JP5412131B2 - 基板処理装置および基板処理方法 - Google Patents

基板処理装置および基板処理方法 Download PDF

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Publication number
JP5412131B2
JP5412131B2 JP2009033382A JP2009033382A JP5412131B2 JP 5412131 B2 JP5412131 B2 JP 5412131B2 JP 2009033382 A JP2009033382 A JP 2009033382A JP 2009033382 A JP2009033382 A JP 2009033382A JP 5412131 B2 JP5412131 B2 JP 5412131B2
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liquid
microbubbles
substrate
chamber
nanobubbles
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Japanese (ja)
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JP2010192549A5 (enrdf_load_stackoverflow
JP2010192549A (ja
Inventor
治道 廣瀬
正泰 安部
幸伸 西部
勉 菊池
佳大 安藤
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009033382A 2009-02-17 2009-02-17 基板処理装置および基板処理方法 Expired - Fee Related JP5412131B2 (ja)

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JP2009033382A JP5412131B2 (ja) 2009-02-17 2009-02-17 基板処理装置および基板処理方法

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JP2009033382A JP5412131B2 (ja) 2009-02-17 2009-02-17 基板処理装置および基板処理方法

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JP2010192549A JP2010192549A (ja) 2010-09-02
JP2010192549A5 JP2010192549A5 (enrdf_load_stackoverflow) 2012-03-29
JP5412131B2 true JP5412131B2 (ja) 2014-02-12

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012090815A1 (ja) * 2010-12-28 2012-07-05 シャープ株式会社 レジスト除去装置及びレジスト除去方法
JP2012250301A (ja) * 2011-05-31 2012-12-20 Kyocera Crystal Device Corp ナノバブル循環型研磨装置
JP5854668B2 (ja) * 2011-07-07 2016-02-09 芝浦メカトロニクス株式会社 気液混合流体生成装置、気液混合流体生成方法、処理装置及び処理方法
KR101945566B1 (ko) * 2011-07-29 2019-02-07 도쿄엘렉트론가부시키가이샤 처리액 공급 장치, 처리액 공급 방법 및 컴퓨터 기억 매체
JP5781015B2 (ja) * 2012-05-31 2015-09-16 三菱電機株式会社 ウェハ洗浄装置及び洗浄槽の洗浄方法
JP6372329B2 (ja) * 2014-12-03 2018-08-15 富士通セミコンダクター株式会社 半導体装置の製造方法
TWI718962B (zh) * 2020-06-11 2021-02-11 威光自動化科技股份有限公司 液管內之氣泡篩選器

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3205413B2 (ja) * 1993-02-15 2001-09-04 株式会社日立製作所 微粒子計測装置及び微粒子計測方法
JP2006179765A (ja) * 2004-12-24 2006-07-06 Dainippon Screen Mfg Co Ltd 基板処理装置およびパーティクル除去方法
JP2007117799A (ja) * 2005-10-25 2007-05-17 Goto Tekkosho:Kk 微細気泡生成器及びこれを用いた微細気泡生成装置

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