JP5430345B2 - 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる立体造形物 - Google Patents
光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる立体造形物 Download PDFInfo
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- JP5430345B2 JP5430345B2 JP2009245682A JP2009245682A JP5430345B2 JP 5430345 B2 JP5430345 B2 JP 5430345B2 JP 2009245682 A JP2009245682 A JP 2009245682A JP 2009245682 A JP2009245682 A JP 2009245682A JP 5430345 B2 JP5430345 B2 JP 5430345B2
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Images
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
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| Application Number | Priority Date | Filing Date | Title |
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| JP2009245682A JP5430345B2 (ja) | 2009-10-26 | 2009-10-26 | 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる立体造形物 |
| PCT/NL2010/050714 WO2011053133A1 (fr) | 2009-10-26 | 2010-10-26 | Composition de résine liquide durcissable par rayonnement pour la fabrication d'additifs et objet tridimensionnel fabriqué à partir d'une telle résine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009245682A JP5430345B2 (ja) | 2009-10-26 | 2009-10-26 | 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる立体造形物 |
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| JP2011089088A JP2011089088A (ja) | 2011-05-06 |
| JP5430345B2 true JP5430345B2 (ja) | 2014-02-26 |
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| Country | Link |
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| JP (1) | JP5430345B2 (fr) |
| WO (1) | WO2011053133A1 (fr) |
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| WO2013172406A1 (fr) * | 2012-05-18 | 2013-11-21 | シーメット株式会社 | Composition de résine pour stéréolithographie optique |
| US9416220B2 (en) | 2012-05-18 | 2016-08-16 | Cmet Inc. | Resin composition for optical stereolithography |
| JP2014196453A (ja) * | 2013-03-29 | 2014-10-16 | Jsr株式会社 | 光学的立体造形用放射線硬化性液状樹脂組成物、及びそれを光硬化させて得られる光造形物 |
| HUE045364T2 (hu) * | 2015-07-02 | 2019-12-30 | Huntsman Adv Mat Licensing Switzerland Gmbh | Szabadtéri tárgyak elõállítására alkalmas hõre keményedõ epoxigyanta készítmény és az ebbõl elõállított tárgyak |
| JP7489612B2 (ja) | 2019-06-10 | 2024-05-24 | パナソニックＩｐマネジメント株式会社 | 紫外線硬化性樹脂組成物、発光装置の製造方法及び発光装置 |
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| US2807648A (en) * | 1955-09-16 | 1957-09-24 | Stauffer Chemical Co | Process for making sulfonium compounds |
| US4575330A (en) | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
| JP2590215B2 (ja) | 1988-07-15 | 1997-03-12 | 旭電化工業株式会社 | 光学的造形用樹脂組成物 |
| JPH07103218B2 (ja) | 1988-09-13 | 1995-11-08 | 旭電化工業株式会社 | 光学的造形用樹脂組成物 |
| JPH062284A (ja) | 1992-06-17 | 1994-01-11 | Fuemutoron:Kk | 捺染型の製作方法 |
| JP4017238B2 (ja) | 1998-02-24 | 2007-12-05 | Ｊｓｒ株式会社 | 光硬化性液状樹脂組成物 |
| US6287745B1 (en) | 1998-02-18 | 2001-09-11 | Dsm N.V. | Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound |
| JP4017236B2 (ja) | 1998-02-24 | 2007-12-05 | Ｊｓｒ株式会社 | 光硬化性液状樹脂組成物 |
| JP3824286B2 (ja) * | 1998-02-18 | 2006-09-20 | Ｊｓｒ株式会社 | 光硬化性樹脂組成物 |
| JP5226162B2 (ja) * | 2001-05-14 | 2013-07-03 | 株式会社ダイセル | 液状エポキシ樹脂組成物及びその用途 |
| US6811937B2 (en) | 2001-06-21 | 2004-11-02 | Dsm Desotech, Inc. | Radiation-curable resin composition and rapid prototyping process using the same |
| US20030108810A1 (en) * | 2001-08-22 | 2003-06-12 | Williamson Sue Ellen | Deodorizing agent for sulfur- or nitrogen-containing salt photoinitiators |
| JP4257295B2 (ja) * | 2005-01-07 | 2009-04-22 | 日東電工株式会社 | 光屈折率変調重合体組成物、ホログラム記録材料および屈折率制御方法 |
| JP2007169423A (ja) * | 2005-12-21 | 2007-07-05 | Jsr Corp | 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる光造形物 |
| JP5111774B2 (ja) * | 2006-04-04 | 2013-01-09 | シーメット株式会社 | 光学的立体造形用樹脂組成物 |
| JP4969137B2 (ja) * | 2006-04-17 | 2012-07-04 | シーメット株式会社 | 光学的立体造形用樹脂組成物 |
| JP4925900B2 (ja) * | 2007-04-10 | 2012-05-09 | シーメット株式会社 | 光学的立体造形用樹脂組成物 |
| US20090004579A1 (en) | 2007-06-27 | 2009-01-01 | Dsm Ip Assets B.V. | Clear and colorless three-dimensional articles made via stereolithography and method of making said articles |
| JP2009242327A (ja) * | 2008-03-31 | 2009-10-22 | Daikin Ind Ltd | 多官能含フッ素化合物及び該化合物の製造方法 |
| TWI427117B (zh) | 2008-05-30 | 2014-02-21 | Nitto Denko Corp | 光學元件用樹脂組成物、使用其之光學元件及光學鏡片之製造方法 |
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| Publication number | Publication date |
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| JP2011089088A (ja) | 2011-05-06 |
| WO2011053133A1 (fr) | 2011-05-05 |
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