EA200501183A1 - VACUUM CLUSTER FOR APPLYING COATINGS ON A SUBSTRATE (OPTIONS) - Google Patents
VACUUM CLUSTER FOR APPLYING COATINGS ON A SUBSTRATE (OPTIONS)Info
- Publication number
- EA200501183A1 EA200501183A1 EA200501183A EA200501183A EA200501183A1 EA 200501183 A1 EA200501183 A1 EA 200501183A1 EA 200501183 A EA200501183 A EA 200501183A EA 200501183 A EA200501183 A EA 200501183A EA 200501183 A1 EA200501183 A1 EA 200501183A1
- Authority
- EA
- Eurasian Patent Office
- Prior art keywords
- compartment
- vacuum
- vacuum chamber
- substrate
- main
- Prior art date
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Предлагаемый вакуумный кластер и его варианты предназначены для использования в области вакуумного напыления материалов на подложки, в том числе объемные, например кинескопы, плоские дисплеи и т.д., с целью создания тонкопленочных многослойных покрытий на их фронтальной поверхности и может быть использован для формирования многокомпонентных и многослойных покрытий из различных материалов в многокластерных вакуумных установках. Вакуумный кластер согласно первому варианту выполнения отличается от известных установок аналогичного назначения тем, что в нем вакуумная камера снабжена основным и по меньшей мере одним технологическим отсеками, при этом технологическое устройство размещено в технологическом отсеке вакуумной камеры и установлено с возможностью возвратно-поступательного перемещения в основной отсек вакуумной камеры параллельно поверхности подложкодержателя и/или подложки, а механизм перемещения технологического устройства размещен за пределами вакуумной камеры и связан с технологическим устройством с помощью держателей, снабженных коммуникационными элементами, предназначенными для питания технологического устройства. А согласно второму варианту выполнения в вакуумном кластере вакуумная камера снабжена основным и по меньшей мере одним технологическим отсеками, причем основной отсек вакуумной камеры оснащен отверстием и вакуумным затвором, предназначенными для соединения основного отсека с технологическим в единый технологический блок и установленными в плоскости, перпендикулярной плоскости подложкодержателя и/или подложки, при этом технологический отсек выполнен в виде отдельного блока и пристыкован к основному отсеку вакуумной камеры, а технологическое устройство, предназначенное для нанесения покрытия на подложку, установлено в технологическом отсеке с возможностью возвратно-поступательного перемещения в основной отсек в направлении, параллельном поверхности подложкодержателя и/или подложки, причем механизм перемещения технологического устройства размещен вне вакуумной камеры и связан с технологическим устройством с помощью держателей, снабженных коммуникационными элементами, предназначенными для питания технологического устройства.The proposed vacuum cluster and its variants are intended for use in the field of vacuum deposition of materials on substrates, including volumetric ones, such as kinescopes, flat displays, etc., in order to create thin-film multilayer coatings on their frontal surface and can be used to form multi-component and multilayer coatings of various materials in multi-cluster vacuum systems. The vacuum cluster according to the first embodiment differs from the known installations of similar purpose in that the vacuum chamber is provided with the main and at least one process compartment, while the technological device is placed in the process compartment of the vacuum chamber and installed with the possibility of reciprocating movement into the main compartment vacuum chamber parallel to the surface of the substrate holder and / or the substrate, and the mechanism for moving the technological device is placed outside vacuum chamber and is connected to the technological device with the help of holders equipped with communication elements designed to power the technological device. And according to the second embodiment, the vacuum chamber in the vacuum cluster is equipped with a main and at least one process compartment, and the main compartment of the vacuum chamber is equipped with an opening and a vacuum shutter designed to connect the main compartment with the process compartment into a single process unit and installed in a plane perpendicular to the plane of the substrate holder and / or the substrate, while the technological compartment is made as a separate unit and docked to the main compartment of the vacuum chamber, and The optical device designed for coating the substrate is installed in the process compartment with the possibility of reciprocating movement into the main compartment in a direction parallel to the surface of the substrate holder and / or the substrate, wherein the mechanism for moving the technological device is placed outside the vacuum chamber and is connected to the technological device using holders equipped with communication elements designed to power the technological device.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EA200501183A EA007701B1 (en) | 2005-07-18 | 2005-07-18 | Vacuum cluster for applying coating on a substrate |
CN2006100810112A CN1900349B (en) | 2005-07-18 | 2006-05-19 | Vacuum device assembly for applying coating onto substrate |
JP2006195704A JP5270821B2 (en) | 2005-07-18 | 2006-07-18 | Vacuum cluster for substrate deposition (deformation) |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EA200501183A EA007701B1 (en) | 2005-07-18 | 2005-07-18 | Vacuum cluster for applying coating on a substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
EA200501183A1 true EA200501183A1 (en) | 2006-12-29 |
EA007701B1 EA007701B1 (en) | 2006-12-29 |
Family
ID=37656330
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EA200501183A EA007701B1 (en) | 2005-07-18 | 2005-07-18 | Vacuum cluster for applying coating on a substrate |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5270821B2 (en) |
CN (1) | CN1900349B (en) |
EA (1) | EA007701B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2767915C1 (en) * | 2020-12-14 | 2022-03-22 | Общество с ограниченной ответственностью "Оксифилм" (ООО "Оксифилм") | System for carrying out process of chemical precipitation from vapors of volatile precursors |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5142796B2 (en) * | 2008-04-11 | 2013-02-13 | キヤノン株式会社 | Image processing system, image processing method, and program |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62167874A (en) * | 1986-01-17 | 1987-07-24 | Sumitomo Electric Ind Ltd | Vapor deposition crucible exchanger |
RU2030263C1 (en) * | 1990-12-12 | 1995-03-10 | Геллер Сергей Владимирович | Torch for hand welding with consumable electrode |
JPH08325726A (en) * | 1995-05-29 | 1996-12-10 | Hitachi Ltd | Cathode |
JP2000077506A (en) * | 1998-08-28 | 2000-03-14 | Fuji Electric Co Ltd | Sputtering device |
US6460369B2 (en) * | 1999-11-03 | 2002-10-08 | Applied Materials, Inc. | Consecutive deposition system |
JP2001131739A (en) * | 1999-11-05 | 2001-05-15 | Mitsubishi Heavy Ind Ltd | Coaxial type sputtering deposition system with shutter |
RU2158664C1 (en) * | 2000-03-06 | 2000-11-10 | Закрытое акционерное общество "Авиационные технологии" | Electron-beam welding set |
EA003148B1 (en) * | 2000-07-05 | 2003-02-27 | Владимир Яковлевич ШИРИПОВ | Vacuum module (variants thereof) and a system of modules for applying coatings to a substrate |
RU2187576C2 (en) * | 2000-09-14 | 2002-08-20 | Государственное предприятие Всероссийский научно-исследовательский институт авиационных материалов | Protective coat applying apparatus |
KR20040043046A (en) * | 2002-11-15 | 2004-05-22 | 삼성전자주식회사 | Magnetron sputtering apparatus and method thereof |
-
2005
- 2005-07-18 EA EA200501183A patent/EA007701B1/en not_active IP Right Cessation
-
2006
- 2006-05-19 CN CN2006100810112A patent/CN1900349B/en not_active Expired - Fee Related
- 2006-07-18 JP JP2006195704A patent/JP5270821B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2767915C1 (en) * | 2020-12-14 | 2022-03-22 | Общество с ограниченной ответственностью "Оксифилм" (ООО "Оксифилм") | System for carrying out process of chemical precipitation from vapors of volatile precursors |
Also Published As
Publication number | Publication date |
---|---|
JP2007023387A (en) | 2007-02-01 |
JP5270821B2 (en) | 2013-08-21 |
CN1900349A (en) | 2007-01-24 |
EA007701B1 (en) | 2006-12-29 |
CN1900349B (en) | 2010-08-25 |
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QC4A | Termination of a registered licence in a contracting state | ||
PC4A | Registration of transfer of a eurasian patent by assignment | ||
QZ4A | Registered corrections and amendments in a licence | ||
QB4A | Registration of a licence in a contracting state | ||
QC4A | Termination of a registered licence in a contracting state | ||
QC4A | Termination of a registered licence in a contracting state | ||
MM4A | Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s) |
Designated state(s): BY RU |