TW200702466A - Apparatus for vacuum deposition - Google Patents
Apparatus for vacuum depositionInfo
- Publication number
- TW200702466A TW200702466A TW094123176A TW94123176A TW200702466A TW 200702466 A TW200702466 A TW 200702466A TW 094123176 A TW094123176 A TW 094123176A TW 94123176 A TW94123176 A TW 94123176A TW 200702466 A TW200702466 A TW 200702466A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate holder
- vacuum deposition
- systems
- vacuum chamber
- cucible
- Prior art date
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
An apparatus for vacuum deposition includes a vacuum chamber, a substrate holder, plurality of crucible systems, and plurality of baffles. The substrate holder is mounted in the ceiling of the vacuum chamber. The cucible systems are on the bottom of the vacuum chamber below the substrate holder. The baffles gyrally covers between the substrate holder and the cucible systems by using a rotary mechanism.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94123176A TWI391507B (en) | 2005-07-08 | 2005-07-08 | Apparatus for vacuum deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94123176A TWI391507B (en) | 2005-07-08 | 2005-07-08 | Apparatus for vacuum deposition |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200702466A true TW200702466A (en) | 2007-01-16 |
TWI391507B TWI391507B (en) | 2013-04-01 |
Family
ID=48803310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94123176A TWI391507B (en) | 2005-07-08 | 2005-07-08 | Apparatus for vacuum deposition |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI391507B (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI386499B (en) * | 2007-12-14 | 2013-02-21 | Hon Hai Prec Ind Co Ltd | Evaporation equipment |
TWI396767B (en) * | 2008-06-27 | 2013-05-21 | Hon Hai Prec Ind Co Ltd | Optical coating device |
TWI406962B (en) * | 2008-06-27 | 2013-09-01 | Hon Hai Prec Ind Co Ltd | Coating device |
TWI447244B (en) * | 2008-05-30 | 2014-08-01 | Hon Hai Prec Ind Co Ltd | Coating device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWM260551U (en) * | 2004-05-28 | 2005-04-01 | Hon Hai Prec Ind Co Ltd | Optics deposition apparatus |
-
2005
- 2005-07-08 TW TW94123176A patent/TWI391507B/en not_active IP Right Cessation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI386499B (en) * | 2007-12-14 | 2013-02-21 | Hon Hai Prec Ind Co Ltd | Evaporation equipment |
TWI447244B (en) * | 2008-05-30 | 2014-08-01 | Hon Hai Prec Ind Co Ltd | Coating device |
TWI396767B (en) * | 2008-06-27 | 2013-05-21 | Hon Hai Prec Ind Co Ltd | Optical coating device |
TWI406962B (en) * | 2008-06-27 | 2013-09-01 | Hon Hai Prec Ind Co Ltd | Coating device |
Also Published As
Publication number | Publication date |
---|---|
TWI391507B (en) | 2013-04-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1749900A4 (en) | Susceptor for vapor deposition apparatus | |
EP1960566A4 (en) | High-throughput deposition system for oxide thin film growth by reactive coevaportation | |
WO2007053607A3 (en) | Pumping system for atomic layer deposition | |
TW200802543A (en) | Cluster tool for epitaxial film formation | |
GB2437693B (en) | Chemical vapor deposition reactor having multiple inlets | |
TW200624578A (en) | Deposition source and deposition apparatus including deposition source | |
TW200716771A (en) | Arrangement for the vapor deposition on substrates | |
TW200802549A (en) | Vertical plasma processing apparatus for semiconductor process | |
TW200728496A (en) | CVD reactor with replaceable process chamber cover | |
SG152239A1 (en) | Compounds for proteasome enzyme inhibition | |
WO2012096466A3 (en) | Thin film deposition apparatus and substrate treatment system including same | |
IL181394A0 (en) | Atmospheric pressure chemical vapor deposition | |
WO2008106545A3 (en) | Pecvd process chamber backing plate reinforcement | |
GB0520589D0 (en) | Alloyed tungsten produced by chemical vapour deposition | |
TW200725701A (en) | Deposition apparatus | |
TW200638480A (en) | Plasma treatment apparatus | |
TW200702108A (en) | Jig | |
TW200744145A (en) | Cluster processing apparatus | |
EP1727923A4 (en) | High throughput physical vapor deposition system for material combinatorial studies | |
TW200702466A (en) | Apparatus for vacuum deposition | |
AU2003228226A1 (en) | An improved substrate holder for plasma processing | |
WO2007065896A3 (en) | Removable liners for charged particle beam systems | |
TW200710291A (en) | Vapor phase growing apparatus and vapor phase growing method | |
WO2008019076A3 (en) | Substrate carrier enclosure | |
TW200506082A (en) | Shutter disk and blade for physical vapor deposition chamber |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |