WO2009069650A1 - 耐食性部材 - Google Patents

耐食性部材 Download PDF

Info

Publication number
WO2009069650A1
WO2009069650A1 PCT/JP2008/071438 JP2008071438W WO2009069650A1 WO 2009069650 A1 WO2009069650 A1 WO 2009069650A1 JP 2008071438 W JP2008071438 W JP 2008071438W WO 2009069650 A1 WO2009069650 A1 WO 2009069650A1
Authority
WO
WIPO (PCT)
Prior art keywords
halogen
producing
type
corrosion
ppm
Prior art date
Application number
PCT/JP2008/071438
Other languages
English (en)
French (fr)
Inventor
Hiromasa Shimojima
Makoto Sakamaki
Yoshifumi Tsutai
Yukio Inoue
Original Assignee
Nihon Ceratec Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Ceratec Co., Ltd. filed Critical Nihon Ceratec Co., Ltd.
Priority to JP2009543826A priority Critical patent/JP5412290B2/ja
Publication of WO2009069650A1 publication Critical patent/WO2009069650A1/ja

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00Coating starting from inorganic powder
    • C23C24/02Coating starting from inorganic powder by application of pressure only
    • C23C24/04Impact or kinetic deposition of particles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11Oxides

Abstract

 半導体製造装置内、フラットパネルディスプレイ製造装置内または太陽電池製造装置内のようにハロゲン系腐食ガスまたはハロゲン系ガスプラズマ雰囲気中に曝される面の耐食性を高め、長期間の使用を可能にする。そのため、GdまたはYbを含み、かつ、鉄族金属化合物が酸化物換算で5ppmより多く、50ppmよりも少なく含まれている酸化物皮膜で耐食性部材を形成することで、ハロゲン系腐食ガスまたはハロゲン系ガスプラズマに対する十分な耐食性を確保し、パーティクルの発生を少なくする。
PCT/JP2008/071438 2007-11-30 2008-11-26 耐食性部材 WO2009069650A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009543826A JP5412290B2 (ja) 2007-11-30 2008-11-26 耐食性部材

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-311117 2007-11-30
JP2007311117 2007-11-30
JP2008-176272 2008-07-04
JP2008176272 2008-07-04

Publications (1)

Publication Number Publication Date
WO2009069650A1 true WO2009069650A1 (ja) 2009-06-04

Family

ID=40678545

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/071438 WO2009069650A1 (ja) 2007-11-30 2008-11-26 耐食性部材

Country Status (3)

Country Link
JP (1) JP5412290B2 (ja)
TW (1) TWI444331B (ja)
WO (1) WO2009069650A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010106319A (ja) * 2008-10-30 2010-05-13 Nihon Ceratec Co Ltd 耐食性部材
JP2010106317A (ja) * 2008-10-30 2010-05-13 Nihon Ceratec Co Ltd 耐食性部材
JP2010126776A (ja) * 2008-11-28 2010-06-10 Nihon Ceratec Co Ltd 耐食性部材およびその製造方法
CN112908519A (zh) * 2021-01-19 2021-06-04 大正(江苏)微纳科技有限公司 一种抗化学腐蚀的透明导电薄膜及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05148610A (ja) * 1991-11-26 1993-06-15 Kurosaki Refract Co Ltd 溶射材
JP2002080954A (ja) * 2000-06-29 2002-03-22 Shin Etsu Chem Co Ltd 溶射粉及び溶射被膜
JP2004190056A (ja) * 2002-12-09 2004-07-08 Shin Etsu Chem Co Ltd 耐熱性被覆部材
JP2007138288A (ja) * 2005-10-21 2007-06-07 Shin Etsu Chem Co Ltd 多層コート耐食性部材

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05148610A (ja) * 1991-11-26 1993-06-15 Kurosaki Refract Co Ltd 溶射材
JP2002080954A (ja) * 2000-06-29 2002-03-22 Shin Etsu Chem Co Ltd 溶射粉及び溶射被膜
JP2004190056A (ja) * 2002-12-09 2004-07-08 Shin Etsu Chem Co Ltd 耐熱性被覆部材
JP2007138288A (ja) * 2005-10-21 2007-06-07 Shin Etsu Chem Co Ltd 多層コート耐食性部材

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010106319A (ja) * 2008-10-30 2010-05-13 Nihon Ceratec Co Ltd 耐食性部材
JP2010106317A (ja) * 2008-10-30 2010-05-13 Nihon Ceratec Co Ltd 耐食性部材
JP2010126776A (ja) * 2008-11-28 2010-06-10 Nihon Ceratec Co Ltd 耐食性部材およびその製造方法
CN112908519A (zh) * 2021-01-19 2021-06-04 大正(江苏)微纳科技有限公司 一种抗化学腐蚀的透明导电薄膜及其制备方法
CN112908519B (zh) * 2021-01-19 2022-04-12 大正(江苏)微纳科技有限公司 一种抗化学腐蚀的透明导电薄膜及其制备方法

Also Published As

Publication number Publication date
JPWO2009069650A1 (ja) 2011-04-14
JP5412290B2 (ja) 2014-02-12
TW200936504A (en) 2009-09-01
TWI444331B (zh) 2014-07-11

Similar Documents

Publication Publication Date Title
TWI518189B (zh) 具優異絕緣性且熱膨脹係數小之不鏽鋼製太陽電池用基板及其製造方法
UA98118C2 (uk) Порошкоподібний оксид цирконію, спосіб його одержання та застосування, пресований виріб, субстрат та паливний елемент, які його містять
EP2019813A4 (en) PROCESS FOR PRODUCING PHOTOVOLTAIC CELLS WITH ANTIREFLECTIVE LAYER USING CCVD (COMBUSTION CHEMICAL VAPOR DEPOSITION) AND PRODUCT OBTAINED
MX2012003128A (es) Composicion de recubrimiento de poliuretano.
WO2007084564A3 (en) Insulated glass unit with sealant composition having reduced permeability to gas
TW200740992A (en) Cleaning composition
EP2361882A3 (en) Conductive member provided with amorphous carbon film, process for its manufacture and fuel cell separator
WO2009069650A1 (ja) 耐食性部材
WO2009031383A1 (ja) 触媒およびその製造方法ならびにその用途
WO2009143376A3 (en) Ionic liquids and methods for using the same
WO2010076791A3 (en) Luminescent solar concentrator
WO2010026571A3 (en) Metal nanowire thin-films
IL184290A0 (en) High efficiency hypochlorite anode coating
TW201129704A (en) Oxide vapor deposition material and transparent electroconductive membrane and solar cell
TN2011000458A1 (en) Thin film coating and method of making of making the same
WO2011146895A3 (en) Glass substrates for high temperature applications
TW201130055A (en) Method for manufacturing oxide semiconductor film and method for manufacturing semiconductor device
MY156201A (en) Ferromagnetic sputtering target and method for manufacturing same
WO2009060902A1 (ja) セラミックス基板、セラミックス基板の製造方法及びパワーモジュール用基板の製造方法
MX2010004588A (es) Proceso y aparato para tratarn un gas que contiene un contaminante.
SG159487A1 (en) Metallic seal for use in highly-corrosive oil and gas environments
MY151123A (en) Solution and process for increasing the solderability and corrosion resistance of metal or metal alloy surface
EP2495792A3 (en) Solid oxide fuel cell
UA91745C2 (en) Non-evaporable getter alloy and non-evaporable getter device
JP2010106327A5 (ja)

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08855225

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2009543826

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08855225

Country of ref document: EP

Kind code of ref document: A1