the side surface of the edge part of the said cylindrical part and the said permeation part may be enclosed.
The film forming apparatus comprising: The method according to claim 1,
The said heating part is provided in the outer side of the said film-forming chamber rather than the said wall part.
The film forming apparatus comprising: The method according to claim 5,
The tubular portion is provided on the outside of the film formation chamber than the wall portion,
The said heating part is provided so that the side surface of the edge part of the said cylindrical part and the said permeation part may be enclosed.
The film forming apparatus comprising: The method according to any one of claims 1 to 6,
The film forming material is selenium
The film forming apparatus comprising: delete delete

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