JP5412290B2 - 耐食性部材 - Google Patents
耐食性部材 Download PDFInfo
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- JP5412290B2 JP5412290B2 JP2009543826A JP2009543826A JP5412290B2 JP 5412290 B2 JP5412290 B2 JP 5412290B2 JP 2009543826 A JP2009543826 A JP 2009543826A JP 2009543826 A JP2009543826 A JP 2009543826A JP 5412290 B2 JP5412290 B2 JP 5412290B2
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- Prior art keywords
- oxide film
- halogen
- ppm
- manufacturing apparatus
- corrosion
- Prior art date
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- 230000007797 corrosion Effects 0.000 title claims description 39
- 238000005260 corrosion Methods 0.000 title claims description 39
- 239000000463 material Substances 0.000 title description 18
- 238000004519 manufacturing process Methods 0.000 claims description 39
- 239000004065 semiconductor Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 14
- 238000007751 thermal spraying Methods 0.000 claims description 11
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 2
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 51
- 229910052736 halogen Inorganic materials 0.000 description 39
- 150000002367 halogens Chemical class 0.000 description 39
- 239000002245 particle Substances 0.000 description 21
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 16
- 238000005530 etching Methods 0.000 description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 13
- 239000000843 powder Substances 0.000 description 12
- -1 rare earth compounds Chemical class 0.000 description 12
- 229910052688 Gadolinium Inorganic materials 0.000 description 10
- 229910052769 Ytterbium Inorganic materials 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 239000007921 spray Substances 0.000 description 10
- 238000005507 spraying Methods 0.000 description 9
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 8
- 229910001882 dioxygen Inorganic materials 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000005422 blasting Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000007750 plasma spraying Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010285 flame spraying Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010288 cold spraying Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000007749 high velocity oxygen fuel spraying Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Drying Of Semiconductors (AREA)
- Coating By Spraying Or Casting (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Photovoltaic Devices (AREA)
Description
平均粒径が30μm〜40μm、Fe2O3をそれぞれ8ppm、10ppm、20ppm、30ppm、40ppm含むGdの酸化物であるGd2O3の溶射粉末を、エアロプラズマ社製ASP7100プラズマ溶射機を使用し、電圧275V、電流110A、アルゴンガス流量25L/min、酸素ガス流量40L/minの溶射条件にて、ブラスト処理を施した100×100×5t(mm)のアルミニウム基材上に溶射し、200μm〜300μmの酸化物皮膜を形成した。そして、形成された酸化物皮膜のエッチングレートおよび気孔率の評価を実施した。
平均粒径が30μm〜40μm、Fe2O3をそれぞれ8ppm、10ppm、20ppm、30ppm、40ppm含むYbの酸化物であるYb2O3の溶射粉末を、エアロプラズマ社製ASP7100プラズマ溶射機を使用し、電圧275V、電流110A、アルゴンガス流量25L/min、酸素ガス流量40L/minの溶射条件にて、ブラスト処理を施した100×100×5t(mm)のアルミニウム基材上に溶射し、200μm〜300μmの酸化物皮膜を形成した。そして、形成された酸化物皮膜のエッチングレートおよび気孔率の評価を実施した。
平均粒径が30μm〜40μm、Fe2O3をそれぞれ1ppm、3ppm、4ppm、70ppm、80ppm含むGdの酸化物であるGd2O3の溶射粉末を、エアロプラズマ社製ASP7100プラズマ溶射機を使用し、電圧275V、電流110A、アルゴンガス流量25L/min、酸素ガス流量40L/minの溶射条件にて、ブラスト処理を施した100×100×5t(mm)のアルミニウム基材上に溶射し、200μm〜300μmの酸化物皮膜を形成した。そして、形成された酸化物皮膜のエッチングレートおよび気孔率の評価を実施した。
平均粒径が30μm〜40μm、Fe2O3をそれぞれ1ppm、3ppm、4ppm、70ppm、80ppm含むYbの酸化物であるYb2O3の溶射粉末を、エアロプラズマ社製ASP7100プラズマ溶射機を使用し、電圧275V、電流110A、アルゴンガス流量25L/min、酸素ガス流量40L/minの溶射条件にて、ブラスト処理を施した100×100×5t(mm)のアルミニウム基材上に溶射し、200μm〜300μmの酸化物皮膜を形成した。そして、形成された酸化物皮膜のエッチングレートおよび気孔率の評価を実施した。
平均粒径が30μm〜40μm、Fe2O3を10ppm含むYの酸化物であるY2O3の溶射粉末を、エアロプラズマ社製ASP7100プラズマ溶射機を使用し、電圧275V、電流110A、アルゴンガス流量25L/min、酸素ガス流量40L/minの溶射条件にて、ブラスト処理を施した100×100×5t(mm)のアルミニウム基材上に溶射し、200μm〜300μmの酸化物皮膜を形成した。そして、形成された酸化物皮膜のエッチングレートおよび気孔率の評価を実施した。
平均粒径が30μm〜40μm、Fe2O3を8ppm含むGdおよびYbの酸化物であるGd2O3およびYb2O3の溶射粉末を、エアロプラズマ社製ASP7100プラズマ溶射機を使用して、電圧275V、電流110A、アルゴンガス流量25L/min、酸素ガス流量40L/minの溶射条件にて、ブラスト処理を施した棒状のアルミニウム基材上(表面粗さRa5.11μm)に溶射し、200μm〜300μmの酸化物皮膜を形成した。その後、この酸化物皮膜を形成した基材と別の棒状のアルミニウム基材とを接着剤にて接合し、引張により剥離する強度、すなわち、密着強度を測定した。(JISH8666に準じた試験方法)
平均粒径が30μm〜40μm、Fe2O3を8ppm含むYの酸化物であるY2O3の溶射粉末を、エアロプラズマ社製ASP7100プラズマ溶射機を使用し、電圧275V、電流110A、アルゴンガス流量25L/min、酸素ガス流量40L/minの溶射条件にて、ブラスト処理を施した棒状のアルミニウム基材上(表面粗さRa5.02μm)に溶射し、200μm〜300μmの酸化物皮膜を形成した。その後、この酸化物皮膜を形成した基材と別の棒状のアルミニウム基材とを接着剤にて接合し、引張により剥離する強度、すなわち、密着強度を測定した。(JISH8666に準じた試験方法)
Claims (3)
- 基材にGdの酸化物を含む酸化物皮膜を形成してなり、前記酸化物皮膜には酸化第二鉄(Fe 2 O 3 )が5ppmより多く含まれ、50ppmより少なく含まれていることを特徴とする耐食性部材。
- 前記酸化物皮膜は溶射法により形成され、気孔率が5〜15%で、かつ、厚さが100〜1000μmであることを特徴とする請求項1に記載の耐食性部材。
- 半導体製造装置内、またはフラットパネルディスプレイ製造装置内、または太陽電池製造装置内で使用されることを特徴とする請求項2に記載の耐食性部材。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009543826A JP5412290B2 (ja) | 2007-11-30 | 2008-11-26 | 耐食性部材 |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007311117 | 2007-11-30 | ||
JP2007311117 | 2007-11-30 | ||
JP2008176272 | 2008-07-04 | ||
JP2008176272 | 2008-07-04 | ||
PCT/JP2008/071438 WO2009069650A1 (ja) | 2007-11-30 | 2008-11-26 | 耐食性部材 |
JP2009543826A JP5412290B2 (ja) | 2007-11-30 | 2008-11-26 | 耐食性部材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2009069650A1 JPWO2009069650A1 (ja) | 2011-04-14 |
JP5412290B2 true JP5412290B2 (ja) | 2014-02-12 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009543826A Active JP5412290B2 (ja) | 2007-11-30 | 2008-11-26 | 耐食性部材 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5412290B2 (ja) |
TW (1) | TWI444331B (ja) |
WO (1) | WO2009069650A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5390166B2 (ja) * | 2008-10-30 | 2014-01-15 | 株式会社日本セラテック | 耐食性部材 |
JP5390167B2 (ja) * | 2008-10-30 | 2014-01-15 | 株式会社日本セラテック | 耐食性部材 |
JP2010126776A (ja) * | 2008-11-28 | 2010-06-10 | Nihon Ceratec Co Ltd | 耐食性部材およびその製造方法 |
CN112908519B (zh) * | 2021-01-19 | 2022-04-12 | 大正(江苏)微纳科技有限公司 | 一种抗化学腐蚀的透明导电薄膜及其制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004190056A (ja) * | 2002-12-09 | 2004-07-08 | Shin Etsu Chem Co Ltd | 耐熱性被覆部材 |
JP2007138288A (ja) * | 2005-10-21 | 2007-06-07 | Shin Etsu Chem Co Ltd | 多層コート耐食性部材 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05148610A (ja) * | 1991-11-26 | 1993-06-15 | Kurosaki Refract Co Ltd | 溶射材 |
JP3672833B2 (ja) * | 2000-06-29 | 2005-07-20 | 信越化学工業株式会社 | 溶射粉及び溶射被膜 |
-
2008
- 2008-11-25 TW TW097145508A patent/TWI444331B/zh active
- 2008-11-26 JP JP2009543826A patent/JP5412290B2/ja active Active
- 2008-11-26 WO PCT/JP2008/071438 patent/WO2009069650A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004190056A (ja) * | 2002-12-09 | 2004-07-08 | Shin Etsu Chem Co Ltd | 耐熱性被覆部材 |
JP2007138288A (ja) * | 2005-10-21 | 2007-06-07 | Shin Etsu Chem Co Ltd | 多層コート耐食性部材 |
Also Published As
Publication number | Publication date |
---|---|
TWI444331B (zh) | 2014-07-11 |
JPWO2009069650A1 (ja) | 2011-04-14 |
WO2009069650A1 (ja) | 2009-06-04 |
TW200936504A (en) | 2009-09-01 |
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