CN101943863B - 黑抗蚀剂用感光性树脂组合物及滤色器遮光膜 - Google Patents

黑抗蚀剂用感光性树脂组合物及滤色器遮光膜 Download PDF

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Publication number
CN101943863B
CN101943863B CN2010101286898A CN201010128689A CN101943863B CN 101943863 B CN101943863 B CN 101943863B CN 2010101286898 A CN2010101286898 A CN 2010101286898A CN 201010128689 A CN201010128689 A CN 201010128689A CN 101943863 B CN101943863 B CN 101943863B
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CN
China
Prior art keywords
methyl
composition
black resist
photosensitive polymer
black
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CN2010101286898A
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English (en)
Chinese (zh)
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CN101943863A (zh
Inventor
中岛祥人
丸山伶子
东学
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Nippon Steel Chemical and Materials Co Ltd
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Nippon Steel Chemical Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Optical Elements Other Than Lenses (AREA)
CN2010101286898A 2009-03-03 2010-03-03 黑抗蚀剂用感光性树脂组合物及滤色器遮光膜 Active CN101943863B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009049446A JP5416434B2 (ja) 2009-03-03 2009-03-03 ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜
JP2009-049446 2009-03-03

Publications (2)

Publication Number Publication Date
CN101943863A CN101943863A (zh) 2011-01-12
CN101943863B true CN101943863B (zh) 2013-10-02

Family

ID=42965916

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010101286898A Active CN101943863B (zh) 2009-03-03 2010-03-03 黑抗蚀剂用感光性树脂组合物及滤色器遮光膜

Country Status (4)

Country Link
JP (1) JP5416434B2 (ko)
KR (1) KR101740229B1 (ko)
CN (1) CN101943863B (ko)
TW (1) TWI463254B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5875345B2 (ja) * 2011-11-28 2016-03-02 ニッコー・マテリアルズ株式会社 ソルダーレジスト用感光性樹脂組成物、及びこれを用いたソルダーレジスト用フォトレジストフィルム
JPWO2014041940A1 (ja) 2012-09-14 2016-08-18 富士フイルム株式会社 硬化性組成物および画像形成方法
JP6423215B2 (ja) * 2014-09-18 2018-11-14 株式会社Adeka 光硬化性組成物
JP6402778B2 (ja) 2015-09-30 2018-10-10 東レ株式会社 ネガ型着色感光性樹脂組成物、硬化膜、素子および表示装置
CN111435220B (zh) * 2019-01-15 2024-02-27 新应材股份有限公司 感光性树脂组合物、光学膜及其制造方法
US11520197B2 (en) 2020-05-15 2022-12-06 Omnivision Technologies, Inc. Active-pixel device assemblies with rough coating for stray-light reduction, and methods for manufacture

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101045807A (zh) * 2006-03-30 2007-10-03 新日铁化学株式会社 用于滤色片的遮光性树脂组合物及滤色片
CN101266311A (zh) * 2007-03-15 2008-09-17 新日铁化学株式会社 遮光性组合物及滤色器

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007271987A (ja) * 2006-03-31 2007-10-18 Nippon Steel Chem Co Ltd ブラックレジスト用感光性樹脂組成物
JP5449666B2 (ja) * 2006-11-30 2014-03-19 新日鉄住金化学株式会社 アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物、硬化物及びカラーフィルター
JP5133658B2 (ja) * 2007-03-28 2013-01-30 新日鉄住金化学株式会社 ブラックマトリックス用感光性樹脂組成物、それを用いた硬化物及びカラーフィルター
JP4890314B2 (ja) * 2007-03-29 2012-03-07 新日鐵化学株式会社 ブラックレジスト用感光性樹脂組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101045807A (zh) * 2006-03-30 2007-10-03 新日铁化学株式会社 用于滤色片的遮光性树脂组合物及滤色片
CN101266311A (zh) * 2007-03-15 2008-09-17 新日铁化学株式会社 遮光性组合物及滤色器

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2008-156613A 2008.07.10
JP特开2008-268854A 2008.11.06

Also Published As

Publication number Publication date
TW201042367A (en) 2010-12-01
CN101943863A (zh) 2011-01-12
JP5416434B2 (ja) 2014-02-12
KR20100099663A (ko) 2010-09-13
TWI463254B (zh) 2014-12-01
JP2010204363A (ja) 2010-09-16
KR101740229B1 (ko) 2017-05-26

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SE01 Entry into force of request for substantive examination
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Address after: Tokyo, Japan

Applicant after: Nippon Steel Chemical Co.

Address before: Tokyo, Japan

Applicant before: Nippon Seel Chemical Co., Ltd.

COR Change of bibliographic data

Free format text: CORRECT: APPLICANT; FROM: NIPPON SEEL CHEMICAL CO., LTD. TO: NIPPON STEEL + SUMITOMO METAL CORPORATION

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Effective date of registration: 20191211

Address after: No.13-1, No.1, No.1, No

Patentee after: Nippon Iron Chemical Materials Co., Ltd.

Address before: Tokyo, Japan

Patentee before: Nippon Steel Chemical Co.

TR01 Transfer of patent right