EA200501183A1 - VACUUM CLUSTER FOR APPLYING COATINGS ON A SUBSTRATE (OPTIONS) - Google Patents

VACUUM CLUSTER FOR APPLYING COATINGS ON A SUBSTRATE (OPTIONS)

Info

Publication number
EA200501183A1
EA200501183A1 EA200501183A EA200501183A EA200501183A1 EA 200501183 A1 EA200501183 A1 EA 200501183A1 EA 200501183 A EA200501183 A EA 200501183A EA 200501183 A EA200501183 A EA 200501183A EA 200501183 A1 EA200501183 A1 EA 200501183A1
Authority
EA
Eurasian Patent Office
Prior art keywords
compartment
vacuum
vacuum chamber
substrate
main
Prior art date
Application number
EA200501183A
Other languages
Russian (ru)
Other versions
EA007701B1 (en
Inventor
Владимир Яковлевич ШИРИПОВ
Айрат Хамитович ХИСАМОВ
Сергей Павлович МАРЫШЕВ
Николай Евгеньевич Левчук
Original Assignee
Владимир Яковлевич ШИРИПОВ
Айрат Хамитович ХИСАМОВ
Сергей Павлович МАРЫШЕВ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Владимир Яковлевич ШИРИПОВ, Айрат Хамитович ХИСАМОВ, Сергей Павлович МАРЫШЕВ filed Critical Владимир Яковлевич ШИРИПОВ
Priority to EA200501183A priority Critical patent/EA007701B1/en
Priority to CN2006100810112A priority patent/CN1900349B/en
Priority to JP2006195704A priority patent/JP5270821B2/en
Publication of EA200501183A1 publication Critical patent/EA200501183A1/en
Publication of EA007701B1 publication Critical patent/EA007701B1/en

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  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

Предлагаемый вакуумный кластер и его варианты предназначены для использования в области вакуумного напыления материалов на подложки, в том числе объемные, например кинескопы, плоские дисплеи и т.д., с целью создания тонкопленочных многослойных покрытий на их фронтальной поверхности и может быть использован для формирования многокомпонентных и многослойных покрытий из различных материалов в многокластерных вакуумных установках. Вакуумный кластер согласно первому варианту выполнения отличается от известных установок аналогичного назначения тем, что в нем вакуумная камера снабжена основным и по меньшей мере одним технологическим отсеками, при этом технологическое устройство размещено в технологическом отсеке вакуумной камеры и установлено с возможностью возвратно-поступательного перемещения в основной отсек вакуумной камеры параллельно поверхности подложкодержателя и/или подложки, а механизм перемещения технологического устройства размещен за пределами вакуумной камеры и связан с технологическим устройством с помощью держателей, снабженных коммуникационными элементами, предназначенными для питания технологического устройства. А согласно второму варианту выполнения в вакуумном кластере вакуумная камера снабжена основным и по меньшей мере одним технологическим отсеками, причем основной отсек вакуумной камеры оснащен отверстием и вакуумным затвором, предназначенными для соединения основного отсека с технологическим в единый технологический блок и установленными в плоскости, перпендикулярной плоскости подложкодержателя и/или подложки, при этом технологический отсек выполнен в виде отдельного блока и пристыкован к основному отсеку вакуумной камеры, а технологическое устройство, предназначенное для нанесения покрытия на подложку, установлено в технологическом отсеке с возможностью возвратно-поступательного перемещения в основной отсек в направлении, параллельном поверхности подложкодержателя и/или подложки, причем механизм перемещения технологического устройства размещен вне вакуумной камеры и связан с технологическим устройством с помощью держателей, снабженных коммуникационными элементами, предназначенными для питания технологического устройства.The proposed vacuum cluster and its variants are intended for use in the field of vacuum deposition of materials on substrates, including volumetric ones, such as kinescopes, flat displays, etc., in order to create thin-film multilayer coatings on their frontal surface and can be used to form multi-component and multilayer coatings of various materials in multi-cluster vacuum systems. The vacuum cluster according to the first embodiment differs from the known installations of similar purpose in that the vacuum chamber is provided with the main and at least one process compartment, while the technological device is placed in the process compartment of the vacuum chamber and installed with the possibility of reciprocating movement into the main compartment vacuum chamber parallel to the surface of the substrate holder and / or the substrate, and the mechanism for moving the technological device is placed outside vacuum chamber and is connected to the technological device with the help of holders equipped with communication elements designed to power the technological device. And according to the second embodiment, the vacuum chamber in the vacuum cluster is equipped with a main and at least one process compartment, and the main compartment of the vacuum chamber is equipped with an opening and a vacuum shutter designed to connect the main compartment with the process compartment into a single process unit and installed in a plane perpendicular to the plane of the substrate holder and / or the substrate, while the technological compartment is made as a separate unit and docked to the main compartment of the vacuum chamber, and The optical device designed for coating the substrate is installed in the process compartment with the possibility of reciprocating movement into the main compartment in a direction parallel to the surface of the substrate holder and / or the substrate, wherein the mechanism for moving the technological device is placed outside the vacuum chamber and is connected to the technological device using holders equipped with communication elements designed to power the technological device.

EA200501183A 2005-07-18 2005-07-18 Vacuum cluster for applying coating on a substrate EA007701B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EA200501183A EA007701B1 (en) 2005-07-18 2005-07-18 Vacuum cluster for applying coating on a substrate
CN2006100810112A CN1900349B (en) 2005-07-18 2006-05-19 Vacuum device assembly for applying coating onto substrate
JP2006195704A JP5270821B2 (en) 2005-07-18 2006-07-18 Vacuum cluster for substrate deposition (deformation)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EA200501183A EA007701B1 (en) 2005-07-18 2005-07-18 Vacuum cluster for applying coating on a substrate

Publications (2)

Publication Number Publication Date
EA200501183A1 true EA200501183A1 (en) 2006-12-29
EA007701B1 EA007701B1 (en) 2006-12-29

Family

ID=37656330

Family Applications (1)

Application Number Title Priority Date Filing Date
EA200501183A EA007701B1 (en) 2005-07-18 2005-07-18 Vacuum cluster for applying coating on a substrate

Country Status (3)

Country Link
JP (1) JP5270821B2 (en)
CN (1) CN1900349B (en)
EA (1) EA007701B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2767915C1 (en) * 2020-12-14 2022-03-22 Общество с ограниченной ответственностью "Оксифилм" (ООО "Оксифилм") System for carrying out process of chemical precipitation from vapors of volatile precursors

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5142796B2 (en) * 2008-04-11 2013-02-13 キヤノン株式会社 Image processing system, image processing method, and program

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62167874A (en) * 1986-01-17 1987-07-24 Sumitomo Electric Ind Ltd Vapor deposition crucible exchanger
RU2030263C1 (en) * 1990-12-12 1995-03-10 Геллер Сергей Владимирович Torch for hand welding with consumable electrode
JPH08325726A (en) * 1995-05-29 1996-12-10 Hitachi Ltd Cathode
JP2000077506A (en) * 1998-08-28 2000-03-14 Fuji Electric Co Ltd Sputtering device
US6460369B2 (en) * 1999-11-03 2002-10-08 Applied Materials, Inc. Consecutive deposition system
JP2001131739A (en) * 1999-11-05 2001-05-15 Mitsubishi Heavy Ind Ltd Coaxial type sputtering deposition system with shutter
RU2158664C1 (en) * 2000-03-06 2000-11-10 Закрытое акционерное общество "Авиационные технологии" Electron-beam welding set
EA003148B1 (en) * 2000-07-05 2003-02-27 Владимир Яковлевич ШИРИПОВ Vacuum module (variants thereof) and a system of modules for applying coatings to a substrate
RU2187576C2 (en) * 2000-09-14 2002-08-20 Государственное предприятие Всероссийский научно-исследовательский институт авиационных материалов Protective coat applying apparatus
KR20040043046A (en) * 2002-11-15 2004-05-22 삼성전자주식회사 Magnetron sputtering apparatus and method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2767915C1 (en) * 2020-12-14 2022-03-22 Общество с ограниченной ответственностью "Оксифилм" (ООО "Оксифилм") System for carrying out process of chemical precipitation from vapors of volatile precursors

Also Published As

Publication number Publication date
JP2007023387A (en) 2007-02-01
JP5270821B2 (en) 2013-08-21
CN1900349A (en) 2007-01-24
EA007701B1 (en) 2006-12-29
CN1900349B (en) 2010-08-25

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QB4A Registration of a licence in a contracting state
QB4A Registration of a licence in a contracting state
QC4A Termination of a registered licence in a contracting state
PC4A Registration of transfer of a eurasian patent by assignment
QZ4A Registered corrections and amendments in a licence
QB4A Registration of a licence in a contracting state
QC4A Termination of a registered licence in a contracting state
QC4A Termination of a registered licence in a contracting state
MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): BY RU