CN107017177B - Rate of film build detects mould group, film-forming apparatus, rate of film build detection method - Google Patents
Rate of film build detects mould group, film-forming apparatus, rate of film build detection method Download PDFInfo
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- CN107017177B CN107017177B CN201710277788.4A CN201710277788A CN107017177B CN 107017177 B CN107017177 B CN 107017177B CN 201710277788 A CN201710277788 A CN 201710277788A CN 107017177 B CN107017177 B CN 107017177B
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- rate
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- film
- film build
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
The present invention provides a kind of rate of film build detection mould group, film-forming apparatus, rate of film build detection method, belongs to rate of film build detection technique field, can at least partly solve the problems, such as that existing rate of film build detection technique Detection accuracy is low.Rate of film build detection mould group of the invention includes: multiple master references, is used to detect the rate for forming film thereon；Each master reference and the main baffle with main opening are covered, can be moved so that main opening corresponds to each master reference in turn；Auxiliary sensor is used to detect the rate for forming film thereon；Cover auxiliary sensor and the auxiliary baffle with auxiliary opening, its energy periodic motion, auxiliary opening passes through the position of corresponding auxiliary sensor during periodic motion, and auxiliary opening area and its ratio that inswept area is accumulated in a period of motion are k, k is less than or equal to 1/n, and n is main number of probes.
Description
Technical field
The invention belongs to rate of film build detection technique fields, and in particular to a kind of rate of film build detection mould group, film-forming apparatus,
Rate of film build detection method.
Background technique
Organic Light Emitting Diode (OLED) display panel is with visibility is big, brightness is high, voltage requirements are low, saving energy, sound
Should the fast, advantages such as thickness is thin, simple structure, light weight and cost are low, therefore be widely used.The performance of OLED display panel and its
The film thickness of middle structure is closely related, and many structures are to be prepared by evaporation process, therefore its film thickness is by rate of film build (vapor deposition speed
Rate) and film formation time decision.For this purpose, it is particularly significant to guarantee properties of product to detect rate of film build during vapor deposition.For detection
Vibratile rate of film build sensor can be arranged in vapor deposition chamber in rate of film build, when vapor deposition on rate of film build sensor also at
Film as film thickness increases its vibration state corresponding change, therefore can calculate rate of film build by vibration state.When rate of film build passes
Service life expires when film thickness on sensor reaches certain value, it is necessary to replace, but can not detect in replacement process.To reduce replacement
Frequency can detect mould group with baffle and multiple rate of film build sensors composition rate of film build, which has opening, when opening is aligned
When certain rate of film build sensor, rate of film build sensor exposure can simultaneously be detected, and other rate of film build sensors are then kept off
Plate is blocked therefore is not formed a film；After the rate of film build sensor reaches service life, baffle is mobile to make opening be directed at another film forming speed
Rate sensor is simultaneously detected with it, is so repeated, is replaced with again until whole rate of film build sensors all reach service life
Film rate detects mould group.
Above method in only one rate of film build working sensor of synchronization, Ruo Qiyin failure etc. generate mistake then without
Method is found, and causes Detection accuracy low.If being measured simultaneously with multiple rate of film build sensors, rate of film build can be accelerated
The consumption of sensor reduces the service life of rate of film build detection mould group.
Summary of the invention
The present invention at least partly solves the problems, such as that existing rate of film build detection technique Detection accuracy is low, and providing one kind can
The rate of film build that Detection accuracy is improved in the case where not impacting to service life detects mould group, film-forming apparatus, film forming
Speed detection method.
Solving technical solution used by present invention problem is a kind of rate of film build detection mould group comprising:
Multiple master references are used to detect the rate for forming film thereon；
Each master reference and the main baffle with main opening are covered, can be moved so that main opening corresponds to each main biography in turn
Sensor；
Auxiliary sensor is used to detect the rate for forming film thereon；
Cover auxiliary sensor and the auxiliary baffle with auxiliary opening, energy periodic motion, auxiliary opening during periodic motion
By the position of the auxiliary sensor of correspondence, and auxiliary opening area and its ratio that inswept area is accumulated in a period of motion are k, k
Less than or equal to 1/n, n is main number of probes.
Preferably, the main baffle is the circular ring shape plate with main opening, and the multiple master reference is along circular ring shape plate
Circumferentially it is uniformly distributed.
Preferably, the auxiliary baffle is the circular slab for having auxiliary opening, and it is non-circular that the auxiliary sensor is set to corresponding circular slab
The position of the heart.
Preferably, the main baffle is the circular ring shape plate with main opening, and the multiple master reference is along circular ring shape plate
Circumferentially it is uniformly distributed；The auxiliary baffle is the circular slab for having auxiliary opening, and the auxiliary sensor is set to the corresponding non-center of circle of circular slab
Position；The circular slab is concentric to be set on the inside of the circular ring shape plate.
Preferably, the radius of the circular slab is equal to the internal diameter of circular ring shape plate.
Preferably, the area of the auxiliary opening is equal to its 1/n that inswept area is accumulated in a period of motion.
Preferably, the rate of film build detects mould group further include: main driving unit, for driving the main baffle to transport
It is dynamic；Auxiliary driving unit, for driving the periodic motion of the auxiliary baffle at the uniform velocity.
Solving technical solution used by present invention problem is a kind of film-forming apparatus, including the film forming chamber for film forming
Room,
It is equipped with above-mentioned rate of film build in the film forming chamber and detects mould group.
Preferably, the film-forming apparatus is evaporated device.
Solving technical solution used by present invention problem is a kind of rate of film build detection method, using above-mentioned
Rate of film build detects mould group and carries out, and the rate of film build detection method includes:
Mobile main baffle makes the corresponding master reference of main opening, which detects to obtain main rate of film build；Meanwhile
Make the periodic motion of auxiliary baffle at the uniform velocity, auxiliary sensor detects to obtain auxiliary rate of film build；
Judge whether the ratio of the auxiliary film forming speed and main rate of film build is equal to k, rate of film build detection knot is indicated if not waiting
Fruit mistake.
Rate of film build of the invention detects in mould group, constantly forms a film on the master reference detected, and on auxiliary sensor
Time of the time of film forming then than master reference film forming is short, and the two is in special ratios k, therefore under normal circumstances, auxiliary sensor
The rate of film build (average rate of film build) detected and the ratio of master reference testing result should also be equal to k, indicate it if not waiting
In a sensor there is mistake, testing result can be verified accordingly, improve detection accuracy.
Simultaneously as on auxiliary sensor actual rate of film build be less than or equal to master reference rate of film build 1/n, therefore its
Service life should be greater than n times equal to single master reference service life, therefore, when making for the master reference that n take turns to operate
When being expired with the service life, the service life of auxiliary sensor should just expire (k=1/n) or also not yet due (k < 1/n), thus should
The whole service life of rate of film build detection mould group will not reduce, and need not frequently replace.
Detailed description of the invention
Fig. 1 is that a kind of rate of film build of the embodiment of the present invention detects the distribution schematic diagram of sensor in mould group；
Fig. 2 is that a kind of rate of film build of the embodiment of the present invention detects structural schematic diagram when mould group works；
Wherein, appended drawing reference are as follows: 1, master reference；11, main baffle；111, main opening；2, auxiliary sensor；21, auxiliary baffle；
211, auxiliary opening；9, chassis.
Specific embodiment
Technical solution in order to enable those skilled in the art to better understand the present invention, with reference to the accompanying drawing and specific embodiment party
Present invention is further described in detail for formula.
Embodiment 1:
As shown in Figure 1 and Figure 2, the present embodiment provides a kind of rate of film builds to detect mould group.
Rate of film build detection mould group can be placed in the film forming chamber of film-forming apparatus, to detect the film forming speed of the equipment
The rate of film build (evaporation rate) when structure is deposited in rate, such as detection oled panel.
Specifically, rate of film build detection mould group includes:
Multiple master references 1 are used to detect the rate for forming film thereon；
Each master reference 1 and the main baffle 11 with main opening 111 are covered, can be moved so that main opening 111 is right in turn
Answer each master reference 1；
Auxiliary sensor 2 is used to detect the rate for forming film thereon；
Cover auxiliary sensor 2 and the auxiliary baffle 21 with auxiliary opening 211, energy periodic motion, during periodic motion
Auxiliary opening 211 by corresponding auxiliary sensors 2 position, and 211 areas of auxiliary opening and its accumulated in a period of motion it is inswept
The ratio of area is k, and k is less than or equal to 1/n, and n is 1 number of master reference.
It include an auxiliary sensor 2 and multiple (n) master references 1, master in the rate of film build detection mould group of the present embodiment
Sensor 1 and auxiliary sensor 2 can detect the rate (i.e. rate of film build) that film is formed on itself respectively, and can be used known
Rate of film build sensor.For example, a kind of available rate of film build sensor can produce vibration, when gradually forming a film thereon,
Corresponding change can occur for vibration state, therefore by analysis vibration state, and rate of film build sensor is you can learn that corresponding film forming
Rate.
Wherein, as shown in Figure 1, for convenience of carrying etc., whole master reference 1 and auxiliary sensor 2 can be all set to one
On chassis 9, it is not described in detail herein.
Above multiple master references 1 are covered by main baffle 11, have main opening 111 on the main baffle 11, when the main opening 111
When certain corresponding master reference 1, filmogen can be deposited on the master reference 1 by main opening 111, which can examine
Rate of film build is measured, and other master references 1 are then blocked by the entity part of main baffle 11 and can not be formed a film at this time, therefore cannot
Detect rate of film build.By the movement of main baffle 11, main opening 111 can correspond to each master reference 1 in turn, to make each master
1 Polling of sensor.
It is additionally provided with the auxiliary baffle 21 for covering auxiliary sensor 2 in the rate of film build detection mould group of the present embodiment, with main baffle 11
It is similar, there is auxiliary opening 211, when auxiliary opening 211 is in the position of corresponding auxiliary sensor 2, auxiliary sensor 2 can on auxiliary baffle 21
Rate of film build is detected, and when auxiliary opening 211 does not correspond to auxiliary sensor 2, auxiliary sensor 2 is then hidden by the entity part of auxiliary baffle 21
Gear, cannot form a film.
Different from main baffle 11, auxiliary baffle 21 can be moved periodically, therefore auxiliary opening 211 is also transported along the certain track period
It is dynamic, and its motion profile has to pass through auxiliary sensor 2.Moreover, the area of auxiliary opening 211 and it is inswept in a period of motion
Area ratio be k；It is auxiliary to open in a period of motion for auxiliary sensor 2 if auxiliary 21 uniform motion of baffle as a result,
Mouthfuls 211 by the ratio of times and cycle duration above it be k, in other words, when the time and period that can form a film on auxiliary sensor 2
Long ratio is k.The k should be less than being equal to 1/n simultaneously, i.e., in one cycle, the time that can be formed a film on auxiliary sensor 2 should be less than
In the 1/n of cycle duration, for example, it is assumed that master reference 1 has 10, it is a cycle duration 20 seconds, then auxiliary within 20 seconds time
The time (times of 211 inswept auxiliary sensors 2 of auxiliary opening) that can be formed a film on sensor 2 should be less than being equal to 2 seconds, correspondingly, auxiliary biography
Rate of film build (average rate of film build) in the period that sensor 2 detects also just should be less than 1/ equal to practical rate of film build
10。
As it can be seen that the rate of film build of the present embodiment detects in mould group, constantly form a film on the master reference 1 detected, and it is auxiliary
Time of the time to form a film on sensor 2 then than master reference film forming 1 is short, and the two is at special ratios k, therefore in normal condition
Under, the ratio of the rate of film build (average rate of film build) that auxiliary sensor 2 detects and 1 testing result of master reference should also be equal to k, if
It is not equal then to indicate that mistake occurs in one of sensor, testing result can be verified accordingly, improve detection accuracy.
Simultaneously as actual rate of film build is less than or equal to the 1/n of the rate of film build of master reference 1 on auxiliary sensor 2, therefore
Its service life should be greater than n times equal to single 1 service life of master reference, therefore, when the master reference 1 that n take turns to operate
Service life when expiring, the service life of auxiliary sensor 2 should just expire (k=1/n) or also not yet due (k < 1/n), from
And the whole service life of rate of film build detection mould group will not reduce, and need not frequently replace.
Preferably, the area of auxiliary opening 211 is equal to its 1/n that inswept area is accumulated in a period of motion.
As the easiest way, it is auxiliary opening 211 area can be exactly equal to its accumulated in a period of motion it is inswept
Area 1/n, so that the rate of film build that detects of auxiliary sensor 2 is also exactly the rate of film build that master reference 1 detects
1/n, and after the service life of whole master references 1 expires, the service life of auxiliary sensor 2 also just expires, and can avoid
Waste.
Wherein, the specific number (i.e. the value of n) of master reference 1 can according to need determination, but usually its quantity should not be too
Few, the whole service life to guarantee rate of film build detection mould group is longer, for example, can be as shown in Figure 1, rate of film build detects mould group
In have 10 master references 1.
Preferably, main baffle 11 is the circular ring shape plate with main opening 111, and multiple master references 1 are circumferential along circular ring shape plate
It is uniformly distributed.
As shown in Fig. 2, main baffle 11 is preferably the form of circular ring shape plate, and each master reference 1 is circumferentially equal along circular ring shape plate
Even distribution.In this way, main opening 111 can be made to correspond to each master reference 1 in turn, driving is most when circular ring shape plate is rotated around the center of circle
It is easy.
Preferably, auxiliary baffle 21 is the circular slab for having auxiliary opening 211, and auxiliary sensor 2 is set to the corresponding non-center of circle of circular slab
Position.
As shown in Fig. 2, auxiliary baffle 21 is preferably the form of circular slab, and auxiliary sensor 2 is set to away from circular slab center of circle r
Place, so that circular slab is per the right center of circle, one circle (a cycle) of rotation, auxiliary opening 211 once (can be completed by auxiliary sensor 2
A cycle).Certainly, at the r of the center of circle, the size of auxiliary opening 211 circumferentially also should be less than being equal to 2 π r/n (i.e. auxiliary opening
211 should be less than being equal to 1/n circumference) so that proportion requirement more than its area coinciding.
Preferably, the above circular slab is concentric is set on the inside of circular ring shape plate.It is furthermore preferred that the radius of circular slab is equal to annulus
The internal diameter of shape plate.
As shown in Fig. 2, the form of above circular ring shape plate and circular slab can be respectively adopted in main baffle 11 and auxiliary baffle 21, and auxiliary
Baffle 21 (auxiliary sensor 2) can be set on the inside of main baffle 11 (master reference 1), to save sky shared by rate of film build detection mould group
Between.
Further, to avoid occurring between circular ring shape plate and circular slab gap, therefore the inner side and outer side edge of the two is preferred
It is in contact.Certainly, although circular ring shape plate and circular slab are in contact, the two should be independent from each other, can respectively in different ways
Movement.
Preferably, rate of film build detects mould group further include: main driving unit, for driving main baffle 11 to move；Auxiliary driving
Unit, for driving the periodic motion of auxiliary baffle 21 at the uniform velocity.
That is, can detect in rate of film build motor etc. is set as driving unit, to drive main baffle 11 in mould group
Respectively required movement (such as rotating around the center of circle) is carried out respectively with auxiliary baffle 21, due to the mode for the device that baffle can be driven mobile
It is various, therefore is no longer described in greater detail herein.
Certainly, the above driving unit can also be the component of film-forming apparatus, and rate of film build detection mould group is being installed into film forming
Shi Zaiyu driving unit connects in equipment.
The present embodiment also provides a kind of film-forming apparatus comprising is equipped with for the film forming chamber of film forming, and in the chamber that forms a film
Above-mentioned rate of film build detects mould group.
It is mounted in film forming chamber that is, rate of film build can be detected to mould, to form complete film-forming apparatus.
Of course it is to be understood that the service life of rate of film build detection mould group is shorter, therefore when its service life expires (i.e.
The service life of whole master references 1 expires) after, then replaceable new rate of film build detects mould group.
Preferably, film-forming apparatus is evaporated device.
That is, the above film-forming apparatus is preferably evaporated device, which may be preferably used for preparing oled panel
In various structures.
It is to be understood that the film-forming apparatus can also be other any tools such as sputtering equipment, chemical vapor depsotition equipment (CVD)
There is the equipment of film forming function.
The present embodiment also provides a kind of rate of film build detection method, is carried out using above-mentioned rate of film build detection mould group,
The rate of film build detection method specifically includes:
Mobile main baffle 11 makes the corresponding master reference 1 of main opening 111, and the master reference 1 detection obtains main film forming speed
Rate；Meanwhile making the periodic motion of auxiliary baffle 21 at the uniform velocity, the auxiliary detection of sensor 2 obtains auxiliary rate of film build；
Judge whether the ratio of auxiliary film forming speed and main rate of film build is equal to k, indicates that rate of film build testing result is wrong if not waiting
Accidentally.
That is, auxiliary sensor 2 and one can be made when using above-mentioned rate of film build detection mould group detection rate of film build
A master reference 1 is detected simultaneously, and compares the proportionate relationship whether rate of film build that the two detects meets above k times,
If then showing that testing result is correct, if otherwise indicating, one of sensor produces mistake, can shut down and check etc..
Certainly, after the master reference 1 reaches service life, then moving main baffle 11 keeps the correspondence of main opening 111 another
A master reference 1 simultaneously continues to test, and so repeats, until all 1 service lifes of master reference expire, then integral replacing film forming
Rate detects mould group.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, essence of the invention is not being departed from
In the case where mind and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (10)
1. a kind of rate of film build detects mould group characterized by comprising
Multiple master references are used to detect the rate for forming film thereon；
Each master reference and the main baffle with main opening are covered, main baffle can move so that main opening corresponds to each main biography in turn
Sensor；
Auxiliary sensor is used to detect the rate for forming film thereon；
Cover auxiliary sensor and the auxiliary baffle with auxiliary opening, auxiliary baffle energy periodic motion, auxiliary opening during periodic motion
By the position of the auxiliary sensor of correspondence, and the ratio that auxiliary opening area and auxiliary opening accumulate inswept area in a period of motion is
K, k are less than or equal to 1/n, and n is main number of probes.
2. rate of film build according to claim 1 detects mould group, which is characterized in that
The main baffle is the circular ring shape plate with main opening, and the multiple master reference is circumferentially uniformly distributed along circular ring shape plate.
3. rate of film build according to claim 1 detects mould group, which is characterized in that
The auxiliary baffle is the circular slab for having auxiliary opening, and the auxiliary sensor is set to the position in the corresponding non-center of circle of circular slab.
4. rate of film build according to claim 1 detects mould group, which is characterized in that
The main baffle is the circular ring shape plate with main opening, and the multiple master reference is circumferentially uniformly distributed along circular ring shape plate；
The auxiliary baffle is the circular slab for having auxiliary opening, and the auxiliary sensor is set to the position in the corresponding non-center of circle of circular slab；
The circular slab is concentric to be set on the inside of the circular ring shape plate.
5. rate of film build according to claim 4 detects mould group, which is characterized in that
The radius of the circular slab is equal to the internal diameter of circular ring shape plate.
6. rate of film build according to claim 1 detects mould group, which is characterized in that
The area of the auxiliary opening is equal to its 1/n that inswept area is accumulated in a period of motion.
7. rate of film build according to claim 1 detects mould group, which is characterized in that further include:
Main driving unit, for driving the main baffle to move；
Auxiliary driving unit, for driving the periodic motion of the auxiliary baffle at the uniform velocity.
8. a kind of film-forming apparatus, including the film forming chamber for film forming, which is characterized in that
It is equipped with rate of film build described in any one of claim 1 to 7 in the film forming chamber and detects mould group.
9. film-forming apparatus according to claim 8, which is characterized in that
The film-forming apparatus is evaporated device.
10. a kind of rate of film build detection method, which is characterized in that use the speed of film forming described in any one of claim 1 to 9
Rate detects mould group and carries out, and the rate of film build detection method includes:
Mobile main baffle makes the corresponding master reference of main opening, which detects to obtain main rate of film build；Meanwhile making auxiliary
The periodic motion of baffle at the uniform velocity, auxiliary sensor detect to obtain auxiliary rate of film build；
Judge whether the ratio of the auxiliary film forming speed and main rate of film build is equal to k, indicates that rate of film build testing result is wrong if not waiting
Accidentally.
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| CN201710277788.4A CN107017177B (en) | 2017-04-25 | 2017-04-25 | Rate of film build detects mould group, film-forming apparatus, rate of film build detection method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710277788.4A CN107017177B (en) | 2017-04-25 | 2017-04-25 | Rate of film build detects mould group, film-forming apparatus, rate of film build detection method |
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| CN107017177B true CN107017177B (en) | 2019-06-07 |
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| CN108277459B (en) * | 2018-03-29 | 2020-02-18 | 武汉华星光电半导体显示技术有限公司 | Film thickness detection device and evaporation machine |
| CN114395755B (en) * | 2022-01-07 | 2023-11-28 | 京东方科技集团股份有限公司 | Crystal oscillator disk structure and use method thereof |
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| CN101021501A (en) * | 2007-03-28 | 2007-08-22 | 哈尔滨理工大学 | Flat-plate sandwich structural semiconductor type gas sensor and producing method thereof |
| CN101183643A (en) * | 2006-11-16 | 2008-05-21 | 索尼株式会社 | Method for manufacturing thin film semiconductor device |
| CN102653852A (en) * | 2011-03-03 | 2012-09-05 | 住友重机械工业株式会社 | Film forming apparatus |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002033362A (en) * | 2000-07-17 | 2002-01-31 | Matsushita Electric Ind Co Ltd | Semiconductor-inspecting device |
| US9335151B2 (en) * | 2012-10-26 | 2016-05-10 | Applied Materials, Inc. | Film measurement |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101183643A (en) * | 2006-11-16 | 2008-05-21 | 索尼株式会社 | Method for manufacturing thin film semiconductor device |
| CN101021501A (en) * | 2007-03-28 | 2007-08-22 | 哈尔滨理工大学 | Flat-plate sandwich structural semiconductor type gas sensor and producing method thereof |
| CN102653852A (en) * | 2011-03-03 | 2012-09-05 | 住友重机械工业株式会社 | Film forming apparatus |
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