JP5433943B2 - 光学部材、撮像系光学物品、撮像モジュール、カメラ、及び光学部材の製造方法 - Google Patents
光学部材、撮像系光学物品、撮像モジュール、カメラ、及び光学部材の製造方法 Download PDFInfo
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- JP5433943B2 JP5433943B2 JP2007309983A JP2007309983A JP5433943B2 JP 5433943 B2 JP5433943 B2 JP 5433943B2 JP 2007309983 A JP2007309983 A JP 2007309983A JP 2007309983 A JP2007309983 A JP 2007309983A JP 5433943 B2 JP5433943 B2 JP 5433943B2
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- 230000003287 optical effect Effects 0.000 title claims description 158
- 238000003384 imaging method Methods 0.000 title claims description 55
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000463 material Substances 0.000 claims description 75
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 69
- 229910052731 fluorine Inorganic materials 0.000 claims description 69
- 239000011737 fluorine Substances 0.000 claims description 69
- 239000011347 resin Substances 0.000 claims description 59
- 229920005989 resin Polymers 0.000 claims description 59
- 239000000758 substrate Substances 0.000 claims description 50
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 42
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 25
- 238000005566 electron beam evaporation Methods 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 8
- 229910000077 silane Inorganic materials 0.000 claims description 6
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 239000010408 film Substances 0.000 description 308
- 239000000428 dust Substances 0.000 description 36
- 238000007740 vapor deposition Methods 0.000 description 36
- 238000000151 deposition Methods 0.000 description 27
- 230000008021 deposition Effects 0.000 description 27
- 238000010521 absorption reaction Methods 0.000 description 21
- 239000000523 sample Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 230000003595 spectral effect Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 230000001133 acceleration Effects 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000006059 cover glass Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- -1 silane compound Chemical class 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
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- Surface Treatment Of Optical Elements (AREA)
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007309983A JP5433943B2 (ja) | 2007-11-30 | 2007-11-30 | 光学部材、撮像系光学物品、撮像モジュール、カメラ、及び光学部材の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007309983A JP5433943B2 (ja) | 2007-11-30 | 2007-11-30 | 光学部材、撮像系光学物品、撮像モジュール、カメラ、及び光学部材の製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009134064A JP2009134064A (ja) | 2009-06-18 |
JP2009134064A5 JP2009134064A5 (enrdf_load_stackoverflow) | 2010-12-16 |
JP5433943B2 true JP5433943B2 (ja) | 2014-03-05 |
Family
ID=40865985
Family Applications (1)
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JP2007309983A Expired - Fee Related JP5433943B2 (ja) | 2007-11-30 | 2007-11-30 | 光学部材、撮像系光学物品、撮像モジュール、カメラ、及び光学部材の製造方法 |
Country Status (1)
Country | Link |
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JP (1) | JP5433943B2 (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11137661B2 (en) | 2018-09-21 | 2021-10-05 | Samsung Electronics Co., Ltd. | Multilayer thin-film structure and phase shifting device using the same |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012113045A (ja) * | 2010-11-22 | 2012-06-14 | Seiko Epson Corp | 光学多層膜、光学素子、撮像アッセンブリー、デジタルカメラ及び光学多層膜の製造方法 |
CN102721991B (zh) * | 2012-07-03 | 2015-11-11 | 四川世创达电子科技有限公司 | 直贴膜 |
US11231533B2 (en) * | 2018-07-12 | 2022-01-25 | Visera Technologies Company Limited | Optical element having dielectric layers formed by ion-assisted deposition and method for fabricating the same |
CN110177191B (zh) * | 2019-05-10 | 2024-02-06 | 惠州市航泰光电有限公司 | 一种用于3d摄像头人脸识别模块的盖板及其生产方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003149404A (ja) * | 2001-11-09 | 2003-05-21 | Canon Inc | 光学薄膜およびその製造方法、及び光学薄膜による光学素子、光学系、該光学系を備える撮像装置、記録装置、露光装置 |
JP3989294B2 (ja) * | 2002-05-20 | 2007-10-10 | オリンパス株式会社 | カメラ及びこれに用いる撮像素子ユニット |
JP2005148379A (ja) * | 2003-11-14 | 2005-06-09 | Nikon Corp | 光学素子および撮像装置 |
JP2005189817A (ja) * | 2003-12-02 | 2005-07-14 | Olympus Corp | 光学素子及び光学機器 |
JP4768995B2 (ja) * | 2005-02-09 | 2011-09-07 | オリンパス株式会社 | 光学フィルタおよび撮像装置 |
JP2006163275A (ja) * | 2004-12-10 | 2006-06-22 | Kyocera Kinseki Corp | 光学部品 |
JP2007065259A (ja) * | 2005-08-31 | 2007-03-15 | Seiko Epson Corp | 光学多層膜フィルタ、及び電子機器装置 |
-
2007
- 2007-11-30 JP JP2007309983A patent/JP5433943B2/ja not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11137661B2 (en) | 2018-09-21 | 2021-10-05 | Samsung Electronics Co., Ltd. | Multilayer thin-film structure and phase shifting device using the same |
US11947238B2 (en) | 2018-09-21 | 2024-04-02 | Samsung Electronics Co., Ltd. | Multilayer thin-film structure and phase shifting device using the same |
Also Published As
Publication number | Publication date |
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JP2009134064A (ja) | 2009-06-18 |
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