TW201011468A - Radiation sensitive composition for formation of colouring layer, color filter and color liquid crystal display element - Google Patents

Radiation sensitive composition for formation of colouring layer, color filter and color liquid crystal display element Download PDF

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TW201011468A
TW201011468A TW098124180A TW98124180A TW201011468A TW 201011468 A TW201011468 A TW 201011468A TW 098124180 A TW098124180 A TW 098124180A TW 98124180 A TW98124180 A TW 98124180A TW 201011468 A TW201011468 A TW 201011468A
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Taiwan
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meth
group
polymer
compound
acrylate
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TW098124180A
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Chinese (zh)
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TWI459133B (en
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Hidenori Naruse
Takaki Minowa
Kouji Itano
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Jsr Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

The purpose of the present invention is to provide a radiation sensitive composition for formation of colouring layer which is able to form the pixels and black matrixs having sufficient development resistance even in the low quantity of exposure, and also has excellent solvent resistance. The said radiation sensitive composition for formation of colouring layer is characterized in that comprises (A) colorant, (B) polymer having oxetanyl group and polymerization unsaturated bond, and (C) photopolymerization initiator.

Description

201011468 六、發明說明： 【發明所屬之技術領域】 本發明係關於著色層形成用感放射線性組成物、彩 色濾光片和液晶顯示元件，更具體地說，關於透射型或 反射型彩色液晶顯示裝置、彩色攝影管元件等中所用的 彩色濾光片中適用的著色層形成用感放射線性組成 物、具有使用該感放射線性組成物形成的著色層的彩色 0 濾光片、以及具有該彩色濾光片的彩色液晶顯示元件。 【先前技術】 作爲使用著色感放射線性組成物形成彩色濾光片 的方法，已知通過在基板上或預先形成了所需圖案狀遮 光層的基板上，形成著色感放射線性組成物塗膜，借助 具有所需圖案的光罩照射射線（以下稱爲“曝光”），並 顯影以溶解除去未曝光部分，然後進行後烘焙而獲得各 色畫素的方法（參考例如專利文獻1、專利文獻2)。另 0 外，還已知使用含有黑色材料的光聚合性組成物形成黑 色矩陣的方法（參考例如專利文獻3)。 並且，近年來在彩色濾光片技術領域，減少曝光量 以縮短生產節拍時間已成爲主流，故而要求即使是低曝 光量也具有足夠的耐顯影性、耐溶劑性等，即著色層形 成用感放射線性組成物的高敏感化。特別是對於耐溶劑 性，由於畫素圖案中產生裂縫或碎片、畫素圖案中著色 201011468 成分的溶出的問題日益突顯，故而需要解決。這種問題 產生的背景，被認爲是爲了應對近年來對彩色液晶顯示 元件的高對比度化、高亮度化和高色純化的要求，對著 色層形成用感放射線性組成物中所用的顏料大多進行 了各種微細化處理或表面處理，以及著色層形成用感放 射線性組成物中顏料所占的含量比率具有越來越高的 趨勢》 © 另外’例如在專利文獻4~6中，爲了提高使用感放 射線性組成物形成的畫素圖案的耐溶劑性，提出了使其 含有具有氧雜環丁烷骨架的黏合劑聚合物的方案。但 是’這種感放射線性組成物中存在如果降低曝光量或使 用特定的顏料，則不能獲得足夠的耐顯影性和耐溶劑性 的問題。 (專利文獻） 0 專利文獻1:日本特開平2 — 144502號公報 專利文獻2:日本特開平3-53201號公報 專利文獻3:日本特開平6-35188號公報 專利文獻4:日本特開200'2-296778號公報 専利文獻5:日本特開2007-31 64 85號公報 專利文獻6:日本特開2007 — 3 1 6506號公報 【發明内容】 201011468 發明所欲解決之課題 本發明的課題是提供能夠形成即使是低曝光量也 具有足夠的耐顯影性、並且耐溶劑性優良的畫素和黑色 矩陣的著色層形成用感放射線性組成物。 本發明的另一課題是提供具有由上述彩色濾光片 用感放射線性組成物形成的畫素的彩色濾光片，以及具 有該彩色濾光片的彩色液晶顯示元件。 〇 用於解決課題之手段 本發明者們進行專心硏究的結果發現，通過使其含 有具有氧雜環丁烷基和聚合性不飽和鍵的聚合物，可以 解決上述課題，從而完成了本發明。 即，本發明第一係提供一種著色層形成用感放射線 性組成物，其特徵在於含有（A)著色劑、（B)具有氧雜環 丁烷基和聚合性不飽和鍵的聚合物、以及（C)光聚合引 發劑。 G 本發明中所述的“放射線”，含義是指包含可見光 線、紫外線、遠紫外線、電子束、X射線等的放射線。 本發明第二係提供具有用該著色層形成用感放射 線性組成物形成的著色層而形成的彩色濾光片，以及具 有該彩色濾光片的彩色液晶顯示元件。 發明之效果 本發明的感放射線性組成物，能夠形成即使是低曝 201011468 光量也具有足夠的耐顯影性、並且耐溶劑性優良的畫素 和黑色矩陣。其耐顯影性和耐溶劑性’與使用專利文獻 4〜6中所述的含有僅具有氧雜環丁烷基的共聚物的組 成物或者不含具有氧雜環丁烷基的共聚物的組成物的 情況相比顯著地更優異。 【實施方式】 實施發明之最佳形態 φ 以下，對本發明進行詳細說明。 著色層形成用感放射線件組成物 本發明的著色層形成用感放射線性組成物（以下也 簡稱爲“感放射線性組成物”）中的“著色層”，是指 由彩色濾光片中所用的畫素和/或黑色矩陣構成的層。 以下，對本發明著色層形成用感放射線性組成物的 構成成分進行說明。 一（A)著色劑- 〇 本發明中的（A)著色劑，對其色調沒有特別的限 制’可以根據所得彩色濾光片的用途而適當地選定，顔 料、染料或天然色素均可以。由於彩色濾光片要求具有 耐熱性’因而作爲本發明中的著色劑，較佳爲有機顏料 或無機顏料。 作爲上述有機顏料，可以列舉例如顏料索引（CI.; The Society of pyers and Colourists 公司發行）中分爲 201011468 顏料（Pigment)類的化合物，具體地說，可以列舉帶有下 述顏料索引（C.I.)編號的化合物。 C.I.顏料黃12、C.I.顏料黃13、C.I.顏料黃14、 C.I.顏料黃17、C.I.顏料黃20、C.I.顏料黃24、C.I. 顏料黃31、C.I.顏料黃55、C.I.顏料黃83、C.I.顏 料黃93、C.I.顏料黃109、C.I.顏料黃110、C.I.顏 料黃138、C.I.顏料黃139、C.I.顏料黃150、C.I.顏 0 料黃153、C.I.顏料黃154、C.I.顏料黃155、C.I.顏 料黃166、C.I.顏料黃168' C.I.顏料黃180、C.I.顏 料黃211 ; C.I.顏料橙5、C.I.顏料橙13、C.I.顏料橙14、 C.I.顏料橙24、C.I.顏料橙34、C.I.顏料橙36、C.I. 顏料橙38、C.I.顏料橙40、C.I.顏料橙43、C.I.顏 料橙46、C.I.顏料橙49、C.I.顏料橙61、C.I.顏料 橙64、C.I.顏料橙68、C.I.顏料橙70、C.I.顏料橙 〇 7 1' C.I.顏料橙72、C.I.顏料橙73、C.I.顏料橙74; C.I.顏料紅1、C.I.顏料紅2、C.I.顏料紅5、C.I. 顏料紅17、C.I.顏料紅31、C.I.顏料紅32、C.I_.顏 料紅41、C.I.顏料紅122、C.I.顏料紅123、C.I.顏 料紅144、C.I.顏料紅149、C.I.顏料紅166、C.I.顏 料紅168、C.I.顏料紅170、C.I.顏料紅171、C.I.顏 料紅175、C.I.顏料紅176、C.I.顏料紅177'C.I.顏 201011468 料紅178、n 料紅185、 料紅206、 料紅214、 料紅224、 料紅254、 料紅264、 ❹ 顏料紅179 ' C.I. 顏料紅187 ' C.I. 顏料紅207、H 顏料紅220、c.I_ 顏料紅242、d 顏料紅255、 顏料紅272 ; 顔料紅180、CM·顏 顏料紅202、c.I.顏 顏料紅209'c.I.顏 顏料紅2 2 1、c . I.顏 顏料紅243、C.I.顏 顔料紅262、C丄顏 '-•l. C.I. c.I. c.I. c.I. c.I. C.1.顔料紫i、c丄顔料紫19、c」顏料紫23 C·1.顏料紫 29、C·1·顔料紫 32' C.L _ 紫 36、c· 顏料紫38 ; C.I.顏料藍15、C.I.顔料藍15: 3、CI顏料藍 & 4、CM.顏料藍15: 6、c·〗顏料藍6〇、c·〗顏 料藍80 ; C丄顏料綠7、C丄顔料綠36、c〗顏料綠58; C.I·顏料棕23 ' C.I.顔料棕25 ; O C·1.顏料黑1、C.I.顏料黑p 在本發日月中，㈣顔料可以使用再結晶法、再沉殿 法、溶劑洗條法、昇華法、真空加熱法或者它們的組合 進行精製後再使用。 ' 另外，作爲上述無機顏料，可以列舉例如氧化鈦、 硫酸鋇、碳酸鈣、鋅華、硫酸鉛、黃色鉛、鋅黃、鐵丹 (紅色氧化鐵（III))、鎘紅、群青、鐵藍、氧化鉻綠、鈷 201011468 綠、赭土、鈦黑、合成鐵黑、碳黑等。 胃&著色劑，根據需要，其顆粒表面還可以使用聚 合物進行改性。作爲改性顔料顆粒表面的聚合物，可以 列舉例如曰本特開平8 - 259876號公報中所述的聚合 物’或者市售的各種顏料分散用聚合物或低聚物等。對 於碳黑表面的聚合物被覆方法，在例如日本特開平9-71733號公報、日本特開平9— 9562 5號公報、日本特開 〇 平9一 1 24 969號公報等中已經公開。 上述著色劑可以單獨或兩種以上混合使用。 當將本發明的感放射線性組成物用於形成畫素 時，由於畫素要求高精細的發色，因而作爲（A)著色劑， 較佳爲發色性高的著色劑，具體地說，較佳係使用有機 顏料。 另外，當將本發明的感放射線性組成物用於形成黑 色矩陣時，由於黑色矩陣要求具有遮光性，因而作爲（A) 〇 著色劑，較佳係使用有機顏料或碳黑。 另外，本發明的感放射線性組成物，在提高使用感 放射線性組成物形成的著色層的耐溶劑性方面特別有 用，該感放射線性組成物含有選自於C.I.顏料紅254、 C.I.顏料綠58和碳黑構成的群組中的至少一種作爲（A) 著色劑。 本發明的感放射線性組成物，即使著色劑的含量達 -10- 201011468 到感放射線性組成物全部固體成分中的30重量％以上 時，也具有優良的耐溶劑性。另外，在本發明中’著色 劑含量的上限，從確保顯影性的角度出發’較佳爲感放 射線性組成物全部固體成分中的70重量％以下，特佳 係60重量％以下。這裏，所謂固體成分，是指下述溶 劑以外的成分。 本發明中的著色劑，根據需要，還可以與分散劑、 0 分散助劑一起使用。 作爲上述分散劑，可以使用例如陽離子類、陰離子 類、非離子類或兩性等適當的分散劑，較佳爲聚合物分 散劑。具體地，可以列舉改性丙烯酸類共聚物、丙烯酸 類共聚物、聚胺基甲酸酯、聚酯、高分子共聚物的烷基 銨鹽或磷酸酯鹽、陽離子性梳型接枝聚合物等。這裏， 所謂陽離子性梳型接枝聚合物，是指具有在1分子中具 有多個鹸性基團（陽離子性官能團）的主鏈聚合物上，枝 Q 接連接2分子以上支鏈聚合物的結構的聚合物，可以列 舉例如主鏈聚合物部分爲聚乙嫌亞胺、支鏈聚合物部分 、 爲ε ·己內酯旳開環聚合物而構成的聚合物。這些分散 劑中，較佳爲改性丙烯酸類共聚物、聚胺基甲酸酯、陽 離子性梳型接枝聚合物。 這種分散劑可以商業購得，例如，作爲改性丙烯酸 類聚合物，可以列舉 Disperbyk — 2000、Disperbyk — -11- 201011468 2001(以上由BYK-Chemie(BYK)公司製），作爲聚胺基甲 酸醋，可以列舉 Disperbyk — 161、Disperbyk — 162、 Disperbyk— 165、Disperbyk— 167、Disperbyk— 170、 Disperbyk- 182(以上由 BYK-Chemie(BYK)公司製）、 SOLSPERSE 76500(由LUBRIZOL(股）公司製），作爲陽離 子性梳型接枝聚合物，可以列舉 SOLSPERSE 24000(由 LUBRIZOL(股）公司製），AJISPER PB 821、 ❹ AJISPER PB 822、AJISPER PB 880(由味之素 FineTechno 股份有限公司生產）等。 這些分散劑可以單獨或兩種以上混合使用。分散劑 的含量，相對於100重量份（A)著色劑，通常爲100重 量份以下，較佳爲0.5~100重量份，更佳爲1~70重量 份，特佳係10~50重量份。如果分散劑的含量過多，則 存在損害顯影性等的危險性。 作爲上述分散助劑，可以列舉例如藍色顏料衍生 ❹ 物、黃色顏料衍生物等，具體地，可以列舉例如銅酞菁 衍生物等。 -（B)具有氧雜環丁烷基和聚合性不飽和鍵的聚合 物― 本發明中的（B)具有氧雜環丁烷基和聚合性不飽和 鍵的聚合物（以下也稱爲“聚合物（B)”），是在曝光和後 烘焙步驟時發生交聯反應而使塗膜硬化的成分。本發明 -12- 201011468 的感放射線性組成物，通過含有聚合物（B)，可以形成 即使在低曝光量的情況下耐顯影性和耐溶劑性也優良 的著色層。 聚合物（B)的使用凝膠滲透色譜（G PC，溶出溶劑： 四氫呋喃）測定的聚苯乙烯換算的重量平均分子量（以 下稱爲“Mw” ），較佳爲 3000〜50000，更佳爲 5000-30000 « Q 另外，聚合物（B)的Mw與使用凝膠滲透色譜法 (GPC ’溶出溶劑：四氫呋喃）測定的聚苯乙烯換算的數 均分子量（以下稱爲“ Μη ” ）之比（Mw/Mn)，較佳爲 1~5 ’更佳爲1〜4。如果Mw過小，則存在不能獲得所需 效果的危險性，另一方面，若過大，則存在未曝光部分 的基板上或遮光層上產生浮垢、殘膜等的危險性。 聚合物（B)中的氧雜環丁烷基，還可以具有取代 基。作爲該取代基，可以列舉例如氟、碳原子數爲1 ~4 Ο 的烷基、苯基、碳原子數爲1~4的全氟烷基等。聚合物 (B)較佳爲具有下述式（1)表示的重複單元。201011468 6. Technical Field of the Invention The present invention relates to a radiation sensitive composition for forming a colored layer, a color filter, and a liquid crystal display element, and more particularly to a transmissive or reflective type color liquid crystal display. a color-sensitive layer forming sensitizing radiation composition suitable for use in a color filter used in a device, a color photographic tube element, or the like, a color 0 filter having a coloring layer formed using the sensitizing radiation composition, and having the color A color liquid crystal display element of a filter. [Prior Art] As a method of forming a color filter using a coloring-sensing radiation linear composition, it is known to form a color-sensitive radiation composition coating film on a substrate or a substrate on which a desired pattern-like light-shielding layer is formed in advance. A method of irradiating a ray (hereinafter referred to as "exposure") with a mask having a desired pattern, and developing to dissolve and remove the unexposed portion, and then performing post-baking to obtain respective color pixels (refer to, for example, Patent Document 1 and Patent Document 2) . In addition, a method of forming a black matrix using a photopolymerizable composition containing a black material is also known (refer to, for example, Patent Document 3). Further, in recent years, in the field of color filter technology, it has become a mainstream to reduce the amount of exposure to shorten the tact time. Therefore, it is required to have sufficient development resistance, solvent resistance, and the like even at a low exposure amount, that is, a feeling of forming a colored layer. High sensitivity to radioactive compositions. In particular, with respect to solvent resistance, since the problem of cracks or chips in the pixel pattern and the elution of the coloring of the component 201011468 in the pixel pattern is becoming more and more prominent, it needs to be solved. The background of such a problem is considered to be in response to recent demands for high contrast, high luminance, and high color purification of color liquid crystal display elements, and most of the pigments used in the radiation-sensitive composition for forming a colored layer are used. Various kinds of miniaturization treatments or surface treatments have been carried out, and the ratio of the content of the pigment in the radioactive linear composition for coloring layer formation has become higher and higher. © In addition, for example, in Patent Documents 4 to 6, in order to improve use The solvent resistance of the pixel pattern formed by the radiation-sensitive composition is proposed to contain a binder polymer having an oxetane skeleton. However, in such a radiation-sensitive composition, if the exposure amount is lowered or a specific pigment is used, sufficient development resistance and solvent resistance cannot be obtained. (Patent Document 1) Japanese Unexamined Patent Publication No. Hei No. Hei. No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. 2007-31, No. 2007-31, No. JP-A No. 2007-31, No. It is possible to form a sensitizing radiation-forming composition for coloring layer formation of a pixel and a black matrix which have sufficient development resistance and low solvent resistance even at a low exposure amount. Another object of the present invention is to provide a color filter having a pixel formed of the radiation sensitive composition for a color filter, and a color liquid crystal display device having the color filter. Means for Solving the Problem As a result of intensive investigation, the present inventors have found that the above problem can be solved by including a polymer having an oxetane group and a polymerizable unsaturated bond, thereby completing the present invention. . That is, the first aspect of the present invention provides a radiation sensitive composition for forming a coloring layer, characterized by comprising (A) a coloring agent, (B) a polymer having an oxetane group and a polymerizable unsaturated bond, and (C) Photopolymerization initiator. G "Radiation" as used in the present invention means radiation containing visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray or the like. The second aspect of the present invention provides a color filter having a coloring layer formed using the photosensitive layer-forming radiation sensitive composition, and a color liquid crystal display element having the color filter. Advantageous Effects of Invention The radiation sensitive composition of the present invention can form a pixel and a black matrix which have sufficient development resistance and excellent solvent resistance even in low exposure 201011468 light amount. The development resistance and solvent resistance of the composition and the composition containing the copolymer having only the oxetane group described in Patent Documents 4 to 6 or the copolymer having no oxetane group The situation of the object is significantly superior. [Embodiment] The best mode for carrying out the invention φ Hereinafter, the present invention will be described in detail. The photosensitive layer forming composition for a colored layer is a "colored layer" in the photosensitive layer forming photosensitive composition for forming a coloring layer (hereinafter also referred to simply as "radiation-sensitive linear composition"), and is used in a color filter. Layers of pixels and/or black matrices. Hereinafter, the constituent components of the radiation sensitive composition for forming a colored layer of the present invention will be described. (A) Colorant - ( The coloring agent (A) in the present invention is not particularly limited in color tone, and may be appropriately selected depending on the use of the obtained color filter, and a pigment, a dye or a natural pigment may be used. Since the color filter is required to have heat resistance, it is preferably a coloring agent in the present invention, and is preferably an organic pigment or an inorganic pigment. As the above-mentioned organic pigment, for example, a pigment index (CI.; issued by The Society of pyers and Colourists) can be cited as a compound of the 201011468 Pigment type, and specifically, the following pigment index (CI) can be cited. Numbered compound. CI Pigment Yellow 12, CI Pigment Yellow 13, CI Pigment Yellow 14, CI Pigment Yellow 17, CI Pigment Yellow 20, CI Pigment Yellow 24, CI Pigment Yellow 31, CI Pigment Yellow 55, CI Pigment Yellow 83, CI Pigment Yellow 93, CI Pigment Yellow 109, CI Pigment Yellow 110, CI Pigment Yellow 138, CI Pigment Yellow 139, CI Pigment Yellow 150, CI Yan 0 Material Yellow 153, CI Pigment Yellow 154, CI Pigment Yellow 155, CI Pigment Yellow 166, CI Pigment Yellow 168' CI Pigment Yellow 180, CI Pigment Yellow 211; CI Pigment Orange 5, CI Pigment Orange 13, CI Pigment Orange 14, CI Pigment Orange 24, CI Pigment Orange 34, CI Pigment Orange 36, CI Pigment Orange 38, CI Pigment Orange 40, CI Pigment Orange 43, CI Pigment Orange 46, CI Pigment Orange 49, CI Pigment Orange 61, CI Pigment Orange 64, CI Pigment Orange 68, CI Pigment Orange 70, CI Pigment Orange 〇 7 1 ' CI Pigment Orange 72, CI Pigment Orange 73, CI Pigment Orange 74; CI Pigment Red 1, CI Pigment Red 2, CI Pigment Red 5, CI Pigment Red 17, CI Pigment Red 31, CI Pigment Red 32, C.I_. Pigment Red 41, CI Pigment Red 122, CI Pigment Red 123, CI Pigment Red 144, CI Pigment Red 149, CI Pigment Red 166, CI Pigment 168, CI Pigment Red 170, CI Pigment Red 171, CI Pigment Red 175, CI Pigment Red 176, CI Pigment Red 177'CI Yan 201011468 Red 178, n Red 185, Red 206, Red 214, Red 224 , Red 254, Red 264, ❹ Pigment Red 179 ' CI Pigment Red 187 ' CI Pigment Red 207, H Pigment Red 220, c.I_ Pigment Red 242, d Pigment Red 255, Pigment Red 272; Pigment Red 180, CM · Pigment Red 202, cI Pigment Red 209'cI Pigment Red 2 2, c. I. Pigment Red 243, CI Pigment Red 262, C丄颜'-•l. CI cIcIcIcI C.1. Pigment Purple i, c丄 Pigment Violet 19, c" Pigment Violet 23 C·1. Pigment Violet 29, C·1·Pigment Violet 32' CL _ Violet 36, c· Pigment Violet 38; CI Pigment Blue 15, CI Pigment Blue 15 : 3, CI Pigment Blue & 4, CM. Pigment Blue 15: 6, c·〗 Pigment Blue 6〇, c·〗 Pigment Blue 80; C丄 Pigment Green 7, C丄 Pigment Green 36, c〗 Pigment Green 58 CI·Pigment Brown 23 'CI Pigment Brown 25; OC·1. Pigment Black 1, CI Pigment Black p In the day of the month, (4) pigments can be recrystallized, re-sinking, solvent washing, sublimation Method, vacuum heating The method or a combination thereof is refined and used. Further, examples of the inorganic pigment include titanium oxide, barium sulfate, calcium carbonate, zinc oxide, lead sulfate, yellow lead, zinc yellow, iron oxide (red iron oxide (III)), cadmium red, ultramarine blue, and iron blue. , chrome oxide green, cobalt 201011468 green, alumina, titanium black, synthetic iron black, carbon black and so on. The stomach & colorant can also be modified with a polymer surface as needed. Examples of the polymer of the surface of the modified pigment particle include a polymer described in JP-A-H08-259876, or a commercially available polymer or oligomer for pigment dispersion. A method of coating a polymer on the surface of a carbon black is disclosed in, for example, Japanese Laid-Open Patent Publication No. Hei 9-71733, Japanese Patent Application Laid-Open No. Hei 9-9562, and Japanese Patent Application Laid-Open No. Hei No. Hei. The above colorants may be used singly or in combination of two or more. When the radiation sensitive composition of the present invention is used for forming a pixel, since the pixel requires high-definition color development, the coloring agent (A) is preferably a coloring agent having a high color developability, specifically, It is preferred to use an organic pigment. Further, when the radiation sensitive composition of the present invention is used to form a black matrix, since the black matrix is required to have light blocking properties, it is preferred to use an organic pigment or carbon black as the (A) 着色 coloring agent. Further, the radiation sensitive composition of the present invention is particularly useful for improving the solvent resistance of a coloring layer formed using a radiation sensitive composition containing a color selected from CI Pigment Red 254 and CI Pigment Green 58. At least one of the group consisting of carbon black is used as the (A) colorant. The radiation sensitive composition of the present invention has excellent solvent resistance even when the content of the colorant is from -10-201011468 to 30% by weight or more of all the solid components of the radiation sensitive composition. In the present invention, the upper limit of the content of the colorant is preferably 70% by weight or less, and more preferably 60% by weight or less, based on the total solid content of the radiation-sensitive composition. Here, the solid component means a component other than the following solvent. The coloring agent in the present invention may be used together with a dispersing agent and a 0 dispersing aid as needed. As the dispersing agent, for example, a suitable dispersing agent such as a cationic substance, an anionic type, a nonionic type or an amphoteric type can be used, and a polymer dispersing agent is preferable. Specific examples thereof include an alkyl amide salt or a phosphate salt of a modified acrylic copolymer, an acrylic copolymer, a polyurethane, a polyester, a polymer copolymer, a cationic comb-type graft polymer, and the like. . Here, the cationic comb-type graft polymer refers to a main chain polymer having a plurality of inert groups (cationic functional groups) in one molecule, and the branch Q is connected to a branched polymer of two or more molecules. The polymer of the structure may, for example, be a polymer in which the main chain polymer portion is a polyethylene iodide, a branched polymer portion, or a ε·caprolactone oxime ring-opening polymer. Among these dispersants, preferred are modified acrylic copolymers, polyurethanes, and cationic comb-type graft polymers. Such a dispersant is commercially available, for example, as a modified acrylic polymer, and examples thereof include Disperbyk-2000, Disperbyk--11-201011468 2001 (above, BYK-Chemie (BYK)), as a polyaminocarboxylic acid. Vinegar can be listed as Disperbyk - 161, Disperbyk - 162, Disperbyk - 165, Disperbyk - 167, Disperbyk - 170, Disperbyk - 182 (above BYK-Chemie (BYK)), SOLSPERSE 76500 (manufactured by LUBRIZOL Co., Ltd.) As the cationic comb-type graft polymer, SOLSPERSE 24000 (manufactured by LUBRIZOL Co., Ltd.), AJISPER PB 821, ❹ AJISPER PB 822, AJISPER PB 880 (produced by Ajinomoto FineTechno Co., Ltd.), etc., may be mentioned. . These dispersing agents may be used alone or in combination of two or more. The content of the dispersant is usually 100 parts by weight or less, preferably 0.5 to 100 parts by weight, more preferably 1 to 70 parts by weight, particularly preferably 10 to 50 parts by weight, per 100 parts by weight of the (A) coloring agent. If the content of the dispersant is too large, there is a risk of impairing developability and the like. The dispersing aid may, for example, be a blue pigment-derived quinone or a yellow pigment derivative. Specific examples thereof include a copper phthalocyanine derivative. - (B) a polymer having an oxetane group and a polymerizable unsaturated bond - (B) a polymer having an oxetane group and a polymerizable unsaturated bond in the present invention (hereinafter also referred to as " The polymer (B)") is a component which undergoes a crosslinking reaction at the time of exposure and post-baking steps to harden the coating film. In the radiation sensitive composition of the present invention -12-201011468, by containing the polymer (B), it is possible to form a coloring layer which is excellent in development resistance and solvent resistance even in the case of a low exposure amount. The polystyrene-equivalent weight average molecular weight (hereinafter referred to as "Mw") of the polymer (B) measured by gel permeation chromatography (G PC, elution solvent: tetrahydrofuran) is preferably 3,000 to 50,000, more preferably 5,000. -30000 « Q The ratio of the Mw of the polymer (B) to the polystyrene-equivalent number average molecular weight (hereinafter referred to as "Μη") measured by gel permeation chromatography (GPC 'dissolving solvent: tetrahydrofuran) (Mw /Mn), preferably 1 to 5' is more preferably 1 to 4. If the Mw is too small, there is a risk that the desired effect cannot be obtained. On the other hand, if it is too large, there is a risk that scallops, residual film, and the like may be generated on the unexposed portion of the substrate or on the light shielding layer. The oxetane group in the polymer (B) may further have a substituent. Examples of the substituent include fluorine, an alkyl group having 1 to 4 carbon atoms, a phenyl group, and a perfluoroalkyl group having 1 to 4 carbon atoms. The polymer (B) preferably has a repeating unit represented by the following formula (1).

-13- .201011468 中爲與A連接的連接鍵）或者伸苯基，a表示具 有氧雜環丁院基的基團，R7表示氫原子或甲基 另外，作爲聚合物（B)中的聚合性不飽和鍵，可以 列舉乙烯基、（甲基）丙烯醯基、烯丙基等，較佳爲（甲 基）丙烯醯基。另外’聚合物（B)較佳爲其側鏈上具有聚 合性不飽和鍵》 聚合物（B)，從耐顯影性和耐溶劑性角度出發，較 Q 佳爲具有0.1~5.0毫莫耳/g氧雜環丁烷基和0.^5.0毫 莫耳/g(甲基）丙烯醯基的聚合物，更佳爲具有〇.3~4.0 毫莫耳/g氧雜環丁烷基和〇.3~4.0毫莫耳/g(甲基）丙烯 醯基的聚合物，特佳係具有0.3-2.5毫莫耳/g氧雜環丁 烷基和0.5~4.0毫莫耳/g (甲基）丙烯醯基的聚合物。 聚合物（B)，只要滿足上述條件，則對其沒有特別 的限制，例如，可以爲選自於 (B- 1)使含有（M)具有氧雜環丁烷基的聚合性不飽 〇 和化合物和（b2)具有羥基的聚合性不飽和化合物而構 成的單體的共聚物（以下也稱爲“先質共聚物（1)” ）與 (b3)不飽和異氰酸酯化合物反應所得的聚合物（以下也 稱爲“聚合物（B - 1) ”）、 (B - 2)使含有（bl)具有氧雜環丁烷基的聚合性不飽 和化合物和（b4)不飽和羧酸而構成的單體的共聚物（以 下也稱爲“先質共聚物（2)”）與（b5)具有環氧乙烷基的 -14- 201011468 聚合性不飽和化合物反應所得的聚合物（以下也稱爲 “聚合物（B — 2)”）、以及 (B - 3)使含有（bl)具有氧雜環丁烷基的聚合性不飽 和化合物和（b5)具有環氧乙烷基的聚合性不飽和化合 物而構成的單體的共聚物（以下也稱爲“先質共聚物 (3)” ）與（b4)不飽和羧酸反應所得的聚合物（以下也稱 爲“聚合物（B- 3)”）構成的群組中的至少一種。 Q 以下，（bl)具有氧雜環丁烷基的聚合性不飽和化合 物' (b2)具有羥基的聚合性不飽和化合物、（b3)不飽和 異氰酸酯化合物、（b4)不飽和羧酸和（b5)具有環氧乙烷 基的聚合性不飽和化合物，分別也稱爲“化合物 (bl)” 、 “化合物（b2)” 、 “化合物（b3)” 、 “化合物 (b4)”和“化合物（b5)” 。另外，上述化合物（bl)〜（b5) 以外的聚合性不飽和化合物以下也稱爲“化合物 (b6)” 。 〇 作爲上述化合物（bl)，可以列舉例如3-(乙烯基氧 基甲基）·2-甲基氧雜環丁烷、3-(乙烯基氧基甲基）-3-甲 基氧雜環丁烷、3-(乙烯基氧基甲基）-2-乙基氧雜環丁 烷、3-(乙烯基氧基甲基）·3-乙基氧雜環丁烷、3-(乙烯基 氧基乙基）-2-甲基氧雜環丁烷、3-(乙烯基氧基乙基）-3-甲基氧雜環丁烷、3-(乙烯基氧基乙基）-2-乙基氧雜環丁 烷、3-(乙烯基氧基乙基）-3-乙基氧雜環丁烷、2-(乙烯基 -15- 201011468 氧基甲基）-2-甲基氧雜環丁烷、2-(乙烯基氧基甲基）-3-甲基氧雜環丁烷、2-(乙烯基氧基甲基）-2-乙基氧雜環丁 烷、2-(乙烯基氧基甲基）-3 -乙基氧雜環丁烷、2-(乙稀基 氧基乙基）·2 -甲基氧雜環丁烷、2-(乙烯基氧基乙基）-3_ 甲基氧雜環丁烷、2-(乙烯基氧基乙基）-2-乙基氧雜環丁 院、2-(乙嫌基氧基乙基）-3 -乙基氧雜環丁院等（乙嫌基 氧基烷基）烷基氧雜環丁烷； φ 3-[(甲基）丙烯酿氧基甲基]氧雜環丁烷、3-[2-(甲基） 丙烯醯氧基乙基]氧雜環丁烷、2-[(甲基）丙烯醯氧基甲 基]氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙基]氧雜環丁 烷等（甲基）丙烯醯氧基烷基氧雜環丁烷； 3-[(甲基）丙烯醯氧基甲基]-2_甲基氧雜環丁烷、 3-[(甲基）丙烯醯氧基甲基]-3-甲基氧雜環丁烷、3-[(甲 基）丙烯醯氧基甲基]-2-乙基氧雜環丁烷、3-[(甲基）丙烯 醯氧基甲基]-3-乙基氧雜環丁烷、3-[2-(甲基）丙烯醯氧 〇 基乙基]-2-甲基氧雜環丁烷、3-[2-(甲基）丙烯醯氧基乙 基]-3-甲基氧雜環丁烷、3-[2-(甲基）丙烯醯氧基乙基]-2-乙基氧雜環丁烷、3-[2-(甲基）丙烯醯氧基乙基]-3-乙基 氧雜環丁烷、2-[(甲基）丙烯醯氧基甲基]-2-甲基氧雜環 丁烷、2-[(甲基）丙烯醯氧基甲基]-3-甲基氧雜環丁烷、 2-[(甲基）丙烯醯氧基甲基]-4-甲基氧雜環丁烷、2-[(甲 基）丙烯醯氧基甲基]-2-乙基氧雜環丁烷、2-[(甲基）丙烯 -16 - 201011468 醯氧基甲基]-3-乙基氧雜環丁烷、2·[(甲基）丙烯醯氧基 甲基]-4·乙基氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙 基]-2-甲基氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙基]-3-甲基氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙基]-4-甲基 氧雜環丁烷、2-[2·(甲基）丙烯醯氧基乙基]-2-乙基氧雜 環丁烷、2-[2-(甲基）丙烯醯氧基乙基]-3-乙基氧雜環丁 烷、2-[2-(甲基）丙烯醯氧基乙基]-4-乙基氧雜環丁烷等 Q [(甲基）丙烯權氧基烷基]烷基氧雜環丁烷： 3-[(甲基）丙烯醯氧基甲基]-2-三氟甲基氧雜環丁 烷、3-[(甲基）丙烯醯氧基甲基]-2-五氟乙基氧雜環丁 烷、3-[(甲基）丙烯醯氧基甲基]-2-氟氧雜環丁烷、3-[(甲 基）丙烯醯氧基甲基]-2,2-二氟氧雜環丁烷、3-[(甲基）丙 烯醯氧基甲基]-2,2,4-三氟氧雜環丁烷、3_[(甲基）丙烯 醯氧基甲基]-2,2,4,4-四氟氧雜環丁烷、3-[2·(甲基）丙烯 醯氧基乙基]-2-三氟甲基氧雜環丁烷、3-[2_(甲基）丙烯 G 醯氧基乙基]-2-五氟乙基氧雜環丁烷、3·[2-(甲基）丙烯 醯氧基乙基]-2-氟氧雜環丁烷、3_[2_(甲基）丙烯醯氧基 乙基]-2,2-二氟氧雜環丁烷、3-[2:(甲基）丙嫌酸氧基乙 基]-2,2,4-三氟氧雜環丁烷、3-[2-(甲基）丙儲酿氧基乙 基]-2,2,4,4-四氟氧雜環丁烷、 2-[(甲基）丙烯醯氧基甲基]-2-三氟甲基氧雜環丁 烷、2-[(甲基）丙烯醯氧基甲基]-3-三氟甲基氧雜環丁 -17- 2010H468 燒、2-[(甲基）丙烯醯氧基甲基]·4_三氟甲基氧雜環丁 烷、2-[(甲基）丙烯醯氧基甲基]-2-五氟乙基氧雜環丁 烷、2-[(甲基）丙烯醯氧基甲基]-3-五氟乙基氧雜環丁 烷' 2-[(甲基）丙烯醯氧基甲基]-4-五氟乙基氧雜環丁 院、2-[(甲基）丙烯醯氧基甲基]-2,3-二氟氧雜環丁烷、 2-[(甲基）丙烯醯氧基甲基]_2,4-二氟氧雜環丁烷、2-[(甲 基）丙烯醯氧基甲基]-3,3-二氟氧雜環丁烷、2-[(甲基）丙 φ 烯醯氧基甲基]-3,4-二氟氧雜環丁烷、2-[(甲基）丙烯醯 氧基甲基]-4,4-二氟氧雜環丁烷、2-[(甲基）丙烯醯氧基 甲基]-3,3,4-三氟氧雜環丁烷、2-[(甲基）丙烯醯氧基甲 基]-3,4,4-三氟氧雜環丁烷、2-[(甲基）丙烯醯氧基甲 基]-3,3,4,4-四氟氧雜環丁烷、2-[2-(甲基）丙烯醢氧基乙 基]·2·三氟甲基氧雜環丁烷、2-[2-(甲基）丙烯酶氧基乙 基]-3-三氟甲基氧雜環丁烷、2-[2·(甲基）丙烯醯氧基乙 基]-4-三氟甲基氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙 ❹ 基]-2 -五氣乙基氧雜環丁院、2-[2-(甲基）丙燦酿氧基乙 基]-3-五氟乙基氧雜環丁烷、2-[2-(甲基）丙烯醸氧基乙 基]-4 -五氟乙基第雜缉丁院、2-[2-(甲基）丙嫌醯氧基乙 基]-2,3-二氟氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙 基]-2,4-二氟氧雜環丁烷、2-[2-(甲基）丙烯醢氧基乙 基]-3,3·二氟氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙 基]-3,4-二氟氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙 -18 - 201011468 基]-4,4-二氟氧雜環丁院、2-[2-(甲基）丙烯酿氧基乙 基]-3,3,4-三氟氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙 基]-3,4,4-三氟氧雜環丁烷、2-[2-(甲基）丙烯醯氧基乙 基]-3,3，4,4-四氟氧雜環丁烷等[(甲基）丙烯醯氧基烷基] 氛氧雜環丁院或者[(甲基）丙嫌醯氧基院基]氟代院基氧 雜環丁烷； 2-[(甲基）丙烯醯氧基甲基]-2 -苯基氧雜環丁烷、 0 2-[(甲基）丙烯醯氧基甲基]-3-苯基氧雜環丁烷、2-[(甲 基）丙烯醯氧基甲基]-4-苯基氧雜環丁烷、2-[2-(甲基） 丙烯醯氧基乙基]-2-苯基氧雜環丁烷、2-[2-(甲基）丙烯 醯氧基乙基]-3-苯基氧雜環丁烷、2-[2-(甲基）丙烯醯氧 基乙基]-4-苯基氧雜環丁烷等[(甲基）丙烯醯氧基烷基] 苯基氧雜環丁烷； 4-[3-(3-乙基氧雜環丁烷-3-基甲氧基）丙氧基]苯乙 烯、4-[4-(3-乙基氧雜環丁烷-3-基甲氧基）丁氧基]苯乙 〇 烯、4-[5-(3-乙基氧雜環丁烷-3-基甲氧基）戊氧基]苯乙 烯、4·[6-(3-乙基氧雜環丁烷-3-基甲氧基）己氧基]苯乙 烯、4-[7-_(3-乙基氧雜環丁烷-3-基甲氧基）庚氧基]苯乙 烯等具有氧雜環丁烷基的芳香族乙烯化合物等。 這些化合物（bl)中，從提高所得著色層的耐溶劑性 方面考慮，較佳爲3-(乙烯基氧基甲基）-3-乙基氧雜環丁 烷、3-[(甲基）丙烯醯氧基甲基]氧雜環丁烷、3-[(甲基） -19- 201011468 丙嫌醯氧基甲基]-3 -乙基氧雜環丁院、3-[(甲基）丙嫌酿 氧基甲基]-2-三氟甲基氧雜環丁烷、3_[(甲基）丙烯醯氧 基甲基]-2-苯基氧雜環丁烷、2-[(甲基）丙烯醯氧基甲基] 氧雜環丁院、2-[(甲基）丙嫌酸氧基甲基]-三氟甲基氧 雜環丁烷。 化合物（bl)可以單獨或兩種以上混合使用。 另外，作爲化合物（b2)，可以列舉例如（甲基）丙烯 φ 酸2-羥基乙酯、（甲基）丙烯酸3-羥基丙酯、（甲基）丙烯 酸4-羥基丁酯、（甲基）丙烯酸5-羥基戊酯、（甲基）丙烯 酸6-羥基己酯、（甲基）丙烯酸7-羥基庚酯、（甲基）丙烯 酸8-羥基辛酯、（甲基）丙烯酸9-羥基壬酯、（甲基）丙烯 酸10-羥基癸酯、（甲基）丙烯酸11-羥基十一烷基酯、（甲 基）丙烯酸12-羥基十二烷基酯等（甲基）丙烯酸羥基烷基 酯； (甲基）丙烯酸2-(6-羥基己醯氧基）乙酯、（甲基）丙 0 烯酸3-(6_羥基己醯氧基）丙酯、（甲基）丙烯酸4-(6-羥基 己醯氧基）丁酯、（甲基）丙烯酸5-(6-羥基己醯氧基）戊 酯、（甲基）丙烯酸6-(6-羥基己醯氧基）己酯等（甲基）丙 烯酸（6-羥基己醯氧基）烷基酯等。 作爲甲基丙烯酸（6-羥基己醯氧基）烷基酯與甲基丙 烯酸2-羥基乙酯的混合物的市售品，商品名可以列舉 PLACCEL FM1D、FM2D(戴西爾化學工業（股）生產）等。 -20- 201011468 另外，還可以列舉（甲基）丙烯酸2-(3-羥基-2,2-二甲 基-丙氧羰氧基）-乙基酯’、（甲基）丙烯酸3-(3-羥基-2,2-二甲基-丙氧羰氧基）-丙基酯、（甲基）丙烯酸4-(3-羥基 -2,2-二甲基-丙氧羰氧基）-丁基酯、（甲基）丙烯酸5-(3-羥基-2,2-二甲基-丙氧羰氧基）-戊基酯、（甲基）丙烯酸 6-(3-羥基-2,2-二甲基-丙氧羰氧基）-己基酯等（甲基）丙 烯酸（3-羥基-2,2-二甲基·丙氧羰氧基）·烷基酯等。 φ 作爲（甲基）丙烯酸（3-羥基-2,2-二甲基-丙氧羰氧 基）-烷基酯與甲基丙烯酸2·羥基乙酯的混合物的市售 品，商品名可以列舉HEMAC1 (戴西爾化學工業（股）生產） 等。 另外，還可以列舉（甲基）丙烯酸4-羥基-環己基酯、 (甲基）丙烯酸4-羥甲基-環己基甲基酯、（甲基）丙烯酸 4-羥乙基-環己基乙基酯、（甲基）丙烯酸3-羥基-二環 [2.2.1]庚-5-烯-2-基酯、（甲基）丙烯酸3-羥甲基-二環 Ο [2.2.1]庚-5-烯-2-基甲基酯、（甲基）丙烯酸3-羥乙基-二 環[2.2.1]庚-5-烯-2-基乙基酯、（甲基）丙烯酸8-羥基-二 環[2.2.1]庚-5-烯-2-基酯、（甲基）丙烯酸2-羥基-八氫 -4,7-亞甲基-茚-5-基酯、（甲基）丙烯酸2-羥甲基-八氫 -4,7-亞甲基-茚-5-基甲基酯、（甲基）丙烯酸2-羥乙基-八氫-4,7-亞甲基-茚-5-基乙基酯、（甲基）丙烯酸3-羥基-金剛烷-1-基酯、（甲基）丙烯酸3-羥甲基-金剛烷-1-基甲 -21- 201011468 基酯、（甲基）丙烯酸3-羥乙基-金剛烷-1-基乙基酯等具 有脂環式結構的（甲基）丙烯酸羥基烷基酯； (甲基）丙烯酸1,2-二羥基乙基酯、（甲基）丙烯酸2,3-二羥基丙基酯、（甲基）丙烯酸1，3-二羥基丙基酯、（甲基） 丙烯酸3,4-二羥基丁基酯、（甲基）丙烯酸3-[3-(2,3-二羥 基丙氧基）-2-羥基丙氧基]-2-羥基丙基酯等（甲基）丙烯 酸多羥基烷基酯等。 φ 其中，作爲供給上述先質共聚物（1)的合成的化合 物（b 2)，從共聚反應性及與化合物（b3)的反應性的角度 出發’較佳爲（甲基）丙烯酸2 -羥基乙酯、（甲基）丙烯酸 3-羥基丙酯、（甲基）丙烯酸4-羥基丁酯、（甲基）丙烯酸 2-(6 -淫基己醯氧基）乙基醋、（甲基）丙嫌酸2-(3-羥基 -2,2-二甲基-丙氧羰氧基）-乙基酯 '(甲基）丙烯酸4_羥甲 基·環己基甲基酯.、（甲基）丙烯酸3-羥甲基·金剛烷-1-基甲基酯、（甲基）丙烯酸2,3-二羥基丙基酯等。 〇 化合物（b2)可以單獨或兩種以上混合使用。 上述化合物（b 3)是具有乙烯性不飽和鍵和異氰酸 醋基的化合物’可以列舉例如（甲基）丙烯醯氧基異氰酸 酯、2-(甲基）丙烯醯氧基苯基異氰酸酯、2_(卜乙烯基苯 基）丙烷-2-基異氰酸酯、2-(甲基）丙烯醯氧基乙基異氰 酸酯、3-(甲基）丙烯醯氧基丙基異氰酸酯、‘（甲基）丙 稀酿氧基丁基異氰酸酯、6-(甲基）丙烯醯氧基己基異氰 -22- 201011468 酸酯、8-(甲基）丙烯醯氧基辛基異氰酸酯、ι〇·(甲基）丙 烯醯氧基癸基異氰酸酯、1，1-[二（甲基）丙烯醯氧基甲基] 乙基異氰酸酯、1,1,1-[三（甲基）丙烯醯氧基甲基]甲基異 氰酸酯 '(甲基）丙烯酸2-(2-異氰酸酯基乙氧基）乙酯、 (甲基）丙烯酸2-[2-(2-異氰酸酯基乙氧基）乙氧基]乙基 酯 '(甲基）丙烯酸2-[2-[2-(2-異氰酸酯基乙氧基）乙氧基] 乙氧基]乙基酯、（甲基）丙烯酸2-(2-異氰酸酯基丙氧基） Q 乙酯、（甲基）丙烯酸2-[2-(2-異氰酸酯基丙氧基）丙氧基] 乙基酯等。 這種化合物（b3)中，作爲2-丙烯醯氧基乙基異氰酸 酯的市售品，商品名可以列舉KARENS AOI(昭和電工 (股）生產），作爲2-甲基丙烯醯氧基乙基異氰酸酯的市 售品，商品名可以列舉 KARENS MOI(昭和電工（股）生 產）’作爲甲基丙烯酸2-(2-異氰酸酯基乙氧基）乙基酯的 市售品，商品名可以列舉KARENS MOI- EG(昭和電工 G (股）生產），作爲1，1-(二丙烯醯氧基甲基）乙基異氰酸酯 的市售品，商品名可以列舉KARENS BEI(昭和電工（股） 生產）。-13- .201011468 is a linkage to A) or a phenyl group, a represents a group having an oxetane group, R7 represents a hydrogen atom or a methyl group, and as a polymerization in the polymer (B) The unsaturated bond may, for example, be a vinyl group, a (meth)acryl fluorenyl group or an allyl group, and is preferably a (meth) acrylonitrile group. Further, the polymer (B) preferably has a polymerizable unsaturated bond in its side chain (B), and from the viewpoint of development resistance and solvent resistance, it is preferably 0.1 to 5.0 mmol/min. a polymer of g oxetane and 0.^5.0 mmol/g (meth) propylene fluorenyl, more preferably 〇.3 to 4.0 mM/g oxetane and hydrazine .3~4.0 millimoles/g of (meth)acrylonitrile-based polymer, particularly preferably having 0.3-2.5 millimoles/g oxetane and 0.5-4.0 millimoles/g (methyl) a polymer of acrylonitrile. The polymer (B) is not particularly limited as long as it satisfies the above conditions, and for example, it may be selected from (B-1) to contain (M) a polymerizable unsaturated group having an oxetane group and a polymer obtained by reacting a compound and (b2) a copolymer of a monomer having a hydroxyl group-containing polymerizable unsaturated compound (hereinafter also referred to as "proline copolymer (1)") with (b3) an unsaturated isocyanate compound ( Hereinafter, it is also referred to as "polymer (B-1)"), (B-2), and is composed of (bl) a polymerizable unsaturated compound having an oxetane group and (b4) an unsaturated carboxylic acid. a polymer obtained by reacting a copolymer of a body (hereinafter also referred to as "proline copolymer (2)") with (b5) a polymerizable unsaturated compound having an oxirane group of -14 to 201011468 (hereinafter also referred to as " The polymer (B-2)"), and (B-3) are such that (bl) a polymerizable unsaturated compound having an oxetanyl group and (b5) a polymerizable unsaturated compound having an oxirane group The copolymer of the monomer (hereinafter also referred to as "proline copolymer (3)") and (b4) unsaturated The resulting acid reaction of the polymer (hereinafter also referred to as "polymer (B- 3)") of at least one of the group consisting of. Q (b) a polymerizable unsaturated compound having an oxetanyl group (b2) a polymerizable unsaturated compound having a hydroxyl group, (b3) an unsaturated isocyanate compound, (b4) an unsaturated carboxylic acid, and (b5) a polymerizable unsaturated compound having an oxiranyl group, also referred to as "compound (bl)", "compound (b2)", "compound (b3)", "compound (b4)", and "compound (b5), respectively. )". Further, the polymerizable unsaturated compound other than the above compounds (b1) to (b5) is hereinafter also referred to as "compound (b6)". 〇 as the above compound (bl), for example, 3-(vinyloxymethyl)·2-methyloxetane, 3-(vinyloxymethyl)-3-methyloxocycle Butane, 3-(vinyloxymethyl)-2-ethyloxetane, 3-(vinyloxymethyl)·3-ethyloxetane, 3-(vinyl Oxyethyl)-2-methyloxetane, 3-(vinyloxyethyl)-3-methyloxetane, 3-(vinyloxyethyl)-2- Ethyloxetane, 3-(vinyloxyethyl)-3-ethyloxetane, 2-(vinyl-15- 201011468 oxymethyl)-2-methyloxa Cyclobutane, 2-(vinyloxymethyl)-3-methyloxetane, 2-(vinyloxymethyl)-2-ethyloxetane, 2-(ethylene Benzyloxymethyl)-3-ethyloxetane, 2-(ethylideneoxyethyl)-2-methyloxetane, 2-(vinyloxyethyl)- 3_Methyloxetane, 2-(vinyloxyethyl)-2-ethyloxetan, 2-(ethyl-ethyloxyethyl)-3-ethyloxetane a hospital (such as a benzyloxyalkyl)alkyl oxetane; Φ 3-[(Methyl)acryloxymethyl]oxetane, 3-[2-(methyl)acryloxyethyl)oxetane, 2-[(methyl) (Meth) propylene oxyalkyl oxetane such as acryloxymethyl]oxetane or 2-[2-(meth)acryloxyethyl]oxetane 3-[(Meth)acryloxymethyl]-2-methyloxetane, 3-[(meth)acryloxymethyl]-3-methyloxetane , 3-[(Meth)acryloxymethyl]-2-ethyloxetane, 3-[(meth)acryloxymethyl]-3-ethyloxetane 3-[2-(Methyl)acryloyloxyindolyl]-2-methyloxetane, 3-[2-(methyl)propenyloxyethyl]-3-methyl Oxetane, 3-[2-(methyl)propenyloxyethyl]-2-ethyloxetane, 3-[2-(methyl)propenyloxyethyl]- 3-ethyloxetane, 2-[(meth)acryloxymethyl]-2-methyloxetane, 2-[(meth)acryloxymethyl]- 3-methyloxetane, 2-[(meth)acryloxymethyl]-4-methyloxetane, 2-[(meth)acrylofluorene Methyl]-2-ethyloxetane, 2-[(meth)acryl-16 - 201011468 decyloxymethyl]-3-ethyloxetane, 2·[(methyl ) acryloxymethyl]-4.ethyloxetane, 2-[2-(methyl)propenyloxyethyl]-2-methyloxetane, 2-[2 -(Methyl)acryloxyethyl]-3-methyloxetane, 2-[2-(methyl)propenyloxyethyl]-4-methyloxetane, 2-[2·(Methyl)acryloxyethyl]-2-ethyloxetane, 2-[2-(methyl)propenyloxyethyl]-3-ethyloxa Q [(methyl)propenyloxyalkyl]alkyloxirane such as cyclobutane or 2-[2-(methyl)acryloxyethyl]-4-ethyloxetane Alkane: 3-[(Methyl)propenyloxymethyl]-2-trifluoromethyloxetane, 3-[(methyl)propenyloxymethyl]-2-pentafluoroethyl Oxetane, 3-[(meth)acryloxymethyl]-2-fluorooxetane, 3-[(methyl)acryloxymethyl]-2,2-di Fluoxetane, 3-[(meth)acryloxymethyl]-2,2,4-trifluorooxetane, 3-[(meth)acryloxymethyl]- 2 , 2,4,4-tetrafluorooxetane, 3-[2·(methyl)acryloxyethyl]-2-trifluoromethyloxetane, 3-[2_(A Phenyl G methoxyethyl]-2-pentafluoroethyl oxetane, 3·[2-(methyl) propylene methoxyethyl]-2-fluorooxetane, 3_ [2-(Meth)acryloxyethyl)-2,2-difluorooxetane, 3-[2:(methyl)propanoic acidoxyethyl]-2,2,4- Trifluorooxetane, 3-[2-(methyl)propanyloxyethyl]-2,2,4,4-tetrafluorooxetane, 2-[(meth)propene醯oxymethyl]-2-trifluoromethyloxetane, 2-[(meth)acryloxymethyl]-3-trifluoromethyloxetane-17-2010H468, 2-[(Meth) propylene methoxymethyl] 4-trifluoromethyl oxetane, 2-[(methyl) propylene methoxymethyl]-2-pentafluoroethyl oxa Cyclobutane, 2-[(meth)acryloxymethyl]-3-pentafluoroethyloxetane 2-[(methyl)acryloxymethyl]-4-pentafluoro Ethyloxetine, 2-[(meth)acryloxymethyl]-2,3-difluorooxetane, 2-[(meth)acryloxymethyl]_2 4-difluorooxetine , 2-[(Meth) propylene methoxymethyl]-3,3-difluorooxetane, 2-[(methyl)propyl φ olefinoxymethyl]-3,4-di Fluoxetane, 2-[(meth)acryloxymethyl]-4,4-difluorooxetane, 2-[(meth)acryloxymethyl]-3 , 3,4-trifluorooxetane, 2-[(meth)acryloxymethyl]-3,4,4-trifluorooxetane, 2-[(meth)propene醯oxymethyl]-3,3,4,4-tetrafluorooxetane, 2-[2-(methyl)propenyloxyethyl]·2·trifluoromethyloxetane Alkane, 2-[2-(methyl)propenyloxyethyl]-3-trifluoromethyloxetane, 2-[2·(methyl)propenyloxyethyl]-4- Trifluoromethyloxetane, 2-[2-(methyl)propenyloxyethoxycarbonyl]-2-5-pentaethylethene, 2-[2-(methyl)propene酿 ethoxyethyl]-3-pentafluoroethyl oxetane, 2-[2-(methyl) propylene methoxyethyl]-4 -pentafluoroethyl diterpenoid, 2 -[2-(Methyl)propanophenoxyethyl]-2,3-difluorooxetane, 2-[2-(methyl)propenyloxyethyl]-2,4- Difluorooxetane, 2-[2-(methyl) propylene oxime Benzyl]-3,3·difluorooxetane, 2-[2-(methyl)propenyloxyethyl]-3,4-difluorooxetane, 2-[2 -(Meth)acryloyloxyethyl-18 - 201011468 yl]-4,4-difluorooxetane, 2-[2-(methyl)acryloxyethyl]-3,3, 4-trifluorooxetane, 2-[2-(methyl)propenyloxyethyl]-3,4,4-trifluorooxetane, 2-[2-(methyl) Acryloxyethyl]-3,3,4,4-tetrafluorooxetane, etc. [(Meth)acryloxyalkylene] Oxyxetane or [(methyl)-propyl Alkoxy-based oxetane; 2-[(meth)acryloxymethyl]-2-phenyloxetane, 0 2-[(meth) propylene醯oxymethyl]-3-phenyloxetane, 2-[(meth)acryloxymethyl]-4-phenyloxetane, 2-[2-(methyl ) propylene methoxyethyl]-2-phenyl oxetane, 2-[2-(methyl) propylene methoxyethyl]-3-phenyl oxetane, 2-[2 -(Methyl)acryloxyethyl)-4-phenyloxetane, etc. [(Methyl) propylene oxyalkyl] phenyl oxetane; 4-[3-(3 -ethyloxetane -3-ylmethoxy)propoxy]styrene, 4-[4-(3-ethyloxetan-3-ylmethoxy)butoxy]phenylethene, 4-[ 5-(3-ethyloxetan-3-ylmethoxy)pentyloxy]styrene, 4·[6-(3-ethyloxetan-3-ylmethoxy) An aromatic vinyl compound having an oxetanyl group such as hexyloxy]styrene or 4-[7-(3-ethyloxetan-3-ylmethoxy)heptyloxy]styrene Wait. Among these compounds (b), from the viewpoint of improving the solvent resistance of the resulting colored layer, 3-(vinyloxymethyl)-3-ethyloxetane and 3-[(methyl) are preferred. Propylene methoxymethyl]oxetane, 3-[(methyl)-19- 201011468 propyl oxalyloxymethyl]-3-ethyloxetane, 3-[(methyl) Aromatic oxymethyl]-2-trifluoromethyloxetane, 3-[(meth)acryloxymethyl]-2-phenyloxetane, 2-[(A Base) propylene methoxymethyl] oxetane, 2-[(methyl)propionic acid oxymethyl]-trifluoromethyloxetane. The compound (b1) may be used singly or in combination of two or more. Further, examples of the compound (b2) include 2-hydroxyethyl (meth) propylene phthalate, 3-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and (methyl). 5-hydroxypentyl acrylate, 6-hydroxyhexyl (meth)acrylate, 7-hydroxyheptyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, 9-hydroxydecyl (meth)acrylate a (hydroxy) (meth) acrylate such as 10-hydroxydecyl (meth)acrylate, 11-hydroxyundecyl (meth)acrylate or 12-hydroxydodecyl (meth)acrylate; 2-(6-hydroxyhexyloxy)ethyl (meth)acrylate, 3-(6-hydroxyhexyloxy)propyl (meth)acrylate, 4-(6) (meth)acrylate -hydroxyhexyloxy)butyl ester, 5-(6-hydroxyhexyloxy)pentyl (meth)acrylate, 6-(6-hydroxyhexyloxy)hexyl (meth)acrylate, etc. ()-(6-hydroxyhexyloxy)alkyl acrylate or the like. As a commercial product of a mixture of (6-hydroxyhexyloxy)alkyl methacrylate and 2-hydroxyethyl methacrylate, the trade name can be listed as PLACEL FM1D, FM2D (Dai Sil Chemical Industry Co., Ltd.) )Wait. -20- 201011468 In addition, 2-(3-hydroxy-2,2-dimethyl-propoxycarbonyloxy)-ethyl ester (meth)acrylate and 3-(3) (meth)acrylate may also be mentioned. -hydroxy-2,2-dimethyl-propoxycarbonyloxy)-propyl ester, 4-(3-hydroxy-2,2-dimethyl-propoxycarbonyloxy)-butyl (meth)acrylate Base ester, 5-(3-hydroxy-2,2-dimethyl-propoxycarbonyloxy)-pentyl (meth)acrylate, 6-(3-hydroxy-2,2-(meth)acrylate (3-hydroxy-2,2-dimethyl-propoxycarbonyloxy)-alkyl (meth)acrylate, such as dimethyl-propoxycarbonyloxy)-hexyl ester. φ is a commercial product of a mixture of (3-hydroxy-2,2-dimethyl-propoxycarbonyloxy)-alkyl (meth)acrylic acid and 2-hydroxyethyl methacrylate, and the trade name may be listed. HEMAC1 (Dai Sil Chemical Industry Co., Ltd.) and so on. Further, 4-hydroxy-cyclohexyl (meth)acrylate, 4-hydroxymethyl-cyclohexylmethyl (meth)acrylate, and 4-hydroxyethyl-cyclohexylethyl (meth)acrylate may also be mentioned. Ester, 3-hydroxy-bicyclo[2.2.1]hept-5-en-2-yl (meth)acrylate, 3-hydroxymethyl-bicyclo(meth)acrylate [2.2.1]g- 5-en-2-ylmethyl ester, 3-hydroxyethyl-bicyclo[2.2.1]hept-5-en-2-ylethyl (meth)acrylate, 8-hydroxyl (meth)acrylate -bicyclo[2.2.1]hept-5-en-2-yl ester, 2-hydroxy-octahydro-4,7-methylene-indol-5-yl (meth)acrylate, (methyl) 2-Hydroxymethyl-octahydro-4,7-methylene-indol-5-ylmethyl acrylate, 2-hydroxyethyl-octahydro-4,7-methylene-fluorene (meth)acrylate 5-5-ethyl ethyl ester, 3-hydroxy-adamantan-1-yl (meth)acrylate, 3-hydroxymethyl-adamantane-1-ylmethyl-21-201011468-based (meth)acrylate, a hydroxyalkyl (meth) acrylate having an alicyclic structure such as 3-hydroxyethyl-adamantan-1-ylethyl (meth)acrylate; 1,2-dihydroxyethyl (meth)acrylate Ester, (meth)acrylic acid 2,3-di Hydroxypropyl ester, 1,3-dihydroxypropyl (meth)acrylate, 3,4-dihydroxybutyl (meth)acrylate, 3-[3-(2,3-) A polyhydroxyalkyl (meth)acrylate such as dihydroxypropoxy)-2-hydroxypropoxy]-2-hydroxypropyl ester. φ. The compound (b 2) to be used as the synthesis of the precursor copolymer (1) is preferably a 2-hydroxy group of (meth)acrylic acid from the viewpoints of copolymerization reactivity and reactivity with the compound (b3). Ethyl ester, 3-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 2-(6-mercaptohexyloxy)ethyl vinegar (meth)acrylate, (methyl) 2-(3-hydroxy-2,2-dimethyl-propoxycarbonyloxy)-ethyl ester of 4-acrylic acid 4-(hydroxymethyl)cyclohexylmethyl (meth)acrylate. 3 - hydroxymethyl adamantyl-1-ylmethyl acrylate, 2,3-dihydroxypropyl (meth) acrylate, and the like. 〇 The compound (b2) may be used singly or in combination of two or more. The above compound (b 3) is a compound having an ethylenically unsaturated bond and an isocyanate group, and examples thereof include (meth)acryloxylated isocyanate, 2-(meth)acryloxyphenyl isocyanate, 2_ (Bu vinylphenyl)propan-2-yl isocyanate, 2-(methyl) propylene methoxyethyl isocyanate, 3-(methyl) propylene methoxy propyl isocyanate, '(Methyl) propylene Oxybutyl butyl isocyanate, 6-(methyl) propylene methoxy hexyl isocyanide-22- 201011468 acid ester, 8-(meth) propylene decyl octyl isocyanate, ι〇·(methyl) propylene oxime Alkyl isocyanate, 1,1-[di(methyl)acryloxymethyl]ethyl isocyanate, 1,1,1-[tris(methyl)propenyloxymethyl]methyl isocyanate' 2-(2-Isocyanate ethoxy)ethyl methacrylate, 2-[2-(2-isocyanate ethoxy)ethoxy]ethyl (meth) acrylate (meth) acrylate 2-[2-[2-(2-Isocyanate ethoxy)ethoxy]ethoxy]ethyl ester, 2-(2-isocyanatepropoxy) Q ethyl (meth)acrylate, ( Methyl) propyl 2-[2-(2-Isocyanatepropylpropoxy)propoxy]ethyl acrylate and the like. In the compound (b3), a commercially available product of 2-propenyloxyethyl isocyanate may be exemplified by KARENS AOI (produced by Showa Denko Co., Ltd.) as 2-methylpropenyloxyethyl isocyanate. Commercially available products, such as KARENS MOI (produced by Showa Denko), are commercially available as 2-(2-isocyanate ethoxy)ethyl methacrylate. The trade name can be listed as KARENS MOI- EG (produced by Showa Denko G Co., Ltd.), which is a commercial product of 1,1-(dipropenyloxymethyl)ethyl isocyanate, and the product name is KARENS BEI (produced by Showa Denko Co., Ltd.).

V 這些化合物（b3)中，從與化合物（b2)的反應性的角 度出發，較佳爲2·(甲基）丙烯醯氧基乙基異氰酸酯、 4-(甲基）丙烯醯氧基丁基異氰酸酯、（甲基）丙烯酸2-(2-異氰酸酯基乙氧基）乙基酯、1，1-[二（甲基）丙烯醯氧基 -23- 201011468 甲基]乙基異氰酸酯。 在聚合物（B-1)的合成中，化合物（b 3)可以單獨或 兩種以上混合使用。 另外，作爲化合物（b4)，可以列舉例如（甲基）丙烯 酸、巴豆酸、α-氯丙烯酸、桂皮酸等不飽和單羧酸； 馬來酸、馬來酸酐、富馬酸、衣康酸、衣康酸酐、 檸康酸、檸康酸酐、中康酸、中康酸酐等不飽和二酸酸 0 或其酸軒； 琥珀酸單[2-(甲基）丙烯醯氧基乙基]酯、鄰苯二甲 酸[2-(甲基）丙烯醯氧基乙基]酯等二元以上的多元羧酸 的單[(甲基）丙烯醯氧基烷基]酯； ω-羧基聚己內酯單（甲基）丙烯酸酯等兩末端具有 羧基和羥基的聚合物的單（甲基）丙烯酸酯等。 當將這些化合物（b4)用於先質共聚物（2)的合成 時，從共聚反應性和容易獲得的角度出發，較佳爲（甲 〇 基）丙烯酸、琥珀酸單[2-(甲基）丙烯醯氧基乙基]酯、ω- 羧基聚己內酯單（甲基）丙烯酸酯。 另一方面’當將化合物（b4)用於與先質共聚物（3) 反應合成聚合物（B - 3)時，從與化合物（b5)的反應性、 容易獲得性等方面考慮，較佳爲（甲基）丙嫌酸。 化合物（b4)可以單獨或兩種以上混合使用。 另外，作爲化合物（b 5 )’可以列舉例如（甲基）丙烯 -24- 201011468 酸縮水甘油酯、（甲基）丙烯酸2·甲基縮水甘油酯、（甲 基）丙烯酸3,4-環氧基丁基酯、（甲基）丙烯酸6,7-環氧基 庚基酯、（甲基）丙烯酸3,4-環氧基環己基酯、（甲基）丙 烯酸3,4-環氧基環己基甲基酯、（甲基）丙烯酸2-縮水甘 油基氧基乙基酯、（甲基）丙烯酸3-縮水甘油基氧基丙基 酯、（甲基）丙烯酸4-縮水甘油基氧基丁基酯等具有環氧 乙烷基的（甲基）丙烯酸酯； ❹ 乙基丙烯酸縮水甘油酯、α -正丙基丙烯酸縮水 甘油酯、正丁基丙烯酸縮水甘油酯、α-乙基丙烯酸 6,7-環氧基庚基酯等具有環氧乙烷基的α ·烷基丙烯酸 酯； 1-乙烯基-2,3·環氧基環己烷、1-乙烯基-3,4-環氧基 環己烷、鄰乙烯基苄基縮水甘油醚、間乙烯基苄基縮水 甘油醚、對乙烯基苄基縮水甘油醚等具有環氧乙烷基的 乙烯基化合物等。 ❹ 這些化合物（b5)中，在供給先質共聚物（3)的合成以 及用於與先質共聚物（2)反應合成聚合物（B- 2)的任一 情況下，均較佳爲具有環氧乙烷基的（甲基）丙烯酸酯， 從提高所得著色層的耐顯影性和耐溶劑性的方面考 慮，較佳爲（甲基）丙烯酸縮水甘油酯、（甲基）丙烯酸2-甲基縮水甘油酯、（甲基）丙烯酸4-縮水甘油基氧基丁基 酯或（甲基）丙烯酸3,4-環氧基環己基甲基酯》 -25- 201011468 化合物（b5)可以單獨或兩種以上組合使用。 另外’化合物（b6)是在先質共聚物（1)~(3)中能夠進 行共聚的化合物（bl)~(b5)以外的聚合性不飽和化合 物。作爲其具體例子，可以列舉例如： 馬來醯亞胺； N-苯基馬來醯亞胺、N-鄰羥基苯基馬來醯亞胺、N-間羥基苯基馬來醯亞胺、N-對羥基苯基馬來醯亞胺、N-φ 苄基馬來醯亞胺、N-環己基馬來醯亞胺、N-琥珀醯亞胺 基馬來醯亞胺基苯甲酸酯' N-琥珀醯亞胺基-4-馬來 醯亞胺基丁酸酯、N-琥珀醯亞胺基-6-馬來醯亞胺基己 酸酯、N-琥珀醯亞胺基-3-馬來醯亞胺基丙酸酯、N-(吖 啶基）馬來醯亞胺等N位取代的馬來醯亞胺； 苯乙烯、α -甲基苯乙烯、鄰乙烯基甲苯、間乙烯 基甲苯、對乙烯基甲苯、對氯苯乙烯、鄰甲氧基苯乙烯、 間甲氧基苯乙烯、對甲氧基苯乙烯、鄰乙烯基苯酚、間 〇 乙烯基苯酚、對乙烯基苯酚、對羥基-α-甲基苯乙烯、 鄰乙烯苄基甲基醚、間乙烯苄基甲基醚、對乙烯苄基甲 基醚等芳香族乙烯基化合物； 苊烯、5-氯苊烯、5-羥甲基苊烯、5_羥基苊烯等苊 烯類； 茚、1-甲基茚等茚類； (甲基）丙烯酸甲酯、（甲基）丙烯酸乙酯、（甲基）丙 -26- 201011468 烯酸正丙酯、（甲基）丙烯酸異丙酯、（甲基）丙烯酸正丁 酯、（甲基）丙烯酸異丁酯、（甲基）丙烯酸第二丁酯、（甲 基）丙烯酸第三丁酯、（甲基）丙烯酸2-乙基己基酯等（甲 基）丙烯酸烷基酯； (甲基）丙烯酸環己基酯、（甲基）丙烯酸2-甲基環己 基酯、（甲基）丙烯酸三環[5.2.1.02’6]癸烷-8-基酯、（甲基） 丙烯酸異冰片基酯、（甲基）丙烯酸四氫糠基酯等（甲基） φ 丙烯酸的脂環族酯； (甲基）丙烯酸苯酯、（甲基）丙烯酸苄基酯、（甲基） 丙烯酸4-羥基苯酯等（甲基）丙烯酸芳基酯； (甲基）丙烯酸2-甲氧基酯、（甲基）丙烯酸2-苯氧基 乙基酯、聚乙二醇（n=2~100)甲醚（甲基）丙烯酸酯、聚 丙二醇（η =2〜100)甲醚（甲基）丙烯酸酯、對枯基苯酚的 環氧乙烷改性的（甲基）丙烯酸酯等具有烯化氧結構的 (甲基）丙烯酸酯； 〇 (甲基）丙烯酸烯丙基酯； 醋酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、安息香酸 乙烯嘩等羧酸乙烯酯； 乙烯基甲基醚、乙烯基乙基醚等不飽和醚； (甲基）丙烯腈、α-氯丙烯腈、偏二氰乙烯等氰化 乙烯基化合物； (甲基）丙烯醯胺、α -氯丙烯醯胺、Ν-2-羥基乙基（甲 -27- 201011468 基）丙烯醯胺等不飽和醯胺； 1,3-丁二烯、異戊二烯、氯丁二烯等脂肪族共軛二 烯； 聚苯乙烯、聚（甲基）丙烯酸甲酯、聚（甲基）丙烯酸 正丁酯、聚矽氧烷等聚合物分子鏈末端具有單（甲基）丙 烯醯基的大分子單體等。 化合物（b6)可以單獨或兩種以上混合使用。 0 另外，在先質共聚物（1)中共聚合化合物（b 4)可以使 其具有鹸可溶性，先質共聚物（2)、（3)中可以共聚合化 合物（b2)。 在本發明中，作爲化合物（b6)，較佳爲N-位取代的 馬來醯亞胺、芳香族乙烯基化合物、苊烯類、（甲基）丙 烯酸烷基酯 '(甲基）丙烯酸的脂環族酯、（甲基）丙烯酸 芳基酯、（甲基）丙烯酸烯丙基酯、具有烯化氧結構的（甲 基）丙烯酸酯，特佳爲N-苯基馬來醯亞胺、N-環己基馬 〇 來醯亞胺、苯乙烯、α-甲基苯乙烯、對羥基-α-甲基 苯乙烯、苊烯、（甲基）丙烯酸甲酯、（甲基）丙烯酸正丁 酯、（甲基）丙烯酸2-乙基己基酯 '(甲基）丙烯酸苄基酯、 (甲基）丙烯酸4-羥基苯基酯、對枯基苯酚的環氧乙烷改 性的（甲基）丙烯酸酯、（甲基）丙烯酸烯丙基酯。 先質共聚物（1)中化合物（bl)的共聚合比率，通常爲 10~90重量％，較佳爲1〇~80重量％。先質共聚物（1)中 -28- 201011468 化合物（b2)的共聚合比率’通常爲5〜9〇重量％，較佳爲 1 0 ~ 8 0 重量 ％。 先質共聚物（2)中化合物（bl)的共聚合比率，通常爲 5~90重量％ ’較佳爲10〜80重量％。先質共聚物（2)中化 合物（b 4)的共聚合比率’通常爲5〜50重量％，較佳爲 10~40 重量 ％。 先質共聚物（3)中化合物（bi)的共聚合比率，通常爲 Q 5~90重量％’較佳爲1〇~80重量％。先質共聚物（3)中化 合物（b 5)的共聚合比率，通常爲5~90重量％，較佳爲 1 0〜8 0重量％。 在合成先質共聚物（1)〜（3)時通過將化合物（bl)~(b5) 的共聚合比率設定在上述範圍內，可以以所需的轉化率 合成非凝膠化的聚合物（B - 1)〜（B — 3)，並且可以改善 含有所得聚合物（B — 1)~(B - 3)的感放射線性組成物的 耐顯影性和耐溶劑性，因而是較佳的。 ❹ 先質共聚物（1)~(3)，可以通過例如將各聚合性不飽 和化合物在適當的溶劑中，在2,2’ -偶氮二異丁腈、 2,2’ -偶氮二（2,4-二甲基戊腈）、2,2’ -偶氮二-(4-甲氧 基-2，4-二甲基戊腈）等自由基聚合引發劑的存在下進行 聚合而製備。 先質共聚物（1)〜（3)，在如上所述將聚合性不飽和化 合物進行自由基聚合後，可以通過使用兩種以上極性不 -29- 201011468 同的有機溶劑進行再沉澱精製而製備。即，將聚合後的 良溶劑中的溶液，根據需要通過過濾或離心分離等除去 不溶的雜質後，投入到大量（通常爲聚合物溶液體積的 5〜10倍的量）的沉澱劑（不良溶劑）中，使共聚物再沉澱 而精製。此時，共聚物溶液中殘留的雜質中，可溶於沉 澱劑的雜質殘留在液相而從精製的先質共聚物（1)~(3) 中分離出來。 0 作爲該再沉澱法中使用的良溶劑/沉澱劑的組合， 可以列舉例如二甘醇單甲醚乙酸酯/正己烷、甲基乙基 酮/正己烷、二甘醇單甲醚乙酸酯/正庚烷、甲基乙基酮 /正庚烷等。 另外，先質共聚物（1)〜（3)，還可以通過將各聚合性 不飽和化合物在2,2’ -偶氮二異丁腈、2,2’ -偶氮二 (2,4-二甲基戊腈）、2,2’ -偶氮二- (4-甲氧基-2,4-二甲基 戊腈）等自由基聚合引發劑以及吡唑-1-二硫代羧酸氰基 〇 (二甲基）甲基酯、吡唑-1-二硫代羧酸苄基酯、四乙基秋 蘭姆二硫化物、二（吡唑-1-基硫代羰基）二硫化物、二（3-甲基-吡唑-1-基硫代羰基）二硫化物、二（4-甲基-吡唑-1-基硫代羰基）二硫化物、二（5-甲基-吡唑-1-基硫代羰基） 二硫化物、二（3，4,5·三甲基-吡唑-1-基硫代羰基）二硫化 物、二（吡咯-1-基硫代羰基）二硫化物、二硫代苯甲醯基 二硫化物等起引發轉移終止劑作用的分子量調節劑的 -30- 201011468 存在下’在惰性溶劑中，通常使反應溫度爲〇~15〇艺， 較佳爲50~120°c，進行活性自由基聚合而製備。 另外’先質共聚物（1)~ (3)，還可以通過將各聚合性 不飽和化合物在上述自由基聚合引發劑和起鏈轉移劑 作用的多元硫醇化合物的存在下，在適當的溶劑中進行 自由基聚合而製備。這裏，所謂多元硫醇化合物，是指 1分子中具有2個以上锍基的化合物，可以列舉例如三 〇 經甲基丙烷三（3-锍基丙酸酯）、季戊四醇四（3-锍基丙酸 醋）、四甘醇二（3-锍基丙酸酯）、二季戊四醇六（3 _巯基 丙酸酯）、季戊四醇四（硫代甘醇酸酯）、1，4-二（3-锍基丁 酿氧基）丁烷、季戊四醇四（3-锍基丁酸酯）、ι，3,5-三（3-毓基丁氧基乙基）-1,3,5-三畊-2,4,6-(11^311，511)-三酮等。 聚合物（B_ 1)的合成，即先質共聚物（1)所具有的羥 基與化合物（b3)的反應，可以通過將含有先質共聚物（1) 的溶劑’根據需要在催化劑和聚合阻止劑的存在下，加 〇 入化合物（b3)使其反應的方法進行。作爲含有先質共聚 物（1)的溶液，可以直接使用合成先質共聚物（1)時的聚 合物溶液，或者也可以將先質共聚物（1)從聚合物溶液 中分離出來後溶於另一溶劑中。 化合物（b3)的使用量，相對於先質共聚物（1)所具有 的羥基的合計量，較佳爲30〜100莫耳％，更佳爲50~100 莫耳％。當化合物（b3)的使用量過少時，則不能獲得所 -31- .201011468 需的效果，另一方面’若過多，則會出現反應溶液中殘 留有未反應的化合物（b3)，使所得聚合物.溶液和感放射 線性組成物的保存穩定性下降的危險。 作爲上述催化劑，可以使用二月桂酸二正丁基錫 (IV)等催化劑。另外，作爲上述聚合阻止劑，可以列舉 例如對甲氧基酚、對苯醌、吩噻阱等。較佳的反應條件 爲：溫度爲20~100°C，反應時間爲1~1〇小時。 Ο ㈣ @(B 一 2)的合成，即先質共聚物（2)所具有的羧 基與化合物（b5)的反應，除分別用先質共聚物（2)代替先 質共聚物（1)、以及用化合物（b5)代替化合物（b3)以外， 可以按照上述聚合物（B - 1)的合成而進行。化合物（b5) 的用量’相對於先質共聚物（2)所具有的羧基的合計 量’較佳爲30~ 100莫耳％，更佳爲π—! 〇〇莫耳％。作 爲催化劑，可以使用溴化四丁基銨、三乙胺。 在合成聚合物（B- 2)時，通過調整化合物（b5)的用 © 量使其殘留有未反應的羧基，可以使聚合物（B_2)具有 鹼可溶性。 聚合物（B — 3)的合成，即先質共聚物（3)所具有的環 氧乙烷基與化合物（b4)的反應，除分別用先質共聚物（3) 代替先質共聚物（1)、以及用化合物（b4)代替化合物（b3) 以外，可以按照上述聚合物（Β_υ的合成而進行。化合 物（b4)的用量，相對於先質共聚物（3)所具有的環氧乙烷 -32- 201011468 基的合計量，較佳爲30~100莫耳％，更佳爲50~100莫 耳％。作爲催化劑，可以使用與聚合物（B- 2)的合成中 所用的相同催化劑。 在本發明中，聚合物（B)可以單獨或兩種以上混合 使用。 在本發明中，聚合物（B)的含量，相對於1〇〇重量 份（A)著色劑，通常爲5~800重量份，更佳爲10〜500重 0 量份。如果聚合物（B)的含量過少，則存在不能獲得所 需效果的可能，另一方面，若過多，則由於顏料濃度相 對較小，故而存在薄膜難以達到目標色濃度的危險。 一（C)光聚合引發劑一 本發明中的（C)光聚合引發劑，是指通過使用含有 可見光線、紫外線、遠紫外線、電子束、X射線等的放 射線進行曝光’可產生能夠引發上述聚合物（B)和根據 需要使用的（D)具有聚合性不飽和鍵的單體的聚合的活 ® 性種的化合物。 作爲這種光聚合引發劑，可以列舉例如噻噸酮類化 合物、苯乙酮類化合物、二咪唑類化合物 '三畊類化合 物、0 -醯基肟類化合物、鎗鹽類化合物、苯偶姻類化合 物、二苯酮類化合物、二酮類化合物、多核醌類化 口物、重氮類化合物、酸亞胺擴酸酯（imide sulfonate) 類化合物等。 -33- 201011468 在本發明中，光聚合引發劑可以單獨或兩種以上混 合使用。作爲光聚合引發劑，較佳爲含有選自於噻噸酮 類化合物、苯乙酮類化合物、二咪唑類化合物、三畊類 化合物、〇-醯基肟類化合物構成的群組中的至少一種。 在本發明的較佳光聚合引發劑中，作爲噻噸酮類化 合物的具體例子，可以列舉噻噸酮、2-氯噻噸酮、2-甲 基噻噸酮、2-異丙基噻噸酮、4-異丙基噻噸酮、2,4-二 φ 氯噻噸酮、2，4-二甲基噻噸酮、2,4-二乙基噻噸酮、2,4-二異丙基噻噸酮等。 另外，作爲上述苯乙酮類化合物的具體例子，可以 列舉2 -甲基-1-[4-(甲硫基）苯基]-2 -味琳基丙院-1-嗣、 2-苄基-2-二甲基胺基-1-(4-味啉基苯基）丁烷-1-酮、 2-(4 -甲基苯甲醯基）-2_(二甲胺基）-1-(4-味啉基苯基）丁 院-1-酮等。 另外，作爲上述二咪唑類化合物的具體例子，可以 ❹ 列舉 2,2’ -二（2-氯苯基）-4,4’ ，5,5’ -四苯基-1,2’ -二 咪唑、2,2’ -二（2,4-二氯苯基）-4,4’ ，5,5，-四苯基 • 12’ ·二咪唑.、2,2’ -二（2,4,6-三氯苯基）-4,4，，5,5，_ 四苯基-1，2’ -二咪唑等。 另外，當使用二咪唑類化合物作爲光聚合引發劑 時，從能夠改善敏感度的角度考慮，較佳爲與氫供體聯 用。這裏所謂的“氫供體”，是指通過曝光能夠向二咪 -34- 201011468 唑類化合物產生的自由基提供氫原子的化合物。作爲氫 供體，可以列舉例如2-锍基苯并噻唑、2-锍基苯并噁唑 等硫醇類氫供體、4,4’ -二（二甲基胺基）二苯酮、4,4’ - 二（二乙基胺基）二苯酮等胺類氫供體。在本發明中，氫 供體可以單獨或兩種以上混合使用，從能夠進一步改善 敏感度的角度考慮，較佳爲將1種以上硫醇類氫供體與 1種以上胺類氫供體組合使用。 Q 另外，作爲上述三阱類化合物的具體例子，可以列 舉2,4,6-三（三氯甲基）-S-三哄、2-甲基-4,6-二（三氯甲 基）-s-三阱、2·[2·(5-甲基呋喃-2-基）乙烯基]-4,6-二（三 氯甲基）-8-三阱、2-[2-(呋喃-2-基）乙烯基]-4,6-二（三氯 甲基）-s-三畊、2-[2-(4-二乙胺基-2-甲基苯基）乙烯 基]-4,6-二（三氯甲基）-s-三畊、2-[ 2-(3,4-二甲氧基苯基） 乙烯基]-4,6-二（三氯甲基）-s-三畊、2-(4-甲氧基苯 基）-4,6-二（三氯甲基）-s-三畊、2-(4-乙氧基苯乙烯 〇 基）-4,6-二（三氯甲基）-s-三阱、2-(4-正丁氧基苯基）·4,6-二（三氯甲基）-s·三畊等具有鹵代甲基的三哄類化合物。 另外，作爲0-醯基肟類化合物的具體例子，可以 列舉1，2-辛二酮，1-[4-(苯硫基）苯基]-，2-(0-苯甲醯基 肟）、乙酮，1-[9-乙基-6-(2-甲基苯甲醯基）-9H-嗪唑-3-基]-，1-(0-乙醯基肟）、乙酮，1-[9-乙基-6-(2-甲基-4-四 氫呋喃基甲氧基苯甲醯基）-9Η·嘮哩-3-基]-，1- (0-乙醯 -35- 201011468 基肟）' 乙酮，l-[9-乙基-6-{2·甲基-4-(2,2-二甲基-l，3-二氧戊環基）甲氧基苯甲醯基}-9H-嗪唑-3·基]·，l-(0-乙 醯基肟）等。 在本發明中，當使用苯乙酮類化合物等二咪唑類化 合物以外的光聚合引發劑時，還可以聯用增敏劑。作爲 這種增敏劑，可以列舉例如4,4’ ·二（二甲基胺基）二苯 酮、4，4’ -二（二乙基胺基）二苯酮、4-二乙胺基苯乙酮、 Q 心二甲基胺基苯丙酮、4-二甲胺基苯甲酸乙酯、4-二甲 胺基苯甲酸2-乙基己基酯、2,5-二（4-二乙胺基苯亞甲基） 環己酮、7·二乙胺基-3-(4-二乙胺基苯甲醯基）香豆素、 4-(二乙胺基）査耳酮等。 在本發明中，光聚合引發劑的含量，相對於100質 量份聚合物（Β)，較佳爲〇.〇1~120質量份，特佳係1〜100 質量份。若光聚合引發劑的含量過少，則存在曝光硬化 不充分的危險性，另一方面，若過多，則存在所形成的 Θ 著色層在顯影時容易從基板上脫落的傾向。 一（D)具有聚合性不飽和鍵的單體— 在本發明中，通過進一步使用（D)具有聚合性不飽 和鍵的單體，可以提高感放射線性組成物的敏感度。作 爲具有聚合性不飽和鍵的單體，可以列舉具有兩個以上 聚合性不飽和鍵的多官能性單體、和具有1個聚合性不 飽和鍵的單官能性單體。 -36- 201011468 作爲上述多官能性單體，可以列舉例如乙二醇、丙 二醇等烷二醇的二（甲基）丙烯酸酯類； 聚乙二醇、聚丙二醇等聚烷二醇的二（甲基）丙烯酸 酯類； 甘油、三羥甲基丙烷、季戊四醇、二季戊四醇等三 元以上的多元醇的聚（甲基）丙烯酸酯類或其二羧酸改 性物； φ 聚酯、環氧樹脂、聚胺基甲酸酯樹脂、醇酸樹酯、 聚矽氧樹脂、螺環樹脂等低聚（甲基）丙烯酸酯類； 兩末端羥基聚-1,3-丁二烯、兩末端羥基聚異戊二 烯、兩末端羥基聚己內酯等兩末端羥基聚合物的二（甲 基）丙烯酸酯類；或 三[2-(甲基）丙烯醯氧基乙基]磷酸酯或； 異氰尿酸環氧乙烯改性三丙烯酸酯； 具有胺基甲酸酯結構的聚（甲基）丙烯酸酯等。 〇 這些多官能性單體可以單獨或兩種以上混合使用。 另外，作爲上述單官能性單體，可以列舉例如琥珀 酸單[2-(甲基）丙烯醯氧基乙基]酯、鄰苯二甲酸單[2-(甲 基）丙烯醯氧基乙基]酯等二元以上的多元羧酸的單[(甲 基）丙烯醢氧基烷基]酯；羧基聚己內酯單（甲基）丙烯 酸酯等兩末端具有羧基和羥基的聚合物的單（甲基）丙 烯酸酯；N-乙烯基琥珀醯亞胺、N-乙烯基吡咯烷酮、Ν α- 201011468 乙烯基鄰苯二甲醯亞胺、N-乙烯基-2-呱啶酮、N-乙烯 基·ε -己內醯胺、N -乙烯基吡咯、N -乙烯基吡咯烷、N-乙烯基咪唑、Ν-乙烯基咪唑啉、Ν-乙烯基吲哚、Ν-乙烯 基吲哚啉、Ν -乙烯基苯并咪唑、Ν -乙烯基嘮唑、Ν -乙烯 基呱啶、Ν -乙烯基呱阱、Ν -乙烯基味啉、Ν -乙烯基吩噁 畊等Ν_乙烯基含氮雜環化合物；Ν-(甲基）丙烯醯基味 啉，除此以外，作爲市售品，可以列舉Μ-5400、Μ-5600(商 品名’東亞合成（股）生產）等。 這些單官能性單體可以單獨或兩種以上混合使用。 在本發明中，作爲具有聚合性不飽和鍵的單體，較 佳爲多官能性單體，特佳爲三元以上的多元醇的聚（甲 基）丙烯酸酯類及其二羧酸改性物、以及具有胺基甲酸 酯結構的聚（甲基）丙烯酸酯。作爲三元以上的多元醇的 聚（甲基）丙烯酸酯類及其二羧酸改性物，較佳爲三羥甲 基丙烷三丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、季 〇 戊四醇三丙烯酸酯、季戊四醇三甲基丙烯酸酯、季戊四 醇四丙烯酸酯、季戊四醇四甲基丙烯酸酯、二季戊四醇 五丙烯酸酯、二季戊四醇五甲基丙烯酸酯、二季戊四醇 六丙烯酸酯、二季戊四醇六甲基丙烯酸酯、季戊四醇三 丙烯酸酯與琥珀酸的單酯化物、季戊四醇三甲基丙烯酸 酯與琥珀酸的單酯化物、二季戊四醇五丙烯酸酯與琥珀 酸的單酯化物、二季戊四醇五甲基丙烯酸酯與琥珀酸的 -38- 201011468 單酯化物，從著色層的強度高、著色層的表面平滑性優 良、且未曝光部分基板上和遮光層上難以產生浮垢、殘 膜等方面考慮，特佳爲三羥甲基丙烷三丙烯酸酯、季戊 四醇三丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇 六丙烯酸酯、季戊四醇三丙烯酸酯與琥珀酸的單酯化物 和二季戊四醇五丙烯酸酯與琥珀酸的單酯化物。 本發明中的具有聚合性不飽和鍵的單體的含量，相 Q 對於100重量份聚合物（B)，較佳爲1~500重量份，更 佳爲5〜30 0重量份。通過使其以這種比率含有聚合性不 飽和鍵的單體，可以獲得敏感度更高的感放射線性組成 物。 —(E)鹼可溶性樹脂_ 在本發明中，通過進一步使用（E)鹼可溶性樹脂（（B) 成分除外），可以提高所得感放射線性組成物的顯影性 和保存穩定性。鹼可溶性樹脂，只要是對（A)著色劑起 Q 黏合劑作用，並且在顯影處理步驟中對所用的鹼性顯影 液具有可溶性，則對其沒有特別的限制，通常爲具有羧 基、酚性羥基等酸性官能團的聚合物。某中，較佳爲具 有羧基的聚合物，作爲其具體例子，可以列舉例如具有 1個以上羧基的乙烯性不飽和單體（以下也稱爲“含羧 基不飽和單體”）與其他可共聚的乙烯性不飽和單體 (以下稱爲“不飽和單體（e)” ）的共聚物（以下也稱爲 -39- 201011468 “聚合物（El)”）。 作爲含羧基不飽和單體的具體例子，可以列舉作爲 聚合物（B)中的化合物（b4)而例示的化合物。 在本發明中，作爲含羧基不飽和單體，較佳爲（甲 基）丙烯酸、琥珀酸單[2-(甲基）丙烯醯氧基乙基]酯、ω -羧基聚己內酯單（甲基）丙烯酸酯等，特佳爲（甲基）丙烯 酸。 Q 這些含羧基不飽和單體可以單獨或兩種以上混合 使用。 在聚合物（Ε1)中，含竣基不飽和單體的共聚合比 率，較佳爲5~50重量％，更佳爲10~40重量％。若該共 聚合比率過少，則存在所得感放射線性組成物對於鹼性 顯影液的溶解性小的傾向，另一方面，若過多，則存在 對於鹼性顯影液的溶解性過大，在用鹸性顯影液進行顯 影時容易導致畫素從基板脫落和畫素表面產生膜龜裂 的傾向。 另外’作爲不飽和單體（e)的具體例子，可以列舉 作爲聚合物（B)中的化合物（b2)和.化合物（b6)而例示的V. Among these compounds (b3), from the viewpoint of reactivity with the compound (b2), 2·(meth)acryloxyethyl isocyanate and 4-(methyl)propenyloxybutyl group are preferred. Isocyanate, 2-(2-isocyanatoethoxy)ethyl (meth)acrylate, 1,1-[bis(methyl)propenyloxy-23-201011468 methyl]ethyl isocyanate. In the synthesis of the polymer (B-1), the compound (b 3) may be used singly or in combination of two or more. Further, examples of the compound (b4) include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid; maleic acid, maleic anhydride, fumaric acid, itaconic acid, and the like. Unsaturated diacid 0 such as itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid, mesaconic anhydride or its acid; monosuccinic acid [2-(methyl) propylene oxiranyl ethyl ester], Mono[(methyl)propenyloxyalkyl]ester of a divalent or higher polycarboxylic acid such as [2-(meth)acryloxyethyl) phthalate; ω-carboxypolycaprolactone A mono(meth)acrylate such as a mono(meth)acrylate or the like having a carboxyl group and a hydroxyl group at both terminals. When these compounds (b4) are used for the synthesis of the precursor copolymer (2), from the viewpoint of copolymerization reactivity and easy availability, (meth)acrylic acid, succinic acid mono [2-(methyl) is preferred. Acryloxyethyl]ester, ω-carboxypolycaprolactone mono(meth)acrylate. On the other hand, when the compound (b4) is used to react with the precursor copolymer (3) to synthesize the polymer (B-3), it is preferred from the viewpoints of reactivity with the compound (b5), availability, and the like. It is a (meth)propane acid. The compound (b4) may be used singly or in combination of two or more. Further, examples of the compound (b 5 )' include (meth)acryl-24-201011468 acid glycidyl ester, (meth)acrylic acid 2 methyl glycidyl ester, and (meth)acrylic acid 3,4-epoxy resin. Butyl butyl ester, 6,7-epoxyheptyl (meth) acrylate, 3,4-epoxycyclohexyl (meth) acrylate, 3,4-epoxy ring (meth) acrylate Hexylmethyl ester, 2-glycidyloxyethyl (meth)acrylate, 3-glycidoxypropyl (meth)acrylate, 4-glycidyloxy (meth)acrylate a (meth) acrylate having an oxiranyl group such as a benzyl ester; 缩 glycidyl ethacrylate, glycidyl α-n-propyl acrylate, glycidyl n-butyl acrylate, α-ethyl acrylate 6, Α-alkyl acrylate having an oxiranyl group such as 7-epoxyheptyl ester; 1-vinyl-2,3·epoxycyclohexane, 1-vinyl-3,4-epoxy Ethylene oxide based on cyclohexane, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether Alkenyl compound. ❹ In the case of the compound (b5), in the case of the synthesis of the precursor copolymer (3) and the synthesis of the polymer (B-2) by reaction with the precursor copolymer (2), it is preferred to have The (meth) acrylate (meth) acrylate is preferably glycidyl (meth)acrylate or 2-methyl (meth)acrylate from the viewpoint of improving the development resistance and solvent resistance of the obtained colored layer. Glycidyl ester, 4-glycidyloxybutyl (meth)acrylate or 3,4-epoxycyclohexylmethyl (meth)acrylate -25- 201011468 Compound (b5) can be used alone or Two or more combinations are used. Further, the compound (b6) is a polymerizable unsaturated compound other than the compounds (b1) to (b5) which can be copolymerized in the precursor copolymers (1) to (3). As specific examples thereof, for example, maleimide; N-phenylmaleimide, N-o-hydroxyphenylmaleimide, N-m-hydroxyphenylmaleimide, N - p-hydroxyphenyl maleimide, N-φ benzyl maleimide, N-cyclohexyl maleimide, N-amber succinimide, maleimide benzoate N-Amber succinimide-4-maleimido butyrate, N-succinimide-6-maleimido hexanoate, N-succinimide-3- N-substituted maleimide such as maleic acid imidopropionate or N-(acridinyl)maleimide; styrene, α-methylstyrene, o-vinyltoluene, methylene Toluene, p-vinyl toluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylphenol, m-vinylphenol, p-vinylphenol, An aromatic vinyl compound such as p-hydroxy-α-methylstyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether or p-vinylbenzyl methyl ether; terpene, 5-chlorodecene, 5 -Hydroxymethyl decene, 5-hydroxy decene, etc. Alkene; anthracene such as hydrazine or 1-methylhydrazine; methyl (meth) acrylate, ethyl (meth) acrylate, (methyl) propyl-26- 201011468 n-propyl acrylate, (meth) acrylate Isopropyl ester, n-butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate, 2-ethyl (meth)acrylate (meth)acrylic acid alkyl ester such as hexyl hexyl ester; cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, tricyclo[5.1.02'6] fluorene An alicyclic ester of (meth) φ acrylate such as alkane-8-yl ester, isobornyl (meth)acrylate or tetrahydrofurfuryl (meth) acrylate; phenyl (meth) acrylate, (A) Ethyl (meth) acrylate such as benzyl acrylate, 4-hydroxyphenyl (meth) acrylate; 2-methoxy ester (meth) acrylate, 2-phenoxy acetyl (meth) acrylate Base ester, polyethylene glycol (n=2~100) methyl ether (meth) acrylate, polypropylene glycol (η = 2~100) methyl ether (meth) acrylate, p- cumyl (meth) acrylate having an alkylene oxide structure such as an ethylene oxide-modified (meth) acrylate of phenol; allyl methacrylate; vinyl acetate, vinyl propionate, butyl Vinyl carboxylate, vinyl benzoate such as vinyl benzoate; unsaturated ether such as vinyl methyl ether or vinyl ethyl ether; cyanide such as (meth)acrylonitrile, α-chloroacrylonitrile or vinylidene Vinyl compound; (meth) acrylamide, α-chloropropenylamine, hydrazine-2-hydroxyethyl (methyl-27-201011468) acrylamide, unsaturated decylamine; 1,3-butadiene Aliphatic conjugated diene such as isoprene or chloroprene; polymer molecular chain such as polystyrene, poly(methyl) methacrylate, poly(methyl) acrylate or polyoxyalkylene A macromonomer having a mono(meth)acrylinyl group at the end or the like. The compound (b6) may be used singly or in combination of two or more. Further, the copolymer (b 4) may be copolymerized in the precursor copolymer (1) to have hydrazine solubility, and the precursor copolymers (2) and (3) may be copolymerized with the compound (b2). In the present invention, as the compound (b6), a N-substituted maleimide, an aromatic vinyl compound, a terpene, or an alkyl (meth)acrylate '(meth)acrylic acid is preferable. An alicyclic ester, an aryl (meth) acrylate, an allyl (meth) acrylate, a (meth) acrylate having an alkylene oxide structure, particularly preferably an N-phenyl maleimide, N-cyclohexylmazepine, imine, α-methylstyrene, p-hydroxy-α-methylstyrene, terpene, methyl (meth)acrylate, n-butyl (meth)acrylate , 2-ethylhexyl (meth) acrylate 'benzyl (meth) acrylate, 4-hydroxyphenyl (meth) acrylate, ethylene oxide modified (methyl) p-cumyl phenol Acrylate, allyl (meth)acrylate. The copolymerization ratio of the compound (b1) in the precursor copolymer (1) is usually 10 to 90% by weight, preferably 1 to 80% by weight. In the precursor copolymer (1), -28-201011468 The copolymerization ratio ' of the compound (b2) is usually 5 to 9 % by weight, preferably 10 to 80 % by weight. The copolymerization ratio of the compound (b1) in the precursor copolymer (2) is usually from 5 to 90% by weight, preferably from 10 to 80% by weight. The copolymerization ratio ' of the compound (b 4) in the precursor copolymer (2) is usually 5 to 50% by weight, preferably 10 to 40% by weight. The copolymerization ratio of the compound (bi) in the precursor copolymer (3) is usually from 5 to 90% by weight, preferably from 1 to 80% by weight. The copolymerization ratio of the compound (b 5) in the precursor copolymer (3) is usually from 5 to 90% by weight, preferably from 10 to 80% by weight. By synthesizing the copolymerization ratio of the compound (b1) to (b5) within the above range when synthesizing the precursor copolymers (1) to (3), it is possible to synthesize a non-gelled polymer at a desired conversion ratio ( B - 1) ~ (B - 3), and it is preferable to improve the developability and solvent resistance of the radiation-sensitive composition containing the obtained polymer (B-1) to (B-3). ❹ The precursor copolymers (1) to (3) can be, for example, each of the polymerizable unsaturated compounds in a suitable solvent in 2,2'-azobisisobutyronitrile, 2,2'-azodi Polymerization in the presence of a radical polymerization initiator such as (2,4-dimethylvaleronitrile) or 2,2'-azobis-(4-methoxy-2,4-dimethylvaleronitrile) preparation. The precursor copolymers (1) to (3) can be prepared by radically polymerizing the polymerizable unsaturated compound as described above, and then reprecipitating and refining by using two or more organic solvents having the same polarity of -29-201011468. . In other words, the solution in the good solvent after the polymerization is removed by infiltration or centrifugation as necessary, and then a large amount of a precipitant (usually 5 to 10 times the volume of the polymer solution) is introduced (poor solvent). In the case, the copolymer is reprecipitated and refined. At this time, among the impurities remaining in the copolymer solution, impurities soluble in the precipitate remain in the liquid phase and are separated from the purified precursor copolymers (1) to (3). 0 As a combination of a good solvent/precipitant used in the reprecipitation method, for example, diethylene glycol monomethyl ether acetate/n-hexane, methyl ethyl ketone/n-hexane, diethylene glycol monomethyl ether acetate may be mentioned. Ester/n-heptane, methyl ethyl ketone/n-heptane, and the like. Further, the precursor copolymers (1) to (3) can also be obtained by using each polymerizable unsaturated compound in 2,2'-azobisisobutyronitrile and 2,2'-azobis (2,4-). Radical polymerization initiators such as dimethyl valeronitrile and 2,2'-azobis-(4-methoxy-2,4-dimethylvaleronitrile) and pyrazole-1-dithiocarboxylic acid Cyano quinone (dimethyl) methyl ester, pyrazole-1-dithiocarboxylic acid benzyl ester, tetraethyl thiuram disulfide, bis(pyrazole-1-ylthiocarbonyl) disulfide , bis(3-methyl-pyrazol-1-ylthiocarbonyl) disulfide, bis(4-methyl-pyrazol-1-ylthiocarbonyl) disulfide, bis(5-methyl -pyrazol-1-ylthiocarbonyl)disulfide, bis(3,4,5-trimethyl-pyrazol-1-ylthiocarbonyl) disulfide, di(pyrrole-1-ylthio) Carbonyl) disulfide, dithiobenzimidyl disulfide, etc., which act as a molecular weight regulator for initiating a transfer terminator, in the presence of -30-201011468 in the presence of an inert solvent, usually at a reaction temperature of 〇~15〇 It is preferably 50 to 120 ° C and is prepared by living radical polymerization. Further, the precursor copolymers (1) to (3) may also be in a suitable solvent by using each of the polymerizable unsaturated compounds in the presence of the above-mentioned radical polymerization initiator and a polythiol compound which functions as a chain transfer agent. Prepared by performing free radical polymerization. Here, the polythiol compound refers to a compound having two or more mercapto groups in one molecule, and examples thereof include tridecylmethylpropane tris(3-mercaptopropionate) and pentaerythritol tetrakis(3-mercaptopropane). Sour vinegar), tetraethylene glycol bis(3-mercaptopropionate), dipentaerythritol hexa(3-mercaptopropionate), pentaerythritol tetra(thioglycolate), 1,4-bis(3-quinone) Butyloxy)butane, pentaerythritol tetrakis(3-mercaptobutyrate), iota,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-three tillage-2 , 4,6-(11^311,511)-trione and the like. The synthesis of the polymer (B-1), that is, the reaction of the hydroxyl group possessed by the precursor copolymer (1) with the compound (b3), can be prevented by the catalyst containing the precursor copolymer (1) as needed in the catalyst and polymerization. In the presence of the agent, a method of adding the compound (b3) to the reaction is carried out. As the solution containing the precursor copolymer (1), the polymer solution in the case of synthesizing the precursor copolymer (1) may be used as it is, or the precursor copolymer (1) may be separated from the polymer solution and dissolved. In another solvent. The amount of the compound (b3) to be used is preferably from 30 to 100 mol%, more preferably from 50 to 100 mol%, based on the total amount of the hydroxyl groups of the precursor copolymer (1). When the amount of the compound (b3) used is too small, the effect required by -31-.201011468 cannot be obtained, and on the other hand, if too much, unreacted compound (b3) remains in the reaction solution, and the obtained polymerization is obtained. There is a danger that the storage stability of the solution and the radiation sensitive composition will decrease. As the catalyst, a catalyst such as di-n-butyltin dilaurate (IV) can be used. Further, examples of the polymerization inhibitor include p-methoxyphenol, p-benzoquinone, and phenothiazine. The preferred reaction conditions are: a temperature of 20 to 100 ° C and a reaction time of 1 to 1 hour.四 (4) The synthesis of @(B-2), that is, the reaction of the carboxyl group of the precursor copolymer (2) with the compound (b5), except that the precursor copolymer (2) is used instead of the precursor copolymer (1), In addition to the compound (b5) in place of the compound (b3), it can be carried out in accordance with the synthesis of the above polymer (B-1). The amount ' of the compound (b5) is preferably from 30 to 100 mol%, more preferably from π to 〇〇 mol%, based on the total amount of the carboxyl groups of the precursor copolymer (2). As the catalyst, tetrabutylammonium bromide or triethylamine can be used. When the polymer (B-2) is synthesized, the polymer (B_2) can be made alkali-soluble by adjusting the amount of the compound (b5) to leave an unreacted carboxyl group. The synthesis of the polymer (B-3), that is, the reaction of the oxirane group of the precursor copolymer (3) with the compound (b4), except that the precursor copolymer (3) is used instead of the precursor copolymer ( 1) and the compound (b4) may be used in place of the compound (b3), and may be carried out in accordance with the synthesis of the above polymer (Β_υ. The amount of the compound (b4) relative to the epoxy resin of the precursor copolymer (3) The total amount of the alkane-32-201011468 group is preferably 30 to 100 mol%, more preferably 50 to 100 mol%. As the catalyst, the same catalyst as used in the synthesis of the polymer (B-2) can be used. In the present invention, the polymer (B) may be used singly or in combination of two or more. In the present invention, the content of the polymer (B) is usually 5 parts based on 1 part by weight of the (A) coloring agent. 800 parts by weight, more preferably 10 to 500 parts by weight 0. If the content of the polymer (B) is too small, there is a possibility that a desired effect cannot be obtained, and if too large, since the pigment concentration is relatively small, Therefore, there is a danger that the film is difficult to reach the target color concentration. One (C) photopolymerization initiator The (C) photopolymerization initiator in the invention refers to exposure by using radiation containing visible light, ultraviolet rays, far ultraviolet rays, electron beams, X-rays, etc., which can generate the above polymer (B) and, if necessary, (D) a compound of a polymerized active species of a monomer having a polymerizable unsaturated bond. Examples of such a photopolymerization initiator include a thioxanthone compound, an acetophenone compound, and a diimidazole compound. Compound 'three-till compound, 0-mercapto quinone compound, gun salt compound, benzoin compound, benzophenone compound, diketone compound, polynuclear hydrazine compound, diazo compound, acid In the present invention, the photopolymerization initiator may be used singly or in combination of two or more. The photopolymerization initiator preferably contains a thioxene selected from the group consisting of thiophene thiophene. At least one selected from the group consisting of a ketone compound, an acetophenone compound, a diimidazole compound, a tri-farming compound, and an anthraquinone-based quinone compound. Among the polymerization initiators, specific examples of the thioxanthone compound include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, and 4-isopropyl group. Thioxanthone, 2,4-diφ chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, and the like. Further, specific examples of the acetophenone-based compound include 2-methyl-1-[4-(methylthio)phenyl]-2--------- -2-dimethylamino-1-(4-morpholinylphenyl)butan-1-one, 2-(4-methylbenzylidene)-2-(dimethylamino)-1- (4-tyrosolinylphenyl) butyl ketone-1-one. Further, as a specific example of the above diimidazole compound, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-diimidazole can be exemplified. , 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5,-tetraphenyl•12'-diimidazole., 2,2'-di(2,4, 6-trichlorophenyl)-4,4,5,5,_tetraphenyl-1,2'-diimidazole, and the like. Further, when a diimidazole compound is used as the photopolymerization initiator, it is preferably used in combination with a hydrogen donor from the viewpoint of improving sensitivity. The term "hydrogen donor" as used herein refers to a compound capable of supplying a hydrogen atom to a radical generated by an azole compound of Dimitai-34-201011468 by exposure. Examples of the hydrogen donor include a mercaptan hydrogen donor such as 2-mercaptobenzothiazole or 2-mercaptobenzoxazole, and 4,4′-bis(dimethylamino)benzophenone. An amine hydrogen donor such as 4'-bis(diethylamino)benzophenone. In the present invention, the hydrogen donor may be used singly or in combination of two or more. It is preferred to combine one or more thiol hydrogen donors with one or more amine hydrogen donors from the viewpoint of further improving the sensitivity. use. Further, specific examples of the above-described triple well-based compound include 2,4,6-tris(trichloromethyl)-S-triazine and 2-methyl-4,6-di(trichloromethyl). -s-tripper, 2·[2·(5-methylfuran-2-yl)ethenyl]-4,6-di(trichloromethyl)-8-triad, 2-[2-(furan) -2-yl)vinyl]-4,6-bis(trichloromethyl)-s-trin, 2-[2-(4-diethylamino-2-methylphenyl)vinyl]- 4,6-bis(trichloromethyl)-s-three tillage, 2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-di(trichloromethyl)- S-three tillage, 2-(4-methoxyphenyl)-4,6-di(trichloromethyl)-s-three tillage, 2-(4-ethoxystyrylsulfonyl)-4, 6-bis(trichloromethyl)-s-tripper, 2-(4-n-butoxyphenyl)·4,6-di(trichloromethyl)-s·three-plowed, etc. Triterpenoids. Further, specific examples of the 0-fluorenyl quinone compound include 1,2-octanedione, 1-[4-(phenylthio)phenyl]-, 2-(0-benzylidenehydrazine). Ethylketone, 1-[9-ethyl-6-(2-methylbenzylidenyl)-9H-azazol-3-yl]-, 1-(0-ethenylhydrazine), ethyl ketone, 1-[9-ethyl-6-(2-methyl-4-tetrahydrofurylmethoxybenzylidene)-9Η·唠哩-3-yl]-,1-(0-acetamid-35- 201011468 基肟)' Ethylketone, l-[9-ethyl-6-{2·methyl-4-(2,2-dimethyl-l,3-dioxolanyl)methoxybenzoate Mercapto}-9H-azazole-3·yl]·, l-(0-ethylindenyl) and the like. In the present invention, when a photopolymerization initiator other than a diimidazole compound such as an acetophenone compound is used, a sensitizer may be used in combination. As such a sensitizer, for example, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, and 4-diethylamino group can be mentioned. Acetophenone, Q-heart dimethylaminophenylpropiophenone, ethyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2,5-di(4-diethyl) Aminobenzylidene) cyclohexanone, 7·diethylamino-3-(4-diethylaminobenzimidyl)coumarin, 4-(diethylamino)chalcone, and the like. In the present invention, the content of the photopolymerization initiator is preferably from 1 to 120 parts by mass, particularly preferably from 1 to 100 parts by mass, per 100 parts by mass of the polymer (Β). When the content of the photopolymerization initiator is too small, there is a risk that the exposure hardening is insufficient. On the other hand, if the amount is too large, the formed Θ colored layer tends to fall off from the substrate during development. (D) Monomer having a polymerizable unsaturated bond - In the present invention, the sensitivity of the radiation sensitive composition can be improved by further using (D) a monomer having a polymerizable unsaturated bond. The monomer having a polymerizable unsaturated bond may, for example, be a polyfunctional monomer having two or more polymerizable unsaturated bonds, and a monofunctional monomer having one polymerizable unsaturated bond. -36-201011468 Examples of the polyfunctional monomer include di(meth)acrylates of alkylene glycols such as ethylene glycol and propylene glycol; and dialkyl glycols such as polyethylene glycol and polypropylene glycol. Acrylates; poly(meth)acrylates of divalent or higher polyhydric alcohols such as glycerin, trimethylolpropane, pentaerythritol, dipentaerythritol or the like; or φ polyester, epoxy resin , oligo (meth) acrylates such as polyurethane resin, alkyd resin, polyoxyn epoxide resin, spiro resin; hydroxy poly-1,3-butadiene at both ends, hydroxyl group at both ends a di(meth)acrylate of a two-terminal hydroxyl polymer such as isoprene or a two-terminal hydroxypolycaprolactone; or a tris[2-(methyl)propenyloxyethyl]phosphate or an isocyanide Uric acid ethylene oxide modified triacrylate; poly(meth) acrylate having a urethane structure, and the like. 〇 These polyfunctional monomers may be used singly or in combination of two or more. Further, examples of the monofunctional monomer include succinic acid mono [2-(methyl) propylene methoxyethyl] ester, and phthalic acid mono [2-(methyl) propylene methoxyethyl group. a single [(meth)acryloxyalkylalkyl] ester of a divalent or higher polycarboxylic acid such as an ester; a single polymer having a carboxyl group and a hydroxyl group at both terminals, such as a carboxypolycaprolactone mono(meth)acrylate; (meth) acrylate; N-vinyl succinimide, N-vinyl pyrrolidone, Ν α- 201011468 vinyl phthalimide, N-vinyl-2-acridone, N-ethylene Base·ε-caprolactam, N-vinylpyrrole, N-vinylpyrrolidine, N-vinylimidazole, anthracene-vinylimidazoline, anthracene-vinyl anthracene, anthracene-vinylporphyrin, Ν-vinylbenzimidazole, Ν-vinylcarbazole, Ν-vinyl acridine, Ν-vinyl hydrazine trap, Ν-vinyl porphyrin, Ν-vinyl phenanthrene, etc. 乙烯基 vinyl nitrogen In addition to the above, commercially available products include Μ-5400 and Μ-5600 (trade name 'East Asia Synthetic Co., Ltd.), and the like. These monofunctional monomers may be used singly or in combination of two or more. In the present invention, as the monomer having a polymerizable unsaturated bond, a polyfunctional monomer, preferably a poly(meth)acrylate of a trihydric or higher polyhydric alcohol, and a dicarboxylic acid modification thereof are preferred. And poly(meth) acrylate having a urethane structure. As the poly(meth) acrylate of a trihydric or higher polyhydric alcohol and a dicarboxylic acid modified product thereof, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, and quaternary phosphonium are preferable. Pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate Acrylate, monoester of pentaerythritol triacrylate and succinic acid, monoester of pentaerythritol trimethacrylate and succinic acid, monoester of dipentaerythritol pentaacrylate and succinic acid, dipentaerythritol pentamethyl acrylate -38- 201011468 monoester ester of succinic acid, from the viewpoint of high strength of the colored layer, excellent surface smoothness of the colored layer, and difficulty in generating scum, residual film, etc. on the unexposed portion of the substrate and the light shielding layer, Is trimethylolpropane triacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipenta Hexa acrylate, pentaerythritol triacrylate succinic acid monoester and dipentaerythritol pentaacrylate succinic acid monoester with. The content of the monomer having a polymerizable unsaturated bond in the present invention is preferably from 1 to 500 parts by weight, more preferably from 5 to 30 parts by weight, per 100 parts by weight of the polymer (B). By making the monomer having a polymerizable unsaturated bond in this ratio, a more sensitive radiation sensitive composition can be obtained. —(E) Alkali-soluble resin _ In the present invention, by further using (E) an alkali-soluble resin (excluding the component (B)), the developability and storage stability of the obtained radiation-sensitive composition can be improved. The alkali-soluble resin is not particularly limited as long as it functions as a Q binder for the (A) colorant and is soluble in the alkaline developer used in the development treatment step, and usually has a carboxyl group and a phenolic hydroxyl group. A polymer such as an acidic functional group. In some cases, a polymer having a carboxyl group is preferable. Specific examples thereof include an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter also referred to as "carboxyl-containing unsaturated monomer") and other copolymerizable copolymers. A copolymer of an ethylenically unsaturated monomer (hereinafter referred to as "unsaturated monomer (e)") (hereinafter also referred to as -39-201011468 "Polymer (El)"). Specific examples of the carboxyl group-containing unsaturated monomer include compounds exemplified as the compound (b4) in the polymer (B). In the present invention, as the carboxyl group-containing unsaturated monomer, (meth)acrylic acid, succinic acid mono[2-(methyl)acryloxyethyl ester], ω-carboxypolycaprolactone mono ( Methyl) acrylate or the like is particularly preferably (meth)acrylic acid. Q These carboxyl group-containing unsaturated monomers may be used singly or in combination of two or more. In the polymer (?1), the copolymerization ratio of the mercapto group-containing unsaturated monomer is preferably from 5 to 50% by weight, more preferably from 10 to 40% by weight. When the copolymerization ratio is too small, the solubility of the obtained radiation sensitive composition to the alkaline developer tends to be small. On the other hand, if the amount is too large, the solubility in the alkaline developer is too large, and the solubility is excessive. When the developer is developed, it tends to cause the pixels to fall off from the substrate and the film surface to crack. Further, as a specific example of the unsaturated monomer (e), it can be exemplified as the compound (b2) and the compound (b6) in the polymer (B).

V 化合物。 在本發明中，作爲不飽和單體（e)，較佳爲化合物 (b2) ' N-取代的馬來醯亞胺、芳香族乙烯基化合物、苊 稀類、（甲基）丙烯酸烷基酯、（甲基）丙烯酸的脂環族酯、 -40 - 201011468 (甲基）丙烯酸芳基酯、具有烯化氧結構的（甲基）丙烯酸 酯、聚合物分子鏈末端具有單（甲基）丙烯醯基的大分子 單體，特佳爲N-苯基馬來醯亞胺、N-環己基馬來醢亞 胺、苯乙烯、α-甲基苯乙烯、對羥基-α-甲基苯乙烯、 苊烯、（甲基）丙烯酸甲酯、（甲基）丙烯酸正丁酯、（甲基） 丙烯酸2-乙基己基酯、（甲基）丙烯酸2-羥基乙基酯、（甲 基）丙烯酸烯丙基酯、（甲基）丙烯酸苄基酯、甘油單（甲 Q 基）丙烯酸酯 '(甲基）丙烯酸4-羥基苯基酯、對枯基苯 酚的環氧乙烷改性的（甲基）丙烯酸酯、聚苯乙烯大分子 單體、聚甲基丙烯酸甲酯大分子單體。 這些不飽和單體（e)可以單獨或兩種以上混合使 用。 在本發明中，還可以使用例如日本特開平5-19467 號公報、日本特開平6— 230212號公報等中公開的側鏈 上具有（甲基）丙烯醯基等聚合性不飽和鍵的含羧基共 〇 聚物、具有下述式⑴表示的重複單元的聚合物（以下稱 爲“聚合物（E2)”）作爲鹼可溶性樹脂。V compound. In the present invention, as the unsaturated monomer (e), a compound (b2) 'N-substituted maleimide, an aromatic vinyl compound, an anthracene, an alkyl (meth)acrylate is preferred. , an alicyclic ester of (meth)acrylic acid, -40 - 201011468 aryl (meth) acrylate, (meth) acrylate having an alkylene oxide structure, and a mono(methyl) propylene at the end of the polymer molecular chain Mercapto macromonomer, especially N-phenyl maleimide, N-cyclohexylmaleimide, styrene, α-methylstyrene, p-hydroxy-α-methylstyrene , terpene, methyl (meth) acrylate, n-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, (meth) acrylate Allyl ester, benzyl (meth) acrylate, glycerol mono (methyl meth) acrylate '4-hydroxyphenyl (meth) acrylate, ethylene oxide modified with p-cumyl phenol (A Acrylate, polystyrene macromonomer, polymethyl methacrylate macromonomer. These unsaturated monomers (e) may be used singly or in combination of two or more. In the present invention, a carboxyl group having a polymerizable unsaturated bond such as a (meth)acryl fluorenyl group in a side chain disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. A conjugated polymer or a polymer having a repeating unit represented by the following formula (1) (hereinafter referred to as "polymer (E2)") is used as an alkali-soluble resin.

(I) -41 - 201011468 (式中，RhR2和R3各自獨立地表示氫原子或碳原 子數爲1〜10的烷基，X表示具有丙烯醯基或甲基丙嫌 醯基的一價有機基團或者乙烯基或1-甲基乙烯基，γ表 示二價的有機基團，i表示1〜5的整數）。 在上述式（1)中，R1較佳爲氫原子或甲基，更佳爲 氫原子。R2以及R3較佳爲氫原子。i較佳爲1。 在上述式（1)中，作爲X的具有丙烯醯基或甲基丙 ❹ 燒醯基的一價有機基團，較佳爲下述式（X - 1)或下述式 (X - 2)表示的基團。作爲上述式（I)中的X，較佳爲乙烯 基或1-甲基乙烯基。 R4 (x-l) -c5h10-o—c\—c=ch2 〇J] (式中，R4表示氫原子或甲基 表示連接鍵）。 R5 R6-C-〇-C2H4-〇-C-C=CH2 6 〇 表示0~10的整數， (X-2) (式中，R5表示氫原子或甲基 R6表示單鍵、亞甲 基、碳原子數爲2〜6的伸烷基、環己烷-1,2-二基或1,2-伸苯基，表示連接鍵）。 作爲上述式（I)中的Y，較佳爲亞甲基、碳原子數爲 2〜6的伸烷基或伸烯基（其中這些伸烷基和伸烯基中間 -42- 201011468 還可以具有醚鍵）、環己烷二基、環己烯二基、或碳原 子數爲6~ 12的亞芳基（其中該亞芳基還可以具有羧基或 酸酐基），更佳爲亞甲基、伸乙基、1,3-伸丙基、1，2-亞 乙烯基、1,2-亞丙烯基、1,3-亞丙烯基、2,3·亞丙烯基、 環己烷-1,2-二基、4-環己烯-1,2-二基、1，2-伸苯基、聯 苯-2,2’ -二基或-CH2-0-CH2-表示的二價基團。 在聚合物（E2)中，上述式⑴表示的重複單元，相對 0 於聚合物（E2)的全部重複單元，較佳爲5~80重量％，更 佳爲10-60重量％。如果上述式（I)表示的重複單元過 少，則存在所得感放射線性組成物對於鹸性顯影液的溶 解性小的傾向，另一方面，若過多，則存在對於鹼性顯 影液的溶解性過大，在用鹼性顯影液進行顯影時容易導 致畫素從基板脫落和畫素表面產生膜龜裂的傾向。 在聚合物（E2)中，較佳爲與上述式（I)表示的重複單 元一起還具有來源於與對於聚合物（E1)所列舉的不飽 〇 和單體（e)相同的不飽和單體的重複單元。 本發明中的鹼可溶性樹脂的 Mw，較佳爲 1 000~45000，特佳係3000〜30000。另外，本發明中的鹼 可溶性樹脂的Mw與Μη之比（Mw/Mn)較佳爲1 ~5，更佳 爲1〜4。若Mw過小，則存在所得覆膜的殘膜率等下降， 損害圖案形狀、耐熱性等，並且電學性能變差的危險 性，另一方面，若過大，則存在解析度下降，損害圖案 -43- 201011468 形狀，並且在使用狹縫噴嘴方式進行塗布時容易產生乾 燥異物的危險性。 聚合物（E1)可以與上述先質共聚物（1)~(3)同樣地 製備。 聚合物（E2)可以通過例如將對乙烯基苄基縮水甘 油醚等乙烯基苄基（聚）縮水甘油醚類與上述不飽和單 體，與上述先質共聚物（1)〜（3)同樣地進行共聚，在所得 n 共聚物中的縮水甘油基上，加成丙烯酸、甲基丙烯酸、 ω-羧基-聚己內酯單丙烯酸酯、〇>-羧基-聚己內酯單甲 基丙烯酸酯、2-丙烯醯氧基乙基琥珀酸酯、2-甲基丙烯 醯氧基乙基琥珀酸酯等不飽和羧酸，然後加成琥珀酸 酐、戊二酸酐、鄰苯二甲酸酐、4-環己烯-1,2-二羧酸酐 等多元羧酸酐而製備。不飽和羧酸和多元羧酸酐的加成 反應，可以按照已知的方法進行。 在本發明中，鹼可溶性樹脂可以單獨或兩種以上混 Q 合使用。 在本發明中，鹼可溶性樹脂的含量，相對於100重 量份（Α)著色劑，較佳爲10~1000重量份，更佳爲20~500 重量份。通過使其以這種比率含有鹼可溶性樹脂，可以 獲得顯影性和保存穩定性更優良的感放射線性組成物。 一添加劑一 本發明的感放射線性組成物，根據需要，還可以含 -44 - 201011468 有各種添加劑。 作爲添加劑，可以列舉在後烘焙步驟時促進聚合物 (B)所具有的環氧乙烷基開環硬化反應的熱酸發生劑。 作爲熱酸發生劑，可以列举例如锍鹽類、苯并噻唑鎗鹽 類、錶鹽類、鳞鹽類、磺酸酯化合物、磺基醯亞胺化合 物、重氮甲烷化合物等。其中，較佳爲鏑鹽類、苯并噻 唑鎗、磺酸酯化合物、磺基醯亞胺化合物、重氮甲烷化 ❹ 合物。 作爲較佳的熱酸發生劑，可以列舉4-乙醯氧基苯基 二甲基鏑六氟砷酸鹽、苄基-4-羥基苯基甲基锍六氟銻 酸鹽、4-乙醯氧基苯基苄基甲基毓六氟銻酸鹽、苄基-4-羥基苯基毓六氟錄酸鹽、4-乙醯氧基苯基苄基锍六氟銻 酸鹽、3-苄基苯并噻唑鎗六氟銻酸鹽、N-(三氟甲磺醯 氧基）二環[2.2.1]庚-5-烯-2,3-二羧酸醯亞胺等。 作爲其他添加劑，可以列舉例如玻璃、礬土等塡充 〇 劑；聚乙烯基醇、聚（氟代烷基丙烯酸酯）等高分子化合 物；非離子類表面活性劑、陽離子類表面活性劑 '陰離 子類表面活性劑等表面活性劑；乙烯基三甲氧基矽烷、 乙烯基三乙氧基矽烷、乙烯基三（2-甲氧基乙氧基）矽 烷、N-(2-胺基乙基）-3-胺基丙基甲基二甲氧基矽烷、 N-(2-胺基乙基）-3-胺基丙基三甲氧基矽烷、3-胺基丙基 三乙氧基矽烷；3-環氧丙氧基丙基三甲氧基矽烷、3-環 -45- 201011468 氧丙氧基甲基二甲氧基矽烷、2-(3，4-環氧基環己基）乙 基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙 基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽 烷、3-锍基丙基三甲氧基矽烷等黏合促進劑；2,2-硫基 二（4-甲基-6-第三丁基苯酚）、2,6-二第三丁基苯酚等抗 氧化劑；2-(3-第三丁基-5-甲基-2-羥基苯基）-5-氯苯并 噻唑、烷氧基二苯酮類等紫外線吸收劑；聚丙烯酸鈉等 0 抗凝劑等。 一溶劑— 本發明的感放射線性組成物含有上述（A)~(C)成分 以及任選添加的其他成分，通常要混合溶劑而調製成液 體組成物。 作爲上述溶劑，只要是能夠分散或溶解構成感放射 線性組成物的（A)~(C)成分和其他成分，並且不與這些 成分反應、具有適當的揮發性的溶劑，即可適當地選擇 〇 使用。 作爲這種溶劑，可以列舉例如甲醇、乙醇、节基醇 等醇類； 乙二醇單甲醚 '乙二醇單乙醚、乙二醇單正丙醚、 乙二醇單正丁醚、二甘醇單甲醚、二甘醇單乙醚、二甘 醇單正丙醚、二甘醇單正丁醚、三甘醇單甲醚、三甘醇 單乙醚、丙二醇單甲醚、丙二醇單乙醚、二丙二醇單甲 -46- 201011468 醚、二丙二醇單乙醚、二丙二醇單正丙醚、二丙二醇單 正丁醚、三丙二醇單甲醚、三丙二醇單乙醚等（聚）烷二 醇單烷基醚類； 乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二 醇單正丙醚乙酸酯、乙二醇單正丁醚乙酸酯、二甘醇單 甲醚乙酸酯、二甘醇單乙醚乙酸酯、二甘醇單正丙醚乙 酸酯、二甘醇單正丁醚乙酸酯、丙二醇單甲醚乙酸酯、 〇 丙二醇單乙醚乙酸酯、3-甲氧基丁基乙酸酯等（聚）烷二 醇單烷基醚乙酸酯類； 二甘醇二甲醚、二甘醇甲基乙基醚、二甘醇二乙 醚、四氫呋喃等其他醚類； 甲基乙基酮、環己酮、2-庚酮、3-庚酮、二丙酮醇 (4-羥基-4-甲基戊-2-酮）、4-羥基-4-甲基己-2-酮等酮類； 丙二醇二乙酸酯、1,3-丁二醇二乙酸酯、l，6-己二 醇二乙酸酯等二乙酸酯類； © 乳酸甲酯、乳酸乙酯等乳酸烷基酯類； 乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、 乙酸異丁酯、甲酸正戊基酯、乙酸異戊基酯、3_甲氧基 丁基乙酸酯、3-甲基-3-甲氧基丁基乙酸酯、丙酸正丁 酯、3-甲基-3-甲氧基丁基丙酸酯、丁酸乙酯、丁酸正丙 酯、丁酸異丙酯、丁酸正丁酯、羥基乙酸乙酯、乙氧基 乙酸乙酯、3·甲氧基丙酸甲酯、3_甲氧基丙酸乙酯、3_ -47- 201011468 乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、丙酮酸甲酯、丙 酮酸乙酯、丙酮酸正丙酯、乙醃乙酸甲酯 '乙醯乙酸乙 醋、2-經基-2-甲基丙酸乙酯、2-輕基_3_甲基丁酸甲醋、 2-氧代丁酸乙酯等其他酯類； 甲苯、二甲苯等芳香族烴類； N-甲基吡略烷酮、N，N-二甲基甲醯胺、N，N_二甲基 乙醯胺等醯胺類。 〇 這些溶劑中，從溶解性、齄料分散性'塗布性等角 度出發，較佳爲苄基醇、乙二醇單正丁醚、丙二醇單甲 酸、丙二醇單乙醚、乙二醇單甲醚乙酸酯 '乙二醇單正 丁酸乙酸醋、二甘醇單正.丁魅乙酸醋、丙二醇單甲酸乙 酸酯、丙二醇單乙魅乙酸醋、二甘醇二甲醚、二甘醇甲 基乙基醚、環己酮、2-庚嗣、3-庚酮、丙二醇二乙酸酯、 1，3-丁二醇二乙酸酯、乙酸正丁酯、乙酸異丁酯、甲酸 正戊酯、乙酸異戊酯.、3-甲氧基丁基乙酸酯 '丙酸正丁 Ο 酯'丁酸乙酯、丁酸異丙酯、丁酸正丁酯、3-甲氧基丙 酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-甲 基-3-甲氧基丁基丙酸酯.、丙酮酸乙酯等。(I) -41 - 201011468 (wherein, RhR2 and R3 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and X represents a monovalent organic group having an acryloyl group or a methyl propyl group; A group or a vinyl group or a 1-methylvinyl group, γ represents a divalent organic group, and i represents an integer of 1 to 5). In the above formula (1), R1 is preferably a hydrogen atom or a methyl group, more preferably a hydrogen atom. R2 and R3 are preferably a hydrogen atom. i is preferably 1. In the above formula (1), the monovalent organic group having an acrylonitrile group or a methyl propyl sulfonium group as X is preferably the following formula (X-1) or the following formula (X-2) The group represented. As X in the above formula (I), a vinyl group or a 1-methylvinyl group is preferred. R4 (x-l) -c5h10-o-c\-c=ch2 〇J] (wherein R4 represents a hydrogen atom or a methyl group represents a linkage). R5 R6-C-〇-C2H4-〇-CC=CH2 6 〇 represents an integer from 0 to 10, (X-2) (wherein R5 represents a hydrogen atom or a methyl group R6 represents a single bond, a methylene group, a carbon atom The number 2 to 6 alkylene, cyclohexane-1,2-diyl or 1,2-phenylene means a linking bond). As Y in the above formula (I), a methylene group or an alkylene group or an alkenyl group having 2 to 6 carbon atoms is preferable (wherein these alkyl groups and alkenyl groups are intermediate - 42 - 201011468 may also have an ether) a bond, a cyclohexanediyl group, a cyclohexenediyl group, or an arylene group having 6 to 12 carbon atoms (wherein the arylene group may further have a carboxyl group or an acid anhydride group), more preferably a methylene group or a stretching group Ethyl, 1,3-propanyl, 1,2-vinylidene, 1,2-propylene, 1,3-propenylene, 2,3·propylene oxide, cyclohexane-1,2 a divalent group represented by a diyl group, a 4-cyclohexene-1,2-diyl group, a 1,2-phenylene group, a biphenyl-2,2'-diyl group or a -CH2-0-CH2- group. In the polymer (E2), the repeating unit represented by the above formula (1) is preferably from 5 to 80% by weight, more preferably from 10 to 60% by weight, based on the total of the repeating units of the polymer (E2). When the number of repeating units represented by the above formula (I) is too small, the solubility of the obtained radiation sensitive composition tends to be small in the inert developing solution. On the other hand, if the amount is too large, the solubility in the alkaline developing solution is too large. When developing with an alkaline developer, it tends to cause the pixels to fall off from the substrate and the film surface to crack. In the polymer (E2), it is preferred to have the same unsaturated monomer as the monomer (e) exemplified for the polymer (E1) together with the repeating unit represented by the above formula (I). Repeat unit of the body. The Mw of the alkali-soluble resin in the present invention is preferably from 1 000 to 45,000, particularly preferably from 3,000 to 30,000. Further, the ratio (Mw/Mn) of Mw to Μη of the alkali-soluble resin in the present invention is preferably from 1 to 5, more preferably from 1 to 4. When the Mw is too small, the residual film ratio of the obtained film is lowered, and the pattern shape, heat resistance, and the like are impaired, and the electrical properties are deteriorated. On the other hand, if the thickness is too large, the resolution is lowered, and the pattern is deteriorated. - 201011468 Shape, and the risk of drying foreign matter is likely to occur when coating with a slit nozzle method. The polymer (E1) can be produced in the same manner as the above precursor copolymers (1) to (3). The polymer (E2) can be, for example, a vinylbenzyl (poly)glycidyl ether such as p-vinylbenzyl glycidyl ether and the above unsaturated monomer, similarly to the above precursor copolymers (1) to (3). Copolymerization, addition of acrylic acid, methacrylic acid, ω-carboxy-polycaprolactone monoacrylate, 〇>-carboxy-polycaprolactone monomethacrylic acid to the glycidyl group in the obtained n copolymer An unsaturated carboxylic acid such as an ester, 2-propenyloxyethyl succinate or 2-methylpropenyloxyethyl succinate, followed by addition of succinic anhydride, glutaric anhydride, phthalic anhydride, 4 - Preparation of a polycarboxylic acid anhydride such as cyclohexene-1,2-dicarboxylic anhydride. The addition reaction of the unsaturated carboxylic acid and the polycarboxylic acid anhydride can be carried out in accordance with a known method. In the present invention, the alkali-soluble resin may be used singly or in combination of two or more. In the present invention, the content of the alkali-soluble resin is preferably from 10 to 1,000 parts by weight, more preferably from 20 to 500 parts by weight, per 100 parts by weight of the coloring agent. By containing an alkali-soluble resin in such a ratio, a radiation-sensitive composition excellent in developability and storage stability can be obtained. One additive One The radiation sensitive composition of the present invention may further contain various additives as needed from -44 to 201011468. As the additive, a thermal acid generator which promotes an oxiranyl group ring-opening hardening reaction which the polymer (B) has in the post-baking step can be mentioned. The thermal acid generator may, for example, be an onium salt, a benzothiazole gun salt, a surface salt, a scale salt, a sulfonate compound, a sulfoximine compound or a diazomethane compound. Among them, an onium salt, a benzothiazazole gun, a sulfonate compound, a sulfoximine compound, and a diazomethane methanide are preferred. Preferred examples of the thermal acid generator include 4-ethyloxy phenyl dimethyl hexafluoroarsenate, benzyl-4-hydroxyphenylmethyl hexafluoroantimonate, and 4-ethyl hydrazine. Oxyphenylbenzylmethylphosphonium hexafluoroantimonate, benzyl-4-hydroxyphenylphosphonium hexafluoroantimonate, 4-acetoxyphenylbenzylphosphonium hexafluoroantimonate, 3-benzyl Benzothiazole gun hexafluoroantimonate, N-(trifluoromethanesulfonyloxy)bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid quinone imine, and the like. Examples of the other additives include an anthracene agent such as glass or alumina; a polymer compound such as polyvinyl alcohol or poly(fluoroalkyl acrylate); a nonionic surfactant and a cationic surfactant 'anion Surfactants such as surfactants; vinyl trimethoxy decane, vinyl triethoxy decane, vinyl tris(2-methoxyethoxy) decane, N-(2-aminoethyl)- 3-aminopropylmethyldimethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane; 3- Glycidoxypropyltrimethoxydecane, 3-cyclo-45-201011468 oxypropoxymethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane , 3-chloropropylmethyldimethoxydecane, 3-chloropropyltrimethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane, 3-mercaptopropyltrimethoxydecane, etc. Adhesion promoter; 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-tert-butylphenol and other antioxidants; 2-(3-tert-butyl- 5-methyl-2-hydroxyphenyl Thiazol -5-chlorobenzotriazole, alkoxy benzophenone ultraviolet absorbers and the like; 0 anticoagulants such as sodium polyacrylate. One solvent - The radiation sensitive composition of the present invention contains the above components (A) to (C) and optionally other components, and is usually prepared by mixing a solvent to prepare a liquid composition. The solvent can be appropriately selected as long as it can disperse or dissolve the components (A) to (C) constituting the radiation sensitive composition and other components, and does not react with these components and has appropriate volatility. use. Examples of such a solvent include alcohols such as methanol, ethanol, and decyl alcohol; ethylene glycol monomethyl ether 'ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, and digan Alcohol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, two Propylene glycol monomethyl-46- 201011468 Ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether (poly) alkanediol monoalkyl ether ; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-propyl ether acetate, ethylene glycol mono-n-butyl ether acetate, diethylene glycol monomethyl ether acetate Ester, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-propyl ether acetate, diethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3 (poly)alkylene glycol monoalkyl ether acetates such as methoxybutyl acetate; diglyme, diethylene glycol methyl ethyl ether, two Other ethers such as alcohol diethyl ether and tetrahydrofuran; methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, diacetone alcohol (4-hydroxy-4-methylpentan-2-one), 4 Ketones such as -hydroxy-4-methylhexan-2-one; diacetates such as propylene glycol diacetate, 1,3-butanediol diacetate, and 1,6-hexanediol diacetate ; © alkyl lactate such as methyl lactate or ethyl lactate; ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl formate, isoamyl acetate Ester, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, n-butyl propionate, 3-methyl-3-methoxybutylpropionate , ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, ethyl hydroxyacetate, ethyl ethoxyacetate, methyl methoxypropionate, 3-methoxy Ethyl propyl propionate, 3_-47- 201011468 methyl ethoxypropionate, ethyl 3-ethoxypropionate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetate 'acetate ethyl acetate, 2-methyl-2-methylpropionate, 2-light base_3_methylbutyric acid methyl vinegar, 2 - other esters such as ethyl oxobutanoate; aromatic hydrocarbons such as toluene and xylene; N-methylpyrrolidone, N,N-dimethylformamide, N,N-dimethyl B Indoleamines such as guanamine. Among these solvents, benzyl alcohol, ethylene glycol mono-n-butyl ether, propylene glycol monocarboxylic acid, propylene glycol monoethyl ether, ethylene glycol monomethyl ether B are preferred from the viewpoints of solubility, coating dispersibility, and coating properties. Acid ester 'ethylene glycol mono-n-butyric acid acetic acid vinegar, diethylene glycol mono-n-butyl acetacetic acid vinegar, propylene glycol mono-formic acid acetate, propylene glycol mono-acetamide acetic acid vinegar, diglyme, diethylene glycol methyl Ethyl ether, cyclohexanone, 2-heptanthene, 3-heptanone, propylene glycol diacetate, 1,3-butanediol diacetate, n-butyl acetate, isobutyl acetate, n-amyl formate , isoamyl acetate., 3-methoxybutyl acetate 'n-butyl acrylate propionate' ethyl butyrate, isopropyl butyrate, n-butyl butyrate, 3-methoxypropionic acid Ester, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 3-methyl-3-methoxybutylpropionate, ethyl pyruvate, and the like.

V 上述溶劑可以單獨或兩種以上混合使用。 另外，還可以與上述溶劑一起聯用苄基乙基醚、二 正己基醚、丙酮基丙酮、異佛爾酮、己酸、辛酸、1-辛醇、1-壬醇、乙酸苄酯、苯甲酸乙酯、草酸二乙酯、 -48- 201011468 馬來酸二乙酯、τ-丁內酯、碳酸乙二酯、碳酸丙二酯、 乙二醇單苯基醚乙酸酯等高沸點溶劑β 上述高沸點溶劑可以單獨或兩種以上混合使用。 趁色濾光片_ 本發明的彩色濾光片具有由本發明感放射線性組 成物形成的著色層。 以下，對本發明彩色濾光片的形成方法進行說明。 0 首先，在基板表面上，根據需要，形成劃分出要形 成畫素部分的遮光層（黑色矩陣），再在該基板上，塗布 分散了例如紅色顏料的感放射線性組成物的液體組成 物後，進行預烘焙使溶劑蒸發，形成塗膜。接著，通過 光罩對該塗膜進行曝光後，用鹸性顯影液進行顯影，以 溶解除去塗膜的未曝光部分，然後進行後烘焙，形成紅 色畫素圖案按預定佈局設置的畫素陣列。 然後，使用分散了綠色或藍色顏料的各感放射線性 〇 組成物的液體組成物，與上述同樣地進行各液體組成物 的塗布、預烘焙、曝光、顯影和後烘焙，在同一基板上 依次形成綠色畫奉陣列和藍色畫素陣列，製得在基板上 設置了紅色、綠色和藍色三原色的畫素陣列的彩色濾光 片》不過，在本發明中，各色畫素的形成順序，並不局 限於上述順序。 另外’黑色矩陣，可以使用本發明的感放射線性組 -49- 201011468 成物，與上述畫素形成時同樣地形成。 作爲形成畫素和/或黑色矩陣時所用的基板，可以 列舉例如玻璃、矽、聚碳酸酯、聚酯、芳香族聚醯胺、 聚醯胺醯亞胺、聚醯亞胺等。 另外，這些基板，根據需要，還可以預先進行砂烷 耦合劑等化學試劑處理、等離子處理、離子鍍、濺射、 氣相反應法、真空蒸鍍等適當的前處理。 0 作爲形成本發明感放射線性組成物塗膜的方法，可 以使用例如（1)塗布法、（2)乾膜法。 當使用（1)塗布法時，通過將本發明的感放射線性 組成物較佳爲以組成物溶液塗布於基板上後，對塗布面 進行預烘焙而形成塗膜。 作爲組成物溶液的塗布方法，可以使用例如噴塗 法、輥塗法、旋轉塗布法（旋塗法）、縫模塗布法、棒塗 法、噴墨塗布法等適當的塗布方法，特佳爲旋塗法、縫 G 模塗布法。 預烘焙的條件，根據各成分的種類、配合比率等而 .不同.，較佳爲在70~120°C下進行1~15分鐘。V The above solvents may be used singly or in combination of two or more. In addition, benzyl ethyl ether, di-n-hexyl ether, acetone acetone, isophorone, hexanoic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl acetate, benzene may be used together with the above solvent. Ethyl formate, diethyl oxalate, -48- 201011468 high-boiling solvent such as diethyl maleate, τ-butyrolactone, ethylene carbonate, propylene carbonate, ethylene glycol monophenyl ether acetate β The above high boiling point solvents may be used singly or in combination of two or more. Color filter _ The color filter of the present invention has a coloring layer formed of the radiation sensitive composition of the present invention. Hereinafter, a method of forming the color filter of the present invention will be described. 0 First, on the surface of the substrate, a light-shielding layer (black matrix) that defines a pixel portion to be formed is formed as needed, and then a liquid composition in which a radiation-sensitive linear composition such as a red pigment is dispersed is applied onto the substrate. Prebaking is carried out to evaporate the solvent to form a coating film. Next, the coating film was exposed through a photomask, and developed with an inert developing solution to dissolve and remove the unexposed portion of the coating film, followed by post-baking to form a pixel array in which a red pixel pattern was arranged in a predetermined layout. Then, using the liquid composition of each of the radiation-sensitive enthalpy compositions in which the green or blue pigment is dispersed, coating, prebaking, exposing, developing, and post-baking the respective liquid compositions are carried out in the same manner as described above, sequentially on the same substrate. Forming a green painting array and a blue pixel array, and obtaining a color filter in which a pixel array of three primary colors of red, green, and blue is disposed on the substrate. However, in the present invention, the order of formation of each color pixel, It is not limited to the above order. Further, the 'black matrix' can be formed in the same manner as in the case of forming the above-described pixel by using the radiation sensitive group of the present invention -49-201011468. Examples of the substrate used for forming the pixel and/or the black matrix include glass, ruthenium, polycarbonate, polyester, aromatic polyamide, polyamidimide, polyimine, and the like. Further, these substrates may be subjected to chemical treatment such as a silane coupling agent or a suitable pretreatment such as plasma treatment, ion plating, sputtering, gas phase reaction, or vacuum vapor deposition, as needed. As a method of forming the coating film of the radiation sensitive composition of the present invention, for example, (1) coating method and (2) dry film method can be used. When the coating method (1) is used, it is preferred that the radiation-sensitive composition of the present invention is applied onto a substrate as a composition solution, and then the coated surface is pre-baked to form a coating film. As a coating method of the composition solution, for example, a suitable coating method such as a spray coating method, a roll coating method, a spin coating method (spin coating method), a slit die coating method, a bar coating method, or an inkjet coating method can be used. Coating method, slit G die coating method. The prebaking conditions are different depending on the type of each component, the blending ratio, etc., and it is preferably carried out at 70 to 120 ° C for 1 to 15 minutes.

"V 另外，在形成本發明感放射線性組成物的塗膜時， 當使用（2)乾膜法時，該乾膜是在基膜、較佳爲可塑性 基膜上層壓由本發明感放射線性組成物構成的感放射 線性層而形成的（以下，稱爲“感放射線性乾膜”）。 -50- 201011468 上述感放射線性乾膜可以通過在基膜上較佳爲以 溶液狀組成物的狀態塗布本發明的感放射線性組成物 後除去溶劑，從而層壓感放射線性層而形成。作爲感放 射線性乾膜的基膜，可以使用例如聚對苯二甲酸乙二醇 酯（PET)、聚乙烯、聚丙烯、聚碳酸酯、聚氯乙烯等合 成樹脂膜。基膜的厚度爲15〜125 jum的範圍較合適。所 得感放射線性層的厚度較佳爲1〜3〇vm左右。溶劑的除 ❹ 去，可較佳爲在80〜150 °C下加熱1~10分鐘而進行。 另外，感放射線性乾膜在未使用時，其感放射線性 層上還可以進一步層壓覆膜而進行保存。該覆膜需要具 有適度的脫模性，以使其在未使用時不會脫落，而在使 用時可以容易地被剝離。作爲滿足這種條件的覆膜，可 以使用例如在PET膜、聚丙烯膜、聚乙烯膜、聚氯乙烯 膜等合成樹脂膜的表面上塗布或燒結聚矽氧烷類脫模 劑的薄膜。覆膜的厚度通常爲25#m左右即足夠。 ❹ 當本發明感放射線性組成物以溶液狀態使用時，其 固體含量濃度（從組成物除去溶劑後的重量相對於全部 組成物重量的比率），較佳爲5 ~ 80重量％。更佳爲固體 含量濃度根據覆膜的形成方法而不同。當覆膜的形成使 用塗布法時，固體含量濃度較佳爲5〜50重量％，當覆 膜的形成使用乾膜法時，固體含量濃度較佳爲50〜7 0重 量％。 -51- 201011468 塗布厚度’作爲乾燥後的厚度，通常爲0.1〜10//m, 較佳爲0.2 ~ 8.0// m，特佳爲0.2 ~ 6.0以m。 作爲形成畫素和/或黑色矩陣時使用的放射線，可 以使用例如可見光、紫外線 '遠紫外線、電子束、X射 線等，而較佳爲波長爲190~450nm.範圍的放射線。放射 線的曝光量，較佳爲10~10000 J/m2。以前的感放射線 性組成物，如日本特開2002— 296778號公報、日本特 φ 開2007 — 3 1 6485號公報、日本特開2007 — 3 1 6506號公 報的實施例中所公開的那樣，形成.具有足夠耐溶·劑性的 圖案，需要1500-2000 J/m2的曝光量。而若使用本發明 的感放射線性組成物，即使通過5 00 J/m2以下的曝光 量’也能形成具有優良的耐顯影性和耐溶劑性的微細圖 案。 另外，作爲上述鹼性顯影液，較佳爲例如碳酸鈉、 氫氧化鈉、氫氧化鉀、氫氧化四甲基銨、膽鹸、1，8-二 〇 氮雜二環[5.4.0]-7-十一碳烯、1,5-二氮雜二環[4 ·3.0]-5-壬烯等的水溶液。 上述鹼性顯影液中還可以添加例如適量的甲醇、乙 醇等水溶性有機溶劑和表面活性劑等。另外，鹼顯影 後，通常進行水洗。 作爲顯影處理法，可以使用冲洗顯影法、喷洗顯影 法、浸泡（浸漬）顯影法、塗漿式（盛液）顯影法等。顯影 -52- 201011468 條件較佳爲常溫下顯影5~300秒。 如此製得的本發明彩色濾光片，對於高精細的彩色 液晶顯示元件、彩色攝影管元件、色彩感測器等來說很 有價値。 彩色液晶顯示元件 本發明的彩色液晶顯示元件具有本發明的彩色濾 光片。 u 本發明的彩色液晶顯示元件可以採取適當的構 造。例如，可以採取在設置了薄膜電晶體（TFT)的驅動 用基板以外的基板上形成彩色濾光片，使驅動用基板與 形成了彩色濾光片的基板通過液晶層相對向的構造，並 且也可以採取使在設置了薄膜電晶體（TFT)的驅動用基 板的表面上形成了彩色濾光片的基板與形成了 ITO(摻 錫氧化銦）電極的基板，通過液晶層相對向的構造。後 者構造可以使開口率顯著地提高，具有能夠製得光亮、 G 高精細的液晶顯示元件的優點。 (實施例） 以下，列舉實施例對本發明的實施方式進行更具體 的說明。但是，本發明並不局限於下述實施例。 (顔料分散液的調製） 調製例1 使用作爲（A)著色劑的15重量份C.I.顏料紅254(汽 -53- 201011468 巴特殊化學品公司製，商品名ΒΚ — CF)、作爲分散劑的 4重量份Disperbyk- 2000(換算爲固體含量）、作爲溶劑 的丙二醇單甲醚乙酸酯/丙二醇單乙醚=80/20(重量比） 的混合物，使其固體含量濃度爲19%，用球磨機處理， 調製出顏料分散液（A— 1)。 調製例2 使用作爲（A)著色劑的20重量份碳黑、作爲分散劑 ❹ 的4重量份Disperbyk — 167(換算爲固體含量）、作爲溶 劑的3-甲氧基丁基乙酸酯，使其固體含量濃度爲24%， 用球磨機處理，調製出顏料分散液（A — 2)。 調製例3 使用作爲（A)著色劑的15重量份C.I.顔料綠58(大 曰本油墨化學工業股份有限公司生產）/C.I.顏料黃150 =60M0(重量比）的混合物、作爲分散劑的4重量份 Disperbyk — 2001(換算爲固體含量）、作爲溶劑的丙二醇 〇 單甲醚乙酸酯/1，3-丁二醇二乙酸酯= 5 0/5 0(重量比）的 混合物，使其固體含量濃度爲19%，使用球磨機處理， 用球磨機混合·分散12小時，調製出顏料分散液（A— 3)。 調製例4 使用作爲（A)著色劑的15重量份C.I.顔料綠36/C.I. 顏料黃150 = 60/4 0(重量比）的混合物、作爲分散劑的4.0 重量份Disperbyk — 2001(換算爲固體含量）、作爲溶劑的 -54- 201011468 丙二醇單甲醚乙酸酯/1,3-丁二醇二乙酸酯=50/5〇(重 量比）的混合物，使其固體含量濃度爲19%，使用球磨 機處理，用球磨機混合·分散12小時，調製出顔料分散 液（A- 4)。 (先質共聚物和聚合物（B)的合成） 先質共聚物的合成 合成例1 H 在裝有冷凝管和攪拌器的燒瓶中，將70.0g 3-丙烯 醯氧基甲基-3-乙基氧雜環丁烷、15.0g丙烯酸和15.0g ω-羧基聚己內酯單丙烯酸酯溶於3 00g丙二醇單甲醚乙 酸酯中，再加入3.0g2,2’·偶氮二異丁腈和5.0g α-甲基 苯乙烯二聚物，然後用氮氣吹洗15分鐘。用氮氣吹洗 後，一邊攪拌反應液和進行氮氣鼓泡，一邊在80°C下 加熱，進行5小時聚合，得到含有25重量％先質共聚 物[b — 1]的溶液。該先質共聚物[b - 1]的聚苯乙烯換算 〇 的重量平均分子量（Mw)爲10000。 合成例2~9 除了作爲聚合性不飽和化合物的化合物（bl)、化合 物（b2)、化合物（b4)和化合物（b6)、聚合引發劑、鏈轉 移劑以及分子量調節劑的種類和用量如表1中所示以 外，與上述合成例1同樣地進行’分別得到含25重量 %先質共聚物[b— 2]~[b-9]的溶液。 -55- 201011468 各合成例中製得的先質共聚物的聚苯乙烯換算的 重量平均分子量（Mw)如表1中所示。"V Further, when the coating film of the radiation sensitive composition of the present invention is formed, when the (2) dry film method is used, the dry film is laminated on the base film, preferably the plasticity base film, by the radiation linearity of the present invention. It is formed by a radiation sensitive layer composed of a composition (hereinafter referred to as "radial radiation dry film"). -50-201011468 The radiation sensitive dry film can be formed by applying the radiation sensitive composition of the present invention to a base film, preferably in the form of a solution composition, and then removing the solvent to laminate the radiation sensitive layer. As the base film of the radiation-releasing dry film, a synthetic resin film such as polyethylene terephthalate (PET), polyethylene, polypropylene, polycarbonate, or polyvinyl chloride can be used. The thickness of the base film is preferably in the range of 15 to 125 jum. The thickness of the resulting radiation sensitive layer is preferably about 1 to 3 〇 vm. The removal of the solvent is preferably carried out by heating at 80 to 150 ° C for 1 to 10 minutes. Further, when the radiation sensitive dry film is not used, the film may be further laminated on the radiation sensitive layer and stored. The film needs to have a moderate release property so that it does not fall off when not in use, and can be easily peeled off when it is used. As the film which satisfies such a condition, for example, a film obtained by coating or sintering a polyoxyalkylene type releasing agent on the surface of a synthetic resin film such as a PET film, a polypropylene film, a polyethylene film or a polyvinyl chloride film can be used. It is sufficient that the thickness of the film is usually about 25 #m. ❹ When the radiation sensitive composition of the present invention is used in a solution state, the solid content concentration (ratio of the weight after removing the solvent from the composition to the total weight of the composition) is preferably from 5 to 80% by weight. More preferably, the solid content concentration differs depending on the method of forming the film. When the coating film is formed by a coating method, the solid content concentration is preferably 5 to 50% by weight, and when the film is formed by a dry film method, the solid content concentration is preferably 50 to 70% by weight. -51 - 201011468 The coating thickness ' is usually 0.1 to 10 / / m, preferably 0.2 to 8.0 / / m, and particularly preferably 0.2 to 6.0 in m. As the radiation used for forming the pixel and/or the black matrix, for example, visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray, or the like can be used, and radiation having a wavelength in the range of 190 to 450 nm is preferable. The exposure amount of the radiation is preferably 10 to 10000 J/m2. The conventional radiation-sensitive composition is formed as disclosed in the examples of Japanese Laid-Open Patent Publication No. 2002-296778, Japanese Patent Application Publication No. Hei. A pattern having sufficient resistance to solvent can require an exposure amount of 1500 to 2000 J/m 2 . On the other hand, when the radiation sensitive composition of the present invention is used, a fine pattern having excellent development resistance and solvent resistance can be formed even by an exposure amount of 500 J/m2 or less. Further, as the above alkaline developing solution, for example, sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, cholesteric, 1,8-dioxazabicyclo[5.4.0]- An aqueous solution of 7-undecene or 1,5-diazabicyclo[4.3.0]-5-decene. For example, an appropriate amount of a water-soluble organic solvent such as methanol or ethanol, a surfactant, or the like may be added to the alkaline developing solution. Further, after alkali development, it is usually washed with water. As the development treatment method, a rinsing development method, a spray development method, a immersion (immersion) development method, a paste type (liquid) development method, or the like can be used. Development -52- 201011468 The condition is preferably 5 to 300 seconds at room temperature. The color filter of the present invention thus obtained is very expensive for high-definition color liquid crystal display elements, color photographic tube elements, color sensors, and the like. Color Liquid Crystal Display Element The color liquid crystal display element of the present invention has the color filter of the present invention. The color liquid crystal display element of the present invention can be suitably constructed. For example, a color filter may be formed on a substrate other than the driving substrate on which the thin film transistor (TFT) is provided, and the driving substrate and the substrate on which the color filter is formed may face the liquid crystal layer, and A substrate in which a color filter is formed on the surface of the driving substrate on which the thin film transistor (TFT) is provided and a substrate on which an ITO (tin-doped indium oxide) electrode is formed may be employed, and the liquid crystal layer may face each other. The latter structure can significantly increase the aperture ratio, and has the advantage of being able to produce a bright, G-high definition liquid crystal display element. (Embodiment) Hereinafter, embodiments of the present invention will be described more specifically by way of examples. However, the invention is not limited to the following embodiments. (Preparation of Pigment Dispersion) Preparation Example 1 15 parts by weight of CI Pigment Red 254 (manufactured by Steam-53-201011468 Bar Specialty Chemicals, trade name CF-CF) and 4 as a dispersing agent were used as the (A) coloring agent. a mixture of Disperbyk-2000 (converted to solid content), propylene glycol monomethyl ether acetate as solvent, and propylene glycol monoethyl ether = 80/20 (by weight), having a solid content concentration of 19%, treated with a ball mill, A pigment dispersion (A-1) was prepared. Preparation Example 2 20 parts by weight of carbon black as the (A) coloring agent, 4 parts by weight of Disperbyk-167 (in terms of solid content) as a dispersing agent, and 3-methoxybutyl acetate as a solvent were used. The solid content concentration was 24%, and it was treated with a ball mill to prepare a pigment dispersion (A-2). Preparation Example 3 15 parts by weight of CI Pigment Green 58 (produced by Otsuka Ink Chemical Industry Co., Ltd.) / CI Pigment Yellow 150 = 60 M0 (weight ratio) as a coloring agent (A), and 4 parts as a dispersing agent were used. a mixture of Disperbyk - 2001 (converted to solids content), propylene glycol monomethyl ether acetate / 1,3-butanediol diacetate = 5 0/5 0 (by weight) as solvent The content concentration was 19%, which was treated with a ball mill, and mixed and dispersed in a ball mill for 12 hours to prepare a pigment dispersion liquid (A-3). Preparation Example 4 A mixture of 15 parts by weight of CI Pigment Green 36/CI Pigment Yellow 150 = 60/40 (weight ratio) as a coloring agent (A) and 4.0 parts by weight Disperbyk - 2001 as a dispersing agent (converted to solid content) were used. ), as a solvent -54- 201011468 propylene glycol monomethyl ether acetate / 1,3-butanediol diacetate = 50 / 5 〇 (by weight) mixture, the solid content concentration is 19%, use The ball mill was treated and mixed and dispersed in a ball mill for 12 hours to prepare a pigment dispersion liquid (A-4). (Synthesis of a precursor copolymer and a polymer (B)) Synthesis of a precursor copolymer Synthesis Example 1 H In a flask equipped with a condenser and a stirrer, 70.0 g of 3-propenyloxymethyl-3- Ethyloxetane, 15.0 g of acrylic acid and 15.0 g of ω-carboxypolycaprolactone monoacrylate were dissolved in 300 g of propylene glycol monomethyl ether acetate, and then 3.0 g of 2,2'·azobisisobutylate was added. Nitrile and 5.0 g of α-methylstyrene dimer were then purged with nitrogen for 15 minutes. After purging with nitrogen, the reaction mixture was stirred and nitrogen gas was bubbled, and the mixture was heated at 80 ° C for 5 hours to obtain a solution containing 25% by weight of the precursor copolymer [b-1]. The polystyrene-equivalent 〇 of the precursor copolymer [b-1] had a weight average molecular weight (Mw) of 10,000. Synthesis Examples 2 to 9 In addition to the types and amounts of the compound (b1), the compound (b2), the compound (b4), and the compound (b6) as a polymerizable unsaturated compound, a polymerization initiator, a chain transfer agent, and a molecular weight modifier, A solution containing 25% by weight of the precursor copolymers [b-2] to [b-9] was obtained in the same manner as in the above Synthesis Example 1 except for the above. -55-201011468 The polystyrene-equivalent weight average molecular weight (Mw) of the precursor copolymer obtained in each Synthesis Example is shown in Table 1.

❿ -56- 201011468 1—I嗽 1合成例9 Os 1 X) 1 <N 1 〇〇 1 I 二 1 1 ο f—4 I Os 1 v〇 1 1 1 10000 1合成例8| 00 1 1 1 I 1 1 〇 1 00 1 00 1 i 6000 合成例7 b—7 1 1 1 〇 1 〇 Ο ί i m 1 m 1 i 15000 |合成例6| ο 1 χ> 1 s 1 1 1 1 〇 1 1 i 1 1 i cn 1 对 1 1 12000 |合成例5| b-5 1 o 1 1 1 1 〇 ο u-i 1 1 1 1 1 9500 |合成例4| b-4 1 芝 1 1 〇 1 1 ON 1 1 m 1 1 1 寸 5000 1合成伊J3] b-3 1 1 o 1 〇 1 〇 1 CN 1 1 1 VO 1 1 13000 |合成例2丨 b~2 1 宕 1 〇 1 〇 U-i 1 1 对 1 in I 9000 |合成Mil x> o 1 1 1 1 1 i 1 1 1 m 1 κη 1 10000 先質共聚物名稱 3-丙烯醯氧基甲基-3-乙基氧雜環丁烷(g) | "So m 親 m 稍 -Kl ή B- m 祕 m 逻 m &· 3-(乙烯基氧基甲基)-3-乙基氧雜環丁烷(g) 甲基丙烯酸(g) 丙烯酸(g) ω-羧基聚己內酯單丙烯酸酯(g) 甲基丙烯酸2-羥基乙基酯(g) 甲基丙烯酸2,3·二羥基丙基酯(g) 苯乙烯(g) 甲基丙烯酸苄基酯(g) N-苯基馬來醯亞胺(g) 苊烯(g) 琥珀酸單2-丙烯醯氧基乙基酯(g) 2,2’-偶氮二異丁腈(g) 2,2’-偶氮二(2,4-二甲基戊腈)(g) α-甲基苯乙烯二聚物(g) 季戊四醇四(3-疏基丙酸酯)(g) 吡唑-1-二硫代羧酸氰基(二甲基)甲基酯(g) 重量平均分子量(Mw) _ LSr 201011468 聚合物（B)的合成 合成例10 將上述合成例1中製得的含有先質共聚物[b-1]的溶 液200g、作爲化合物（b5)的甲基丙烯酸縮水甘油酯25.6g' 作爲聚合阻止劑的4_甲氧基苯酚〇.2g和作爲催化劑的溴化 四丁基銨2.5g加入到燒瓶中，在not：的溫度下使其反應 9小時。對該反應液，每次.用7 5 g離子交換水，進行四次水 洗’再進行減壓濃縮，得到含有33重量％聚合物[B — 1]的 〇溶液。聚合物[B-1]的聚苯乙烯換算的重量平均分子量（Mw) 爲1 1500’氧雜環丁烷基的含量爲2.8毫莫耳/g，聚合性不 飽和鍵的含量爲1.8毫莫耳/g。 合成例1 1〜1 4 除了所用的先質共聚物的種類、化合物（b5)、催化劑 和聚合阻止劑的種類及用量如表2所示以外，與上述合成 例10同樣地進行，得到分別含有33重量％聚合物[B — 2]~[b 一 5]的溶液》 © 各合成例中製得的聚合物（B)的聚苯乙烯換算的重量 平均分子量（Mw)、氧雜環丁烷基的含量和聚合性不飽和鍵 的含量如表2所示。 合成例1 5 將上述合成例6中製得的含有先質共聚物[b_6]的溶 液200g、作爲化合物（b3)的2 -甲基丙嫌釀氧基乙基異氰酸 酯47.6g、作爲聚合阻止劑的4-甲氧基苯酚〇.2g加入到燒 瓶中’在110°C的溫度下使其反應9小時。對該反應液，每 次用75g離子交換水’進行2次水洗，再進行減壓濃縮， 58 201011468 得到含有33重量％聚合物[b — 6]的溶液。聚合物[B — 6]的 聚苯乙烯換算的重量平均分子量（Mw)爲13600，氧雜環丁 烷基的含量爲1_6毫莫耳/ g’聚合性不飽和鍵的含量爲3.i 毫莫耳/g。 合成例16~18 除了所用的先質共聚物的種類' 化合物（b3)和聚合阻 止劑的種類及用量如表2所示以外，與上述合成例15同樣 地進行，得到分別含有33重量％聚合物[B-7]~[B - 9]的溶 ❹液。 各合成例中製得的聚合物（B)的聚苯乙烯換算的重量 平均分子量（Mw)、氧雜環丁烷基的含量和聚合性不飽和鍵 的含量如表2所示》 合成例1 9 在裝有冷凝管和攪拌器的燒瓶中，將55.0g3-甲基丙烯 醯氧基甲基-3-乙基氧雜環丁烷、15.0g甲基丙烯酸和30.0g 甲基丙烯酸稀丙基酯溶於200g丙二醇單甲醚乙酸酯中，再 〇 加入3.〇£2,2’-偶氮二異丁腈和4.(^2,2’-偶氮二（2,4-二甲 基戊腈），然後用氮氣吹洗15分鐘。用氮氣吹洗後，一邊 攪拌反應液和進行氮氣鼓泡，一邊在80°C下加熱，保持該 溫度進行5小時聚合，得到含有33重量％聚合物[B— 10] 的溶液。該聚合物[B - 10]的聚苯乙烯換算的重量平均分子 量（Mw)爲110 00，氧雜環丁烷基的含量爲2.8毫莫耳/g，聚 合性不飽和鍵的含量爲2.2毫莫耳/g。 59 201011468 合成例18 Ο 1 Os i Λ 1 1 00 1 1 i 1 <N d 12000 00 〇 合成例17 〇〇 1 0Q 00 1 X) 1 1 1 31.7 1 1 <N ο 1 7200 〇〇 00 (N 合成例16 卜 1 P3 b—7 1 1 1 cs 1 1 1 (N o 17000 卜 ο 寸 <N 合成例15 v〇 1 CQ 1 X) 1 1 47.6 1 i 1 CN o’ 1 13600 口 〇 CS 合成例14 1 b-5 29.5 1 1 I 1 1 (N o 1 10800 iTi 卜 合成例13 呀 1 0Q b—4 44.8 1 1 1 卜 cn 1 (N o 1 6200 Ο Η 合成例12 m 1 b-3 i 30.0 1 1 ο 1 1 CM o 14600 ^Τί d 寸· 合成例11 (N 1 CQ b-2 12.8 1 1 1 ο (N 1 cs d 1 10000 00 ο 寸· 合成例10 1 m 1 x> 25.6 1 1 1 1 <N o 1 11500 00 oi 〇〇 聚合物(B)的名稱 先質共聚物的麵 甲基丙烯酸縮水甘油酯(g) 丙烯酸4-縮水甘油基氧基丁基酯(g) 2-甲基丙烯醯氧基乙基異氰酸酯(g) _1 u-二(丙讎縫甲基)乙顯i^g) 溴化四丁基銨(g) 二月桂酸二正丁基錫(g) 4-甲氧基苯酚(g) 酚噻畊(g) 窜暈平均分子量(Mw) 氧雜環丁烷基的含量(mmol/g) 聚合性不飽和鍵的含量(mmol/g) 201011468 ((E)鹼可溶性樹脂的合成） 合成例20 在裝有冷凝管和攪拌器的燒瓶中’將20.0g甲基丙 烯酸、15.0g甲基丙烯酸2-羥基乙基酯、15.0g N-苯基 馬來醯亞胺' 12.0g苯乙烯、l〇.〇g甲基丙烯酸苄基酯和 28.0g甲基丙烯酸2-乙基己基酯溶於2 00g丙二醇單甲醚 乙酸酯中，再加入3.0g 2,2’-偶氮二異丁腈和5.0g α-0 甲基苯乙烯二聚物，然後用氮氣吹洗15分鐘。用氮氣 吹洗後，一邊攪拌反應液和進行氮氣鼓泡’ 一邊在80 °C下加熱，保持該溫度進行5小時聚合，得到含有33 重量％鹼可溶性樹脂[E - 1]的溶液。該鹼可溶性樹脂[E -1]的聚苯乙烯換算的重量平均分子量（Mw)爲1 1000。 合成例2 1 在裝有冷凝管和攪拌器的燒瓶中，將20.0g甲基丙 烯酸' 25.0g N-苯基馬來醯亞胺、15.0g苯乙烯、5.0g 0 甲基丙烯酸苄基酯、15.0g甲基丙烯酸2-羥基乙基酯和 20.0g甲基丙烯酸烯丙基酯溶於200g丙二醇單甲醚乙酸 酯中，再加入7.〇£2,2’-偶氮二（2,4-二甲基戊腈）和7.〇£ α-甲基苯乙烯二聚物，然後用氮氣吹洗15分鐘。用氮 氣吹洗後，一邊攪拌反應液和進行氮氣鼓泡，一邊在 80°C下加熱，保持該溫度進行5小時聚合，得到含有 33重量％鹼可溶性樹脂[E- 2]的溶液。該鹼可溶性樹脂 -61- 201011468 [E - 2]的聚苯乙烯換算的重量平均分子量（M w)爲 10000 » 合成例22 在裝有冷凝管和攪拌器的燒瓶中，將15.0g甲基丙 烯酸、30.0g苊烯、35.0g甲基丙烯酸苄基酯和20.〇g甘 油單甲基丙烯酸酯溶於200g丙二醇單甲醚乙酸酯中’ 再加入4.0g 2,2’-偶氮二異丁腈和6.0g α-甲基苯乙嫌二 φ 聚物，然後用氮氣吹洗15分鐘。用氮氣吹洗後’一邊 攪拌反應液和進行氮氣鼓泡，一邊在80°C下加熱’保 持該溫度進行5小時聚合，得到含有33重量％鹼可溶 性樹脂[E — 3]的溶液。該鹼可溶性樹脂[E— 3]的聚苯乙 烯換算的重量平均分子量（Mw)爲13000。 合成例23 在裝有冷凝管和攪拌器的燒瓶中，將44.0g對乙烯 基苄基縮水甘油基醚、40.OgN-苯基馬來醯亞胺、16,〇g Q 甲基丙烯酸苄基酯溶於3 00g丙二醇單甲醚乙酸酯中， 再加入8.0g 2,2’-偶氮二異丁腈和8.0g α -甲基苯乙烯二 聚物，然後用氮氣吹洗15分鐘。用氮氣吹洗.後，〜邊 % « 攪拌反應液和進行氮氣鼓泡，一邊在8 0 °C下加熱進行5 小時聚合。 然後，向反應溶液中加入17.0g甲基丙烯酸、〇 5 對甲氧基苯酚和4.4g溴化四丁基銨，在120°C的溫度γ -62- 201011468 使其反應9小時。再添加18.5g琥珀酸酐’在100°C的 溫度下使其反應6小時後，在液體溫度保持於85°C不 變的情況下用水洗滌兩次，再進行減壓濃縮，得到含有 33重量％鹼可溶性樹脂[E- 4]的溶液。該鹼可溶性樹脂 [E-4]的聚苯乙烯換算的重量平均分子量（Mw)爲7800。 比較合成例 合成例24 0 將上述合成例20中製得的含有可溶性樹脂[E- 1] 的溶液200g、作爲化合物（b5)的甲基丙烯酸縮水甘油酯 12.8g、作爲聚合阻止劑的4-甲氧基苯酚0.2g和作爲催 化劑的溴化四丁基銨2.0g加入到燒瓶中，在110°C的溫 度下使其反應9小時。對該反應液，每次用75g離子交 換水，進行4次水洗，再進行減壓濃縮，得到含有33 重量％聚合物[R- 1]的溶液。聚合物[R — 1]的聚苯乙烯 換算的重量平均分子量（Mw)爲1 2500。 〇 感放射線性組成物的調製和評價 實施例1 感放射線件組成物的調製 將作爲（A)著色劑的顏料分散液（A-l)lOO.O重量 份、作爲聚合物（B)的含聚合物[B - 1]的溶液（固體含量 濃度爲33%)40.0重量份、作爲（C)光聚合引發劑的汽巴 特殊化學品公司製的IRGACURE 907(2-甲基-1-[4-(甲硫 -63- 201011468 基）苯基]-2 -味啉基丙院-1-_)4·3重量份、作爲（D)具有 聚合性不飽和鍵的單體的東亞合成股份有限公司生產 的M— 402(二季戊四醇六丙烯酸酯）5.4重量份和東亞合 成股份有限公司生產的TO - 1382(二季戊四醇五丙烯酸 酯與琥珀酸的單酯化物、二季戊四醇六丙烯酸酯以及二 季戊四醇五丙烯酸酯的混合物）3.6重量份、作爲（E)鹼 可溶性樹脂的鹼可溶性樹脂[E - 1]10.0重量份和鹸可 0 溶性樹脂[E-4]4.0重量份、作爲溶劑的3 -乙氧基丙酸 乙酯81.0重量份進行混合，調製出著色層形成用組成 物。 對所得感放射線性組成物，按照下述順序進行評 價。評價結果列於表3。 圖案的形成 使用旋塗機將所得感放射線性組成物塗布於在表 面上形成了防止鈉離子溶出的Si〇2膜的鈉鈣玻璃基板 〇 上後，在90 °C的加熱板上預烘焙2分鐘，形成膜厚爲 1.7从m的塗膜。 然後，將基板冷卻至室溫後，使用高壓汞燈，借助 具有寬度在5 ~ 5 0// m範圍內的尺寸不同的多個狹縫光 罩，對塗膜以40mW/cm2的光照度進行含365nm、405nm 和436nm各波長的紫外線曝光。此時的曝光量爲5 00 J/m2。然後，將基板用23 °C的0.04重量％的氫氧化鉀水 • 64 - 201011468 溶液進行1分鐘沖洗顯影後，用超純水洗滌並晾乾。然 後，在220t的潔淨烘箱中進行30分鐘後烘焙’在基 板上形成布有紅色條紋狀畫素圖案的畫素陣列° 殘渣的評價 觀察上述圖案的形成中製得的基板，對未曝光部分 是否殘留有殘渣，按照以下三個等級進行評價。 〇：沒有鑑定到殘渣 0 △:鑑定到少量殘渣 X:鑑定到大量殘渣 耐顯影件的評價 在上述圖案的形成中，當寬度爲50 的畫素圖案 的顯影前後的厚度比（顯影後的膜厚/顯影前的膜厚）爲 95 %以上時，評價爲〇，當顯影前後的膜厚比不到95%， 或者部分點狀圖案鑑定到缺陷時，評價爲△，當顯影後 圖案全部從基板上脫落時，評價爲X。 〇 電壓保持率的評價 將所製得的感放射線性組成物，用旋塗機塗布在表 面上形成了防止鈉離子溶出的Si 〇2膜、並且以規定形 狀蒸鍍了 ITO(銦-氧化錫合金）電極的鈉鈣玻璃基板上 後，在90°C的潔淨烘箱中進行10分鐘預烘焙，形成膜 厚爲1.8/zm的塗膜。 然後，使用高壓汞燈，不使用光罩，對塗膜以5 00 -65- 201011468 J/m2的曝光量進行含365nm、405nm和436nm各波長的 放射線的曝光。然後，將基板在由23 °C的0.04重量％ 的氫氧化鉀水溶液組成的顯影液中浸漬1分鐘進行顯 影後，用超純水洗滌並晾乾，再在230°C下進行30分 鐘後烘焙使塗膜固化，在基板上形成紅色畫素。 然後，將液晶胞置入60°C的恆溫層中，使用東陽 Technica製造的液晶電壓保持率測定系统VHR-1A型 φ (商品名）測定液晶胞的電壓保持率。此時施加的電壓爲 5.0V的方形波，測定頻率爲60Hz。這裏電壓保持率是 指（16.7毫秒後的液晶胞電位差/〇毫秒時施加的電壓） 的値。評價結果列於表3。 耐溶劑性評價 將上述圖案的形成中製得的基板在60°C的N-甲基 吡咯烷酮中浸漬30分鐘，其結果當浸漬前後的厚度比 (浸漬後的膜厚/浸漬前的膜厚）爲95%以上100%以下， 〇 並且浸漬後的N-甲基吡咯烷酮完全沒有著色時，評價 爲〇，當浸漬前後膜厚比不足95%，或者浸漬後N-甲 基吡咯烷酮有一些著色時，評價爲△，當浸漬後觀察到 產生裂縫或從基板脫落的畫素圖案時，評價爲X。 實施例2〜1 2和比較例1 ~ 8 在實施例1中，除了如表3中所示替換各成分的種 類和含量（重量份）以外’與實施例1同樣地操作，調製 -66- 201011468 感放射線性組成物。 然後，使用所製得的感放射線性組成物，與實施例 1同樣地進行各種評價。結果列於表3。 在表3中，各成分如下。❿ -56- 201011468 1-I嗽1 Synthesis Example 9 Os 1 X) 1 <N 1 〇〇1 I 2 1 1 ο f-4 I Os 1 v〇1 1 1 10000 1 Synthesis Example 8| 00 1 1 1 I 1 1 〇1 00 1 00 1 i 6000 Synthesis Example 7 b-7 7 1 1 〇1 〇Ο ί im 1 m 1 i 15000 | Synthesis Example 6| ο 1 χ> 1 s 1 1 1 1 〇1 1 i 1 1 i cn 1 to 1 1 12000 | Synthesis Example 5| b-5 1 o 1 1 1 1 〇ο ui 1 1 1 1 1 9500 | Synthesis Example 4| b-4 1 Zhi 1 1 〇 1 1 ON 1 1 m 1 1 1 inch 5000 1 synthetic Yi J3] b-3 1 1 o 1 〇1 〇1 CN 1 1 1 VO 1 1 13000 | Synthesis Example 2丨b~2 1 宕1 〇1 〇Ui 1 1 to 1 In I 9000 | Synthetic Mil x> o 1 1 1 1 1 i 1 1 1 m 1 κη 1 10000 Protected Copolymer Name 3-Acetyloxymethyl-3-ethyloxetane (g) | "So m pro-m slightly-Kl ή B- m secret m Logic m & 3-(vinyloxymethyl)-3-ethyloxetane (g) methacrylic acid (g) acrylic acid (g) ω-carboxypolycaprolactone monoacrylate (g) 2-hydroxyethyl methacrylate (g) 2,3·dihydroxypropyl methacrylate (g) styrene (g) methyl Benzyl acrylate (g) N-phenyl醯imine (g) decene (g) succinic acid mono-2-propenyloxyethyl ester (g) 2,2'-azobisisobutyronitrile (g) 2,2'-azobis ( 2,4-Dimethylvaleronitrile) (g) α-methylstyrene dimer (g) pentaerythritol tetrakis(3-sodium propyl propionate) (g) pyrazole-1-dithiocarboxylate cyanide (Dimethyl)methyl ester (g) Weight average molecular weight (Mw) _ LSr 201011468 Synthesis of polymer (B) Synthesis Example 10 The precursor copolymer [b-1] obtained in the above Synthesis Example 1 200 g of the solution, 25.6 g of glycidyl methacrylate as the compound (b5), 2 g of methoxyphenol as a polymerization inhibitor, and 2.5 g of tetrabutylammonium bromide as a catalyst were added to the flask. The reaction was allowed to proceed for 9 hours at a temperature of not:. The reaction solution was washed with water for 7 times with 7 5 g of ion-exchanged water, and concentrated under reduced pressure to obtain a hydrazine solution containing 33% by weight of the polymer [B-1]. The polystyrene-equivalent weight average molecular weight (Mw) of the polymer [B-1] was 1 1500′, the content of the oxetanyl group was 2.8 mmol/g, and the content of the polymerizable unsaturated bond was 1.8 mmol. Ear / g. Synthesis Example 1 1 to 1 4 In the same manner as in the above Synthesis Example 10, except that the type of the precursor copolymer used, the type of the compound (b5), the catalyst, and the polymerization inhibitor were as shown in Table 2, respectively, 33% by weight of a solution of the polymer [B-2]~[b-5] © Polystyrene-equivalent weight average molecular weight (Mw) of the polymer (B) obtained in each synthesis example, oxetane The content of the group and the content of the polymerizable unsaturated bond are shown in Table 2. Synthesis Example 1 5 g of a solution containing the precursor copolymer [b_6] obtained in the above Synthesis Example 6 and 47.6 g of 2-methylpropionic oxyethyl isocyanate as the compound (b3) were used as a polymerization inhibitor. 4-methoxyphenol oxime. 2 g was added to the flask to react at a temperature of 110 ° C for 9 hours. The reaction solution was washed twice with 75 g of ion-exchanged water each time, and concentrated under reduced pressure. 58 201011468 A solution containing 33% by weight of polymer [b-6] was obtained. The polystyrene-equivalent weight average molecular weight (Mw) of the polymer [B-6] is 13,600, and the content of the oxetane group is 1 to 6 mmol/g'. The content of the polymerizable unsaturated bond is 3.i. Moor / g. Synthesis Examples 16 to 18 In the same manner as in the above Synthesis Example 15, except that the type and amount of the compound (b3) and the polymerization inhibitor used were as shown in Table 2, respectively, 33% by weight of polymerization was obtained. a solution of the substance [B-7]~[B-9]. The polystyrene-equivalent weight average molecular weight (Mw), the content of the oxetane group, and the content of the polymerizable unsaturated bond of the polymer (B) obtained in each Synthesis Example are shown in Table 2 Synthesis Example 1 9 In a flask equipped with a condenser and a stirrer, 55.0 g of 3-methacryloxymethyl-3-ethyloxetane, 15.0 g of methacrylic acid and 30.0 g of propyl methacrylate The ester is dissolved in 200 g of propylene glycol monomethyl ether acetate, and then added with 〇2,2'-azobisisobutyronitrile and 4.(^2,2'-azobis(2,4-di) Methyl valeronitrile), followed by nitrogen purge for 15 minutes. After purging with nitrogen, the reaction mixture was stirred and nitrogen gas was bubbled while heating at 80 ° C, and the temperature was maintained for 5 hours to obtain 33 weight. a solution of % polymer [B-10]. The polymer [B-10] has a polystyrene-equivalent weight average molecular weight (Mw) of 110 00 and an oxetane content of 2.8 mmol/g. The content of the polymerizable unsaturated bond was 2.2 mmol/g. 59 201011468 Synthesis Example 18 Ο 1 Os i Λ 1 1 00 1 1 i 1 < N d 12000 00 〇 Synthesis Example 17 〇〇1 0Q 00 1 X ) 1 1 1 31.7 1 1 <N ο 1 7200 〇〇00 (N Synthesis Example 16 Bu 1 P3 b-7 1 1 1 cs 1 1 1 (N o 17000 ο 寸 寸 N N Synthesis Example 15 v 〇 1 CQ 1 X) 1 1 47.6 1 i 1 CN o' 1 13600 Oral CS Synthesis Example 14 1 b-5 29.5 1 1 I 1 1 (N o 1 10800 iTi Synthesis Example 13 呀1 0Q b-4 44.8 1 1 1 Cn 1 (N o 1 6200 Ο Η Synthesis Example 12 m 1 b-3 i 30.0 1 1 ο 1 1 CM o 14600 ^Τί d inch · Synthesis Example 11 (N 1 CQ b-2 12.8 1 1 1 ο (N 1 Cs d 1 10000 00 ο 寸 · Synthesis Example 10 1 m 1 x> 25.6 1 1 1 1 <N o 1 11500 00 oi The name of the polymer (B) is a precursor copolymer of methacrylic acid glycidyl methacrylate (g) 4-glycidyloxybutyl acrylate (g) 2-methylpropenyloxyethyl isocyanate (g) _1 u-di(propionate methyl) ethyl i^g) bromination Tetrabutylammonium (g) di-n-butyltin dilaurate (g) 4-methoxyphenol (g) phenol thiophene (g) halo average molecular weight (Mw) oxetane content (mmol/g Content of polymerizable unsaturated bond (mmol/g) 201011468 ((E) Synthesis of alkali-soluble resin) Synthesis Example 20 In a flask equipped with a condenser and a stirrer 20.0 g of methacrylic acid, 15.0 g of 2-hydroxyethyl methacrylate, 15.0 g of N-phenylmaleimide '12.0 g of styrene, 1 〇g of benzyl methacrylate and 28.0 g 2-ethylhexyl methacrylate was dissolved in 200 g of propylene glycol monomethyl ether acetate, followed by 3.0 g of 2,2'-azobisisobutyronitrile and 5.0 g of α-0 methylstyrene dimer. Then, it was purged with nitrogen for 15 minutes. After purging with nitrogen, the mixture was stirred at 80 ° C while stirring the reaction liquid, and the temperature was maintained for 5 hours to obtain a solution containing 33% by weight of the alkali-soluble resin [E - 1]. The alkali-soluble resin [E-1] had a polystyrene-equivalent weight average molecular weight (Mw) of 11,000. Synthesis Example 2 1 In a flask equipped with a condenser and a stirrer, 20.0 g of methacrylic acid '25.0 g of N-phenylmaleimide, 15.0 g of styrene, 5.0 g of benzyl methacrylate, 15.0 g of 2-hydroxyethyl methacrylate and 20.0 g of allyl methacrylate were dissolved in 200 g of propylene glycol monomethyl ether acetate, followed by 7.2,2'-azobis (2, 4-Dimethylvaleronitrile) and 7. A-methylstyrene dimer were then purged with nitrogen for 15 minutes. After purging with nitrogen, the reaction mixture was stirred and nitrogen gas was bubbled, and the mixture was heated at 80 ° C, and the temperature was maintained for 5 hours to obtain a solution containing 33% by weight of the alkali-soluble resin [E-2]. The alkali-soluble resin-61-201011468 [E-2] had a polystyrene-equivalent weight average molecular weight (Mw) of 10,000 » Synthesis Example 22 In a flask equipped with a condenser and a stirrer, 15.0 g of methacrylic acid was used. 30.0 g of terpene, 35.0 g of benzyl methacrylate and 20. g of glycerol monomethacrylate dissolved in 200 g of propylene glycol monomethyl ether acetate' plus 4.0 g of 2,2'-azo diiso Nitrile and 6.0 g of α-methylphenylethyl sulphide were then purged with nitrogen for 15 minutes. After the mixture was purged with nitrogen, the reaction mixture was stirred while stirring at a temperature of 80 ° C, and the temperature was maintained for 5 hours to obtain a solution containing 33% by weight of an alkali-soluble resin [E-3]. The polystyrene-equivalent weight average molecular weight (Mw) of the alkali-soluble resin [E-3] was 13,000. Synthesis Example 23 In a flask equipped with a condenser and a stirrer, 44.0 g of p-vinylbenzyl glycidyl ether, 40.Og N-phenylmaleimide, 16, 〇g Q benzyl methacrylate The ester was dissolved in 300 g of propylene glycol monomethyl ether acetate, and 8.0 g of 2,2'-azobisisobutyronitrile and 8.0 g of α-methylstyrene dimer were further added, followed by purging with nitrogen for 15 minutes. After purging with nitrogen, the mixture was stirred for 5 hours while heating at 80 ° C for 5 hours while stirring the reaction solution and bubbling nitrogen gas. Then, 17.0 g of methacrylic acid, hydrazine 5 p-methoxyphenol, and 4.4 g of tetrabutylammonium bromide were added to the reaction solution, and the mixture was reacted at a temperature of Δ -62 - 201011468 at 120 ° C for 9 hours. Further, 18.5 g of succinic anhydride was added and reacted at a temperature of 100 ° C for 6 hours, and then washed twice with water while maintaining the liquid temperature at 85 ° C, and concentrated under reduced pressure to obtain 33% by weight. A solution of an alkali soluble resin [E-4]. The polystyrene-equivalent weight average molecular weight (Mw) of the alkali-soluble resin [E-4] was 7,800. Comparative Synthesis Example Synthesis Example 24 0 200 g of a solution containing the soluble resin [E-1] obtained in the above Synthesis Example 20, 12.8 g of glycidyl methacrylate as the compound (b5), and 4 as a polymerization inhibitor 0.2 g of methoxyphenol and 2.0 g of tetrabutylammonium bromide as a catalyst were placed in a flask, and reacted at 110 ° C for 9 hours. The reaction solution was exchanged with water for 75 g each time, washed with water four times, and concentrated under reduced pressure to obtain a solution containing 33% by weight of the polymer [R-1]. The polystyrene-equivalent weight average molecular weight (Mw) of the polymer [R-1] was 1,2,500. Modulation and evaluation of the sensitizing radiation linear composition Example 1 Preparation of the radiation sensitive component composition The pigment dispersion liquid (Al) of (A) coloring agent is 100 parts by weight, and the polymer as the polymer (B) [B-1] solution (solid content concentration: 33%) 40.0 parts by weight, IVAGCURE 907 (2-methyl-1-[4-() manufactured by Ciba Specialty Chemicals Co., Ltd. as (C) photopolymerization initiator Methyl sulphate-63- 201011468 phenyl]-2- benzoyl propyl ketone-1-1) 4·3 parts by weight, produced as a (D) monomer having a polymerizable unsaturated bond, manufactured by Toagosei Co., Ltd. 5.4 parts by weight of M-402 (dipentaerythritol hexaacrylate) and TO-1382 produced by East Asia Synthetic Co., Ltd. (monopentate of dipentaerythritol pentaacrylate and succinic acid, dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate) Mixture) 3.6 parts by weight, 10.0 parts by weight of the alkali-soluble resin [E-1] as the (E) alkali-soluble resin, and 4.0 parts by weight of the oxime-soluble resin [E-4], 3-ethoxypropane as a solvent 81.0 parts by weight of ethyl acetate was mixed to prepare a composition for forming a colored layerThe obtained radiation sensitive composition was evaluated in the following order. The evaluation results are shown in Table 3. Pattern formation The obtained radiation sensitive composition was applied onto a soda lime glass substrate on which a Si 2 film for preventing sodium ion elution was formed on a surface by a spin coater, and then prebaked on a hot plate at 90 ° C. 2 In minutes, a coating film having a film thickness of 1.7 m was formed. Then, after the substrate was cooled to room temperature, the coating film was irradiated with an illuminance of 40 mW/cm 2 by using a high-pressure mercury lamp with a plurality of slit masks having different sizes ranging from 5 to 50 μm. Ultraviolet exposure at 365 nm, 405 nm, and 436 nm wavelengths. The exposure amount at this time is 500 J/m2. Then, the substrate was washed with a solution of 0.04% by weight of potassium hydroxide water • 64 - 201011468 at 23 ° C for 1 minute, washed with ultrapure water, and air-dried. Then, after 30 minutes in a clean oven of 220 t, post-baking was performed to form a pixel array having a red striped pixel pattern on the substrate. Evaluation of the residue was observed in the formation of the above pattern, and whether the unexposed portion was observed. Residues remained and were evaluated according to the following three grades. 〇: No residue was identified. △: A small amount of residue was identified. X: Evaluation of a large amount of residue-resistant developing parts was evaluated. In the formation of the above pattern, the thickness ratio of the pixel pattern having a width of 50 before and after development (developed film) When the film thickness before thickness/development is 95% or more, it is evaluated as 〇, and when the film thickness ratio before and after development is less than 95%, or when a part of the dot pattern is identified as a defect, it is evaluated as Δ, and the pattern is all developed after development. When the substrate was detached, it was evaluated as X. Evaluation of 〇 voltage holding ratio The obtained radiation-sensitive composition was coated on a surface with a spin coater to form a Si 〇 2 film for preventing sodium ion elution, and ITO (indium-tin oxide) was vapor-deposited in a predetermined shape. After the alloy was placed on the soda lime glass substrate, it was prebaked in a clean oven at 90 ° C for 10 minutes to form a coating film having a film thickness of 1.8 / zm. Then, using a high-pressure mercury lamp, exposure of the coating film containing radiation of respective wavelengths of 365 nm, 405 nm, and 436 nm was performed on the coating film at an exposure amount of 500-65 to 201011468 J/m2 without using a photomask. Then, the substrate was immersed in a developing solution composed of a 0.04% by weight aqueous solution of potassium hydroxide at 23 ° C for 1 minute, developed, washed with ultrapure water and dried, and baked at 230 ° C for 30 minutes. The coating film is cured to form a red pixel on the substrate. Then, the liquid crystal cell was placed in a constant temperature layer of 60 ° C, and the voltage holding ratio of the liquid crystal cell was measured using a liquid crystal voltage retention ratio measuring system VHR-1A type φ (trade name) manufactured by Toyo Technica. The voltage applied at this time was a square wave of 5.0 V, and the measurement frequency was 60 Hz. Here, the voltage holding ratio is 値 (the voltage applied when the liquid crystal cell potential difference after 16.7 milliseconds / 〇 milliseconds). The evaluation results are shown in Table 3. Evaluation of solvent resistance The substrate obtained by the formation of the above pattern was immersed in N-methylpyrrolidone at 60 ° C for 30 minutes, and as a result, the thickness ratio before and after immersion (film thickness after immersion / film thickness before immersion) When it is 95% or more and 100% or less, and the N-methylpyrrolidone after immersion is completely uncolored, it is evaluated as yttrium, when the film thickness ratio before and after immersion is less than 95%, or when N-methylpyrrolidone has some coloration after immersion, The evaluation was Δ, and when a crack pattern or a pixel pattern which fell off from the substrate was observed after immersion, it was evaluated as X. Examples 2 to 1 2 and Comparative Examples 1 to 8 In Example 1, except that the type and content (parts by weight) of each component were replaced as shown in Table 3, the same procedure as in Example 1 was carried out to prepare -66- 201011468 Radiation-sensitive linear composition. Then, various evaluations were carried out in the same manner as in Example 1 using the obtained radiation sensitive linear composition. The results are shown in Table 3. In Table 3, each component is as follows.

C 一 1: 2-甲基-1-[4-(甲硫基）苯基]-2-味啉基丙烷-1-酮（商品名IRGACURE 907，汽巴特殊化學品公司製）； C— 2:乙酮，1-[9-乙基-6-(2-甲基苯甲醯基）-9.H.-0 咔唑-3-基]1- (0-乙醯基肟）（商品名 IRGACURE 0X02，汽巴特殊化學品公司製）； D-1:二季戊四醇六丙烯酸酯（商品名M - 402,東 亞合成股份有限公司生產）； D - 2:二季戊四醇五丙烯酸酯與琥珀酸的單酯化 物、二季戊四醇六丙烯酸酯以及二季戊四醇五丙烯酸酯 的混合物（商品名TO - 1382，東亞合成股份有限公司生 產）； . D— 3:季戊四醇四丙烯酸酯（商品名M— 450，東亞 合成公司製）； EEP : 3-乙氧基丙酸乙酯； MBA : 3-甲氧基丁基乙酸酯。 -67- 201011468 5 饈 OC o c o 耷 q y— cn rs l> cn 0 01 r- 'sd q OC c c ί 卜 o c Ο d q m CN r- rn O <N r- VC q r- c p !c i o； VC 〇 o o v〇 <N VC rr. m l> q ζ c c 1 X OC yr o c c d rf CN 2 fT 卜： o f； ：c < X o C 〇 q m o fS r- cn r** VC o c :c c X OC m 〇 〇 c V£ rs rn r< CN r- CN O νΐ o VO < X a v〇 cs C c O d rn 七 νΐ v〇 cn o d q OC c X rr — c c o r*" *T) rr c rn o d o < X JN 接 q c c a cs vq 1·" OC ΓΊ q c c c <N O' 二 〇 〇 ο rr ό q — CN o CS c < c s c C C r^· V- rs • cf rn — »n d q 卜 < c c 5 O' C C cn cn cn r- q OQ c c c s OC C d c cn rn a q CN o rs c c c ! s c- c c VC c cn rn VC -½ r<* o o »ri OQ c c d g 4¾ 驷 VC o d O d m q cs cn c (N SC q 00 c c 〇 s »Λ c g O r< m VC q m 〇 rn 0 〇 c σ- o o O CN m cs r- c *ri q wH VC 〇 〇 c 5 r*· o d Ύ— ο d m 寸 VO (N VO cn cn o VO 〇 〇 c OC OC Cn o d ό »rj Tt *Ti d 卜 *n q 〇 〇 c g — c c c σ o cn 寸 vc cn o c q q 00 0 < c s T < CN i < cn 1 < 1 < 1— 1 ff i 'S 1 ff i 脎 1 PC _I Ai m 1 P： Ί Ai 1 cc 1 喵 m 1 ff 1 踩 'F： l· ff _i m 1 i 踩 1 cc i 1 5 1 ,η i <□ ί i I P— ,1 1 齡 丨1 u CN 1 a T P <N 1 P cn 1 Q 丁 r rn W 寸 1 Ph W W < PQ 埃 翁 φ 菜 腱 s i <： 齡 1 I 1 1 p >~1ϋϊ ϋ i | 蘅 班 像 鼷 fi 隹 1 链 £ i 1 :‘sin 201011468 由表3可知，含有成分（B)[具有氧雜環丁烷基和聚合性 不飽和鍵的聚合物]的本發明感放射線性組成物，即使在低 曝光下也具有足夠的耐顯影性，並且耐溶劑性也優良。相 比之下，含有僅具有氧雜環丁烷基、聚合性不飽和鍵中任 意其中之一的共聚物的感放射線性組成物，或者不含有具 有氧雜環丁烷基的共聚物的感放射線性組成物，耐顯影性 和耐溶劑性不夠好。而且可知更佳係配合鹼可溶性樹脂， 並且，成分（B)所具有的聚合性不飽和鍵，與烯丙基相比， 0更佳係（甲基）丙烯醯基。此外，還可知使用本發明感放射 線性組成物形成的彩色濾光片’電壓保持率也很高。 【圖式簡單說明】 無。 【主要元件符號說明】 無。 ❷ -69-C-1: 2-methyl-1-[4-(methylthio)phenyl]-2-zolinolpropane-1-one (trade name: IRGACURE 907, manufactured by Ciba Specialty Chemicals Co., Ltd.); 2: ethyl ketone, 1-[9-ethyl-6-(2-methylbenzhydryl)-9.H.-0 oxazol-3-yl]1-(0-ethylindenyl) ( Trade name: IRGACURE 0X02, manufactured by Ciba Specialty Chemicals Co., Ltd.); D-1: dipentaerythritol hexaacrylate (trade name M-402, manufactured by Toagosei Co., Ltd.); D-2: dipentaerythritol pentaacrylate and succinic acid a mixture of monoester, dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate (trade name TO-1382, manufactured by Toagosei Co., Ltd.); D-3: pentaerythritol tetraacrylate (trade name M-450, East Asia) EEP: 3-ethoxypropionate; MBA: 3-methoxybutyl acetate. -67- 201011468 5 馐OC oco 耷qy-cn rs l> cn 0 01 r- 'sd q OC cc ί 卜 Ο dqm CN r- rn O <N r- VC q r- cp !cio; VC 〇 Oov〇<N VC rr. m l> q ζ cc 1 X OC yr occd rf CN 2 fT Bu: of; :c < X o C 〇qmo fS r- cn r** VC oc :cc X OC m 〇〇c V£ rs rn r< CN r- CN O νΐ o VO < X av〇cs C c O d rn 七νΐ v〇cn odq OC c X rr — ccor*" *T) rr c rn odo < X JN to qcca cs vq 1·" OC ΓΊ qccc <NO' 二〇〇ο rr ό q — CN o CS c < csc CC r^· V- rs • cf rn — »ndq 卜< Cc 5 O' CC cn cn cn r- q OQ cccs OC C dc cn rn aq CN o rs ccc ! s c- cc VC c cn rn VC -1⁄2 r<* o o »ri OQ ccdg 43⁄4 驷VC od O dmq cs cn c (N SC q 00 cc 〇s »Λ cg O r< m VC qm 〇rn 0 〇c σ- oo O CN m cs r- c *ri q wH VC 〇〇c 5 r*· od Ύ— ο dm inch VO (N VO cn cn o VO 〇〇c OC OC Cn od ό »rj Tt *Ti d 卜*nq 〇〇cg — ccc σ o cn inch vc cn Ocqq 00 0 < cs T < CN i < cn 1 < 1 < 1 - 1 ff i 'S 1 ff i 脎1 PC _I Ai m 1 P: Ί Ai 1 cc 1 喵m 1 ff 1 'F: l· ff _i m 1 i Step 1 cc i 1 5 1 , η i < □ ί i IP— , 1 1 丨 1 u CN 1 a TP <N 1 P cn 1 Q □ r rn W Inch 1 Ph WW < PQ Eon φ 菜 腱 si <: Age 1 I 1 1 p >~1ϋϊ ϋ i | 蘅班像鼷fi 隹1 chain £ i 1 :'sin 201011468 The radiation sensitive composition of the present invention of the component (B) [polymer having an oxetane group and a polymerizable unsaturated bond], even at a low exposure Sufficient development resistance, and excellent solvent resistance. In contrast, a radiation-sensitive composition containing a copolymer having only one of an oxetane group and a polymerizable unsaturated bond, or a copolymer containing no oxetane group Radiation-linear composition, development resistance and solvent resistance are not good enough. Further, it is understood that the alkali-soluble resin is more preferably added, and the polymerizable unsaturated bond of the component (B) is more preferably a (meth) acrylonitrile group than the allyl group. Further, it is also known that the color filter formed by using the radiation sensitive linear composition of the present invention has a high voltage holding ratio. [Simple description of the diagram] None. [Main component symbol description] None. ❷ -69-

Claims (1)

201011468 七、申請專利範圍： 1. 一種著色層形成用感放射線性組成物，其特徵在於含有 (A)著色劑、（B)具有氧雜環丁烷基和聚合性不飽和鍵的 聚合物、以及（C)光聚合引發劑。 2. 如申請專利範圍第1項之著色層形成用感放射線性組成 物，其中（B)具有氧雜環丁烷基和聚合性不飽和鍵的聚合 物爲具有氧雜環丁院基和（甲基）丙烯醯基的聚合物。 3. 如申請專利範圍第1或2項之著色層形成用感放射線性 0 組成物，其中（B)具有氧雜環丁烷基和聚合性不飽和鍵的 聚合物爲選自於 (B - 1)使含有（bl)具有氧雜環丁烷基的聚合性不飽和 化合物和（b2)具有羥基的聚合性不飽和化合物而構成的 單體的共聚物與（b3)不飽和異氰酸酯化合物反應所得的 聚合物、 (B - 2)使含有（bl)具有氧雜環丁烷基的聚合性不飽和 化合物和（b4)不飽和羧酸而構成的單體的共聚物與（b5) Q 具有環氧乙烷基的聚合性不飽和化合物反應所得的聚合 物、以及 (B - 3)使含有（bl)具有氧雜環丁烷基的聚合性不飽和 化合物和（b 5)具有環氧乙烷基的聚合性不飽和化合物而 構成的單體的共聚物與（b4)干飽和羧酸反應所得的聚合 物構成的群組中的至少一種。 4. 如申請專利範圍第1至3項中任一項之著色層形成用感 放射線性組成物，其中更含有（D)具有聚合性不飽和鍵的 單體。 -70- 201011468 5. 如申請專利範圍第1至4項中任一項之著色層形成用感 放射線性組成物，其中更含有（E)鹼可溶性樹脂（但是上 述（B)成分除外）。 6. 如申請專利範圍第1至5項中任一項之著色層形成用感 放射線性組成物，其中作爲（A)著色劑，含有選自於C·1. 顔料紅254、C.I.顏料綠58和碳黑構成的群組中的至少 一種。 7. —種彩色濾光片，其係具備使用如申請專利範圍第1至 6項中任一項之著色層形成用感放射線性組成物形成的 著色層。 8. —種彩色液晶顯示元件’其係具備如申請專利範圍第7 項之彩色濾光片。 -71- 201011468 四、指定代表圖： (一) 本案指定代表圖為：無。 (二) 本代表圖之元件符號簡單說明： ίΕ 〇 ❹ 五、本案若有化學式時，請揭示最能顯示發明特徵的化學 式：201011468 VII. Patent Application Range: 1. A radiation sensitive composition for forming a coloring layer, characterized by containing (A) a coloring agent, (B) a polymer having an oxetane group and a polymerizable unsaturated bond, And (C) a photopolymerization initiator. 2. The sensitizing radioactive composition for coloring layer formation according to item 1 of the patent application, wherein (B) the polymer having an oxetane group and a polymerizable unsaturated bond is an oxetane group and Methyl) propylene fluorenyl polymer. 3. The sensitizing radioactive 0 composition for coloring layer formation according to claim 1 or 2, wherein (B) the polymer having an oxetane group and a polymerizable unsaturated bond is selected from (B - 1) A copolymer obtained by reacting (b) a polymerizable unsaturated compound having an oxetanyl group and (b2) a polymerizable unsaturated compound having a hydroxyl group with (b3) an unsaturated isocyanate compound (B-2) a copolymer comprising (b) a polymerizable unsaturated compound having an oxetane group and a (b4) unsaturated carboxylic acid, and (b5) Q having a ring a polymer obtained by reacting an oxyethylene group-containing polymerizable unsaturated compound, and (B-3) containing (bl) a polymerizable unsaturated compound having an oxetanyl group and (b5) having ethylene oxide At least one of the group consisting of a copolymer of a monomer having a polymerizable unsaturated compound and a polymer obtained by reacting (b4) a dry saturated carboxylic acid. 4. The sensitizing radioactive composition for forming a coloring layer according to any one of claims 1 to 3, further comprising (D) a monomer having a polymerizable unsaturated bond. The sensitizing radioactive composition for forming a coloring layer according to any one of claims 1 to 4, further comprising (E) an alkali-soluble resin (except for the component (B) described above). 6. The sensitizing radioactive composition for coloring layer formation according to any one of claims 1 to 5, wherein the coloring agent (A) is selected from the group consisting of C·1. Pigment Red 254, CI Pigment Green 58 At least one of the group consisting of carbon black. A color filter comprising a colored layer formed using the radiation sensitive composition for forming a color layer according to any one of claims 1 to 6. 8. A color liquid crystal display element' having a color filter as in item 7 of the patent application. -71- 201011468 IV. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: Ε Ε ❹ ❹ 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
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