JP5416434B2 - ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜 - Google Patents

ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜 Download PDF

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Publication number
JP5416434B2
JP5416434B2 JP2009049446A JP2009049446A JP5416434B2 JP 5416434 B2 JP5416434 B2 JP 5416434B2 JP 2009049446 A JP2009049446 A JP 2009049446A JP 2009049446 A JP2009049446 A JP 2009049446A JP 5416434 B2 JP5416434 B2 JP 5416434B2
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Japan
Prior art keywords
group
resin composition
photosensitive resin
carbon atoms
light
Prior art date
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Application number
JP2009049446A
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English (en)
Japanese (ja)
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JP2010204363A (ja
Inventor
祥人 中島
伶子 丸山
学 東
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel and Sumikin Chemical Co Ltd
Original Assignee
Nippon Steel and Sumikin Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel and Sumikin Chemical Co Ltd filed Critical Nippon Steel and Sumikin Chemical Co Ltd
Priority to JP2009049446A priority Critical patent/JP5416434B2/ja
Priority to TW099103346A priority patent/TWI463254B/zh
Priority to KR1020100018543A priority patent/KR101740229B1/ko
Priority to CN2010101286898A priority patent/CN101943863B/zh
Publication of JP2010204363A publication Critical patent/JP2010204363A/ja
Application granted granted Critical
Publication of JP5416434B2 publication Critical patent/JP5416434B2/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2009049446A 2009-03-03 2009-03-03 ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜 Active JP5416434B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009049446A JP5416434B2 (ja) 2009-03-03 2009-03-03 ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜
TW099103346A TWI463254B (zh) 2009-03-03 2010-02-04 Black photoresist with photosensitive resin composition and color filter shading film
KR1020100018543A KR101740229B1 (ko) 2009-03-03 2010-03-02 블랙 레지스트용 감광성 수지 조성물 및 컬러필터 차광막
CN2010101286898A CN101943863B (zh) 2009-03-03 2010-03-03 黑抗蚀剂用感光性树脂组合物及滤色器遮光膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009049446A JP5416434B2 (ja) 2009-03-03 2009-03-03 ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜

Publications (2)

Publication Number Publication Date
JP2010204363A JP2010204363A (ja) 2010-09-16
JP5416434B2 true JP5416434B2 (ja) 2014-02-12

Family

ID=42965916

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009049446A Active JP5416434B2 (ja) 2009-03-03 2009-03-03 ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜

Country Status (4)

Country Link
JP (1) JP5416434B2 (ko)
KR (1) KR101740229B1 (ko)
CN (1) CN101943863B (ko)
TW (1) TWI463254B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5875345B2 (ja) * 2011-11-28 2016-03-02 ニッコー・マテリアルズ株式会社 ソルダーレジスト用感光性樹脂組成物、及びこれを用いたソルダーレジスト用フォトレジストフィルム
JPWO2014041940A1 (ja) 2012-09-14 2016-08-18 富士フイルム株式会社 硬化性組成物および画像形成方法
JP6423215B2 (ja) * 2014-09-18 2018-11-14 株式会社Adeka 光硬化性組成物
JP6402778B2 (ja) 2015-09-30 2018-10-10 東レ株式会社 ネガ型着色感光性樹脂組成物、硬化膜、素子および表示装置
CN111435220B (zh) * 2019-01-15 2024-02-27 新应材股份有限公司 感光性树脂组合物、光学膜及其制造方法
US11520197B2 (en) 2020-05-15 2022-12-06 Omnivision Technologies, Inc. Active-pixel device assemblies with rough coating for stray-light reduction, and methods for manufacture

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4828275B2 (ja) * 2006-03-30 2011-11-30 新日鐵化学株式会社 カラーフィルター用遮光性樹脂組成物及びカラーフィルター
JP2007271987A (ja) * 2006-03-31 2007-10-18 Nippon Steel Chem Co Ltd ブラックレジスト用感光性樹脂組成物
JP5449666B2 (ja) * 2006-11-30 2014-03-19 新日鉄住金化学株式会社 アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物、硬化物及びカラーフィルター
KR101482969B1 (ko) * 2007-03-15 2015-01-21 신닛테츠 수미킨 가가쿠 가부시키가이샤 차광성 조성물 및 컬러필터
JP5133658B2 (ja) * 2007-03-28 2013-01-30 新日鉄住金化学株式会社 ブラックマトリックス用感光性樹脂組成物、それを用いた硬化物及びカラーフィルター
JP4890314B2 (ja) * 2007-03-29 2012-03-07 新日鐵化学株式会社 ブラックレジスト用感光性樹脂組成物

Also Published As

Publication number Publication date
TW201042367A (en) 2010-12-01
CN101943863A (zh) 2011-01-12
KR20100099663A (ko) 2010-09-13
CN101943863B (zh) 2013-10-02
TWI463254B (zh) 2014-12-01
JP2010204363A (ja) 2010-09-16
KR101740229B1 (ko) 2017-05-26

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